Patents Issued in May 6, 2004
  • Publication number: 20040086775
    Abstract: A fuel cell is described and which includes an ion exchange membrane having opposite anode and cathode sides; an electrode disposed adjacent to each of the anode and cathode sides; a gas diffusion layer which is located adjacent to each electrode and which defines a major surface and wherein at least one of the gas diffusion layers has a hydrophobicity which varies when measured in a direction which is substantially along the major surface, and which provides a substantially optimal hydration for the ion exchange membrane at fuel cell operational temperatures; an airflow is provided to the fuel cell and which is supplied in part to the cathode, and wherein the airflow further regulates the operational temperature of the fuel cell.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 6, 2004
    Inventors: Greg A. Lloyd, Lijun Bai, Shiblihanna I. Bayyuk
  • Publication number: 20040086776
    Abstract: A fuel cell (100) includes a membrane electrode assembly (110) located together with a layer of variable porosity porous gas diffusion material (150). The variable porosity gas diffusion material layer (150) operates to selectively limit the amount of reactants reaching localized areas of the membrane electrode assembly (110) in order to reduce hot spots.
    Type: Application
    Filed: October 17, 2003
    Publication date: May 6, 2004
    Applicant: Motorola, Inc.
    Inventors: Sivakumar Muthuswamy, Steven D. Pratt, Ronald J. Kelley
  • Publication number: 20040086777
    Abstract: A system for supplying fluid to a battery, a vacuum source, a vehicle, a combination, a method for supplying fluid to a battery and a method of charging a battery. The fluid supply system supplies fluid to a battery in a vehicle, the vehicle including a frame supporting the battery, the battery including a battery cell, fluid being transmittable to the battery cell. The system is defined as including a hydraulic circuit connecting the battery to a tank. The hydraulic circuit is defined as including an inlet conduit connectable to tank, an outlet conduit connectable to the battery cell, and a vacuum source connectable to the battery cell and to the tank. The vacuum source is defined as including a pump having a pump inlet conduit connectable to the tank, and a pump outlet, and a venturi having a first inlet connectable to the pump outlet, a second inlet connectable to the battery cell, and a venturi outlet is connectable to the tank.
    Type: Application
    Filed: October 30, 2002
    Publication date: May 6, 2004
    Inventors: Michael A. Vassily, R. Linwood Woodard
  • Publication number: 20040086778
    Abstract: An exhaust structure is provided on an upper part of a storage battery. In the structure, an exhaust chamber is formed with an inlet, through which gas generated from a cell chamber of the storage battery is introduced, a first outlet, arranged in an upper portion of the exhaust chamber and through which the gas is exhausted to an exterior of the storage battery, a second outlet, arranged in a bottom portion of the exhaust chamber and communicated with the cell chamber, side walls and a bottom wall defining the exhaust chamber. The bottom wall is slanted toward the second outlet. A plurality of plate members, which intercepts liquid contained in the gas. Each of the plate members is extended from one of the side walls such that a distal end portion faces another one of the side walls while defining a gap therebetween, and is slanted toward the second outlet so that the intercepted liquid is guided to the second outlet and returned to the cell chamber.
    Type: Application
    Filed: October 27, 2003
    Publication date: May 6, 2004
    Applicant: The Furukawa Battery Co., Ltd.
    Inventors: Kenji Nakano, Shyuichi Yabuki, Hisashi Ouchi, Ichiro Sano
  • Publication number: 20040086779
    Abstract: A rechargeable multi-cell battery including a plurality of electrochemical cells. Each of the cells includes a gas port that allows passage of cell gases into and out of the cell but prevent passage of cell electrolyte out of the cell. The gas port may be a gas permeable membrane. The multi-cell batter may be a bipolar battery.
    Type: Application
    Filed: October 24, 2003
    Publication date: May 6, 2004
    Inventors: Lin R. Higley, Marshall D. Muller, Dennis A. Corrigan
  • Publication number: 20040086780
    Abstract: The invention relates to a casing for receiving at least one energy storage device, whereof the temperature in the casing interior can be regulated to a predetermined temperature level. For this purpose the casing interior is thermally insulated and is in direct heat conducting connection with a heat transfer device, substantially the entire heat flow into and out of the casing interior taking place through the heat transfer device when the casing interior is closed.
    Type: Application
    Filed: September 24, 2003
    Publication date: May 6, 2004
    Inventor: Heiko Ebermann
  • Publication number: 20040086781
    Abstract: A polymer battery is provided with a positive electrode active material layer, a negative electrode active material layer placed in opposition to the positive electrode active material layer, a polymer electrolyte layer disposed between the positive electrode active material layer and the negative electrode active material layer, and a distance defining member included in the polymer electrolyte layer to define a distance between the positive electrode active material layer and the negative electrode active material layer.
    Type: Application
    Filed: September 10, 2003
    Publication date: May 6, 2004
    Applicant: NISSAN MOTOR CO., LTD
    Inventors: Tatsuhiro Fukuzawa, Kouichi Nemoto
  • Publication number: 20040086782
    Abstract: A battery separator for a lithium-ion secondary battery is a microporous membrane with an adjuvant. The microporous membrane is made of a thermoplastic. The adjuvant, in an effective amount, is mixed into the separator or coated thereon. The adjuvant is a material adapted to reduce or eliminate energy concentrations around the separator. The energy concentration is sufficient to initiate a reaction of the components of the lithium ion secondary battery.
    Type: Application
    Filed: November 1, 2002
    Publication date: May 6, 2004
    Applicant: Celgard Inc.
    Inventors: Zhengming Zhang, Donald K. Simmons, Kevin D. Chambers, Pankaj Arora
  • Publication number: 20040086783
    Abstract: An energy storage device, such as an electrical storage battery, having a unique terminal structure, sealing arrangement and an S-shaped mandrel for the electrode assembly. The battery generally includes a case in which an electrode assembly is dispose, and a cover provided with a fill hole and fill plug, and a terminal structure that forms a battery terminal. The terminal hole and the fill hole have counter bore structure to provide tighter sealing. A nickel layer is provided on the aluminum fill plug to facilitate electrical contact with the external circuit. A mandrel is provided for the rolled electrode assembly, and is electrically coupled to the terminal structure via a push-in tab inserted into a space in the S-shape of the mandrel.
    Type: Application
    Filed: October 27, 2003
    Publication date: May 6, 2004
    Inventors: Wendy Fong, Mikito Nagata, Andrew Szyszkowski, Hisashi Tsukamoto
  • Publication number: 20040086784
    Abstract: The invention provides an electrochemical cell which comprises a first electrode and a second electrode which is a counter electrode to said first electrode. The first electrode comprises a phosphorous compound of the nominal general formula Li3E′aE″b(PO4)3, desirably at least one E is a metal; and preferably, Li3M′M″(PO4)3. E′ and E″ are the same or different from one another, where at least one of E′ and E″ has more than one oxidation state.
    Type: Application
    Filed: October 6, 2003
    Publication date: May 6, 2004
    Inventors: Jeremy Barker, M. Yazid Saidi
  • Publication number: 20040086785
    Abstract: A bi-layer attenuating phase shifting film and method of forming the film are described. The bi-layer film has a first layer of AlSix1Oy1 and a second layer of AlSix2Oy2. The first layer of AlSix1Oy1 and the second layer of AlSix2Oy2 are both deposited by sputtering using a sputtering system an aluminum target, a silicon target, a source of oxygen gas, and a source of argon gas. The index of refraction, n, and the extinction coefficient, k, of the deposited films are controlled by controlling the direct current, DC, power to the aluminum target and by controlling the oxygen flow rate. The values of n and k are selected to produce a bi-layer film having a transmittance of between about 15% and 45% and good chemical stability. The phase shift of the bi-layer film is determined by the index of refraction, extinction coefficient, and thickness of each of the films.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: Taiwan Semiconductor Manufacturing Company
    Inventor: Cheng-Ming Lin
  • Publication number: 20040086786
    Abstract: A method for forming a patterned microelectronics layer employing electron beam lithography in a sensitive material upon a substrate with optimal correction for proximity effects resulting from electron back scattering into the resist material. There is provided a substrate having formed thereon a layer of resist material sensitive to electron beam exposure. There is then exposed the sensitive layer to a vector scan shaped electron beam to write a primary pattern with dose correction of the beam dose for proximity effects due to electron scattering at each point in the primary pattern There is then written a secondary pattern which is a negative reversed image of the primary pattern in a secondary exposure employing a vector scan shaped focused electron beam at an exposure dose substantially below the primary beam dose, there being provided a gap between the primary pattern and the secondary pattern.
    Type: Application
    Filed: November 1, 2002
    Publication date: May 6, 2004
    Applicant: Taiwan Semiconductor Manufacturing Company
    Inventors: San-De Tzu, Ching Shiun Chiu, Wei-Zen Chou, Chia Fang Wu
  • Publication number: 20040086787
    Abstract: The present invention generally relates to optical lithography and more particularly relates to the fabrication of transparent or semitransparent phase shifting masks used in the manufacture of semiconductor devices. More particularly, the present invention implements a method for modifying anisotropically etched features on conventional alternating aperture phase shift masks (“aaPSMs”) using an isotropic plasma quartz etch process, which involves three processing stages: (1) defining the opaque region (e.g., chrome) using a chlorine-based decoupled plasma process; (2) forming an alternating anisotropic phase shift feature to a specific predetermined depth through the use of a decoupled plasma source with a fluorine etchant; and (3) changing the plasma conditions by interrupting the bias power applied across the mask and etching strictly in the inductively coupled plasma mode. These three processing stages achieve an isotropic undercutting of opaque layers which define the aaPSM.
    Type: Application
    Filed: November 5, 2002
    Publication date: May 6, 2004
    Inventors: Nabila Lehachi Waheed, William Otis Walden, Patrick Martin
  • Publication number: 20040086788
    Abstract: In a halftone-type phase-shift mask blank having a phase shifter film 5, the phase shifter film 5 has a phase adjustment layer 4 for primarily controlling the phase of exposure light, and a transmissivity adjustment layer 3 which is formed between a transparent substrate 2 and the phase adjustment layer 4 and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer 3 has a thickness of 90 angstroms or less.
    Type: Application
    Filed: April 24, 2003
    Publication date: May 6, 2004
    Applicant: HOYA CORPORATION
    Inventors: Yuki Shiota, Osamu Nozawa, Hideaki Mitsui, Ryo Ohkubo
  • Publication number: 20040086789
    Abstract: In order to shorten the time required to change or correct a mask pattern over a mask, light-shielding patterns formed of a resist film for integrated circuit pattern transfer are partly provided over a mask substrate constituting a photomask in addition to light-shielding patterns formed of a metal for the integrated circuit pattern transfer.
    Type: Application
    Filed: October 17, 2003
    Publication date: May 6, 2004
    Inventors: Norio Hasegawa, Toshihiko Tanaka, Joji Okada, Kazutaka Mori, Ko Miyazaki
  • Publication number: 20040086790
    Abstract: To provide a mask able to prevent a drop in pattern position accuracy due to the influence of internal stress of a membrane and able to align patterns including complementary divided patterns precisely, a method of producing the same, and a method of producing a semiconductor device. A stencil mask having lattice-shaped struts formed by etching a silicon wafer on four regions of a membrane wherein the lattices are offset from each other in the four regions and all of the struts are connected to other struts or the silicon wafer around the membrane (frame), a method of producing a stencil mask, and a method of producing a semiconductor device.
    Type: Application
    Filed: October 21, 2003
    Publication date: May 6, 2004
    Inventors: Shigeru Moriya, Shinji Omori
  • Publication number: 20040086791
    Abstract: The present invention provides a photomask defect testing method, a photomask manufacturing method and a semiconductor integrated circuit manufacturing method. In the photomask defect testing method, reference data is created from corrected photomask design data that is corrected on the basis of an exposure transfer pattern, and sensor data is created by measuring the shape of the photomask based on the corrected photomask design data. Furthermore, first non-testing region data indicating non-testing regions including pattern portions having a predetermined width or less and pattern spaces having a predetermined value or less is extracted from the corrected photomask design data, the extracted first non-testing region data is stored so as to be included in the corrected photomask design data, the non-testing regions indicated by the first non-testing region data is excluded, and the reference data is compared with the sensor data, whereby defects on the photomask are detected.
    Type: Application
    Filed: October 22, 2003
    Publication date: May 6, 2004
    Applicants: SHARP KABUSHIKI KAISHA, TOPPAN PRINTING CO., LTD.
    Inventors: Eiji Aoki, Shinji Kobayashi, Toshiyuki Marumo, Shinji Akima
  • Publication number: 20040086792
    Abstract: Using an attenuated phase shifting mask (Att.PSM) with square-section etch window there is the advantage of permitting good resolution and simultaneously increasing the depth of focus and the exposure latitude (the range of energy), improving the lithographic process itself compared to the traditional masks, called binary. The Att.PSM masks introduce the problem of the side lobe effects which is solved with the present invention adopting a polygonal etch window with at least six sides, preferably with an octagonal shape.
    Type: Application
    Filed: October 24, 2003
    Publication date: May 6, 2004
    Inventors: Carmelo Romeo, Paolo Canestrari, Antonio Fiorino
  • Publication number: 20040086793
    Abstract: A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
    Type: Application
    Filed: May 27, 2003
    Publication date: May 6, 2004
    Applicant: University of Texas System Board of Regents, UT System
    Inventors: S. V. Sreenivasan, Byung J. Choi, Matthew Colbum, Todd Bailey
  • Publication number: 20040086794
    Abstract: An electrophotographic photoreceptor comprising a conductive support and a photosensitive layer disposed on the conductive support, wherein the photosensitive layer comprises a silicon compound-containing layer containing a silicon compound, and the silicon compound-containing layer further contains a resin, and wherein the photosensitive layer has a peak area in the region of −40 to 0 ppm (S1) and a peak area in the region of −100 to −50 ppm (S2) in a 29Si-NMR spectrum satisfying the following equation (1):
    Type: Application
    Filed: August 27, 2003
    Publication date: May 6, 2004
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Wataru Yamada, Katsumi Nukada, Kazuhiro Koseki, Takayuki Yamashita, Masahiro Iwasaki, Takahiro Suzuki
  • Publication number: 20040086795
    Abstract: Coupled alcohol ethoxylates made by reacting alcohol ethoxylates with a diisocyanate have been found to improve the thermal properties of toner compositions and powder coatings. The alcohol ethoxylates have saturated linear alcohol portions of from about 20-70 carbon atom chain lengths. The diisocyanates may be aromatic diisocyanates such as toluene diisocyanate (TDI) and/or methylenediphenyl diisocyanate (MDI). Preferably, about one mole of diisocyanate is reacted with about two moles of the alcohol ethoxylates to form the coupled alcohol ethoxylates that are useful compatibilizers to improve the homogeneity of toner compositions and powder coating compositions.
    Type: Application
    Filed: October 24, 2003
    Publication date: May 6, 2004
    Inventors: Richard J. Nadolsky, Thomas Joseph Clark, David D. Truong
  • Publication number: 20040086796
    Abstract: An imaging member including, for example, a substrate, a charge blocking layer, an optional adhesive layer, a charge generating layer, a charge transporting layer comprising, and a film forming polymer binder substantially free of low molecular weight fractions.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Applicant: Xerox Corporation.
    Inventors: Robert C. U. Yu, Timothy J. Fuller, Kathleen M. Carmichael
  • Publication number: 20040086797
    Abstract: A polyester resin composition for a toner comprising a titanium compound in an amount of from 0.005 to 4% by weight, and an inorganic phosphorus compound in an amount of from 0.001 to 5% by weight; a toner comprising the polyester resin composition as defined above; and a process for preparing the polyester resin composition for a toner as defined above, comprising the step of polycondensing the raw material monomers for the polyester in the presence of a titanium compound and an inorganic phosphorus compound. The polyester resin composition for a toner is suitably used as a resin binder for a toner for developing a latent image formed in electrophotography, electrostatic recording method, electrostatic printing method or the like, a process for preparing the same, and a toner comprising the polyester resin composition.
    Type: Application
    Filed: October 28, 2003
    Publication date: May 6, 2004
    Applicant: Kao Corporation
    Inventors: Takashi Kubo, Katsutoshi Aoki, Eiji Shirai
  • Publication number: 20040086798
    Abstract: A heat-sensitive recording material including a substrate having disposed thereon a heat-sensitive recording layer containing a diazo compound and a coupler compound capable of reacting with the diazo compound to develop color,
    Type: Application
    Filed: October 27, 2003
    Publication date: May 6, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yohsuke Takeuchi, Akinori Fujita, Daisuke Arioka, Tetsunori Matsushita
  • Publication number: 20040086799
    Abstract: A lithographic printing plate precursor comprising a support having a hydrophilic surface having provided thereon an image-forming layer containing a hydrophobic high molecular compound having at least either a functional group represented by formula (1) or a functional group represented by formula (2): 1
    Type: Application
    Filed: December 5, 2003
    Publication date: May 6, 2004
    Applicant: Fuji Photo Film Co., Ltd.
    Inventors: Hidekazu Oohashi, Kazuto Shimada
  • Publication number: 20040086800
    Abstract: An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. A photoactive adhesion promoter (PAG) is described which helps reduce these and other undesired effects associated with the removal of photoresist in a semiconductor manufacturing process.
    Type: Application
    Filed: November 4, 2002
    Publication date: May 6, 2004
    Inventor: Robert P. Meagley
  • Publication number: 20040086801
    Abstract: An object of the present invention is to provide a process for producing a printed wiring board, which is advantageous not only in that the reduction in size and increase in density of the wiring board are achieved and further the steps are simplified, but also in that the connection reliability of mount parts and the yield are improved, and a photosensitive resin composition used in the process.
    Type: Application
    Filed: September 29, 2003
    Publication date: May 6, 2004
    Inventors: Toshihiko Akahori, Ken Sawabe, Michiko Natori, Tomoaki Aoki, Takuya Kajiwara
  • Publication number: 20040086802
    Abstract: An ultra-high density data storage and retrieval unit has a phase-change layer for storing and retrieving data and at least one other layer. The phase-change layer and/or the other layer comprises a two-dimensional material, primarily one of the chalcogen-based materials.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Inventor: Gary A. Gibson
  • Publication number: 20040086803
    Abstract: A non-resonant two-photon absorbing material is provided, comprising a methine dye undergoing a non-resonant two-photon absorption, in which the methine dye is preferably a cyanine dye, a merocyanine dye or an oxonol dye, and a non-resonant two-photon absorbing material is provided, comprising a non-resonant two-photon absorbing compound undergoing non-resonant two-photon absorption in the intermolecular aggregation state.
    Type: Application
    Filed: October 6, 2003
    Publication date: May 6, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Hiroo Takizawa, Takeharu Tani, Naoki Morinaga
  • Publication number: 20040086804
    Abstract: A resist pattern can be formed on a microelectronic substrate, the resist pattern comprising a resist material. A coating layer, including a water-soluble resin, is formed on the resist pattern, wherein the water-soluble resin and the resist material are miscible with one another and intermix to provide an intermixed layer comprising the resist material and the water-soluble resin between the resist pattern and a non-intermixed coating layer. The intermixed layer can be hardened and the non-intermixed coating layer can be removed from the hardened intermixed layer.
    Type: Application
    Filed: October 8, 2002
    Publication date: May 6, 2004
    Inventors: Sangjun-Choi, Sihyeung-Lee, Hyoungdo Kim, Woosung-Han
  • Publication number: 20040086805
    Abstract: A substrate material for LIGA applications w hose general composition is Ti/Cu/Ti/SiO2. The SiO2 is preferably applied to the Ti/Cu/Ti wafer as a sputtered coating, typically about 100 nm thick. This substrate composition provides improved adhesion for epoxy-based photoresist materials, and particularly the photoresist material SU-8.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Inventor: Paul M. Dentinger
  • Publication number: 20040086806
    Abstract: A method for forming a metal pattern, characterized in that it comprises applying a photosensitive resin composition containing a polysilane having a weight average molecular weight of 10,000 or more and being soluble in an organic solvent, a photosensitive radical generating agent, an oxidizing agent, an alkoxy group-containing silicone compound and an organic solvent on a substrate, to form a photosensitive layer, exposing a region of the photosensitive layer corresponding with the metal pattern to a light, followed by developing, to thereby form a groove in the photosensitive layer, contacting the photosensitive layer with a solution containing a palladium salt or the like, to thereby allow an exposed part in the groove to absorb palladium or the like, contacting the photosensitive layer with an electroless plating solution, to thereby deposit a metal film on the part in the groove having absorbed palladium or the like and form the metal pattern.
    Type: Application
    Filed: September 4, 2003
    Publication date: May 6, 2004
    Inventor: Hiroshi Tsushima
  • Publication number: 20040086807
    Abstract: A method of producing a thin film transistor is described. The doped amorphous silicon is formed by ion implantation. The photoresist used by the ion implantation is formed by backside exposure or by half-tone photo mask, and a photo mask can therefore be eliminated.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 6, 2004
    Inventors: Chih-Yu Peng, Yen-Wen Fang
  • Publication number: 20040086808
    Abstract: The object of the present invention is to provide an information recording/reproduction device for implementing high-density information recording and reading using mutual interaction of a recording medium with near field light, and particularly to a near field optical head with a high optical efficiency and a manufacturing method thereof. This is achieved by enabling an energy propagation mechanism via a plasmon by forming a layer dispersed with metal particulate at a microscopic opening generating near field light, and therefore increase optical efficiency.
    Type: Application
    Filed: October 23, 2003
    Publication date: May 6, 2004
    Applicant: SEIKO INSTRUMENTS INC.
    Inventors: Manabu Oumi, Nobuyuki Kasama, Hidetaka Maeda, Kenji Kato, Takashi Niwa, Yasuyuki Mitsuoka, Yoko Shinohara
  • Publication number: 20040086809
    Abstract: Photoresists may be formed over a structure that has been modified so as to poison a lower layer of the photoresist. Then, when the photoresist is patterned, it is only patterned down to the poisoned layer. The poisoned layer may be removed subsequently. However, because of the use of the modification process, the critical dimensions of the photoresist may be improved in some embodiments.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Inventors: Michael D. Goodner, Robert P. Meagley, Michael J. Leeson
  • Publication number: 20040086810
    Abstract: A photographic bleaching composition has reduced odor and acceptable storage stability. It comprises an iron-ligand complex bleaching agent, a rehalogenating agent, and a phthalic acid or salt thereof. This bleaching composition can be used in various photographic processing protocols to provide color images from color photographic silver halide materials, especially photographic color papers. The bleaching step can also be preceded by an acidic stop that also includes a phthalic acid or salt thereof.
    Type: Application
    Filed: October 27, 2003
    Publication date: May 6, 2004
    Inventors: Shirleyanne E. Haye, Janet M. Huston, Eric R. Schmittou, Therese M. Feller
  • Publication number: 20040086811
    Abstract: A silver halide color photosensitive material has, on a support, a unit blue-sensitive silver halide emulsion layer, a unit green-sensitive silver halide emulsion layer and a unit red-sensitive silver halide emulsion layer, each comprising two or more light-sensitive layers having the same color sensitivity but differing in speed to each other. The silver halide color photosensitive material contains at least one compound represented by the following general formula (I) or general formula (II); and at least one of the light-sensitive layers contains silver halide grains in which tabular grains each having an aspect ratio of 5.0 or more account for 60% or more of the total projected area of the silver halide grains.
    Type: Application
    Filed: October 21, 2003
    Publication date: May 6, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Fumitaka Ueda, Koji Takaku, Ryoji Nishimura, Keisuke Matsumoto, Yoshio Ishii
  • Publication number: 20040086812
    Abstract: A silver halide color photographic lightsensitive material containing at least one compound capable of increasing photographic speed, the compound having at least three heteroatoms in its molecule, and wherein at least one layer of the silver halide emulsion layers comprises an emulsion, the emulsion consisting of a lightsensitive silver halide emulsion wherein 50% or more in number of all the silver halide grains are occupied by tabular grains having (111) faces as main planes, the tabular grains (i) composed of silver iodobromide or silver chloroiodobromide, (ii) having an equivalent circle diameter of 1.0 &mgr;m or more and a thickness of 0.15 &mgr;m or less, and (iii) composed of core portions of 0.1 &mgr;m or less thickness free of growth ring structure and composed of silver iodobromide and shell portions having ten or more dislocation lines.
    Type: Application
    Filed: October 23, 2003
    Publication date: May 6, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Masaaki Miki, Yoshiyasu Inami, Junichiro Hosokawa
  • Publication number: 20040086813
    Abstract: The present invention relates to a new silver halide tabular grain emulsion, wherein said silver halide emulsion comprises tabular grains having average thickness lower than 0.15 &mgr;m, an average diameter of at least 1.20 &mgr;m and an average aspect ratio of at least 8:1, and showing a coefficient of diameter variation COVd within the range of from 31% to 44% and a coefficient of thickness variation COVt lower than 25%.
    Type: Application
    Filed: October 30, 2003
    Publication date: May 6, 2004
    Applicant: Ferrania, S.p.A.
    Inventors: Simona Fava, Roberta Bellunghi, Roberta Ganduglia, Luca Ceruti
  • Publication number: 20040086814
    Abstract: A silver halide emulsion which comprises silver halide tabular grains showing an average thickness lower than 0.15 &mgr;m, an average diameter of at least 1.20 &mgr;m and an average aspect ratio of at least 8:1 dispersed in a hydrophilic colloid mixture comprising from 10% to 30% by weight of dextran, from 20% to 40% by weight of a hydrogenated polysaccharide having an average molecular weight equal to or lower than 10,000, and from 40% to 60% by weight of gelatin and photographic element comprising it.
    Type: Application
    Filed: October 30, 2003
    Publication date: May 6, 2004
    Applicant: Ferrania, S.p.A.
    Inventors: Luca Ceruti, Simona Fava
  • Publication number: 20040086815
    Abstract: A candle structure comprises a fan, wherein the heated air generated by a candle may propel the fan. The candle is housed in a container having a bottom wall and a side wall. The side wall is formed with vents located above the candle so that adequate air needed to permit the candle to combust can be drawn through the vent, thereby to enhance propulsion of the fan. The fan serves to impart a new functional and aesthetically pleasing characteristic to the basic candle structure by distributing the heat and the scent generated by the candle, while concurrently rotating decorative elements.
    Type: Application
    Filed: November 5, 2002
    Publication date: May 6, 2004
    Inventor: Terry Hermanson
  • Publication number: 20040086816
    Abstract: A gas to liquid converter to convert liquids (1) to gas (2) that can include a liquid pressurization element (3), a liquid preheating element (5), and a nozzle (10) to disperse liquids into energy (7) generated by an energy source (8). The gas to liquid converter can be located inside an enclosure (17) and substances dissolved in the liquid can accumulate as solids (13) on deposition surface (12) of the enclosure as the liquid (1) converts to gas (2). Condesation of a portion of the gas (2) generated can be combined with the solids (13) for continuous removal of such solids (13) from the enclosure (17). A gas expansion compensator can generate a pressure gradient (24) to move the volume of gas generated from the liquid from the enclosure (17).
    Type: Application
    Filed: October 27, 2003
    Publication date: May 6, 2004
    Applicant: Western Pump & Dredge, Inc
    Inventors: Herbie Jack Hays, William Merle Hays, Arturo Quezada
  • Publication number: 20040086817
    Abstract: A candle including at least one sculpture that is partially or completely concealed within the candle. The sculpture or sculptures are partially or completely exposed or revealed as the candle melts and the candle fuel is consumed. The candle may further comprise a container and/or at least one platform. The candle may further comprise a message on its exterior.
    Type: Application
    Filed: November 5, 2002
    Publication date: May 6, 2004
    Inventor: Terry Hermanson
  • Publication number: 20040086818
    Abstract: The present invention relates to a jet burner for gaseous fuels with a gas supply and a burner surface (1) permeable for said fuel and on which fuel burns, wherein said burner surface (1) is formed heterogeneously and comprises at least two different surface areas, wherein one or several first surface areas (3) are permeable for said fuel, whereas one or several second surface areas (2) are impermeable for said fuel. Moreover, the present invention pertains to a method for manufacturing a jet burner for gaseous fuels with a correspondingly characterized burner surface.
    Type: Application
    Filed: September 25, 2003
    Publication date: May 6, 2004
    Applicant: Cramer SR, s.r.o.
    Inventors: Burkhard Kruper, Jozef Ninc
  • Publication number: 20040086819
    Abstract: A head-mountable flashback arrestor for a gas torch having body, head, and tip sections. The head-mountable flashback arrestor may be disposed in a variety of gas torches, such as cutting torches, welding torches, heating torches, and so forth. The flashback arrestor also may embody a variety of filtering mechanisms, such as a porous metal structure. For example, the porous metal structure may be sintered from a metal particulate, such as a stainless steel powder, to form a non-linear or random flow pattern.
    Type: Application
    Filed: October 31, 2002
    Publication date: May 6, 2004
    Inventor: Robert W. Wakeman
  • Publication number: 20040086820
    Abstract: The present invention relates to an arrangement and method that help to reduce the build-up formed on the grate of a fluidized-bed furnace in the roasting of fine-grained material such as concentrate. The concentrate is fed into the roaster furnace from the wall of the furnace, and oxygen-containing gas is fed via gas jets under the grate in the bottom of the furnace in order to fluidize the concentrate and oxidize it during fluidization. Below the concentrate feed point, or feed grate, the oxygen content of the gas to be fed is raised compared with gas fed elsewhere using additional gas jets situated in the feed grate higher than the other jets. The extra jets of the feed grate are connected to their own gas distribution unit.
    Type: Application
    Filed: September 9, 2003
    Publication date: May 6, 2004
    Inventors: Jens Nyberg, Heikki Siiril, Juha Jarvi
  • Publication number: 20040086821
    Abstract: The invention is based on the problem of designing an endless sealing ring for the end wall seal of rotary kilns so that it guarantees a high degree of sealing effectiveness with simpler assembly. The most desired features are small tolerances for cross section and diameter. Rotary-kiln end-wall seals according to the invention should exhibit very low wear and tear if possible and have a service life that corresponds to the maintenance intervals of the rotary kiln as much as possible.
    Type: Application
    Filed: January 17, 2003
    Publication date: May 6, 2004
    Inventors: Peter H. Raichle, Harry F. Werner
  • Publication number: 20040086822
    Abstract: Valve and valve lift system suitable for use in a regenerative thermal oxidizer, and oxidizer including the switching valve. The valve of the present invention exhibits excellent sealing characteristics and minimizes wear. In a preferred embodiment, the valve is sealed with pressurized air during its stationary modes, and unsealed during movement to reduce valve wear.
    Type: Application
    Filed: October 30, 2003
    Publication date: May 6, 2004
    Inventors: James T. Cash, Ken Wendorf, Glenn Schmidt
  • Publication number: 20040086823
    Abstract: Pliers for forming and removing bumps for the dental appliance without heating are disclosed. The eraser pliers for erasing a bump on an appliance include a first elongated member having a first jaw portion at one end and a handle portion at the other end, the jaw portion having flat surface mounted at a distal end of the first jaw portion; and a second elongated member joined to the first elongated member, the second elongated member having a second jaw portion at one end and a second handle portion at the other end, the second jaw portion having a second flat surface mounted at a distal end of the second jaw portion, the first and second flat surfaces adapted to engage and flatten the bump.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 6, 2004
    Applicant: ALIGN TECHNOLOGY, INC.
    Inventors: Amir Abolfathi, Brian K. Asselin, Eric Kuo, Loc X. Phan
  • Publication number: 20040086824
    Abstract: An orthodontic appliance of the bracket or tube type for bondable mounting on a tooth including an appliance body having a buccal/labial archwire receiving side and a lingual side and a polymer resin bonding base molded to the lingual side such that at least part of the body is embedded in the base, and wherein the base may include openings for receiving an auxiliary or a secondary archwire.
    Type: Application
    Filed: October 29, 2003
    Publication date: May 6, 2004
    Inventor: Andrew C. Kesling