Mask
Description
FIG. 1 is a perspective view of a mask showing my new design;
FIG. 2 is a side elevation as seen from the right side of FIG. 1;
FIG. 3 is a side elevation as seen from the left side of FIG. 1;
FIG. 4 is a front elevation thereof;
FIG. 5 is a rear elevation thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
Claims
The ornamental design for a mask, as shown and described.
Referenced Cited
Patent History
Patent number: D470551
Type: Grant
Filed: Aug 6, 1999
Date of Patent: Feb 18, 2003
Inventor: Chi-Chin Lin (Sung San Dist., Taipei)
Primary Examiner: Lucy Lieberman
Attorney, Agent or Law Firm: Powell Goldstein Frazer & Murphy LLP
Application Number: 29/108,927
Type: Grant
Filed: Aug 6, 1999
Date of Patent: Feb 18, 2003
Inventor: Chi-Chin Lin (Sung San Dist., Taipei)
Primary Examiner: Lucy Lieberman
Attorney, Agent or Law Firm: Powell Goldstein Frazer & Murphy LLP
Application Number: 29/108,927
Classifications
Current U.S. Class:
Mask (D21/660);
Alien Type (e.g., Humanoid Space Monster Or Creature) (D21/622)
International Classification: 2103;
International Classification: 2103;