Hat

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Description

FIG. 1 is an enlarged perspective view of a hat showing my new design;

FIG. 2 is a top view thereof;

FIG. 3 is a bottom view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a front elevational view thereof; and,

FIG. 7 is a rear elevational view thereof.

The broken lines showing in each of the Figures represent stitching that forms a part of the claimed design.

Claims

The ornamental design for a hat, as shown and described.

Referenced Cited
U.S. Patent Documents
341998 May 1886 Lott et al.
1894213 January 1933 Ostolaza
D153538 April 1949 Morre
D169486 May 1953 Hoeflich
3195864 July 1965 Case
D350427 September 13, 1994 Vig et al.
D392926 March 31, 1998 Adelaar
5802617 September 8, 1998 Boden
D406438 March 9, 1999 Morais
D418179 December 28, 1999 Hansen
6021931 February 8, 2000 Plastino
6499435 December 31, 2002 Markham
6561393 May 13, 2003 Cheng
Patent History
Patent number: D522720
Type: Grant
Filed: Oct 8, 2004
Date of Patent: Jun 13, 2006
Inventor: Cherryll A. Leblanc (Beaumont, TX)
Primary Examiner: Robert M. Spear
Assistant Examiner: Mary Ann Calabrese
Attorney: Stephen R. Greiner
Application Number: 29/214,688
Classifications
Current U.S. Class: D2/873; D2/888