Abstract: A rear projection type display apparatus, comprises an output unit that modulates a light from a light source to output a projection light; an image formation unit that has one or more optical elements, and that subjects the projection light that is output from the output unit to form an image; a Fresnel screen that displays the projection light that is subjected to form an image; a light detection unit that is disposed at a position on which a reflected light from the Fresnel screen focuses, and that detects rays; and a control unit that controls an output of the projection light by the output unit based on the rays that are detected at the light detection unit.

Abstract: A projection device comprises a color wheel module, wherein, the color wheel can be detached from the color wheel module. The color wheel module can be detached from the body of the projection device, so that users can conveniently change, clean or maintain the color wheel as desired.

Abstract: An optical device includes a main body having a light incident surface, a light emitting surface provided facing the light incident surface, and a light-reflecting side surface provided from a periphery of the light incident surface to a periphery of the light emitting surface. In the optical device, the light incident surface, the light emitting surface and the light-reflecting side surface are mirror-finished, and a supporting portion configured to support the main body is provided on the light-reflecting side surface.

Abstract: An image offset adjustment apparatus for an LCD projector which is constructed to enable the adjustment of an image offset. The LCD projector includes a light source for emitting light, mirrors, and an LCD installed in front of the mirrors so that an image generated in the LCD is enlarged and projected on a screen. The image offset adjustment apparatus includes a projection lens section including a plurality of projection lenses having their respective LCDs at different circumferential positions to have different image offsets; a lens housing for housing the respective projection lenses adjacent to one another in a circumferential direction; rotation means for rotating the lens housing; and a controller for controlling the rotation means so that the lens housing can be controllably rotated to select one of the projection lenses and one of the image offsets as desired by a user.

Abstract: A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least one of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.

Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract: In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the image of a pattern onto the substrate (P) via the projection optical system (PL). An optical element (60) and a barrel (PK), which are in contact with the liquid (50) when the substrate (P) is moved, are surface-treated for adjusting the affinity with the liquid (50). Consequently, generation of bubbles in the liquid between the projection optical system and the substrate is suppressed and the liquid is always retained between the projection optical system and the substrate, thereby creating a good immersion state.

Abstract: An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. The apparatus also includes a supply mechanism that supplies liquid to a predetermined spatial area which includes a space between the projection optical system and the substrate on the substrate stage, and an adjustment unit that adjusts exposure conditions based on temperature information on the liquid between the projection optical system and the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, and a liquid recovery mechanism which recovers the liquid on the substrate simultaneously at a plurality of positions. The liquid recovery mechanism recovers the liquid with a recovery force which differs depending on the position for recovering the liquid.

Abstract: An exposure method exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate by using a projection optical system. The exposure method includes supplying the liquid onto a part of the substrate including a projection area of the projection optical system to form a liquid immersion area, the liquid having an affinity for a liquid contact surface disposed at an end of the projection optical system, the affinity being higher than an affinity for a surface of the substrate, and projecting the image of the predetermined pattern onto the substrate through the liquid supplied to the liquid immersion area.

Abstract: An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, a liquid recovery mechanism which recovers the liquid on the substrate at a liquid recovery position apart from the projection area, and a trap member which is arranged outside the liquid recovery position of the liquid recovery mechanism with respect to the projection area and which is formed with a liquid trap surface for capturing the liquid.

Abstract: The present invention provides an exposure apparatus that can satisfactorily perform a measurement process and can accurately perform an exposure process, even if a liquid immersion method is applied to a twin stage type exposure apparatus. An exposure apparatus (EX) comprises: two substrate stages (PST1, PST2) each capable of holding and moving a substrate (P); an exposure station (STE) that exposes, through a projection optical system (PL) and a liquid (LQ), the substrate (P) held by one substrate stage (PST1); and a measuring station (STA) that measures the substrate (P) held by the other substrate stage (PST2) or the abovementioned substrate stage (PST2); and wherein, the measurement performed at the measuring station (STA) is performed in a state wherein the liquid (LQ) is disposed on the substrate stage (PST2) or the substrate (P).

Abstract: A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The first bearing part is at least partly ferromagnetic, and the second bearing part has at least one permanent magnet interacting with the first bearing part for pre-tensioning the gas bearing. The gas bearing may be part of a lithographic apparatus.

Abstract: Pattern images are projected under various conditions of liquid prior to exposing a substrate, and exposure conditions for exposing a pattern image on the substrate is determined based on each projection condition of the pattern images. When a pattern image is projected through liquid, a substrate can be excellently exposed in a desired exposure condition according to the condition of the liquid.

Abstract: Advanced techniques for programmable photolithography provide enhanced resolution and can image features smaller than the single shutter intensity profile, i.e., sub-pixel resolution. Patterns are built up by multiple exposures with relative movement of the mask and resist so as to place each shape from the library where it is needed on the resist. Electro-Optic phase shifting material may be applied to the shutter so as to adjust the single shutter intensity profile, or to adjust the interaction of adjacent shutters. An apodizing mask may be used to engineer the wavefronts of the light striking the resist to achieve better resolution.

Abstract: An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure apparatus EXS has an optical cleaning unit (80) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface (31) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

Abstract: A weighted fit based on a sample density of a plurality of samples is used to determine an alignment curve. A scan that produces the samples may include portions having greater and lesser sample density. While performing an interpolation to produce a best fit curve, a plurality of neighboring samples are chosen for each sample point, for sample points associated with a value above a threshold. A weighting function may be performed based on a distance between a given sample and the chosen nearest neighbors, wherein measurements that are taken in a region with denser samples are given less weight than measurements that are taken in a region with sparser samples.

Abstract: A semiconductor wafer processing apparatus may include a chuck and/or a focus ring. The chuck may be configured to hold a wafer. The focus ring may be disposed surrounding a rim of the chuck. The focus ring may include a first section formed of a first material and a second section formed of a second material. The first material and the second material may have different conductivities. A method of forming a semiconductor wafer processing apparatus may include forming a first section of a focus ring from a first material, forming a second section of the focus ring from a second material having a different conductivity than the first material, combining the first and second sections to form a focus ring, and/or arranging the focus ring so as to surround a chuck.

Abstract: A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.

Abstract: An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.

Abstract: A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.

Abstract: A lithographic apparatus includes a movable object and a control system to control the position of the movable object. The control system includes a position measurement system configured to measure the position of the movable object, a comparative unit configured to generate a servo error signal by subtracting a position signal representative of an actual position of the movable object from a reference signal, a control unit configured to generate a first control signal based on the servo error signal, a feed-forward unit configured to generate a feed-forward signal based on the reference signal, an addition unit configured to generate a second control signal by adding the first control signal and the feed-forward signal, and an actuator unit configured to actuate the movable object. A gain of the feed-forward unit is dependent on the position of the movable object.

Abstract: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.

Abstract: A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced with a local friction limit at each local contact area, respectively.

Abstract: A method, device, and computer program for determining range to a target is disclosed. Specifically, the invention provides a method, device and computer program for determining a second range to a target based on a first range to the target and an angle to the target such that the parabolic trajectory of a projectile is accounted for in determining the second range. The device generally includes a range sensor for determining a first range to a target, a tilt sensor for determining an angle to the target, and a computing element for determining a second range to the target based on the first range and the determined angle.

Abstract: Methods and apparatus are provided for determining the concentration of an analyte in a sample, such as an analyte in a sample of bodily fluid. Some embodiments use a synchronous demodulator and digital filter to reduce microphonic signal content. Some embodiments monitor the microphonic signal content and “hold off” on making a measurement until vibrations subside. Monitoring can be performed using an accelerometer or other vibration sensor. An algorithm can be used to examine the detector output signal and detect excessive microphonic components, making an accelerometer unnecessary.

Abstract: An object of the present invention is to provide a focal point detection apparatus capable of enlarging a pull-in range of an auto-focus operation easily.

Abstract: A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic is held at an angle from a surface normal to avoid reflective artifacts from the specular surface of the substrate. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge. The plurality of lights can modulate color and intensity of light to enhance inspection of the substrate for defects.

Abstract: The invention relates to a method and device of inspecting contamination particles on an object comprising a patterned structure. The device includes a radiation system for directing a radiation beam to the object. The object is configured to scatter the beam. The device also includes an optical system arranged to receive scattered radiation from the object, and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector arranged to detect a fraction of radiation that is transmitted by the filter. Accordingly, contamination particles may be detected quickly and accurately.

Abstract: An optical fiber temperature sensor has a sensing part composed of an optical fiber arranged at a temperature measurement point; a light source for injecting a light to the sensing part; a wavelength filter module for branching the Raman scattered light from the back scattered light generated at the sensing part; photoelectric detectors for detecting the Raman scattered light and a signal processing circuit for processing the electric signals from the photoelectric detectors, wherein the light source is a semiconductor laser having a wavelength bandwidth of 0.78 ?m; the wavelength filter module has a longer wavelength side band pass filter for transmitting the Stokes light and a shorter wavelength side band pass filter for transmitting the anti-Stokes light; and the longer wavelength side band pass filter and the shorter wavelength side band pass filter do not allow the light having the wavelength band of the semiconductor laser to be transmitted.

Abstract: A method and system are presented for producing an output coherent anti-stokes Raman scattering (CARS) signal of a medium. The method comprises generation of a unitary optical excitation pulse that carries a pump photon, a Stokes photon and a probe photon; and inducing a CARS process in the medium by exciting the medium by the at least one such unitary optical excitation pulse.

Abstract: The disclosure generally relates to a system for detecting a change in an attribute of a substance. The system may include a photon source for producing a first of a plurality of photons which interact with the substance while an attribute of the substance changes to produce a second plurality of photons. The system may also include a filter for receiving the collected photons and providing filtered photons; a photon detector for receiving the filtered photons and obtaining therefrom a spectrum of the substance; and a processor for detecting an aspect of the filtered photons wherein the aspect of the filtered photons is the function of the attribute of the substance.

Abstract: Methods and systems for discriminating among sparking modes are disclosed. In one embodiment, a method includes receiving light from a spark into a spectrometer, generating a light intensity spectrum using the spectrometer, and classifying the sparking mode based on an analysis of the light intensity spectrum. The light intensity spectrum may be analyzed for the presence of an atomic emission and a broad blackbody emission. In further embodiments, light emitted by the spark may be received into a photodetector, and the classification of the sparking mode may be based on an analysis of an intensity profile, including at least one of a rise-time phase, a peak intensity, and a drop-off phase.

Abstract: A calibrated spectroscopy instrument and a method for calibrating a spectroscopy instrument are disclosed. The spectroscopy instrument includes a monochromator having a drive mechanism comprising a pair of spur gears for rotating a diffraction grating of the monochromator for selecting a desired wavelength. The drive mechanism is calibrated to account for eccentricities in the spur gears to provide an accurate conversion between selected angular settings for the drive mechanism and the wavelength of the diffracted light from the monochromator. The drive mechanism comprises a pinion spur gear and a main spur gear which each have an AGMA (American Gear Manufacturers' Association) rating of at least 10, which allows errors due to random tooth to tooth variations to be neglected. A calibration algorithm is derived which is based on the error due to eccentricities in the spur gears following a precise geometric cyclic pattern.

Abstract: A system and method are presented for measurement on an article. The system comprises an illuminator for producing light of at least one predetermined wavelength range; an optical system; a displacement arrangement; and a control system. The optical system is configured to define at least a measurement channel, and comprises a light directing assembly for directing an input light beam, propagating along an input light path from the illuminator, onto the article and directing a light beam returned from the illuminated region of the article to at least one light detector. The displacement arrangement is associated with at least the light directing assembly of the optical system, and is configured and operable by the control system to rotate said at least light directing assembly of the optical system with respect to a stage supporting the article about a rotational axis substantially normal to the stage.

Abstract: An apparatus for measuring the reflectance properties of an object having a front reflecting surface and at least one back reflecting surface. The apparatus includes a sample stage for placement of the object, a light source, a detector configured to detect reflected light from the object, and a positioning device configured to provide a plurality of angular positions for the light source and the detector relative to the object on the sample stage such that incident light on the object is specularly reflected towards the detector and the reflected light received at the detector includes a front surface reflection from the object and at least one back surface reflection from the object.

Abstract: Methods, systems and computer program products for generating parameters for software dispersion compensation in optical coherence tomography (OCT) systems are provided. Raw spectral interferogram data is acquired for a given lateral position on a sample and a given reference reflection. A trial spectral phase corresponding to each wavenumber sample of the acquired spectral interferogram data is postulated. The acquired raw spectral data and the postulated trial spectral phase data are assembled into trial complex spectrum data. Trial A-scan data is computed by performing an inverse Fourier transform on the trial complex spectrum data and determining the magnitude of a result.

Abstract: This invention permits retinal images to be acquired at high speed and with unprecedented resolution in three dimensions (4×4×6 ?m). The instrument achieves high lateral resolution by using adaptive optics to correct optical aberrations of the human eye in real time. High axial resolution and high speed are made possible by the use of Fourier-domain optical coherence tomography. Using this system, we have demonstrated the ability to image microscopic blood vessels and the cone photoreceptor mosaic.

Abstract: A differential interference contrast (DIC) determination device and method utilizes an illumination source, a layer having a pair of two apertures that receive illumination from the illumination source, and a photodetector to receive Young's interference from the illumination passing through the pair of two apertures. In addition, a surface plasmon assisted optofluidic microscope and method utilize an illumination source, a fluid channel having a layer with at least one aperture as a surface, and a photodetector that receives a signal based on the illumination passing through the aperture. The layer is corrugated (e.g., via fabrication) and parameters of the corrugation optimize the signal received on the photodetector.

Abstract: An information processing apparatus for forming print data to be print-processed by a printer is constructed by: designation receiving means for receiving designation of a duplex printing, discriminating means for discriminating the number of pages in the case where data to be printed has been arranged on a recording paper, and command adding means for receiving the designation of the duplex printing by the designation receiving means and, in the case where it is determined by the discriminating means that the number of pages of the recording paper on which the data to be printed has been arranged is equal to an odd number, adding a command to urge a forced paper ejection in the printer lest a blank page of the last page is logically counted in the printer. A print data forming method and a print control program for realizing such an apparatus and a memory medium which stores such a program are provided.

Abstract: An image forming device is disclosed that is able to simplify function customization or function expansion. The image forming device includes one or more input units that input image data for image processing; one or more output units that output resulting data of the image processing; a first filter that controls a data-input process with data from the input unit; and a second filter that controls a data-output process and sends data to the output unit. An application is formed by connecting the first filter and the second filter.

Abstract: This invention relates to a self aligning optical printing system, comprising: an electromagnetic energy beam source capable of emitting a plurality of electromagnetic energy beams of differing wavelengths; a plurality of lenses located substantially adjacent to each other such that each of the plurality of electromagnetic energy beams interacts with one of the plurality of lenses to self align the plurality of electromagnetic energy beams with respect to each other; and a multi-wavelength media located adjacent to the plurality of lenses such that the plurality of self aligned electromagnetic energy beams interacts with the media.

Abstract: A technique is provided for adding an annotation to a document described in a markup language. Upon acquisition of a document described in a markup language, a document processing apparatus 100 detects an element which is included in the document, and which has been defined so as to indicate the start position and the end position of the annotation. The document processing apparatus 100 displays the region from the start position up to the end position in a format that differs from the format in which other elements are displayed. A null element which includes no element value may be employed as such an element that indicates the start position and the end position for adding an annotation. Also, the element may store the information in the form of an attribute value which provides the correspondence between the element that indicates the start position and the element that indicates the end position.

Abstract: A method and system reconstructs a contone image from a binary image by first tagging pixels to identify one of a multiplicity of image content types. The tag information and the pattern of bits surrounding the pixel to be converted to a contone value are used to reconstruct a contone image from a binary image. The pattern of bits in the neighborhood is used to generate a unique identifier. The unique identifier is used as the address for a lookup table with the contone value to be used wherein each lookup table corresponds to an image context type.

Abstract: A proof printing system and method comprises a printer and supporting firmware for the printer, the printer comprising spectrophotometer integrated with the printer, which printer may be a commercial printer. The supporting firmware comprises color adjustment tables an/or algorithms. The system is capable of color confirmation and color calibration. The proof printing system is capable of adjusting the output signal of the spectrophotometer to compensate for conditions at the time of printing or conditions at the time of spectrophotometric measurement. The system is also capable of predicting the time it takes a color patch to reach a predetermined degree of drying that will allow reliable spectrophotometric measurements to be made. Measurement and printing conditions compensated for include at least drying of the ink, based on the determination of at least one of humidity and temperature.

Abstract: Image formation free from quality degradation is achieved by selecting whether to perform correction of color shift before or after a halftone process. When the amount of color shift is determined as larger than a predetermined threshold value, the halftone process is executed before a color shift correction process. On the other hand, when the amount of color shift is determined as equal to or smaller than the predetermined threshold value, the halftone process is executed after the color shift correction process. That is, with the large amount of color shift, the image degradation as a result of not being able to keep the number of screen lines when the correction of color shift is performed before the halftone process looks more conspicuous than the case with the correction of color shift after the halftone process.

Abstract: A method for driving a pixel includes driving the pixel with a first gray level and a second gray level within a first sub-frame period and a second sub-frame period of a first frame period, respectively, driving the pixel with a third gray level and a fourth gray level within a first sub-frame period and a second sub-frame period of a second frame period, respectively, and adjusting the third gray level and the fourth grey level such that the luminance of the adjusted fourth grey level is similar to the luminance of the second grey level.

Abstract: Described is a handheld device for performing a transaction. The device includes a first receiving means for receiving first information via a first input device, the input device being one of an optical reader module, a card swipe module, a touch-sensitive screen, and a key pad. The device further includes a first processing means for processing the first information with a processor and a first generating means for generating a first output via a printer. The device also includes a second receiving means for receiving second information via a second input device, the second input device being one of the optical reader module, the touch-sensitive screen, the card swipe module, and the key pad, a second processing means for processing the second information with the processor and a second generating means for generating a second output via one of the printer and a display module.