Chamber block
Latest Tokyo Electron Limited Patents:
- FLUID SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- PLASMA PROCESSING APPARATUS
- INFORMATION PROCESSING METHOD, COMPUTER PROGRAM, INFORMATION PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM
Description
Claims
The ornamental design for a chamber block, as shown.
Patent History
Patent number: D678228
Type: Grant
Filed: Aug 30, 2011
Date of Patent: Mar 19, 2013
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Kouki Suzuki (Nirasaki), Kazuhiro Furuki (Nirasaki), Koichi Yamazaki (Nirasaki)
Primary Examiner: Derrick Holland
Application Number: 29/400,573
Type: Grant
Filed: Aug 30, 2011
Date of Patent: Mar 19, 2013
Assignee: Tokyo Electron Limited (Tokyo)
Inventors: Kouki Suzuki (Nirasaki), Kazuhiro Furuki (Nirasaki), Koichi Yamazaki (Nirasaki)
Primary Examiner: Derrick Holland
Application Number: 29/400,573
Classifications
Current U.S. Class:
Miscellaneous (D13/199)