High conductance low wall deposition upper shield

- Applied Materials, Inc.
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Description

FIG. 1 is a perspective view showing the top of a shield of the invention;

FIG. 2 is a perspective view showing the bottom of a shield of the invention;

FIG. 3 is a top view;

FIG. 4 is a bottom view;

FIG. 5 is a side perspective view; and,

FIG. 6 is a cross sectional view along line 6--6 of FIG. 3.

Referenced Cited
U.S. Patent Documents
5391275 February 21, 1995 Mintz
5456756 October 10, 1995 Ramaswami et al.
5552124 September 3, 1996 Su
Patent History
Patent number: D403337
Type: Grant
Filed: Aug 5, 1997
Date of Patent: Dec 29, 1998
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Inventor: David Tsuenwai Or (Sunnyvale, CA)
Primary Examiner: Antoine Duval Davis
Law Firm: Patterson & Streets, L.L.P.
Application Number: 0/74,544
Classifications
Current U.S. Class: Miscellaneous (D15/199)
International Classification: 1599;