Mask

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Description

FIG. 1 is a front perspective view of a mask, showing my new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a left side elevation view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a rear perspective view thereof.

The washed-out lighter gray portions in the drawings are for the purpose of illustrating portions of the mask which form no part of the claimed design. The broken lines in the drawings immediately adjacent to and surrounding the dark gray photographic area represent the bounds of the claimed design and form no part thereof.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
869741 October 1907 Seitzman
D487510 March 9, 2004 Guney
D571459 June 17, 2008 D'Souza
D578207 October 7, 2008 D'Souza
D600342 September 15, 2009 D'Souza
D956955 July 5, 2022 Trebino
D962420 August 30, 2022 Smith, IV
D974544 January 3, 2023 Perez
D1028222 May 21, 2024 Shin
D1031174 June 11, 2024 Shin
D1057147 January 7, 2025 Shin
Patent History
Patent number: D1133151
Type: Grant
Filed: Jun 11, 2025
Date of Patent: Jul 7, 2026
Inventor: Jae Won Shin (Seoul)
Primary Examiner: Joseph Kukella
Application Number: 30/007,835
Classifications
Current U.S. Class: Mask (D24/110.1)