Abstract: The present invention relates to an inorganic cohesion agent for self-compacting cement pastes consisting of a co-precipitated SiO2/CaCO3 mixture.

Abstract: A cold-weather admixture composition that accelerates the setting time and strength development of cementitious compositions is provided which comprises the components of a soluble inorganic salt having freezing point depressing properties, an inorganic early set and strength accelerator, a polycarboxylate high range water reducing dispersant, and an organic set accelerator. With lower dosages of dispersant than those disclosed in the prior art the admixture composition provides to concrete increased dispersant performance and acceleration of setting time and strength development.

Abstract: An exemplary admixture system for cementitious compositions, comprises a polycarboxylic acid type water reducer and a tertiary amine defoamer having an average molecular weight of 100-1500 and more preferably 200-750. The defoamer permits a stable admixture formulation and helps to achieve a controllable level of entrained air in a concrete mix. Cementitious compositions and methods for modifying the same, using the tertiary amine defoamers, are also described herein.

Abstract: A table with a first work surface and a second lower work surface on a trundle table assembly. The first work surface having a table lip extending upward around the perimeter of the table while the trundle table assembly work surface does not have a lip on either end. The trundle table assembly providing a second and lower work surface so that caregivers can avoid lifting heavier children or children in wheelchairs to the height necessary to clear the table lip around the first work surface. One use for the table with trundle table assembly is a diaper changing table.

Abstract: A table or desk unit includes a worksurface and leg structure, and a wire management arrangement located below the worksurface. The wire management arrangement includes upper and lower wire management members that support wires or cables for providing power and/or communication capability to items or equipment on the worksurface, and front and rear access covers which are movable between open and closed positions for providing access to the upper and lower wire management members. The rear access cover is configured to provide access to the lower wire management member, and engages the upper wire management member when in the closed position. A portion of the upper wire management member above the rear access cover is exposed, to mount power outlets that can be accessed from the rear of the worksurface. The front access cover is engaged with the worksurface when in the closed position, and is configured to provide access to both the upper and lower wire management members when in the open position.

Abstract: A versatile workstation system including two tables which are removably connected to each other, the tables for supporting two computer monitors, two keyboards and two CPU units. One of the tables is at a standard height and may be used as a desk or a conference table. The second table is two inches lower. The second table is mounted on casters to allow it to be rolled up to and away from the first table. The second table includes brackets for connecting to the first table when the tables are adjacent one another. The second table also includes a wire management structure and has a computer support bracket for computer CPUs. The second table may be used to support the monitors, the CPUs and the keyboards as well as other equipment when the second table is rolled out of the way. The combination of the two tables provide versatility for an office space and is efficaciously ergonomic.

Abstract: A packaging system including an overlay having opposing upper and lower surfaces, the lower surface disposable on an upper surface of a pallet and the upper surface having a plurality of channels formed therein, and a plurality of sheets of at least one of card stock and paper disposed on the upper surface of the disposable overlay

Abstract: A reinforced pallet includes a pallet body having a plurality of flexible support arms, each integrally molded adjacent one of the plurality of channels formed in the pallet body. Each of the flexible support arms is configured to flex outward away from the channel upon insertion of an elongated reinforcement member into the channel and to subsequently return to its own deformed position in the channel, thereby retaining the reinforcement member in the channel. In this manner, the reinforcement members can be inserted and locked in the pallet body in a single motion.

Abstract: A shelf assembly includes a pair of shelf brackets secured to a rim which carries a planar support. The shelf brackets include oppositely directed pins spaced a predetermined distance from each other which correspond to a plurality of slots in a pair of mirror image adapter brackets each having a vertical slideway associated with the slots. The adapter brackets have hooks for engaging slots in vertical shelf tracks of a refrigerator compartment to effect “coarse” vertical adjustment of the shelf assembly. However, the shelf can be “fine tuned” vertically adjusted by moving the pins of the shelf brackets along the sideways and into selected pairs of the adapter bracket slots.

Abstract: A shelf assembly includes a pair of shelf adapter brackets each defined by first and second shelf bracket members, one of which includes vertically disposed opposing slideways into which open a plurality of vertically spaced slots and the other of which includes a plurality of supporting projections which move in the slideways and seat in the slots to effect selectively vertical adjustment of an associated shelf. The shelf may include shelf brackets having hooks for engaging in slots of one of the bracket members or can be integrally formed to define one of the first and second bracket members. Another embodiment includes a shelf having an injection molded rim with hooks at rear corners thereof for engaging one of the shelf support members. All embodiments of the invention prevent inadvertent/accidental disengagement of an associated shelf from the adapter brackets.

Abstract: A key storage and concealment device that effectively stores and conceals any type of key in an inconspicuous or unobtrusive fashion, wherein quick and convenient access thereto is permitted by only those informed of the device's presence, thus appeasing any trepidation of discovery by an unauthorized person.

Abstract: A furnace blower housing has a two-piece exhaust transition, one piece of which is an integral extension of the blower housing, that transitions a rectangular cross section outlet of the blower housing to a circular cross section outlet of the exhaust transition that is adapted to be attached to a circular exhaust pipe.

Abstract: An arrangement is disclosed for supplying an air jet form to the furnace of a recovery boiler, where the furnace has a front wall, a rear wall and side walls. Black liquor spraying devices are disposed on the furnace walls at one or several levels of the furnace. A plurality of air ports are located at several horizontal levels for introducing air into the furnace from an air supply. In the arrangement for the secondary air flows, two horizontal air levels at different elevations are arranged above the lower primary levels and below the black liquor sprayer. Secondary air is supplied from two opposite walls and the air ports from each of the two levels are located so that the air jets are introduced in an interlaced pattern having an even number of jets on one opposite wall and an uneven number of jets on the other opposite wall. The air jets of said at least two air levels are located substantially one above each other in substantially vertical rows.

Abstract: An implement for an agricultural machine includes a plurality of discs arranged to create furrows and a plurality of dispensers designed to provide at least first and second depositing locations. The first depositing location lies at a height close to the lowest point of the disc to enable deposition of material at the bottom of a furrow. The second depositing location is located such that the material is deposited into or onto the top of a soil flow created by the discs.

Abstract: An agricultural implement for forming a furrow in a soil, is described and which includes a rotatable shank; a resilient, movement limiting member disposed in force transmitting relation relative to the rotatable shank; and a pair of wheels mounted for earth engaging movement, and respectively positioned on the opposite sides of the rotatable shank, and wherein the pair of wheels are positioned substantially laterally outwardly and rearwardly of an intended direction of movement of the shank.

Abstract: A planting assembly and liquid application device for same having a furrow opening mechanism, a frame including a seed guide, a seed tube for directing seeds into a furrow, a liquid source, a liquid delivery conduit having a delivery end, and a furrow closing mechanism. The planting assembly also including a spray arm including a proximal end, a central portion, and a distal end, the proximal end being mounted to the seed tube, the seed guide, or the frame, and the central portion extending rearward such that the distal end is disposed above the furrow, and wherein the liquid delivery conduit is in fluid communication with the liquid source and the delivery end is adjacent to the distal end.

Abstract: The present invention relates to a non-plowing method for establishing vegetation on at least partially denuded land comprising the steps of: (a) laying out a continuous layer of nutrient matrix directly on said at least partially denuded land, said layer of nutrient matrix containing water and nutrient contents necessary for the growth of plants; (b) sowing plant seeds on the top surface of said at least partially denuded land before said layer of nutrient matrix is laid out, or sowing plant seeds into said layer of nutrient matrix after it is laid out, or mixing plant seeds with the constituents of said layer of nutrient matrix and laying out together with said layer of nutrient matrix; (c) establishing an artificial vegetable cover on said at least partially denuded land by supplying said plant seeds water and nutrient contents in said layer of nutrient matrix to sustain their growth.

Abstract: An agricultural apparatus comprising a carrier frame including a support surface defining an arcuate track about a pivot point, a mainframe mounted to the carrier frame at the pivot point for rotation thereabout between an operating position and a transportation position and a wheel assembly including at least one wheel mounted to a mounting member, the mounting member mounted to the mainframe such that the wheel is received on the curved track for rotation there along where the wheel assembly is vertically adjustable.

Abstract: A blind stitch sewing mechanism for a sewing machine includes a curved, oscillating needle, and a looper, having only one degree of freedom, for cooperatively forming a blind stitch with the curved oscillating needle.

Abstract: A looper threading apparatus includes a threading member capable of holding a thread in a tip portion and inserting the thread through a thread hole, a guide member for movably accommodating the threading member and guiding the threading member to the thread hole, and a support member for supporting the guide member to freely approach and separate from the thread hole provided on an extended line of the threading member accommodated by the guide member. Moreover, there is provided a moving mechanism for moving the threading member and the guide member along an axis of the thread hole provided on the extended line. The moving mechanism moves the guide member and the threading member with respect to the thread hole provided on the extended line in such a manner that the tip portion of the threading member penetrates through the thread hole.

Abstract: A tufting needle which has a transverse eye between the blade of the needle an the point and has a clearance above the eye in the blade on one side and has no yarn guide and protection groove on the opposite side. Also, disclosed is a conventional tufting needle which has the conventional yarn guide and protection groove.

Abstract: A method for outfitting a vessel such as a water ship for a particular mission includes maneuvering the vessel toward a mission module, capturing the mission module with the vessel, and coupling the mission module to the vessel. Such method allows one to interchange mission modules, and thus outfit a vessel for different missions, quickly and easily.

Abstract: A sail that is fully battened by a plurality of essentially thin, spaced apart battens positioned at a steep angle on the sail. The sail is adapted to be furled around the mast. The battens are stiff enough to support a large roach of a square top sail and yet flexible enough to wrap around the mast. The mast is supported on bearings that allow the mast to turn about the mast's long axis with little friction to permit rapid furling and unfurling of the fully battened sail.

Abstract: A ship having a multi-mode hull where the draft, seakeeping, and payload-carrying capacity are varied to match the requirements of the required mission. For example, the ship has a hull with first and second hull portions and with an interconnecting hull structure, and has a ballasting system within the hull portions and operable to adjust the draft of the vessel in conjunction with the payload carried by the ship so that the ship can perform a designated mission. The hull is designed to have an adjustable hull depth according to the payload carried to perform the mission and augmented by the ballasting system so as to optimize draft, and thus hull mode, to meet mission requirements.

Abstract: An integrated, compartmentalized, water impermeable hull that is constructed of a plurality of lengthwise tubes. The tubes are arranged in a generally parallel relation to one another such that an outer surface of each tube abuts an outer surface of at least one other of the tubes. The tubes are sandwiched between a first inner support layer and a second inner support layer. Each inner support layer undulates along and fixedly adheres to the tubes to thereby hold the tubes in a fixed relation to one another. First and second outer support layers are positioned over the first and second inner support layer, respectively, and are fixed to a plurality of peaks of the first inner support layers to thereby reinforce the first inner support layers.

Abstract: A cover fastening system for a boat, the system including a groove formed along a side of the boat. A plurality of expandable anchors is positionable within the groove. Also included are a plurality of fastening members, each fastening member including a threaded portion and a snap portion, the threaded portion of each fastening member being screwed within a respective anchor to expand and fix the anchor at a desired position along the groove, and the snap portion being adapted to engage a corresponding snap structure of a boat cover.

Abstract: Systems, methods, and apparatuses for marking a substrate. In a representative embodiment, the invention involves a marking system including a marker container, a marker cutter, and a marker driver. The marker container is configured to contain marker material having flexible shaft material. The marker cutter is coupled to the marker container, and the marker driver is coupled to the marker cutter.

Abstract: The present invention provides crystals of an oligosaccharide useful, for example, as raw materials for or as intermediates of health foods, pharmaceutical compositions, cosmetics, etc. and a process for producing crystals of an oligosaccharide which is suitable for large-scale synthesis or industrialization.

Abstract: A method for preparing a high-quality garnet single crystal represented by the composition formula CaxNbyGazO12 (2.9<x<3.1, 1.6<y<1.8, 3.1<z<3.3) is provided. The single crystal can preferably be used as a single crystal substrate for forming a defect-free single crystal of bismuth-substituted rare-earth iron garnet thereon by liquid-phase epitaxial deposition. The method is to prepare a single crystal by the Czochralski technique, the single crystal having a garnet structure being represented by the composition formula CaxNbyGazO12 (2.9<x<3.1, 1.6<y<1.8, 3.1<z<3.3). The crystal is grown at a crystal growth rate g less than or equal to 1.72 mm/h. The crystal is preferably grown in an atmosphere containing oxygen 0.4% or more by volume and below 10.0% by volume.

Abstract: High quality epitaxial layers of compound semiconductor materials can be grown overlying large silicon wafers by first growing an accommodating buffer layer on a silicon wafer. The accommodating buffer layer is a layer of monocrystalline oxide spaced apart from the silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline compound semiconductor layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer.

Abstract: High quality epitaxial layers of compound semiconductor materials can be grown overlying large silicon wafers by first growing an accommodating buffer layer on a silicon wafer. The accommodating buffer layer is a layer of monocrystalline oxide spaced apart from the silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline compound semiconductor layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer.

Abstract: A brush applicator forms a tapered inner wall and inwardly extended flange inside of a nozzle, which secures either molded or crimped brush assembly. Two edge applicators apply a substantially uniform thin layer of adhesive or glue only on the edge surface of a workpiece. A first edge applicator applies glue through an exit and a second edge applicator has a roller with side flanges and with a reduced portion in-between. A flat surface applicator implements may have plural vanes and channels inside of two outer walls to distribute adhesive to a wider flat exit. A biscuit applicator applies glue on two side surfaces of elliptical slots that are formed by biscuit cutters. The glue flows through plural vanes or plural transversely positioned openings and passes to form two opposite layers of glue. A dowel applicator applies a thin substantially uniform layer of glue on the wall of a dowel-receiving hole prior to installation of dowel pins.

Abstract: A spray booth comprising an electrostatic disk (1) that is suitable to move along a shaft in order to position it at a chosen height with respect to a piece to be coated, the electrostatic disk (1) being provided with a plurality of electrodes (3) for generating an electrical field and for coating the piece to be coated by electrostatic disk is composed of a plurality of circulars sectors (1a), each powered by an independent voltage source (12).

Abstract: A coating apparatus and method are disclosed in which even if poor coating occurs in a lower-layer, no poor coating occurs in an upper-layer formed on the lower-layer. A pre-wet liquid coating device is disposed between a first coating device at the upstream side of a support web conveying direction, and a second coating device disposed at the downstream side. When an uncoated portion is formed by the first coating device, a pre-wet liquid is coated by a pre-wet liquid coating device, and the coating liquid can be reliably coated by the second coating device. When the pre-wet liquid coating device is removed from the support web, first, the pre-wet liquid coating device is brought into liquid-running out state, and thereafter, removed from the support web. Accordingly, the pool of pre-wet liquid is eliminated and occurrence of a thickly coated portion on the support web can be prevented.

Abstract: A slurry raw material is applied onto a carrier film 3 in a coating section 4, and a predetermined property related to the thickness of the slurry raw material is measured in a property-measuring section 5 in a wet mode before the slurry raw material is dried in a drying section 6. A processing sub-section 7a calculates an estimated value t of the thickness of a sheet from the target thickness of the sheet, a measurement of the slurry raw material property, and the slurry raw material density, to compare the estimated value t with the target value T of the sheet thickness. An adjusting output sub-section 7b transmits signals for adjusting the thickness to a thickness-adjusting means 9 on the basis of the above comparison result, to control the thickness of the slurry raw material applied onto the carrier film 3.

Abstract: A particle control device and a particle control method capable of controlling occurrences of particles in a vacuum reactor are provided. The particle control device for a vacuum processing apparatus having a vacuum reactor, a gas delivery means for supplying process gases to the vacuum reactor, and a sample table for placing and supporting a sample in the vacuum reactor, wherein the apparatus subjects the sample to vacuum processing, the device comprises: a particle monitor for detecting particles floating inside the vacuum reactor; means for generating apparatus condition data indicating a condition of the vacuum processing apparatus; and data managing means for determining a component which is high in a particle occurrence probability based on particle data detected by the particle monitor and the apparatus condition data, thereby enabling the component determined to be displayed.

Abstract: A process for preparing carbon nanotubes comprising locating a substrate (1) capable of supporting carbon nanotube growth in a localised heating zone within a reaction chamber (7), said localised heating zone being provided by a heating element (2) located within the reaction chamber (7), passing a gaseous carbonaceous material into the reaction chamber (7) such that the gaseous material passes over and contacts the substrate (1) in the localised heating zone, whereby the gaseous material undergoes pyrolysis under the influence of the heat to form carbon nanotubes on the substrate (1). Embodiments of the process prepare multilayer carbon nanotubes and hetero-structured multilayer carbon nanotube films.

Abstract: A method and system for reducing the cost of a vacuum processing system by utilizing separately fabricated parts for the walls and the tops and bottoms of chambers. Walls are formed from cylinders (e.g., aluminum tubing or rolled ring forgings), and plates are then hermetically sealed to the top and bottom of the cylinder. Fasteners (and the vacuum inside the chamber) clamp the plates to the cylinder.

Abstract: A deposition apparatus is disclosed for depositing a layer on a substrate such as a semiconductor wafer. The deposition apparatus may include a process chamber, and a susceptor in the process chamber with the susceptor being configured to receive a substrate for depositing a thin layer thereon. The deposition apparatus may also include a showerhead on a side of the process chamber with the showerhead being configured to receive reaction gases and to introduce the reaction gases into the process chamber. The showerhead may include a heating element therein for heating reaction gases prior to introducing the reaction gases into the reaction chamber. Related methods are also discussed.

Abstract: Provided is a reaction chamber for depositing a thin film. The reaction chamber includes a reactor block; a wafer block located inside the reactor block; a top plate that covers the reactor block to maintain a predetermined pressure; a feeding unit which supplies reactive gases to the reactor block; a shower head, which is installed in the top plate and includes a plurality of first spray holes for spraying the first reactive gas on a wafer and a plurality of second spray holes for spraying the second reactive gas; and an exhaust unit which expels gases from the reactor block. The feeding unit includes a feeding block; a distributing block; two or more first gas transfer pipes; and a second gas transfer pipe. The shower head includes an upper diffusion block, an intermediate diffusion block, and a lower diffusion block.

Abstract: An improved gas precursor delivery system for a deposition chamber is disclosed. The system includes, in a preferred embodiment, a shower head containing holes through which the gas precursors will be delivered to the deposition chamber. Each hole within the shower head has associated with it a flow regulating micromachine, such as a microvalve or micropump, for independently regulating the flow of the precursor into the deposition chamber, and if necessary, for vaporizing the source chemical. Each micromachine is preferably associated with a single precursor source, and hence precursor lines are not shared and thus do not need to be purged with the introduction of each new precursor, saving manufacturing time and decreasing wasted precursor gas. Precise control of precursors into the chamber via the micromachines allows film stochiometry and thickness to be carefully controlled.

Abstract: This invention is a vacuum processing apparatus comprising of a vacuum processing area (14) having a stage (16) on which a substrate to be processed (17) is mounted, and a carrier port (18) provided on a periapheral wall of a processing chamber (11) forming the vacuum processing area (14) and carrying the substrate (17) onto and off the stage (16), for generating plasma in the vacuum processing area (14) and subjecting the substrate (17) on the stage (16) to a plasma processing, wherein a shutter (20) closing the carrier port (18) to prevent the plasma from being disordered when the plasma is generated in the vacuum processing chamber is provided.

Abstract: An ultraviolet-ray-assisted processing apparatus (10) for a semiconductor process includes a window disposed in a wall defining the process chamber (12) and to face a worktable (11), and configured to transmit ultraviolet rays. A light source (15) is disposed outside the process chamber (12) to face the window (20), and configured to emit ultraviolet rays. A supply system configured to supply a process gas in the process chamber (12) includes a head space (21) formed in the window (20) and which the process gas passes through, and a plurality of discharge holes (22) for discharging the process gas.

Abstract: This application discloses a practical plasma processing apparatus capable of plasma confinement without plasma-density non-uniformity and electric power loss. The apparatus comprises a plasma shield that surrounds a plasma generation region to prevent plasma from diffusing. The shield has at least one opening. The apparatus comprises a diffusion prevention electrode for preventing the plasma from diffusing through the opening of the plasma shield. The surface of the plasma shield exposed to the plasma is made of insulator. The diffusion prevention electrode is located where electrons diffusing toward the opening or having diffused through the opening from the plasma flow into itself.

Abstract: A system for processing a workpiece includes a plasma immersion ion implantation reactor with an enclosure having a side wall and a ceiling and defining a chamber, and a workpiece support pedestal within the chamber having a workpiece support surface facing the ceiling and defining a process region extending generally across the wafer support pedestal. The reactor further includes a gas distribution apparatus for introducing a process gas containing a first species to be ion implanted into a surface layer of the workpiece, and an RF plasma source power generator coupled across the ceiling or the sidewall and the wafer support pedestal for capacitively coupling RF source power into the process zone.

Abstract: A method for implanting ions in a surface layer of a workpiece includes placing the workpiece on a workpiece support in a chamber with the surface layer being in facing relationship with a ceiling of the chamber, thereby defining a processing zone between the workpiece and the ceiling, and introducing into the chamber a process gas including the species to be implanted in the surface layer of the workpiece. The method includes generating from the process gas a plasma by capacitively coupling RF source power across the workpiece support and the ceiling or the sidewall from an RF source power generator. The method further includes applying an RF bias from an RF bias generator to the workpiece support.

Abstract: In order to realize a plasma doping method capable of carrying out a stable low-density doping, exhaustion is carried out with a pump while introducing a predetermined gas into a vacuum chamber from a gas supplying apparatus, the pressure of the vacuum chamber is held at a predetermined pressure and a high frequency power is supplied to a coil from a high frequency power source. After the generation of plasma in the vacuum chamber, the pressure of the vacuum chamber is lowered, and the low-density plasma doping is performed to a substrate placed on a substrate electrode. Moreover, the pressure of the vacuum chamber is gradually lowered, and the high frequency power is gradually increased, thereby the low-density plasma doping is carried out to the substrate placed on the substrate electrode.

Abstract: This invention relates to a method of forming a precursor for chemical vapour deposition including the steps of: (a) forming metal ions at a source, (b) introducing the ions into a reaction chamber; and (c) exposing the ions to a gas or gasses within the chamber to react with the ions to form the precursor.

Abstract: This invention includes a first filter (27) connected between a susceptor (21) and ground and having a variable impedance, a sensor (28) for detecting an electrical signal based on the state of a plasma (P) generated in a process chamber (11), and a control means (36) for controlling the impedance of the first filter (27) on the basis of a detection result output from the sensor (28). Thus, a preferable plasma distribution to match the object of the plasma process can be realized.

Abstract: A deposit is formed on a deposition substrate using a deposition gun that burns a mixture of a fuel and an oxidizer to form a deposition gas flow, mixes a powder into the deposition gas flow to form a deposition mixture flow, and projects the deposition mixture flow therefrom. The deposition gun is provided with a flowing coolant. A flow rate of the fuel to the deposition gun, a flow rate of the oxidizer to the deposition gun, a flow rate of the powder to the deposition gun, and a cooling capacity of the coolant flow are all measured. The flow rate of the fuel, the flow rate of the oxidizer, the flow rate of the powder, and the cooling capacity of the coolant flow are all controlled responsive to the step of measurements.