Mask
Latest DCSTAR INC Patents:
Description
The broken lines depict portions of the mask that form no part of the claimed design.
Claims
The ornamental design for a mask, as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
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Patent History
Patent number: D1090820
Type: Grant
Filed: May 9, 2024
Date of Patent: Aug 26, 2025
Assignee: DCSTAR INC (New York, NY)
Inventor: David Luo (New York, NY)
Primary Examiner: Michelle E. Wilson
Assistant Examiner: Maheen Khurshid
Application Number: 29/941,491
Type: Grant
Filed: May 9, 2024
Date of Patent: Aug 26, 2025
Assignee: DCSTAR INC (New York, NY)
Inventor: David Luo (New York, NY)
Primary Examiner: Michelle E. Wilson
Assistant Examiner: Maheen Khurshid
Application Number: 29/941,491
Classifications
Current U.S. Class:
Mask (D24/110.1)