Coating machine
- Beneq Oy
Latest Beneq Oy Patents:
- Atomic layer deposition reactor arrangement and a method for operating an atomic layer deposition reactor arrangement
- Gas feeding cup and a gas manifold assembly
- Precursor source arrangement and atomic layer deposition apparatus
- Apparatus and method for atomic layer deposition (ALD)
- Atomic layer deposition apparatus
Description
The broken lines shown in the figures illustrate environmental structure and form no part of the claimed design.
Claims
The ornamental design for a coating machine, as shown and described.
Referenced Cited
U.S. Patent Documents
D173831 | January 1955 | Blazek et al. |
D567264 | April 22, 2008 | Muller et al. |
D622296 | August 24, 2010 | Ueberschlag |
D674420 | January 15, 2013 | Ueberschlag et al. |
D757136 | May 24, 2016 | Yu |
D837844 | January 8, 2019 | Simpson |
D843423 | March 19, 2019 | Maringer |
D847223 | April 30, 2019 | Bartolo |
D858591 | September 3, 2019 | Koch |
D893563 | August 18, 2020 | Crisp |
D893566 | August 18, 2020 | Chen |
D915480 | April 6, 2021 | Fiala |
D940763 | January 11, 2022 | Zhao |
D941370 | January 18, 2022 | Schmitt |
Patent History
Patent number: D978932
Type: Grant
Filed: Jul 18, 2022
Date of Patent: Feb 21, 2023
Assignee: Beneq Oy (Espoo)
Inventors: Heikki Naulapää (Helsinki), Hulda Aminoff (Espoo)
Primary Examiner: Michael C Stout
Assistant Examiner: Fritzgerald L Butac
Application Number: 29/846,561
Type: Grant
Filed: Jul 18, 2022
Date of Patent: Feb 21, 2023
Assignee: Beneq Oy (Espoo)
Inventors: Heikki Naulapää (Helsinki), Hulda Aminoff (Espoo)
Primary Examiner: Michael C Stout
Assistant Examiner: Fritzgerald L Butac
Application Number: 29/846,561
Classifications
Current U.S. Class:
Material Working, Abrading, Or Founding Machinery (D15/122)