Sanitary mask

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Description

FIG. 1 is a bottom perspective view of a sanitary mask, showing our design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a top perspective view thereof;

FIG. 9 is a rear perspective view thereof;

FIG. 10 is an exploded view thereof; and,

FIG. 11 is a reference view thereof showing the sanitary mask in use.

The broken lines in the drawings show portions of the sanitary mask or environment which form no part of the claimed design.

Claims

We claim the ornamental design for a sanitary mask, as shown and described.

Referenced Cited
U.S. Patent Documents
2038310 April 1936 Cayetano
4319567 March 16, 1982 Magidson
4323063 April 6, 1982 Fisichella
D265006 June 15, 1982 Levy
D271432 November 15, 1983 Liao
D273145 March 20, 1984 Ponsi
4467799 August 28, 1984 Steinberg
D285733 September 16, 1986 Cooper
D429385 August 8, 2000 Lee
D897606 September 29, 2020 Oliver
D928305 August 17, 2021 Holbrook
11123581 September 21, 2021 Salvino
20060266364 November 30, 2006 Turdjian
Patent History
Patent number: D977086
Type: Grant
Filed: Sep 1, 2020
Date of Patent: Jan 31, 2023
Assignee: R&F Chemical Co., Ltd. (Hanam-si)
Inventors: Dongil Park (Seoul), Soojeong Lee (Seoul), Nayoung Heo (Seoul), Junyeop Shim (Hanam-si), Jaehong Lee (Gwangju-si)
Primary Examiner: Richard Kearney
Assistant Examiner: Michael Hoffman
Application Number: 29/748,863
Classifications