Microwave introducing antenna for a plasma processing apparatus

- Tokyo Electron Limited
Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a front view of a microwave introducing antenna for a plasma processing apparatus showing our new design:

FIG. 2 is a right side view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a sectional view taken along line 44 of FIG. 1 thereof; and,

FIG. 5 is a perspective view thereof.

Claims

The ornamental design for a microwave introducing antenna for a plasma processing apparatus, as shown.

Referenced Cited
U.S. Patent Documents
5175561 December 29, 1992 Goto
5661498 August 26, 1997 Goto et al.
6124833 September 26, 2000 Bialkowski et al.
7233297 June 19, 2007 Harvey et al.
20020020498 February 21, 2002 Ohmi et al.
20040021611 February 5, 2004 Iida et al.
20040036660 February 26, 2004 Huor
20050211382 September 29, 2005 Ishii et al.
20050250338 November 10, 2005 Ohmi et al.
20060118241 June 8, 2006 Ohmi et al.
20070134895 June 14, 2007 Matsuyama et al.
20070163617 July 19, 2007 Ozaki et al.
Foreign Patent Documents
2-48806 February 1990 JP
5-67918 March 1993 JP
5-90834 April 1993 JP
5-226927 September 1993 JP
Patent History
Patent number: D563951
Type: Grant
Filed: Jun 14, 2007
Date of Patent: Mar 11, 2008
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Jun Yamashita (Amagasaki), Cai Zhong Tian (Amagasaki)
Primary Examiner: Joel A. Sincavage
Assistant Examiner: John Windmuller
Attorney: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
Application Number: 29/281,087