Patents Issued in September 9, 2003
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Patent number: 6617253Abstract: A plasma etching method using selective polymer deposition, and a method of forming a contact hole using the plasma etching method are provided. The plasma etching method uses a method of reinforcing an etch mask by selectively depositing polymer on only a photoresist pattern, which is an etch mask. That is, a dielectric film is plasma etched for a predetermined period of time using the photoresist pattern as an etch mask, and polymer is selectively deposited on only the photoresist pattern which is thinned by plasma etching, thereby forming a polymer layer. Following this, the dielectric film is plasma etched using the photoresist pattern and the polymer layer as a mask. Thus, dielectric film etching providing high resolution and an excellent profile can be performed using the thinned photoresist pattern as a mask, and a contact hole and a self-aligned contact hole each having a very high aspect ratio, and a self-aligned contact hole having an excellent profile, can be formed.Type: GrantFiled: July 20, 2000Date of Patent: September 9, 2003Assignee: Samsung Electronics Co., Ltd.Inventors: Chang-Woong Chu, Tae-Hyuk Ahn, Sang-Sup Jeong, Ji-Soo Kim
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Patent number: 6617254Abstract: Disclosed is a method for manufacturing cathode electrodes of electroluminescent display device capable of forming cathode electrodes of fine patterns. The disclosed comprises the steps of: forming an anode electrode on a transparent insulating substrate; forming an insulating partition having a stripe structure to cross with the anode electrode and define a pixel formation area on the substrate; forming an organic film pixel separated with a predetermined distance, with the insulating partition interposed; depositing a cathode metal layer on the surface of the resulting structure; and forming a cathode electrode exposing a predetermined part of the insulating partition by performing etching processes on the cathode metal layer using laser.Type: GrantFiled: November 6, 2001Date of Patent: September 9, 2003Assignee: Boe-Hydis Technology Co., Ltd.Inventors: Joo Hyeon Lee, Woo Young Kim, Sung Hoo Ju, Sun Woong Kim
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Patent number: 6617255Abstract: A plasma processing method is provided of processing a sample having a silicon nitride layer with high accuracy of size in anisotropy and excellent selectivity to a silicon oxide layer as underlayer. A mixed atmosphere of chlorine gas containing no fluorine with aluminum is converted into plasma in a plasma etching processing chamber and the sample having the silicon nitride layer is etched by using the plasma.Type: GrantFiled: March 7, 2001Date of Patent: September 9, 2003Assignee: Hitachi, Ltd.Inventors: Takao Arase, Motohiko Yoshigai, Go Saito, Masamichi Sakaguchi, Hiroaki Ishimura, Takahiro Shimomura
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Patent number: 6617256Abstract: A plasma process reactor is disclosed that allows for greater control in varying the functional temperature range for enhancing semiconductor processing and reactor cleaning. The temperature is controlled by splitting the process gas flow from a single gas manifold that injects the process gas behind the gas distribution plate into two streams where the first stream goes behind the gas distribution plate and the second stream is injected directly into the chamber. By decreasing the fraction of flow that is injected behind the gas distribution plate, the temperature of the gas distribution plate can be increased. The increasing of the temperature of the gas distribution plate results in higher O2 plasma removal rates of deposited material from the gas distribution plate. Additionally, the higher plasma temperature aids other processes that only operate at elevated temperatures not possible in a fixed temperature reactor.Type: GrantFiled: April 22, 2002Date of Patent: September 9, 2003Assignee: Micron Technology, Inc.Inventors: Kevin G. Donohoe, Guy T. Blalock
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Patent number: 6617257Abstract: A semiconductor manufacturing process wherein an organic antireflective coating is etched with an O2-free sulfur containing gas which provides selectivity with respect to an underlying layer and/or minimizes the lateral etch rate of an overlying photoresist to maintain critical dimensions defined by the photoresist. The etchant gas can include SO2 and a carrier gas such as Ar or He and optional additions of other gases such as HBr. The process is useful for etching 0.25 micron and smaller contact or via openings in forming structures such as damascene structures.Type: GrantFiled: March 30, 2001Date of Patent: September 9, 2003Assignee: Lam Research CorporationInventors: Tuqiang Ni, Weinan Jiang, Conan Chiang, Frank Y. Lin, Chris Lee, Dai N. Lee
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Patent number: 6617258Abstract: In one illustrative embodiment, the method comprises providing a substrate having a process layer formed thereabove, performing a wet etching process comprised of a duration parameter on the process layer to reduce a thickness of the process layer, and adjusting the duration parameter of the wet etching process if the reduced thickness of the process layer after the etching process is complete is not within acceptable limits. In another illustrative embodiment, the present invention is directed to a system that is comprised of an etch tool for performing an etching process for a duration on a process layer formed above a semiconducting substrate to reduce a thickness of the process layer, and a controller for adjusting the duration of the etching process if the reduced thickness of the process layer after the etching process is performed is not within acceptable limits.Type: GrantFiled: July 23, 2001Date of Patent: September 9, 2003Assignee: Advanced Micro Devices, Inc.Inventors: Thomas J. Sonderman, Matthew Ryskoski
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Patent number: 6617259Abstract: A method for fabricating a semiconductor device and forming an insulating film used therein, includes forming an isolation insulating film on a semiconductor wafer and forming gates, separated by gaps having a predetermined distance, on an active region. Next, a first interlayer dielectric film is deposited to a predetermined thickness on the semiconductor wafer having the gates, so that the gaps between the gates are not completely filled. Then, a sputtering etch is performed entirely on a surface of the first interlayer dielectric film. Thereafter, the first interlayer dielectric film is partially removed through isotropic etching. Next, a second interlayer dielectric film is deposited on the first interlayer dielectric film so that the gaps between the gates are completely filled.Type: GrantFiled: May 8, 2002Date of Patent: September 9, 2003Assignee: Samsung Electronics Co., Ltd.Inventors: Woo Chan Jung, Jong Koo Lee
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Patent number: 6617260Abstract: The present invention provides a manufacturing method of a semiconductor device which does not give rise to peeling of a metal film caused by oxygen held in a interlayer insulating film even when the wafer is subjected to a heat treatment after the metal film is formed on the interlayer insulating film. After the formation of the interlayer insulating film, oxygen held in the interlayer insulating film is removed from the interlayer insulating film, then a metal film on the interlayer insulating film.Type: GrantFiled: October 2, 2001Date of Patent: September 9, 2003Assignee: NEC Electronics CorporationInventors: Takayuki Abe, Yasuhide Den
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Patent number: 6617261Abstract: Gallium nitride substrates are formed by etching a gallium nitride layer on a sapphire substrate or by selective area regrowth of a gallium nitride layer first deposited onto a sapphire substrate. The gallium nitride layers are bonded to a support substrate and a laser pulse directed through the transparent sapphire detaches the gallium nitride layers from the sapphire substrate. The gallium nitride layers are then detached from the support substrate forming freestanding gallium nitride substrates.Type: GrantFiled: December 18, 2001Date of Patent: September 9, 2003Assignee: Xerox CorporationInventors: William S. Wong, David K. Biegelsen, Michael A. Kneissl
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Patent number: 6617262Abstract: Insulating material is deposited onto a gate dielectric surface separating two wordline stacks, the method comprising the steps of: A. Forming at least two adjacent wordline stacks over a common gate dielectric, the stacks spaced apart from one another thereby forming an open surface on the gate dielectric between the stacks; and B. Depositing by sputtering the insulating material onto the open surface of the gate dielectric separating the two wordline stacks.Type: GrantFiled: March 18, 2002Date of Patent: September 9, 2003Assignee: Micron Technology, Inc.Inventor: Kevin L. Beaman
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Patent number: 6617263Abstract: An organic film is coated on an insulating substrate and an organic solvent is infiltrated into the organic film to cause dissolution of the organic film to flatten the organic film. Thereafter, the flattened organic film is subjected to heat treatment at temperatures of 100 to 180° C. to evaporate the organic solvent included in the organic film. Evaporating the organic solvent included in the organic film at relatively low temperatures, i.e., temperatures of 100 to 180° C. makes it possible to reduce thermal stress on a wiring layer covered by the organic film and provide flatness of the surface of the insulating substrate.Type: GrantFiled: July 8, 2002Date of Patent: September 9, 2003Assignee: NEC LCD Technologies, Ltd.Inventor: Shusaku Kido
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Patent number: 6617264Abstract: Disclosed herein is an SOG (Spin on Glass) material for spacer anodic bonding, which includes: 0.1˜3 wt % of tetraethyl orthosilicate (TEOS); 0.1˜5 wt % of methyl triethyl orthosilicate (MTEOS); 20˜30 wt % of ethanol; 0.1˜2 wt % of acetic acid solution containing alkali metal ions; and 0.1˜10 wt % of water. The solid content of alkali metal elements in the acetic acid solution containing alkali metal ions is 5%˜60%, and the pH value of the SOG material is 4˜6.Type: GrantFiled: September 9, 2002Date of Patent: September 9, 2003Assignee: Industrial Technology Research InstituteInventors: Ming-Chun Hsiao, Kai-Nung Su, Cheng-Chung Lee, Pang Lin, San-Yuan Chen
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Patent number: 6617265Abstract: A resist mask having a satisfactory resolution effect may be obtained even in the case of use of exposure light having a wavelength of 200 nm or more. An opaque pattern 2a comprising an organic layer for transferring a pattern is constituted by a multi-layer formed by a photo-absorptive organic layer 3a having an light shielding effect or a light attenuating effect even relative to exposure light having a wavelength of 200 nm or more, and a resist layer 4a for chiefly patterning this.Type: GrantFiled: August 13, 2001Date of Patent: September 9, 2003Assignee: Hitachi, Ltd.Inventors: Toshihiko Tanaka, Norio Hasegawa
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Patent number: 6617266Abstract: A process for forming high k dielectric thin films on a substrate, e.g., silicon, by 1) low temperature (500° C. or less) deposition of a dielectric material onto a surface, followed by 2) high temperature post-deposition annealing. The deposition can take place in an oxidative environment, followed by annealing, or alternatively the deposition can take place in a non-oxidative environment (e.g., N2), followed by oxidation and annealing.Type: GrantFiled: April 12, 2001Date of Patent: September 9, 2003Assignee: Applied Materials, Inc.Inventors: Annabel Susan Nickles, Ravi Rajagopalan, Pravin Narwankar
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Patent number: 6617267Abstract: Provided are compounds and methods for modifying a material to change properties of the material, as well as a variety of products obtained using the methods. The material which is modified may be, for example, a carbohydrate, and the modifiable functional groups on the material may be hydroxyls. Multifunctional molecules for use in modifying the surfaces of materials such as textile fibers, yarns and other fabrics made of or, including cotton, wool and nylon, are provided. The multifunctional molecules can include hydrophobic regions and/or hydrophilic regions. The multifunctional molecules also may include binding functional groups that permit either non-covalent or covalent binding to the material being modified, thus permitting the multifunctional molecule to form a non-covalent or covalent coating on the material.Type: GrantFiled: January 29, 2002Date of Patent: September 9, 2003Assignee: Nano-Tex, LLCInventors: David S. Soane, David A. Offord
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Patent number: 6617268Abstract: This invention is directed to methods for the treatment of cellulose-containing fibers and yarn to provide protection to the cellulose from attack by enzymes. The method comprises the steps of exposing cellulose-containing fibers and yarn to an aqueous solution of an enzyme-repelling chemical to give the fibers or yarn a protective coating, and using the protectively coated fibers and yarn to prepare cloth or fabric. In another embodiment, the method of the invention comprises the step of exposing a fabric comprising cellulose-containing yarn to an aqueous solution of an enzyme-repelling chemical to give the fabric a protective coating. The invention also encompasses cellulose-containing fibers and yarn, including cotton, having a protective enzyme-repelling coating. The invention is further directed to denim fabric comprising cotton fill yarn having a protective enzyme-repelling coating.Type: GrantFiled: June 26, 2000Date of Patent: September 9, 2003Assignee: Nano-Tex, LLCInventors: David A. Offord, David S. Soane, William Ware, Jr., Matthew R. Linford
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Patent number: 6617269Abstract: A sealing material for electric parts containing a lead-free tin silicate-phosphate glass of 50-100 volume percents and refractory fillers of the balance. The lead free tin silicate-phosphate glass consists essentially of, by molecular percent, 30-80% SnO, 5.5-20% SiO2, and 10-50% P2O5. The glass may contain at least one of glass stabilizing elements, said glass stabilizing elements including 3-25% ZnO, 0-4.9% B2O3, 0-5% Al2O3, 0-10% WO3, 0-10% MoO3, 0-10% Nb2O5, 0-10% TiO2, 0-10% ZrO2, 0-15% R2O (R is Li, Na, K, and/or Cs), 0-5% CuO, 0-5% MnO, 0-10% R′O (R′ is Mg, Ca, Sr and/or Ba), a total content of at least one of the glass stabilizing elements being up to 40%.Type: GrantFiled: May 22, 2001Date of Patent: September 9, 2003Assignee: Nippon Electric Glass Co. Ltd.Inventor: Toshio Yamanaka
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Patent number: 6617270Abstract: A dispersion is made up of water refractory particles and material for forming pores and a polymeric dispersion. A water sensitive destabilising agent is added to increase the viscosity of the mix and cause it to solidify to form a green body which is removed from a mould and then heated and sintered.Type: GrantFiled: May 15, 2001Date of Patent: September 9, 2003Assignee: Dytech Corporation LimitedInventors: Wayne Austin, Rodney Martin Sambrook, Yan Yin
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Patent number: 6617271Abstract: The disclosed invention describes a new high-performance binderless high purity tungsten carbide material, its manufacturing and applications as a cutting tool material.Type: GrantFiled: March 19, 2002Date of Patent: September 9, 2003Inventors: Vladimir Yurievich Kodash, Edwin Spartakovich Gevorkian
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Patent number: 6617272Abstract: An Si3N4 sintered body produced by reactive sintering of silicon, wherein a compound of at least one element selected from the group consisting of Y, Yb and Sm is contained by 0.6 to 13% by weight as Ln2O3 (wherein Ln=Y, Yb or Sm), an oxygen content in Si3N4 crystal grains is not more than 1% by weight, a ratio of Si and Ln in the Si3N4 sintered body is within a range of 0.1 to 0.8 in a molar ratio of SiO2/Ln2O3 of the Si in terms of SiO2 to the oxide Ln2O3, and the sintered body has a relative density of 85 to 99.9%, a thermal conductivity of at least 70 W/m.K or more and a three-point bending strength of at least 600 MPa. The Si3N4 sintered body is produced by mixing 80 to 99% by weight of silicon powder and 1 to 20% by weight of powder of oxide of at least one element of Y, Yb and SM, by nitriding a molded body of the powder mixture in an atmosphere containing nitrogen at 1400° C.Type: GrantFiled: March 29, 2001Date of Patent: September 9, 2003Assignee: Sumitomo Electric Industries, Ltd.Inventors: Ai Itoh, Michimasa Miyanaga
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Patent number: 6617273Abstract: A non-reducing dielectric ceramic contains Ca, Zr and Ti as metallic elements and does not contain Pb. In a CuK&agr; X-ray diffraction pattern, the ratio of the maximum peak intensity of secondary crystal phases to the maximum peak intensity at 2&thgr;=25° to 35° of a perovskite primary crystal phase is about 12% or less, the secondary crystal phases including all the crystal phases other than the perovskite primary crystal phase. The non-reducing dielectric ceramic exhibits superior insulating resistance and dielectric loss after firing in a neutral or reducing atmosphere and high reliability in a high-temperature loading lifetime test and is useful for producing compact high-capacitance monolithic ceramic capacitors.Type: GrantFiled: April 6, 2001Date of Patent: September 9, 2003Assignee: Murata Manufacturing Co., Ltd.Inventors: Tomoo Motoki, Masahiro Naito, Harunobu Sano
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Patent number: 6617274Abstract: An electric-field-inducible deformable porcelain material is provided, comprising a main component BaTiO3, with 0.05 to 2 wt % of at least one selected from Mn, Cu and Co in terms of a metal added thereto. The crystal phase in the porcelain is a single perovskite phase, and the value of the transversal electric-field-inducible deformation is 300×10−6 or more in the field strength of 2000 V/mm. It is presumed that the amount of the rotating 90° domain becomes greater, and the electric-field-induced deformation due to this is increased. Thus, a sufficient displacement amount as a piezoelectric material is obtained.Type: GrantFiled: April 4, 2002Date of Patent: September 9, 2003Assignee: NGK Insulators, Ltd.Inventors: Hirofumi Yamaguchi, Toshikatsu Kashiwaya
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Patent number: 6617275Abstract: A novel process for converting C2 to C6 aliphatic hydrocarbons to aromatics and catalyst for use in this process are disclosed. The catalyst that contains a zeolite having a silica to alumina molar ratio greater than about 20 and a pore diameter from about 5 Å to about 6 Å, an essentially non-acidic binder, and a gallium component. The binder is selected from silica, zirconia, titania, and mixtures thereof and results in a catalyst formulation having both enhanced selectivity to desired C6-C9 aromatic products and improved stability compared to prior art compositions. Preferred zeolites that can be used include those of the MFI structure type, with ZSM-5 being a specific example.Type: GrantFiled: December 13, 2001Date of Patent: September 9, 2003Assignee: UOP LLCInventors: Sanjay B. Sharma, John Kulach, Aaron James Imrie
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Patent number: 6617276Abstract: An active metal, particularly cesium, impregnated hydrocarbon adsorbent, such as zeolite, comprises an improved hydrocarbon trap/oxidizing catalyst for use in effectively adsorbing hydrocarbons during automotive cold-start and subsequently desorbing, oxidizing and removing hydrocarbons during warmer operating conditions. The active metal modified hydrocarbon adsorbent may be combined in other forms of multi-layer automotive exhaust gas catalytic structures.Type: GrantFiled: July 21, 2000Date of Patent: September 9, 2003Assignee: Johnson Matthey Public Limited CompanyInventors: Todd Howard Ballinger, Paul Joseph Andersen
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Patent number: 6617277Abstract: A catalyst composition has a catalyst component which includes a metallocene transition metal compound, a magnesium compound, a hydroxyl containing compound, and a polymeric material. The catalyst component may also include asilicon compound and an aluminum compound. The catalyst component is combined with a cocatalyst and used in olefin polymerization.Type: GrantFiled: September 10, 2001Date of Patent: September 9, 2003Assignee: Saudi Basic Industries CorporationInventors: Orass Hamed, Akhlaq Moman, Atieh Abu-Raqabah
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Patent number: 6617278Abstract: The present invention provides a catalyst system and processes for preparing the system for use in ethylene polymerization and copolymerization. The catalyst system is obtained by dissolving any electron-donor activator and optionally, a metal halide adjusting agent, into a solution of magnesium halide in a solvent system consisting essentially of organic epoxy compounds and organic phosphorous compounds to form a homogeneous solution. At least one coprecipitator and a titanium halide or its derivative is then mixed to form a solid component, followed by incorporating in combination with an organic aluminum component prior to use in polymerizations. The electron donor activator is an ether or alcohol, and the coprecipitator is an organic acid, anhydride, ether, or ketone.Type: GrantFiled: March 16, 1999Date of Patent: September 9, 2003Assignees: China Petro-Chemical Corporation, China Petro-Chemical Corporation Beijing Research Institute of Chemical IndustryInventors: Maozhu Jin, Yijing Sun, Yi Wang, Rengi Peng, Baolan Zhu, Zhaowen Ma
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Patent number: 6617279Abstract: Hydroxyaromatic compounds such as phenol are carbonylated with oxygen and carbon monoxide in the presence of a catalyst system comprising a Group VIIIB metal, preferably palladium; an iodide salt, preferably sodium iodide; and at least one organic bisphosphine such as 1,3-bis(diphenylphosphino)propane or 1,4-bis(diphenylphosphino)butane. The catalyst system also preferably contains a compound of cerium or lead.Type: GrantFiled: February 12, 2001Date of Patent: September 9, 2003Assignee: General Electric CompanyInventors: Ben Purushotam Patel, Grigorii Lev Soloveichik, John Yaw Ofori
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Patent number: 6617280Abstract: The present invention provides a continuous process for the preparation of a stable aqueous suspension concentrate composition of pendimethalin, alone or in combination with another pesticide, which comprises mixing a molten stream of pendimethalin with a cold aqueous stream containing coformulants plus seed crystals of orange pendimethalin.Type: GrantFiled: August 24, 2001Date of Patent: September 9, 2003Assignee: BASF AktiengesellschaftInventors: Jean-Paul Fafchamps, Jean-Michel Villanueva
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Patent number: 6617281Abstract: The invention relates to new substituted acylaminophenyl-uracils of the general formula (I) in which n, A, Ar, Q1, R1, R2, R3, R4, R5 and R6 have the meanings given in the description, and to a process for their preparation, and to their use as herbicides.Type: GrantFiled: February 20, 2001Date of Patent: September 9, 2003Assignee: Bayer AktiengesellschaftInventors: Roland Andree, Mark Wilhelm Drewes, Dieter Feucht, Rolf Pontzen, Ingo Wetcholowsky
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Patent number: 6617282Abstract: A process for producing 3-phenyl-2,4(1H,3H)-pyrimidinediones having the general formula I and their salts which comprises reacting the isocyanates represented by the general formula (II) and the substituted hydrazono esters represented by the general formula (III) in the presence of a base. These compounds are useful as herbicides, defoliants and desiccants.Type: GrantFiled: September 26, 2001Date of Patent: September 9, 2003Assignee: Ishihara Sangyo Kaisha, Ltd.Inventors: Mark Read, Masamitsu Tsukamoto, Sandeep Gupta
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Patent number: 6617283Abstract: An article with an improved buffer layer architecture includes a substrate having a textured metal surface, and an electrically conductive lanthanum metal oxide epitaxial buffer layer on the surface of the substrate. The article can also include an epitaxial superconducting layer deposited on the epitaxial buffer layer. An epitaxial capping layer can be placed between the epitaxial buffer layer and the superconducting layer. A method for preparing an epitaxial article includes providing a substrate with a metal surface and depositing on the metal surface a lanthanum metal oxide epitaxial buffer layer. The method can further include depositing a superconducting layer on the epitaxial buffer layer, and depositing an epitaxial capping layer between the epitaxial buffer layer and the superconducting layer.Type: GrantFiled: June 22, 2001Date of Patent: September 9, 2003Assignee: UT-Battelle, LLCInventors: M. Parans Paranthaman, Tolga Aytug, David K. Christen
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Patent number: 6617284Abstract: A superconductor composite material consists of sintering products of interaction of superconductor ceramics with silicone material. The superconductor composite material can also include at least one metal, metal oxide or halogen element dope that interacts with superconductor ceramics and silicone residuals at sintering high temperature. The suspension or slurry of superconductor ceramics, silicone and dope powders can be used for coating of the particular substrate. Such coating employs modified forming methods including dip coating, painting, slip casting, cladding, printing, and spraying in order to produce continuous superconductor filament, wire, tape, coil, large size screen, and small chip or electronic element. The condensed suspension is used for extrusion, injection molding, and pressing continuous and short superconductor tubes, rods, beams, rails as well as disks, rings and other bulk shaped materials.Type: GrantFiled: February 16, 2001Date of Patent: September 9, 2003Inventors: Anatoly Rokhvarger, Mikhail I. Topchiashvili
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Patent number: 6617285Abstract: It has been discovered that borate crosslinked fracturing fluid breaker mechanisms are improved by the inclusion of a polyol together with an enzyme. In fact, synergistic results may be achieved when both are used together as contrasted to the cases where each are used separately. Removing the borate ion from the crosslinked polymer reduces the pH of the fluid and in turn increases the activity of the enzyme. That is, once the pH is lowered, viscosity reduction (breaking) occurs by uncrosslinking of the polymer within the fracturing fluid, and by initiating or increasing activity of an enzyme breaker, if present. In one embodiment, the polyol has at least two cis-hydroxyl groups. In another embodiment, the polyols are monosaccharides such as glycerols and sugar alcohols, and may include mannitol, sorbitol, glucose, fructose, galactose, mannose, allose, etc. and mixtures thereof. Oligosaccharides and derivatives of monosaccharides and oligosaccharides are also useful.Type: GrantFiled: July 3, 2001Date of Patent: September 9, 2003Assignee: Baker Hughes IncorporatedInventor: James B. Crews
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Patent number: 6617286Abstract: To provide a lubricating oil composition for continuously variable transmission which ensures both a high coefficient of friction between metals required for a push belt-type CTV oil and excellent oxidation stability guaranteeing the performance over a long time. A lubricating oil composition for continuously variable transmission is provided, which comprises a lubricating base oil made of a mineral oil and/or a synthetic oil formulated with a wear preventive a metal detergent and an ashless dispersant, wherein the ashless dispersant is made of a boron-containing succinimide having boron at a rate of one or more atoms in one molecule of the ashless dispersant.Type: GrantFiled: June 5, 2001Date of Patent: September 9, 2003Assignee: Tonen General Sekiyu K.K.Inventors: Takehisa Sato, Takanori Kugimiya
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Patent number: 6617287Abstract: A novel lubricating composition for manual transmissions with improved performance with sintered synchronized components. The lubricating oil composition contains high level of an alkaline earth sulfonate and amine phosphates.Type: GrantFiled: October 22, 2001Date of Patent: September 9, 2003Assignee: The Lubrizol CorporationInventors: Michael P. Gahagan, Brian M. O'Connor
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Patent number: 6617288Abstract: This invention relates to an aqueous composition comprising water, a surfactant or thickener, and at least one metal-free thiophosphorus acid ester, at least one amine salt of the thiophosphorus acid ester, or a mixture thereof, wherein the thiophosphorus acid ester contains at least one hydrocarbyl terminated oxyalkylene group, at least one hydrocarbyl terminated polyoxyalkylene group, or a mixture thereof. The aqueous compositions have improved antiwear/extreme pressure properties and improved antioxidation properties. In these compositions, the thiophosphorus acid esters and their salts act as antiwear agents and rust inhibitors.Type: GrantFiled: May 8, 1998Date of Patent: September 9, 2003Assignee: The Lubrizol CorporationInventors: Naresh Chand Mathur, Edward J. Konzman
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Patent number: 6617289Abstract: The present invention provides a method for producing a high quality ester and an ester obtained by this method. The method includes reacting an alcohol with a carboxylic acid in a presence of a Lewis acid catalyst in an amount of 0.00001 to 0.005 mol and a phosphorus-containing reducing agent in an amount of 0.0003 to 0.005 mol with respect to one mol of carboxyl groups of the carboxylic acid, and separating a resultant ester. This ester is useful as ester lubricating base stock for grease, automotive engine oil, and refrigerating machine oil.Type: GrantFiled: October 15, 2001Date of Patent: September 9, 2003Assignee: NOF CorporationInventors: Michimasa Memita, Keiji Hirao
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Patent number: 6617290Abstract: The invention teaches the preparation of concentrated sanitizing and cleaning preparation. The preparation has dual use for cleaning and sanitizing food surfaces as well as food contact and non-food contact surfaces. The composition of the invention shows rapid microbicidal properties against representative gram positive and gram-negative bacteria. The invention uses GRAS, food additive ingredients and/or ingredients that are approved by the USFDA for use on food.Type: GrantFiled: July 18, 2001Date of Patent: September 9, 2003Inventor: John A. Lopes
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Patent number: 6617291Abstract: The present invention relates to improved ophthalmic solutions that employ allantoin in order to more effectively preserve solutions and to reduce the degree to which cationic preservatives will deposit on contact lenses. Ophthalmic solutions are here understood to include contact lens treatment solutions, such as cleaners, soaking solutions, conditioning solutions and lens storage solutions, as well as wetting solutions and in-eye solutions for treatment of eye conditions.Type: GrantFiled: November 8, 2001Date of Patent: September 9, 2003Inventor: Francis X. Smith
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Patent number: 6617292Abstract: The present invention relates to a composition for washing keratinous materials which comprises, in a cosmetically acceptable aqueous medium, particles essentially consisting of aluminium oxide and having a mean primary size in numerical terms of less than 200 nm, at least one anionic surfactant and at least one amphoteric or nonionic surfactant. The invention also relates to a method for the cosmetic treatment of keratinous fibres, as well as a use of the composition according to the invention as a shampoo.Type: GrantFiled: September 19, 2001Date of Patent: September 9, 2003Assignee: L'OrealInventors: Béatrice Perron, Serge Restle, Franck Giroud, Henri Samain
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Patent number: 6617293Abstract: A concentrated liquid soap composition that readily increases in viscosity upon dilution with water, the concentrated liquid soap composition containing an amine oxide surfactant or mixture thereof having the general formula R1R2 R3N→O, where R1 and R2 are the same or different and are selected from methyl or ethyl and R3 is a straight chain saturated or unsaturated alkyl group having from about 6-24 carbon atoms; an anionic surfactant or mixture thereof; an electrolyte; water; and a buffering agent, sufficient to maintain the pH of the composition between about 8 and about 10.Type: GrantFiled: August 6, 2001Date of Patent: September 9, 2003Assignee: 3M Innovative Properties CompanyInventor: Yen-Lane Chen
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Patent number: 6617294Abstract: The present development relates to a liquid cleansing product that effectively reduces the level of microbes on the skin in a relatively short wash time and which dries quickly without causing damage and drying to the skin. The sanitizing cleanser composition comprising an effective amount of alcohol to produce a reduction in microorganisms on the surface of the skin, and an additive to maintain the skin pH in the range of from about 4.0 to about 6.0. The cleanser composition may further include silicone to aid further the drying process, and emollients or oils for skin moisturizing.Type: GrantFiled: September 18, 2002Date of Patent: September 9, 2003Inventors: Vinod K. Narula, Dipak Narula
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Patent number: 6617295Abstract: The present invention relates to a composition which can be utilized to induce foaming of a resin or polymeric material in polymer processing machinery. The composition of the present invention includes a blowing agent which decomposes and evolves gases thereby causing the polymeric material to foam. The compositions of the present invention allow for reductions in part weight, cycle times and injection pressure.Type: GrantFiled: June 13, 2002Date of Patent: September 9, 2003Assignee: PolyOne CorporationInventor: Norman E. Nitzsche
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Patent number: 6617296Abstract: A light duty, liquid comprising of at least two different surfactants, lauryol ethylenediaminetriacetate, a zinc inorganic salt and water.Type: GrantFiled: March 5, 2003Date of Patent: September 9, 2003Assignee: Colgate-Palmolive CompanyInventors: Thomas Connors, Robert D'Ambrogio, Bruce Nascimbeni
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Patent number: 6617297Abstract: Solid automatic dishwasher detergent tablets have a chlorine source to most preferably provide 0.5 to 5 percent available chlorine; and a chlorine stability enhancing effective amount of preferably between about 0.5 to about 10 percent by weight of one or more nonionic surfactants having the following structure: R—(AO1)x(AO2)y—OR′ wherein: R is a C6-C18 alkyl group, AO1 represents propylene oxide or a mixture of propylene oxide and other alkylene oxides, AO2 represents ethylene oxide or a mixture of ethylene oxide and other alkylene oxides, R′ is an alkyl, arylalkyl, or benzalkyl group with 1 to about 10 carbon atoms, x is 2-20, y is 0-20, and the sum of x plus y is 5 or greater. The nonionic surfactant imparts improved chlorine stability to the tablet such that greater than 80 percent of the chlorine in the tablet remains active for eight weeks when the tablet is stored at 120° F.Type: GrantFiled: March 29, 2001Date of Patent: September 9, 2003Assignee: BASF CorporationInventors: Glenis R. Mente, Kenneth L. Zack, Michael C. Welch
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Patent number: 6617298Abstract: A composition for the removal of grease and oil spots from concrete, asphalt surfaces, etc., comprises a degreaser and a diatomaceous earth. The degreaser comprises a number of ingredients of respective percentage ranges to emulsify the grease or oil which is then absorbed by the diatomaceous earth.Type: GrantFiled: December 31, 2002Date of Patent: September 9, 2003Inventors: Dennis S. Morrow, William T. Morrow, Kishor Pathak
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Patent number: 6617299Abstract: The invention relates to catalytically bleaching substrates, especially laundry fabrics, with atmospheric oxygen or air. A method of bleaching a substrate is provided that comprises applying to the substrate, in an aqueous medium, a specified ligand from a selected class which forms a complex with a transition metal, the complex catalysing bleaching of the substrate by atmospheric oxygen. Also provided is an aqueous bleaching composition substantially devoid of peroxygen bleach or a peroxy-based or -generating bleach system. Also provided is a method of treating a textile such as a laundry fabric whereby a complex catalyses bleaching of the textile by atmospheric oxygen after the treatment. The catalyst may be used in dry form, or in a liquor that is then dried, such as an aqueous spray-on fabric treatment fluid or a wash liquor for laundry cleaning, or a non-aqueous dry cleaning fluid or spray-on aerosol fluid. The method can confer cleaning benefits to the textile after the treatment.Type: GrantFiled: March 31, 2000Date of Patent: September 9, 2003Assignee: Unilever Home & Personal Care USA, Division of Conopco, Inc.Inventors: Riccardo Filippo Carina, Bernard Lucas Feringa, Ronald Hage, Catherine Hemmert, Jean Hypolites Koek, Rene Marcel LaCrois, Bernard Meunier, Michael Renz, Johannes Gerhardus Roelfes, Ebe Pieter Schudde, Rob Thijssen, Robin Stefan Twisker, Charon Zondervan
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Patent number: 6617300Abstract: A granular bleach activator extrudate that has a size and shape that is within a relatively narrow distribution range. The bleach activator exhibits improved solubility, and reduced product separation when incorporated into a granular detergent composition. Also provided are granular detergent compositions comprising a detersive surfactant and the bleach activator extrudates. Methods for forming the extruded bleach activator particles are also provided.Type: GrantFiled: August 30, 2001Date of Patent: September 9, 2003Assignee: Procter & Gamble CompanyInventors: Scott William Capeci, Michael Steven Gibson, Victoria Ann Majerczak
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Patent number: 6617301Abstract: The present invention relates to surfactant mixtures with improved wetting and/or emulsifying properties for use in agrochemical preparations, comprising: A) at least an alkylpolyglucoside, B) at least an anionic derivative of an alkylpolyglucoside, and C) at least an anionic derivative of a fatty alcohol.Type: GrantFiled: November 24, 2001Date of Patent: September 9, 2003Assignee: Lamberti S.p.A.Inventors: Dario Fornara, Peter Bohus, Alberto Colombo
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Patent number: 6617302Abstract: A dishwashing composition with hydrophobically modified polycarboxylic acids and water soluble entities that reduce phosphate scale formation is described. The dishwashing composition displays excellent cleaning benefits and glass appearance, even in the absence of NaCI additives and conventional rinse aid compositions.Type: GrantFiled: December 16, 2002Date of Patent: September 9, 2003Assignee: Unilever Home & Personal Care USA division of Conopco, Inc.Inventors: Naresh Dhirajlal Ghatlia, Yu-Min Catherine Chiou