Seal member for use in semiconductor production apparatus

Description

1.-4. Seal members for use in semiconductor production apparatus

1.1 : Perspective

1.2 : Front

1.3 : Back

1.4 : Left

1.5 : Right

1.6 : Top

1.7 : Bottom

1.8 : Cross-sectional

1.9 : Partial enlargement of cross-sectional

1.10 : Reference

2.1 : Perspective

2.2 : Front

2.3 : Back

2.4 : Left

2.5 : Right

2.6 : Top

2.7 : Bottom

2.8 : Cross-sectional

2.9 : Partial enlargement of cross-sectional

2.10 : Reference

3.1 : Perspective

3.2 : Front

3.3 : Back

3.4 : Left

3.5 : Right

3.6 : Top

3.7 : Bottom

3.8 : Cross-sectional

3.9 : Partial enlargement of cross-sectional

3.10 : Reference

4.1 : Perspective

4.2 : Front

4.3 : Back

4.4 : Left

4.5 : Right

4.6 : Top

4.7 : Bottom

4.8 : Cross-sectional

4.9 : Partial enlargement of cross-sectional

4.10 : Reference

The present articles are seal members for semiconductor production apparatuses such as chemical vapor deposition apparatuses and dry etching apparatuses; as illustrated in the reproductions 1.10, 2.10, 3.10 and 4.10, each article is to be inserted into grooves of a semiconductor production apparatus; the semiconductor production apparatuses themselves form no part of the claimed designs; the reproductions 1.8, 2.8, 3.8 and 4.8 show transverse cross-sectional front views taken along the horizontal centers of the reproductions 1.6, 2.6, 3.6 and 4.6, respectively; the reproductions 1.9, 2.9, 3.9 and 4.9 are enlarged views showing left end portions of the cross-sectional views 1.8, 2.8, 3.8 and 4.8, respectively.

Claims

The ornamental design for seal member for use in semiconductor production apparatus, as shown and described.