Mask

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Description

FIG. 1 is a perspective view of a mask showing my new design;

FIG. 2 is a side elevation as seen from the right side of FIG. 1;

FIG. 3 is a side elevation as seen from the left side of FIG. 1;

FIG. 4 is a front elevation thereof;

FIG. 5 is a rear elevation thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
3883982 May 1975 McClary
D282861 March 4, 1986 Koper
D357038 April 4, 1995 Sandvik
D366074 January 9, 1996 Sandvik
5970522 October 26, 1999 Apichom
D429507 August 15, 2000 Chou
Other references
  • Hong Kong Toys, vol. 1, 1995, p. 211, item #161, masks.
Patent History
Patent number: D470551
Type: Grant
Filed: Aug 6, 1999
Date of Patent: Feb 18, 2003
Inventor: Chi-Chin Lin (Sung San Dist., Taipei)
Primary Examiner: Lucy Lieberman
Attorney, Agent or Law Firm: Powell Goldstein Frazer & Murphy LLP
Application Number: 29/108,927
Classifications
Current U.S. Class: Mask (D21/660); Alien Type (e.g., Humanoid Space Monster Or Creature) (D21/622)
International Classification: 2103;