Substrate thermometry unit
Latest HITACHI KOKUSAI ELECTRIC INC. Patents:
- IMAGE ANALYSIS SYSTEM AN UPDATE METHOD FOR MACHINE LEARNING MODEL
- SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND BAFFLE STRUCTURE OF THE SUBSTRATE PROCESSING APPARATUS
- SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
- SUBSTRATE PROCESSING APPARATUS, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM THEREOF AND SEMICONDUCTOR MANUFACTURING METHOD BY EMPLOYING THEREOF
- SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Description
Claims
I claim the ornamental design for a substrate thermometry unit, as shown (and described).
Referenced Cited
Patent History
Patent number: D795716
Type: Grant
Filed: May 2, 2016
Date of Patent: Aug 29, 2017
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventor: Yukinori Aburatani (Toyama)
Primary Examiner: Antoine D Davis
Application Number: 29/563,047
Type: Grant
Filed: May 2, 2016
Date of Patent: Aug 29, 2017
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventor: Yukinori Aburatani (Toyama)
Primary Examiner: Antoine D Davis
Application Number: 29/563,047
Classifications
Current U.S. Class:
Element Or Attachment (4) (D10/60)