Frame for a dust mask
1. Frame for a dust mask
This design is for a frame for a dust mask which is installed inside of the mask; the upper branch of the claimed design is located at the nose of the user and the lower branch of the claimed design is located at the chin of the user; further, the main frame connecting the upper branch and lower branch makes the side shape and contour of the entire mask; in reproduction
Claims
The ornamental design for a frame for a dust mask, as shown and described.
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Type: Grant
Filed: Apr 1, 2020
Date of Patent: Apr 19, 2022
Inventor: Jong Seok Park (Gwacheon-si)
Primary Examiner: Calvin E Vansant
Application Number: 35/510,456