Abstract: A reflective cholesteric liquid crystal (CLC) display device has a cholesteric liquid crystal color filter in which a plurality of protrusions is formed on an upper portion of the cholesteric liquid crystal color filter to obtain a uniform luminance and a uniform color in a main viewing angle range. The reflective cholesteric liquid crystal display device includes a first substrate, an absorption layer on the first substrate, a cholesteric liquid crystal color filter on the absorption layer, the cholesteric liquid crystal color filter having a plurality of protrusions, an overcoat layer on the cholesteric liquid crystal color filter, a first electrode on the overcoat layer, a second substrate, a second electrode beneath the second substrate, a retardation layer on the second substrate, a polarizer on the retardation layer, and a liquid crystal layer between the first electrode and the second electrode.

Abstract: The invention provides a small-sized liquid crystal display in which a frame region of an outer peripheral portion of a display region is made small without any light leak at peripheral portion of the display region of a liquid crystal display panel. The invention also provides a manufacturing process of such a liquid crystal display. Periphery shading films (shade films 3a and 3b) of a display region of a liquid crystal display panel are alternately formed on a first substrate 1 (shade film 3a) and a second substrate 2 (shade film 3b) oppositely arranged, and a transparent portion (width Q) for irradiating a seal resin 4 used to adhere the two substrates forming the liquid crystal display panel with ultraviolet rays 7 is provided within a region (width P) where the periphery shading films are formed.

Abstract: By using a plastic substrate as a substrate, a lighter weight, improved shock resistance, and a lower cost are realized, while preventing deterioration of quality of the display image due to expansion and contraction of the substrate. A liquid crystal display apparatus (LCD) is provided with reflective electrodes 13 formed on a plastic substrate 2, color filter layers 14 formed on the reflective electrodes 13, a transparent conductive films 15 electrically connected with the reflective electrodes 13 in an area around the color filter layer 14. In the LCD, a distance between an edge of each reflective electrode 13 and an edge of the color filter layer 14 associated therewith is set based on an amount of expansion and contraction of the substrate 2, which are caused in a step of forming the color filter layers 14 and an amount of expansion and contraction of the substrate 2, which are caused in a step of forming the transparent conductive electrodes 15.

Abstract: A reflector for a reflection-type LCD device is provided, which reflects efficiently incident light to the viewer's side and that suppresses the change of color tone. The reflector comprises a roughened surface having a protrusion pattern. The protrusion pattern gives inclination angle to the surface according to a specific distribution where a first component with an inclination angle value of 0° is 15% or less in area and a second component with an inclination angle value from 2° to 10° is 50% or greater in area. The protrusion pattern gives a variation range of chromaticity coordinates (x, y) on a chromaticity diagram dependent on an angle of view. The variation range is limited in a circle on the chromaticity diagram. The circle has a radius of approximately 0.05 and a center at a point corresponding to white color.

Abstract: According to the present invention, there is provided a display, in which the degradation of a displaying quality caused by a turbulently reflected light beam at the time of exposure can be suppressed. The display according to the present invention having a reflective region and a transmissive region comprises a projecting insulating layer formed in a region corresponding to the reflective region on a substrate and a light shielding layer formed under the projecting insulating layer and formed to extend at least up to a region in which a side end of the projecting insulating layer is located.

Abstract: The present invention discloses an IPS LCD device including a first and second substrate opposing with each other, a common electrode on an inner surface of the first substrate, a pixel electrode parallel to the common electrode, a first alignment layer covering the common and pixel electrodes, wherein the first alignment layer is rubbed, a second alignment layer on an inner surface of the upper substrate, wherein the second alignment layer is photo-aligned, and a liquid crystal layer between the first and second substrates.

Abstract: A method includes exposing an alignment material to an interference pattern to cause a chemical reaction in the alignment material and exposing the alignment material to a liquid crystal, where the liquid crystal aligns relative to the alignment material based on the interference pattern.

Abstract: An in-plane switching mode liquid crystal display device includes, among other features, a gate line, a common line, a data line, a thin film transistor connected to the gate line and the data line, a drain electrode, a first insulating layer to cover the entire surface of a first substrate except a pixel region and portions of the drain electrode and the common line; a first pixel line layer connected to the drain electrode and on a side of the first insulating layer, a first common line layer connected to the common line and on a side of the first insulating layer, a second insulating layer in a region that is not covered by the first insulating layer, a second pixel line layer on the second insulating layer and connected to the first pixel line layer, and a second common line layer on the second insulating layer and connected on the first common line layer.

Abstract: The invention provides a reflection type liquid crystal device, and a projection type display and electronic equipment in which display defects caused by disclination are reduced, minimized or prevented from being produced for a highly fine liquid crystal display with a space between pixels made to be narrow to make it possible to provide a high-contrast and bright display. A liquid crystal device includes a liquid crystal layer sandwiched between a first substrate and a second substrate, and a first electrode and a second electrode formed on a face of the above-described second substrate on a side of the above-described liquid crystal layer. The above-described first electrode and the above-described second electrode are formed so that an electric field substantially parallel to the surface of the substrate with respect to the above-described liquid crystal layer can be applied thereto.

Abstract: An LCD array substrate includes a plurality of gate lines arranged in a first direction; a plurality of data lines arranged in a second direction to cross the plurality of gate lines; a semiconductor layer formed at overlapping regions of the gate lines and the data lines and extending a predetermined length from the overlapping regions over the gate lines; a drain electrode spaced apart from the overlapping regions of the gate and data lines and disposed partially in contact with the semiconductor layer, the drain electrode having ends extended beyond the semiconductor layer and the gate line; and a pair of pixel electrodes disposed on opposing sides of the gate line and electrically connected with the drain electrode.

Abstract: There are disclosed various types of TFT active matrix liquid crystal display devices and method of fabrication thereof in which a pixel is divided into three parts, a capacitor is added to each pixel, light shielding is applied to each TFT, and the matrix is driven by a DC cancelling technique.

Abstract: The present invention discloses a liquid crystal display panel and a method for fabricating the same including a main UV sealant on a substrate, a first dummy UV sealant outside the main UV sealant, and a second dummy UV sealant outside the first dummy UV sealant.

Abstract: An LCD device and a method of manufacturing the same are disclosed, which prevents a liquid crystal from being filled imperfectly or excessively in an active region, thereby obtaining a uniform cell gap and improving picture quality characteristics. The LCD device includes a lower substrate and an upper substrate, a UV sealant between the lower and upper substrates, the UV sealant having a portion for controlling a liquid crystal flow at four corner regions, and a liquid crystal layer between the lower and upper substrates.

Abstract: Exemplary embodiments of the invention provide a new structure to reduce alignment defects caused by a problem inherent in an alignment layer without changing the alignment layer itself. According to exemplary embodiments of the present invention, in a method for fabricating a liquid crystal device, the liquid crystal device has a pair of substrates, liquid crystal therebetween, and an alignment layer at least on the inner surface of the substrate. The alignment layer is in contact with the liquid crystal. The method includes forming an alignment layer including inorganic columnar structures tilted towards a predetermined direction on the substrate and filling a space between the pair of substrates with the liquid crystal. In filling, the liquid crystal is filled so as to flow on the alignment layer in a direction parallel to the predetermined direction.

Abstract: In an array substrate and an LCD apparatus having the same, the array substrate includes a signal line, a first insulating layer formed on the signal line, and a pixel electrode formed on the first insulating layer and overlapped with the signal line. The pixel electrode is electrically connected with the signal line so as to discharge a signal through the signal line. A second insulating layer is disposed between the pixel electrode and the first insulating layer, and includes an opening formed in an overlapped area of the pixel electrode and the signal line so as to partially expose the first insulating layer. Thus, the LCD apparatus may have an enhanced display quality.

Abstract: An apparatus is disclosed. The apparatus includes a compartment for containing a high vacuum environment. The compartment is partly defined by and/or includes a surface that has a subsurface that includes a first zone and a second zone. The second zone is located between the first zone and the surface. The first zone includes a metal or alloy that has a composition which differs from stainless steel. Diffusion is more difficult in the second zone than in the first zone, so that gaseous molecules are inhibited from escaping from the subsurface into the high vacuum environment.

Abstract: A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

Abstract: An exposure apparatus for projecting a pattern of an original onto a substrate using exposure light includes a projection optical system to project the pattern onto the substrate; a shielding structure, having an opening through which the exposure light passes, to shield the projection optical system from an outside environment; and an attraction system, including at least one of a panel to generate an electric field and a cryogenic panel arranged to face a path of the exposure light passing through the opening, to attract contaminants.

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

Abstract: A detector to measure EUV intensity employs a linear array of photodiodes. The detector is particularly suited for photolithography systems that includes: (i) a ringfield camera; (ii) a source of radiation; (iii) a condenser for processing radiation from the source of radiation to produce a ringfield illumination field for illuminating a mask; (iv) a reticle that is positioned at the ringfield camera's object plane and from which a reticle image in the form of an intensity profile is reflected into the entrance pupil of the ringfield camera, wherein the reticle moves in a direction that is transverse to the length of the ringfield illumination field that illuminates the reticle; (v) detector for measuring the entire intensity along the length of the ringfield illumination field that is projected onto the reticle; and (vi) a wafer onto which the reticle imaged is projected from the ringfield camera.

Abstract: An array of individually controllable elements is comprised of elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.

Abstract: An illumination optical system for illuminating an illuminated surface using light from a light source includes a first diffraction optical element upon which the light from the light source is incident, and a second diffraction optical element upon which the light from the light source is incident, wherein the light from the first diffraction optical element forms a first part of an illumination distribution on a predetermined surface that substantially has a Fourier transform relationship with the illuminated surface, and the light from the second diffraction optical element forms a second part of the illumination distribution.

Abstract: A lithography device including a first revolver, a second revolver and a driving device. The first revolver includes a transmittance control filter. The second revolver includes transmittance profile filter. The driving device is capable of rotating the second revolver. The first revolver is for positioning the at least one transmittance control filter in the light path. The second revolver is for positioning the at least one transmittance profile filters in the light path.

Abstract: A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.

Abstract: A distance-measuring system, which comprises a light source unit for emitting a distance-measuring light, a photodetection optical system having a photodetection optical axis, a projecting optical system having a projecting light optical axis and for projecting the distance-measuring light from the light source unit to an object to be measured and for guiding the distance-measuring light reflected from the object to be measured toward the photodetection optical system, and an internal reference optical system for guiding the distance-measuring light from the light source unit to the photodetection optical system as an internal reference light, wherein the light source unit can emit two distance-measuring lights with different spreading angles, and one of the light source unit and the projection optical system has a decentering member for decentering the distance-measuring light with respect to the projecting light optical axis.

Abstract: Two light beams from respective light-emitting devices (e.g., lasers or lamps) cross each other and strike a surface (e.g., of a fluid) at respective oblique orientations relative to the surface (e.g., oblique but nearly vertical orientations that are equal and opposite to each other). A camera captures the surface scattering of the beams in a photographic “double-beam” image containing two respective photographic forms corresponding to the two respective surface scattering locations. The measured distance between the two photographic forms is trigonometrically indicative of the height and slope of the surface in the vicinity of the two surface scattering locations. Some inventive embodiments effect “single-beam” images that are trigonometrically indicative of height only. Plural (e.g.

Abstract: A circuitry for measuring a time interval with ring oscillator has a ring oscillator formed by a plurality of delay switching units, a counter and an encoder. Wherein, the ring oscillator generates a plurality of oscillating signals when receives a pulse signal used to turn on or turn off the ring oscillator. The counter can count the numbers of the oscillating signal during an active period of the pulse signal to generate a counting value. In addition, the encoder encodes the oscillation signals generated by a plurality of delay switching unit with a certain interval of delay time. Therefore, when the pulse signal is disabled to lead to turn off the ring oscillator, one can obtain the time interval of the pulse signal based on the encode data and the counting value.

Abstract: The present invention provides a sight adjuster for a velocity measurement system for sighting a projectile. A velocity measurement unit has a front sensor area and a back sensor area, and the sight adjuster has a front panel with a sighting bore such that the front panel is for positioning in the front sensor area of the velocity measurement unit, and the sight adjuster has a back panel for positioning in the back sensor area of the velocity measurement unit, and a light projects through the front panel sighting bore to strike the back panel.

Abstract: A first luminous flux emitted from the front end face of a LD is reflected by a mirror to be made incident on a detection point on the surface of a measuring object, and a second luminous flux emitted from the rear end face of the LD is reflected by another mirror to be made incident on the detection point. Scattered light from the first detection point is received in a photodiode. A signal processing circuit part calculates the frequency shift quantity of the scattered light based on output from the photodiode. As a result, a velocimeter is provided which detects the moving speed of a measuring object highly precisely.

Abstract: A method of checking the authenticity of a perforation pattern which serves as a security feature and which when viewed in daylight back-lighting shows image information in the substrate of a document in particular in card form, wherein both the front side and also the rear side of the substrate is viewed in the region of the perforation pattern under incident light with light of a defined wavelength and in that case the image which is inherent to the perforation pattern shows on the front side while on the rear side thereof an area corresponding to the region of the perforation pattern shows up only in unspecified fashion.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a thin film characteristic and an electrical property of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: A system for adjusting the light (EMR) input into optical fibers comprising a set of “parasitic” optical fibers randomly distributed among a bundle of transmitting fibers. The parasitic fibers are joined by a separate ferrule from the transmitting fibers and are not connected to an EMR source. As a result, the parasitic fibers pick up and transmit light that is lost from the transmitting fibers for detection by a sensor that determines the amount of light being output from these parasitic fibers and, therefore, the amount of right transmitted by the fiber bundle that is subject to variation, such as variation in the intensity of the light source. The level of light output by the parasitic fibers to the detector determines whether the light (EMR) source needs to be adjusted to maintain a steady output from the transmitting fibers.

Abstract: A laser beam transmitter and a method of calibrating such a transmitter result in a beam of laser light that is projected in a desired direction with respect to a transmitter body. The transmitter and a beam target are positioned such that a properly calibrated beam will illuminate a desired point on the target, such as for example the target center. The transmitter is activated and the offset of the point illuminated on the target from the target center measured. A plurality of optical wedge correction elements having varying wedge angles is provided, and the appropriate one of these optical wedge correction elements that will correct for the measured offset is selected. The selected optical wedge correction element is positioned in the transmitter body in the path of the beam. The optical wedge correction element is rotated until the beam is substantially aligned to illuminate the target center. The optical wedge element is then affixed in place in the transmitter body.

Abstract: A foreign matter monitoring system comprises: a production management system which manages the processing of workpieces in a manufacture line; foreign matter monitors mounted as on-machine equipment in plural process processing apparatuses of the manufacture line, said foreign matter monitors each having an optical head containing a detecting optical system for irradiating a workpiece with light and a detecting optical system for receiving reflected and scattered light from the workpiece and converting the received light to a detection image signal and an A/D converter for converting the detection image signal, which is obtained through conversion by the detecting optical system, to a detection digital image signal; and a base system having a control unit for acquiring control information, a buffer memory for storing said detection digital image signal which is acquired from each foreign matter monitor, a database storing inspection recipes each associated with a foreign matter monitor and an image signal pro

Abstract: The present invention provides an down hole apparatus and method for ultrahigh resolution spectroscopy using a tunable diode laser (TDL) for analyzing a formation fluid sample downhole or at the surface to determine formation fluid parameters. In addition to absorption spectroscopy, the present invention can perform Raman spectroscopy on the fluid, by sweeping the wavelength of the TDL and detecting the Raman-scattered light using a narrow-band detector at a fixed wavelength. The spectrometer analyzes a pressurized well bore fluid sample that is collected downhole. The analysis is performed either downhole or at the surface onsite. Near infrared, mid-infrared and visible light analysis is also performed on the sample to provide an onsite surface or downhole analysis of sample properties and contamination level.

Abstract: An apparatus for total internal reflection microscopy of a sample, comprising a microscope objective lens; an excitation beam path for passing light through the objective lens to said sample; and a coupling element arranged in a back focal plane of the objective lens or in a plane which is conjugate to said back focal plane; said coupling element comprising a first area for relaying light to the objective lens for total internal reflection illumination of said sample and a second area; wherein said second area is capable of separating light emitted by said sample and passing through said excitation beam path in reverse direction from said excitation beam path; wherein said second area is spatially separate from said first area and does not overlap with said first area; and wherein a distance between said optical axis of the objective lens and that boundary of said first area which is nearer to said optical axis of the objective lens is selected such that the light beams passing from said first area into the o

Abstract: The present invention provides devices and methods for detection of particles, such as biological cells, in samples using a photosensitive waveguide. The photosensitive waveguide changes its transmissivity in a detectable manner in response to controlling radiation emitted from the particles. In preferred embodiments, the waveguide is two-dimensional and the position of the particles as well as their presence is obtained by scanning the waveguide in two non-parallel directions. The provided devices are preferably used to locate labeled cells. The present invention also includes control systems and methods for detecting and locating cells using the devices provided.

Abstract: A light processor (such as a spectrometer) providing wavelength equalization for a sample pathway and a reference pathway by actuation of a light amplitude modulator. A chemometric processor including a light amplitude modulator capable of performing chemical analysis by applying weights to wavelengths of light, thereby reducing the need for electronic post processing.

Abstract: Multiple wavelength spectrometers can be tuned to particular wavelengths. A dual wavelength spectrometer can include a spectrometer configured to detect at least some wavelengths that fall within the ultraviolet (UV) spectrum and a spectrometer configured to detect at least some wavelengths that fall within the visible spectrum. In some embodiments, a UV light spectrometer and a visible light spectrometer are disposed adjacent one another on a single substrate. A dual wavelength spectrometer can be used for analyzing bioaerosols, as well as for numerous other applications.

Abstract: A diffractive optical element device for use in spectroscopy, where broadband light is emitted from a light source (31) towards the optical element (24) and from there is transmitted to at least one detector (29; 29?). The optical element has a plurality of diffractive dispersively focusing patterns, preferably partly integrated into each other, whose respective centers are two-dimensionally offset relative to each other in order to produce a plurality of spectra (25–28), where at least two are separate, but offset relative to each other and/or partly overlapping. In an alternative embodiment, the optical element consists of either one diffractive optical element (60) that is related to a wavelength and produces a spectrum, or at least two diffractive optical elements (60, 61) which are related to respective wavelengths and which produce at least two mutually partly overlapping spectra to give a composite spectrum.

Abstract: A liquid crystal based polarimetric system, a process for the calibration of this polarimetric system, and a polarimetric measurement process intended for measuring the representative parameters of a sample in which the polarimetric system contains an excitation section emitting a light beam that passes through a polarization state generator (PSG) and onto a sample. After reflection or transmission by the sample, the beam goes through an analysis section with a polarization state detector (PSD). The PSG and PSD each have a first and a second liquid crystal elements LCj (j=1,2) having, for each LCj element of the PSG (respectively for each LCj element of the PSD), an extraordinary axis making an angle ?j (resp. ??j) with respect to the polarization direction (i), and a retardation ?j (resp (??j) between its ordinary and extraordinary axes, the liquid crystals LCj elements being positioned in reverse order in the PSD with respect to the LCj elements of the PSG.

Abstract: With extremely-thin-film and thin-film measurement, models are formed based upon a combination of film thickness, optical constants obtained using the dispersion formula, incident angle, etc., and the model and measured spectrums are fit by BLMC for a single layer of a structure with a certain number of iterations, obtaining information regarding the single layer. With thin-film multi-layer-structure measurement, models are formed for multiple layers of a thin-film multi-layer structure likewise, and fit by BLMC or EBLMC, obtaining information regarding the thin-film multi-layer structure. In either measurement, light is cast onto a thin film on a substrate to be measured while changing the wavelength as a parameter in order to obtain the spectrums ?E(?i) and ?E(?i) for each wavelength ?i, representing the change in polarization between the incident and reflected light. The measured spectrums are fit, obtaining the best model. The results are confirmed and stored, as necessary.

Abstract: Preferred embodiments of the present invention are directed at limiting power and controlling an output intensity of an optical system using photo-induced anisotropic materials. In a preferred embodiment, an azobenzene polymer film is used. The embodiments in accordance with the present invention include a cross-polarization system to provide clamping of the output intensity.

Abstract: A laser measurement apparatus for carrying out measurement using a laser beam that is capable of performing various types of measurement with a simple structure is provided. Optical signal processing units 103, 104, 105 output laser beams ?1, ?2, ?3 having different wavelengths via a common optical path A toward an object to be measured, and detect the laser beams being reflected by a corner cube 100 attached to the object to be measured. A control unit 102 controls motors 110, 111 so that the laser beams return to a predetermined position of a optical position sensing device 117 of an optical signal processing unit 103, according to which the direction of a reflecting mirror 112 is controlled so that the laser beams follow the object. The control unit 102 computes the distance to the object, or the shape, position, speed etc. of the object based on signals detected at the optical signal processing units 104, 105.

Abstract: In a wavelength detecting apparatus using an etalon, a drift in wavelength measurement by the etalon is stabilized and an adverse influence of out gas is eliminated, so that correct wavelength measurement is realized. The wavelength detecting apparatus includes a housing equipped with a port for use of introducing replacement gas, an etalon set inside the housing, and a moisture-absorbing unit for absorbing at least moisture released inside the housing.

Abstract: An interferometer system includes a plane mirror interferometer, a turning mirror, a retardation plate assembly having a retardation plate that can be adjusted and then fixed, and a retroreflector. A light beam travels in a path comprising the plane mirror interferometer, the turning mirror, the retardation plate assembly, and the retroreflector. The retardation plate assembly may include a plurality of bearings, a ring riding on the bearings, the retardation plate mounted to the ring, and a plunger pushing the ring against the bearings. The retardation plate may be fixed by adhesive after determining an orientation that produces little polarization leakage in the system.

Abstract: A method establishing a reference point for a machine tool with X-, Y-, and Z-stages. A YZ-plane is established by reflecting a light beam off an X-stage reflector such that the light beam is sensed at an interference detector. The X-stage is moved while repositioning the head and reflector and maintaining sensing. An optical alignment module (OAM) is mounted optically perpendicular to the beam, with a bending mirror centered at the Z-axis. The Z-axis is established by setting the bending mirror to deflect the beam to the Z-axis, reflecting it off of a Z-stage reflector so it is sensed, and moving the Z-stage while repositioning the OAM relative to the X- and Y-axes to maintain sensing. An XY-plane is established by bending mirror deflecting the beam to the Y-axis, reflecting it off of a Y-stage reflector so it is sensed, and moving the Y-stage while repositioning the Y-reflector relative to the X- and Z-axes to maintain sensing.

Abstract: A light reflected from a semiconductor die is used for enhanced control of substrate removal from the die. According to an example embodiment of the present invention, light reflected from a semiconductor die as it is undergoing substrate removal is used to detect the progress of the substrate removal process, and the removal process is controlled therefrom. In different embodiments, the reflected light is used to detect the removal of a portion of a layer of material in the die and to detect the removal of an entire layer of material.

Abstract: A method for measuring a characteristic of a substrate, including directing an incident beam at an inspection grid of points on the substrate, receiving the reflected beam with a position sensitive detector, measuring the displacement of the reflected beam from its expected location, compiling a database of the displacement measurements, examining the database for effects of a pattern induced anomaly in the displacement measurements, producing an adjusted database, and deriving the characteristic of the substrate from the adjusted database. Thus, pattern induced errors from the displacement measurements are corrected. In this manner, problems with interpreting the reflection angles of a beam in substrate stress analysis equipment are overcome where distortions in the reflection angles are caused by deposition patterns on the substrates.

Abstract: A CPU executes decomposing processing based on data by a PDL received through a communication interface, and generates data by an intermediate language for each band. Here, the CPU judges whether or not the values of the image data are all zero as the image data in the band. As to the image data whose values become all zero, rendering processing from the intermediate language to the image data and compression processing of the image data by a JBIG compressor are omitted, and only a termination code is stored as coded data in a main memory. Thereby, the processing speed can be increased. A JBIG decompressor decompresses the coded data to generate output image data, which is outputted to a printing unit. Thus, the image processing device of the invention increases the speed of generating coded data, and enhances the total throughput.