Mask

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Description

FIG. 1 is a perspective view of a mask, showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

We claim, the ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
4827924 May 9, 1989 Japuntich
5617849 April 8, 1997 Springett
D431647 October 3, 2000 Henderson
D449377 October 16, 2001 Henderson
D567937 April 29, 2008 Gerson
7677248 March 16, 2010 Gerson
D698498 January 28, 2014 Fleming
D844253 March 26, 2019 Cho
D877885 March 10, 2020 Bergman
D903097 November 24, 2020 Costella
Foreign Patent Documents
302827489 May 2014 CN
303398052 September 2015 CN
305628635 February 2020 CN
305796091 May 2020 CN
306244724 December 2020 CN
D1644822 October 2019 JP
Patent History
Patent number: D935012
Type: Grant
Filed: Apr 27, 2020
Date of Patent: Nov 2, 2021
Inventors: Yun-Ho Chung (Seoul), Shin-Hyan No (Seoul)
Primary Examiner: Lilyana Bekic
Assistant Examiner: Lee D. Starr
Application Number: 29/732,685
Classifications
Current U.S. Class: Mask (D24/110.1)