Facial skin observation device

- Moritex Corporation
Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a front elevational view of a facial skin observation device, showing my new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a right side elevational view thereof, the left side being a mirror image;

FIG. 4 is a top plan view thereof;

FIG. 5 is a bottom plan view thereof; and,

FIG. 6 is a perspective view thereof, shown at a reduced scale.

Claims

I claim the ornamental design for a facial skin observation device, as shown and described.

Referenced Cited
U.S. Patent Documents
D225090 November 1972 Lyuos
4911544 March 27, 1990 Walsh
5938593 August 17, 1999 Ouellette
6280438 August 28, 2001 Eckhouse et al.
6436127 August 20, 2002 Anderson et al.
D483872 December 16, 2003 Cruz
D492414 June 29, 2004 Perry et al.
D492997 July 13, 2004 DiStasio
6902563 June 7, 2005 Wilkens et al.
20040122702 June 24, 2004 Sabol et al.
20040125996 July 1, 2004 Eddowes et al.
20060052719 March 9, 2006 Ruvolo et al.
Other references
  • U.S. Appl. No. 29/218,046 to ASAI, filed Nov. 29, 2004.
  • U.S. Appl. No. 29/218,047 to ASAI, filed Nov. 29, 2004.
Patent History
Patent number: D548326
Type: Grant
Filed: Nov 29, 2004
Date of Patent: Aug 7, 2007
Assignee: Moritex Corporation (Tokyo)
Inventor: Yoshiyuki Asai (Saitama)
Primary Examiner: Carol Rademaker
Assistant Examiner: Anna Burmeister
Attorney: Greenblum & Bernstein, P.L.C.
Application Number: 29/218,045
Classifications
Current U.S. Class: Equipment For Diagnosis, Analysis, Or Treatment (D24/107)