Face mask

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Description

FIG. 1 is a first perspective view of a face mask showing the new design, shown in an unassembled configuration;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a right side elevation view thereof;

FIG. 5 is a left side elevation view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines depict portions of the face mask that form no part of the claimed design.

Claims

The ornamental design for a face mask as shown and described.

Referenced Cited
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Patent History
Patent number: D1066648
Type: Grant
Filed: Jun 28, 2024
Date of Patent: Mar 11, 2025
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Xiaojin Han (Shanghai), Seven Zhou (Shanghai), Hongbing Xiang (Shanghai), Weifeng Shen (Shanghai), Xia Jin Zhao (Shanghai), Teicheng Qu (Shanghai)
Primary Examiner: Omeed Agilee
Assistant Examiner: Michael Hoffman
Application Number: 29/949,828
Classifications
Current U.S. Class: Mask (D24/110.1)