Face mask

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Description

FIG. 1 is a front view of a face mask showing my new design; with the rear view being a mirror image thereof;

FIG. 2 is a top view thereof;

FIG. 3 is a bottom view thereof;

FIG. 4 is a right-side view thereof;

FIG. 5 is a left-side view thereof; and,

FIG. 6 is a perspective view thereof, shown in an open state.

Claims

The ornamental design for a face mask, as shown and described.

Referenced Cited
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Other references
  • “ChiSip”. Found on amazon.com, dated Jan. 4, 2021. Retrieved May 7, 2025 from URL: https://www.amazon.com/KN95-Mask-Breathable-Protection-PM2-5/dp/B08VDRN3W6/ (Year: 2021).
  • “Lement”. Found on amazon.com, dated Mar. 8, 2021. Retrieved May 7, 2025 from URL: https://www.amazon.com/Safety-Filter-Efficiency%E2%89%A595-Breathable-Elastic/dp/B08Y8NVW6Y/ (Year: 2021).
  • An Office Action mailed by the Japanese Patent Office on Sep. 7, 2021, which corresponds to Japanese Design Application No. 2020-026075; with English language concise translation.
  • A Notice of Allowance mailed by the Japanese Patent Office on Dec. 21, 2022, in Japanese Design Application No. 2021-010266 related to Design U.S. Appl. No. 29/799,005; with English language concise translation.
  • A Notification mailed by the Japanese Patent Office on Dec. 21, 2022, in Japanese Design Application No. 2021-010266 related to Design U.S. Appl. No. 29/799,005; with English language concise translation.
  • An Office Action mailed by the Japanese Patent Office on Oct. 26, 2021, which corresponds to Japanese Design Application No. 2021-00847 and is related to Design U.S. Appl. No. 29/799,005; with English language concise translation.
  • A Notice of Allowance mailed by Taiwan Intellectual Property Office on Apr. 8, 2022, which corresponds to Taiwanese Design Application No. 29/799,005 and is related to Design U.S. Appl. No. 29/799,005 with English language Concise Explanation.
Patent History
Patent number: D1112717
Type: Grant
Filed: Jul 12, 2021
Date of Patent: Feb 10, 2026
Assignee: Iris Ohyama Inc. (Sendai)
Inventor: Rie Maeda (Kakuda)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Michael Hoffman
Application Number: 29/799,005
Classifications
Current U.S. Class: Mask (D24/110.1)