Nasal mask

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Description

FIG. 1 is a top, front and left perspective view of a nasal mask showing our new design;

FIG. 2 is a bottom, rear and right perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a top plan view thereof; and,

FIG. 8 is a bottom plan view thereof.

The broken lines in the drawings depict portions of the nasal mask that form no part of the claimed design.

Claims

The ornamental design for a nasal mask as shown and described.

Referenced Cited
U.S. Patent Documents
D623288 September 7, 2010 Lubke
D664250 July 24, 2012 Scheiner
D820432 June 12, 2018 Scheiner
D930148 September 7, 2021 Dantanarayana
D930150 September 7, 2021 Manjunath
D1002001 October 17, 2023 McCracken
D1033632 July 2, 2024 He
20130152938 June 20, 2013 Jablonski
20210093820 April 1, 2021 Grashow
20230057539 February 23, 2023 Chien
20240408339 December 12, 2024 Wang
Foreign Patent Documents
6199192 March 2022 GB
Other references
  • Nasal Mask (N6) by BMC Medical. Retrieval date: Sep. 4, 2024. Retrieved from internet: https://en.bmc-medical.com/products/mask/nasal-mask/333.html (Year: 2024).
Patent History
Patent number: D1094693
Type: Grant
Filed: Mar 30, 2022
Date of Patent: Sep 23, 2025
Assignee: BMC Medical Co., Ltd. (Beijing)
Inventors: Yajie Wang (Beijing), Mingzhao Zhou (Beijing), Zhi Zhuang (Beijing)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/832,779
Classifications