Mask
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Description
The broken lines depict portions of the mask that form no part of the claimed design.
Claims
The ornamental design for a mask, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
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Patent History
Patent number: D1146016
Type: Grant
Filed: Jul 7, 2025
Date of Patent: Sep 1, 2026
Assignee: DCSTAR INC (New York, NY)
Inventor: Ligui He (New York, NY)
Primary Examiner: Christopher M Spivey
Application Number: 30/011,935
Type: Grant
Filed: Jul 7, 2025
Date of Patent: Sep 1, 2026
Assignee: DCSTAR INC (New York, NY)
Inventor: Ligui He (New York, NY)
Primary Examiner: Christopher M Spivey
Application Number: 30/011,935
Classifications