Line laser with nail location means
Latest Kapro Industries Ltd. Patents:
Description
FIG. 1 is a top perspective view of a line laser with nail location means according to a first embodiment;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a right elevational view thereof;
FIG. 5 is a bottom plan view thereof;
FIG. 6 is a left side elevation view thereof;
FIG. 7 is a front elevational view thereof; and,
FIG. 8 is a rear elevational view thereof.
Claims
The ornamental design for a line laser with nail location means, as shown and described.
Referenced Cited
U.S. Patent Documents
D491080 | June 8, 2004 | Wu |
D504627 | May 3, 2005 | Harju |
D526225 | August 8, 2006 | Liao |
D527294 | August 29, 2006 | Lu |
D529403 | October 3, 2006 | Liu |
20040187327 | September 30, 2004 | Levine |
20040258126 | December 23, 2004 | Levine |
20050246912 | November 10, 2005 | Marshall et al. |
20050274030 | December 15, 2005 | Spanski et al. |
20060017427 | January 26, 2006 | Nash et al. |
Patent History
Patent number: D540707
Type: Grant
Filed: Dec 27, 2005
Date of Patent: Apr 17, 2007
Assignee: Kapro Industries Ltd. (Hakarem)
Inventors: Paul Steiner (D.N. Bikat Beit Ha'kerem), Amy Levinson (Upper Galilee)
Primary Examiner: Antoine D. Davis
Assistant Examiner: Patricia Palasik
Attorney: The Nath Law Group
Application Number: 29/245,481
Type: Grant
Filed: Dec 27, 2005
Date of Patent: Apr 17, 2007
Assignee: Kapro Industries Ltd. (Hakarem)
Inventors: Paul Steiner (D.N. Bikat Beit Ha'kerem), Amy Levinson (Upper Galilee)
Primary Examiner: Antoine D. Davis
Assistant Examiner: Patricia Palasik
Attorney: The Nath Law Group
Application Number: 29/245,481
Classifications
Current U.S. Class:
Spirit Level (D10/69);
Linear Or Distance (9) (D10/70);
Angle Or Direction (7) (D10/65)