Apertured continuous filament fabric

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Description

The sole FIGURE is an enlarged, fragmentary front elevational view of an apertured continuous filament fabric embodying the present design, with the opposite elevational view being a mirror image.

Claims

The ornamental design for an apertured continuous filament fabric, substantially as shown and described.

Referenced Cited
U.S. Patent Documents
D34599 May 1901 Townsend
D38047 May 1906 Conde
D58860 August 1921 Worms
D61590 October 1922 Messina
1852936 April 1932 Oscar
D88352 November 1932 Huber
D92165 May 1934 de Liso
D100743 August 1936 Siner
2052088 August 1936 Drumheller
D102276 December 1936 Huber
D102340 December 1936 Siner
D102846 January 1937 Siner
2880111 March 1959 Drelich et al.
3240657 March 1966 Hynek
3345243 October 1967 Kalwaites
3485706 December 1969 Evans
3558412 January 1971 Kurz
3616154 October 1971 Dow et al.
4548856 October 22, 1985 Ali Khan et al.
5645504 July 8, 1997 Westhoff
D478217 August 12, 2003 Bruner et al.
D481872 November 11, 2003 Hennel et al.
Patent History
Patent number: D495150
Type: Grant
Filed: Nov 24, 2003
Date of Patent: Aug 31, 2004
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventors: Gary Hennel (Troutman, NC), Nick Carter (Mooresville, NC)
Primary Examiner: James Gandy
Assistant Examiner: T. Chase Nelson
Attorney, Agent or Law Firm: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/194,419
Classifications
Current U.S. Class: D5/47
International Classification: 0505;