Mask

- DCSTAR INC
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Description

FIG. 1 is a front view of a mask showing my new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a top view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a perspective view thereof; and,

FIG. 8 is another perspective view thereof.

The broken lines depict portions of the mask that form no part of the claimed design.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D933814 October 19, 2021 Eves
D977628 February 7, 2023 Eves
D978331 February 14, 2023 Eves
D1019936 March 26, 2024 He
D1031020 June 11, 2024 Eves
D1031973 June 18, 2024 He
D1069102 April 1, 2025 He
D1078987 June 10, 2025 Meirav
20240390626 November 28, 2024 Luo
Foreign Patent Documents
309190292 March 2015 CN
015075473-0009 November 2024 EM
015075473-0010 November 2024 EM
015075473-0011 November 2024 EM
Patent History
Patent number: D1098411
Type: Grant
Filed: May 2, 2024
Date of Patent: Oct 14, 2025
Assignee: DCSTAR INC (New York, NY)
Inventor: David Luo (New York, NY)
Primary Examiner: Lilyana Bekic
Application Number: 29/940,514
Classifications