Face mask
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Description
The broken lines illustrate portions of the face mask that form no part of the claimed design.
Claims
The ornamental design for a face mask as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
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- T-61 Half Face Respirator Gas Mask with Organic Vapor and Particulate Filtration by Parcil Safety. Oldest review date: Jan. 6, 2019. Retrieval date: Feb. 22, 2024. Retrieved from internet: https://parcilsafety.com/products/t61-gas-mask-respirator (Year: 2019).
- Bacinska et al., U.S. Appl. No. 29/776,776 for “Face Mask”, (unpublished, filed Mar. 31, 2021).
- Hammer et al., U.S. Appl. No. 29/799,138 for “Respirator”, (unpublished, filed Jul. 13, 2021).
- McBrady et al., U.S. Appl. No. 29/772,157 for “Mask”, (unpublished, filed Feb. 26, 2021).
- CN Notice of Allowance Mailed on Apr. 23, 2024 for CN Application No. 202230747071, 2 page(s).
- CN Notice of Allowance Mailed on May 20, 2024 for CN Application No. 202330838664, 2 page(s).
- English translation of CN Notice of Allowance dated Apr. 23, 2024 for CN Application No. 202230747071, 2 page(s).
- English translation of CN Notice of Allowance dated May 20, 2024 for CN Application No. 202330838664, 2 page(s).
Patent History
Patent number: D1061872
Type: Grant
Filed: May 24, 2022
Date of Patent: Feb 11, 2025
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Chuang Ma (Shanghai), Sheng Zhou (Shanghai), Hongbing Xiang (Shanghai), Xiaojin Han (Shanghai)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/839,787
Type: Grant
Filed: May 24, 2022
Date of Patent: Feb 11, 2025
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Chuang Ma (Shanghai), Sheng Zhou (Shanghai), Hongbing Xiang (Shanghai), Xiaojin Han (Shanghai)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/839,787
Classifications
Current U.S. Class:
Mask (D24/110.1)