Mask

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Description

FIG. 1 is a perspective view of a mask showing my design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D407858 April 6, 1999 Cyr et al.
6957447 October 25, 2005 Broersma
D518605 April 4, 2006 Chen
D522697 June 6, 2006 Chen
D526094 August 1, 2006 Chen
D529234 September 26, 2006 Broersma
D529662 October 3, 2006 Broersma
D536833 February 13, 2007 Broersma
20040049825 March 18, 2004 DeHaan et al.
20060090234 May 4, 2006 Cyr
Patent History
Patent number: D555837
Type: Grant
Filed: Sep 20, 2006
Date of Patent: Nov 20, 2007
Inventor: Chun-Nan Chen (Tainan)
Primary Examiner: Ruth McInroy
Attorney: Kamrath & Associates PA
Application Number: 29/266,393