Mask

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Description

FIG. 1 is a perspective view of a mask, showing my new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a left side elevation view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The washed-out lighter gray portions are for the purpose of illustrating portions of the mask which form no part of the claimed design. The broken lines immediately adjacent to and surrounding the dark gray photographic area represent the bounds of the claimed design and form no part thereof.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D823454 July 17, 2018 Bornholdt
D962420 August 30, 2022 Smith, IV
D974544 January 3, 2023 Perez
D1028222 May 21, 2024 Shin
D1031174 June 11, 2024 Shin
D1057147 January 7, 2025 Shin
Patent History
Patent number: D1134821
Type: Grant
Filed: Jun 11, 2025
Date of Patent: Jul 14, 2026
Inventor: Jae Won Shin (Seoul)
Primary Examiner: Joseph Kukella
Application Number: 30/007,838
Classifications
Current U.S. Class: Mask (D24/110.1)