Photomask blank
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Description
FIG. 1 is a front elevational view of a photomask blank showing my new design;
FIG. 2 is a rear elevational view thereof;
FIG. 3 is a left side view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is an enlarged partial front view along line 7—7 in FIG. 1;
FIG. 8 is a reduced scale front, left side, top perspective view of the portion shown in FIG. 7; and,
FIG. 9 is a sectional view along line 9—9 in FIG. 7.
The broken line showing is for illustrative purposes only and forms no part of the claimed design.
Claims
The ornamental design for a photomask blank, as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
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- U.S. Appl. No. 29/213,841, filed Sep. 23, 2004, Inventors: Masaru Mitsui, et al., Entitled: Photomask Blank.
Patent History
Patent number: D537048
Type: Grant
Filed: Sep 23, 2004
Date of Patent: Feb 20, 2007
Assignee: Hoya Corporation (Tokyo)
Inventor: Masaru Mitsui (Mukawa-mura)
Primary Examiner: Selina Sikder
Attorney: Frishauf, Holtz, Goodman & Chick, P.C.
Application Number: 29/213,840
Type: Grant
Filed: Sep 23, 2004
Date of Patent: Feb 20, 2007
Assignee: Hoya Corporation (Tokyo)
Inventor: Masaru Mitsui (Mukawa-mura)
Primary Examiner: Selina Sikder
Attorney: Frishauf, Holtz, Goodman & Chick, P.C.
Application Number: 29/213,840
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)