Residual stress measuring device

- Sintokogio, Ltd.
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Description

FIG. 1 is a front elevational view of a residual stress measuring device showing our new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a front, bottom, left side perspective view thereof; and,

FIG. 8 is a rear, top, right side perspective view thereof.

The broken lines illustrate structure or features which form no part of the claimed design.

The drawings include surface shading which represents contour and not surface ornamentation.

Claims

The ornamental design for a residual stress measuring device, as shown and described.

Referenced Cited
U.S. Patent Documents
D400456 November 3, 1998 Inoue
D456290 April 30, 2002 Gunji
D630957 January 18, 2011 Hsieh
D701131 March 18, 2014 Kurisaki
D709393 July 22, 2014 Lee
D737161 August 25, 2015 Okazaki
D750783 March 1, 2016 Yasukawa
D781734 March 21, 2017 Lim
Patent History
Patent number: D798753
Type: Grant
Filed: Jun 16, 2016
Date of Patent: Oct 3, 2017
Assignee: Sintokogio, Ltd.
Inventors: Kyoichi Iwata (Toyokawa), Takuya Koyama (Toyokawa)
Primary Examiner: Antoine D Davis
Application Number: 29/568,277
Classifications
Current U.S. Class: Weight, Force Or Density (D10/83)