Abstract: Apparatuses for and methods of maximizing particle protection while enabling temporary concurrent illumination of a reticle with exposure radiation through an aperture and auto focus beams or while mounting a reticle to or removing a reticle from a reticle stage are disclosed.

Abstract: A imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The optical system satisfies the condition of 1<D1/(M1+M2)<20, where D1 is a center thickness of the first optically transparent member, M1 a center thickness of a layer of the first liquid, and M2 a center thickness of a layer of the second liquid.

Abstract: An exposure apparatus irradiates an exposure light beam a state that a space, between predetermined optical elements and among a plurality of optical elements included in a projection optical system, is filled with a liquid. When the exposure light beam is not irradiated during, for example, the maintenance or the like, the liquid in the space is substituted by a functional fluid different from the liquid. This makes it possible to reduce any influence exerted by the liquid on the exposure apparatus.

Abstract: An exposure apparatus that exposes onto a substrate a pattern of a mask that is located in a vacuum or reduced atmosphere and includes a multilayer film that is made of a lamination of a molybdenum layer and a silicon layer includes a laser irradiation unit for irradiating onto the mask a pulsed laser beam that has a wavelength of 200 nm or below.

Abstract: An image forming apparatus which is capable of adjusting the color density while improving the printing efficiency. A color density adjustment value-adjusting unit adjusts a color density adjustment value in predetermined adjustment timing so as to keep colors of an image constant. A color density adjustment value-storing unit stores the color density adjustment value in advance. An adjustment timing occurrence-determining unit determines whether or not the adjustment timing occurs during execution of an image forming job. A color density adjustment value-predicting unit predicts the color density adjustment value in the adjustment timing determined to occur, based on the color density adjustment value stored in advance. The color density adjustment value-adjusting unit is adapted to adjust the color density adjustment value based on the predicted color density adjustment value.

Abstract: Imaging system of a microlithographic projection exposure apparatus with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane.

Abstract: A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the associated reflective element. The apparatus further includes a liquid in contact with at least a portion of the reflective elements.

Abstract: A lithography process to pattern a plurality of fields on a substrate is disclosed. The process includes scanning a first field along a first direction using a radiation beam. Thereafter, the processes steps to a second field adjacent the first field and located behind the first field when the first and second fields are viewed along the first direction. The second field is then scanned along the first direction using the radiation beam.

Abstract: An exposure method including the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, removing a gas from the fluid having a displaced interface, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

Abstract: An apparatus includes a stage configured to hold a substrate and to be moved, a measurement station including a measurement device configured to measure, with respect to each of a plurality of measurement points in a surface of the substrate held by the stage, a position of the surface, and an exposure station configured to expose the substrate to radiation while the stage is scanned, the stage being moved to the exposure station from the measurement station after the position of the surface is measured, and being scanned in the exposure station in accordance with the measured position of the surface, wherein the apparatus is configured to calculate a status concerning an error of a measurement value of the measurement device with respect to each of the plurality of measurement points based on outputs of the measurement device obtained with respect to the plurality of measurement points, and to set arrangement of the plurality of measurement points based on the calculated statuses.

Abstract: At least one exemplary embodiment is directed to an exposure apparatus configured to perform an exposure process by interposing a liquid along a path of exposure light between a projection optical system and a substrate surface of an exposure object. A top plate that is coated with a diamond thin film or a diamond like carbon film at least on a surface in contact with the liquid and irradiated with the exposure light is used as a top plate for matching the height of an area surrounding the substrate surface with the height of the substrate surface during the exposure process. Alternately, a surface of a final lens of the projection optical system that is in contact with liquid is coated with a diamond thin film or a diamond like carbon film.

Abstract: The invention relates to a method for manufacturing of a multilayer system (25) with a cap layer system (30), in particular for a reflective optical element for the extreme ultraviolet up to the soft x-ray wavelength range, comprising the steps of: 1. preparing a coating design for the multilayer system (25) with cap layer system (30); 2. coating a substrate (20) with the multilayer system (25) with cap layer system (30); 3. spatially resolved measurement of the coated substrate in terms of reflectance and photoelectron current in at least one surface point; 4. comparison of the measured data with data modelled for different thicknesses of the layers (31, 32, 33) of the cap layer system (30) and/or the layers (21, 22, 23, 24) of the multilayer system (25) for determining of the thickness distribution obtained by the coating; 5. if necessary, adjusting of the coating parameters and repeating steps 2 to 5 until the coated thickness distribution coincides with the design.

Abstract: An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.

Abstract: A device or the operation of a device for the holding, especially sealing support of an optical element, especially an optical lens with at least one holding element for mounting the optical element and preferably at least one sealing element for sealing contact at at least a part of the optical element and/or the holding element, wherein the sealing element or at least a part thereof is displaceable between a first position, in which the sealing element rests against the optical element and a second position, in which the sealing element is spaced apart from the optical element, or wherein the sealing element is switchable such that it rests against the optical element under different contact pressure or adjustable contact force. The holding element can either take on the holding function alone and independently of the sealing element or work together with the sealing element in this regard.

Abstract: An exposure apparatus for performing an exposure of expose an object to light is disclosed. The apparatus comprises a measuring device configured to measure a wavelength spectrum of the light, a processor configured to calculate a central wavelength of the light based on the measured spectrum, and a main controller. The processor obtains a central wavelength of each of a plurality of components of the measured spectrum and a light intensity corresponding to each of the plurality of components, and calculates the central wavelength of the light based on the obtained central wavelengths and the obtained light intensities. The main controller determines whether the exposure is to be performed, based on the calculated central wavelength of the light.

Abstract: There is provided a support structure for temporarily supporting a substrate in a support di-reaction during one of treatment and handling of the substrate comprising a base structure and at least one layer connected to the base structure. The at least one layer defines at least one protrusion of the support structure, the at least one protrusion being adapted to contact the substrate when the substrate is supported by the support structure. The at least one layer comprises a wear resistant material.

Abstract: An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a blade, the blade being provided in the illumination system and blocking at least a portion of illumination light, a stator configured to relatively move the movable element, and a resilient supporting member configured to resiliently support the stator without contacting the stator.

Abstract: The radar apparatus includes a transmit/receive section having a function of emitting a transmission wave, receiving the transmission wave reflected from a reflecting object, and outputting a reception signal having a signal level depending on the intensity of the received transmission wave, a control section controlling the transmit/receive section to transmit the transmission wave a predetermined number of times in the same direction, an integrating section successively integrating the reception signal successively outputted from the transmit/receive section to thereby successively form an integrated signal while the transmit/receive section repeatedly emits the transmission wave in the same direction, and a detector section judging whether or not the integrated signal enables detection of the reflecting object.

Abstract: An apparatus for determining the shape of a gemstone, including irregularities on its surface, is provided, The apparatus comprises a platform adapted to support the gemstone, a scanning system adapted to provide geometrical information concerning the three-dimensional convex envelope of the gemstone, an illumination system adapted to project on the gemstone a plurality of laser beams, an imaging system adapted to capture reflections of at least a part of said laser beams from the surface of the gemstone, and a processor. The processor is adapted to calculate, based on said geometrical information, a predicted reflection of each laser beam, to compare the captured reflections with said predicted reflections and to relate each captured reflection to its corresponding predicted reflection, to determine said shape of the gemstone based on the comparison and said geometrical information.

Abstract: The present invention provides devices and methods for measuring coagulation time. The device comprises a slide coupled to a sample carrier capable of sample flow from one end of the carrier to another end in a continuous back and forth motion until sample coagulates thereby preventing sample flow; a rocker or shaker means for moving sample inside the sample carrier; a light detector assembly for detecting light transmitted through said sample carrier; and a display means for indicating coagulation time corresponding to substantially no change in the amount of light transmitted as indicative of sample coagulation.

Abstract: Disclosed is an apparatus for scanning a surface with electromagnetic radiation. The apparatus comprises a base plate for supporting a medium said medium having a scanning surface to be scanned, an optical head unit adapted to scan the scanning surface with electromagnetic radiation propagating along an optical axis, a fluid film generation unit connected to the optical head unit and adapted to generate a fluid film between the scanning surface and a gliding surface of the fluid film generation unit for maintaining a predetermined distance between the gliding surface and the scanning surface during scanning operation of the optical head unit across the scanning surface, and control means for controlling the position of the fluid film relative to the optical axis.

Abstract: (a) Scattered light from the surface of a sample subjected to the same process as a process for an inspection object is observed, a defect is detected from an intensity of scatted light, and a position of the detected defect and an intensity of scattered light caused by the detected defect are acquired. (b) Defects detected at the step (a) are classified into a group detectable by observing secondary electrons emitted when an electron beam is applied to the surface of the sample and a group not detectable. (c) A decision threshold value of a scattered light intensity for extracting defects to be counted is determined, in accordance with a result of classification by the step (b) and the intensity of scattered light caused by the detected defect.

Abstract: Methods for directly comparing the light spectral power distribution of a natural light source to the light spectral power distribution received on the target area of an outdoor accelerated weathering device, comparing the spectral measuring assembly on accelerated weathering devices with traceable spectral measuring assemblies measuring the same light source at the same instant in time, comparing different outdoor accelerated weathering devices to one another with respect to continuous direct measurement of each such device in a collection relating the quality of each single device back to a single standard measured by all devices and rationalizing the results of different methods of weatherability testing.

Abstract: An apparatus for enhancing the selectivity for spectroscopic measurements of analytes in a turbid medium is described. In one example, spatial filters are used to select only certain radii from the medium to be imaged. This selection is accomplished by placing an optical obstruction on the surface of the medium or at an image plane of the surface later in the optical imaging system. In one implementation, this is achieved by placing a fiber bundle at an image plane of the collecting optical system and then using a spacer of appropriate size at the center of the fiber bundle to act as a central obstruction.

Abstract: An optical cell for spectral analysis is disclosed generally comprising a monolithic cell body that transmits light, the cell body having an outer surface and a fluid channel for receiving a sample that defines an inner surface. The inner surface of said cell body includes a planar section, and the outer surface of said cell body likewise includes a planar section, which is adjacent and substantially parallel to the planar section of the inner surface. In certain embodiments, the ends of the channel are frustoconical, and ferrules are employed to secure sample inlet/outlet tubes to the cell.

Abstract: This invention relates to methods of preparing substrates that enhance the Raman signal of analytes in surface-enhanced Raman spectroscopy (SERS). The SERS-active substrate comprises an array of metal nanoparticles at least partially embedded in a template. The substrate's uniform and readily reproducible SERS-active properties with a wide range of analyte concentrations substantially enhance the power and utility of SERS. This invention also provides sensors, as well as Raman instruments, comprising the SERS-active substrates.

Abstract: A new architecture for implementing a time-resolved Raman spectrometer is 2-3 orders of magnitude faster than current systems. The system additionally is compact, environmentally rugged, low cost and can detect multiple components of a sample simultaneously. In one embodiment, the invention employs a rotating optical switch to time multiplex an input signal through multiple bandpass filters and into a single optical detector which is electrically activated only when the filtered input light pulse is about to impact it. The combination of time-multiplexing the input signal through multiple optical filters and time-sequencing the optical detector enables the device to detect and analyze 2-3 orders of magnitude faster than current designs, processing spectra within milliseconds instead of seconds.

Abstract: An optical spectrum analyzer is implemented with a detector combined with a tunable filter mounted on a stage capable of 360-degree rotation at a constant velocity. Because of the constant rate of angular change, different portions of the input spectrum are detected at each increment of time as a function of filter position, which can be easily measured with an encoder for synchronization purposes. The unidirectional motion of the mirror permits operation at very high speeds with great mechanical reliability. The same improvements may be obtained using a diffraction grating or a prism, in which case the detector or an intervening mirror may be rotated instead of the grating or prism.

Abstract: A method of measuring properties of particles comprises the steps of: generating a beam of radiation (IB) which is propagated along a principal axis (z), illuminating with the beam (IB) an observation region (MR) with particles (B), a portion of the beam (IB) giving rise to radiation (SW) which is scattered by interaction of the portion of the beam (IB) with the particles (B) and another portion (TB) being transmitted substantially undisturbed through the observation region (MR), and detecting, in a plane (M) disposed on the propagation axis (z), radiation intensity values which are determined by the interference between the scattered radiation (SW) and the transmitted radiation (TB).

Abstract: A device is illustrated for detecting particles in a fluid that can detect smaller particles without the need for added power or space and can be implemented inexpensively. The device utilizes two mirrors and a photo-diode. The housing of the photo-electric diode is machined to form one of the mirrors. The mirrors have a special positioning so that the second mirror uses the first mirror to reflect light deflected by particles back to the photo-electric diode.

Abstract: Various optical apparatus, in particular embodiments, may provide a source of parallel light (7, 75). The parallel light (7, 75) may be generally achieved by directing an incident beam at the apex of a prism (1, 22, 24, 26, 28). The prism may have varying configurations. One configuration has a forward conical face (24). Another configuration has a pyramidal forward end (22). Other configurations are also disclosed. Various optical methods and methods for flow cytometry are also disclosed.

Abstract: A method and apparatus for aligning the left and right image channels a two-image stereoscopic three-dimensional display is disclosed. A left and right alignment pattern may be shown on the left-eye and right-eye image screens, respectively, pre-computed for any given input imaging geometry. The operator (or alignment processor) then adjust the displays to converge the superimposed left-eye and right-eye test patterns by moving the display elements using display positioning equipment and/or software. This ensures that the stereoscopic three-dimensional display geometry matches the three-dimensional camera imaging geometry in order to produce a minimally-distorted visual depth perception of objects in space. Such precision alignment can be essential for efficient and safe telerobotic operation applications, as in the case of remote aerial refueling operations, for example.

Abstract: The invention relates to a device for controlling material comprising a sensor device and a lighting device, whereby the material which is to be controlled is guided on a transparent drum.

Abstract: First and second polarizing plates are placed to be crossed nicols across a film to be inspected. A light source projects light toward the film through the first polarizing plate. A light receiver receives the light transmitted through the film and the second polarizing plate.

Abstract: An information-acquiring device for acquiring information on an objective substance to be detected, which is provided with a sensing element that has a surface capable of fixing the objective substance to be detected thereon, and makes applied light change its wavelength characteristics in response to the fixed state of the objective substance to be detected onto the surface, a light source, and light-receiving means for receiving light emitted from the light source through the sensing element, has the light-receiving means and the light source arranged on the same substrate so that the light which has been emitted from the light source and has been transmitted through the sensing element can be led to the light-receiving means, and has means for varying the wavelength regions of each light incident on each of a plurality of the light-receiving means installed in an optical path from the light source to the light-receiving means.

Abstract: A sensor which comprises a support medium and a hologram disposed therein, wherein an optical characteristic of the medium varies as a result of a change of a property of the medium, and wherein the medium is heterogeneous such that the change of property is heterogeneous.

Abstract: The acquisition and reproduction units of the system are interconnected by means of a network in order to survey and regenerate the outline of any kind of object and to reproduced it either virtually in a CAD 3D system or materially in plastic, composite or papery material.

Abstract: An apparatus for determining a polarization-insensitive interferometric signal and a birefringence for a sample and methods for using such an apparatus to characterize the sample are proved herein. Such apparatuses may generally be designed to eliminate birefringence associated with the apparatus itself, collect data from the sample using light in both orthogonal states, and determine the interference birefringence associated with the collected data.

Abstract: A surface inspection apparatus is provided based on an optical interference scheme using a wide-band laser light source, such as diode laser, for an interferometer. In the apparatus, a diode laser with a large spectrum width having a short coherence length is used as an emitted light source; modulation optical elements for performing modulation with slightly different frequencies, and optical path length varying optical elements for adjusting the optical path length are located in each of two optical paths between a branching optical element and a combining optical element; and the above-mentioned optical path length varying optical elements are adjusted, while measuring an interference intensity, so as to maximize the interference intensity.

Abstract: A measurement method for measuring a wavefront aberration of a target optical system using an object plane side slit includes the step of removing a reference wavefront error from a wavefront aberration of the target optical system obtained from an interference pattern formed by interference between light from the first image plane side slit and light from the second image plane side slit. The reference wavefront error is contained in an object plane side reference wavefront generated from the first object plane side slit and an image plane side reference wavefront generated from the first image plane side slit.

Abstract: An operation of projecting slit light onto an object to be measured and receiving light reflected thereon, and an operation of acquiring a two-dimensional image concerning the object to be measured are repeated a certain number of times by changing a focal length. An imaging contrast is calculated with respect to each of areas on the two-dimensional images acquired at the different focal lengths. A high contrast area where the imaging contrast exceeds a predetermined threshold value is extracted with respect to each of the two-dimensional images acquired at the different focal lengths. Distance information concerning the respective areas is acquired by performing triangulation with respect to each of the high contrast areas. Position adjustment of measurement dimensions is performed in such a manner that the areas are included in the measurement dimensions having the predetermined measurement depth, based on the distance information.

Abstract: A number of wafer center finding methods and systems are disclosed herein that improve upon existing techniques used in semiconductor manufacturing.

Abstract: A system and method for controlled monitoring of pending document processing operations is provided. Each document processing request received by a document processing device is assigned a job name, which is then encrypted using a random static encryption key, resulting in a job identification. A user then logs onto the document processing device to view pending jobs, which are displayed to the user by only job identification. Those jobs with which the user is associated are then decrypted by the document processing device, allowing the user to view job information including status and file name. The user is thereby also able to modify or delete those pending jobs with which the user is associated. Once the job queue is empty, the random static encryption key is deleted and a new key is generated when a document processing request is received into the empty queue.

Abstract: A setting data selecting portion selects setting data for each function according to user input to an operation input portion, the setting data being used to set various preset values related to functions of the image processing apparatus. An image forming portion forms setting data selected by the setting data selecting portion into an image on a recording medium to make a clone sheet. A data setting portion sets setting data, which is read from a clone sheet by an image reading portion, on the image processing apparatus into which the data setting portion is incorporated, the set data being the setting data related to corresponding functions. This setting data may include setting data selected out of prepared selection items, setting data set by user input, type information of the image processing apparatus, and log information of the image processing apparatus.

Abstract: A printing apparatus performs print processing on a plurality of sheets according to print data input by an input unit, and sets the printing unit to a first operation state in which monochromatic print processing is capable of being performed or to a second operation state in which color print processing is capable of being performed. The printing apparatus enables selection between a first print mode and a second print mode. In the first print mode, a sheet is conveyed at a defined speed in the monochromatic print processing and is conveyed at a speed lower than the defined speed in the color print processing. In the second print mode, a sheet is conveyed at a speed lower than the defined speed both in the monochromatic print processing and in the color print processing.

Abstract: An image forming apparatus at least includes a photoreceptor, a light emitter, a detector and a controller. The light emitter irradiates the photoreceptor with a laser beam so as to form an electrostatic latent image thereon. The detector detects an incident amount of the laser beam falling on a light receiving portion of the detector on a main scan line. The controller changes at least one of a detection sensitivity of the detector for a laser beam and an emission amount of the laser beam emitted from the light emitter when the incident amount of the laser beam detected by the detector is not greater than a predetermined value.

Abstract: DC power supplied from an AC adaptor to a docking station is supplied to a station power circuit and is also supplied to a printer power circuit. The docking station includes a transistor capable of switching on and off a path of supply of DC power from the AC adaptor to the printer power circuit. An operation state of a power switch of the main printer body can be detected in both a printer control device and a station control device. A one-pulse circuit causes a PC terminal of the printer power circuit to have a GND potential only for a predetermined period of time at the start of supply of DC power that is supplied from the AC adaptor to the docking station.

Abstract: It is an object of the invention to provide a technique for preventing image quality deterioration of a print image involved in adjustment of color conversion parameters in image formation processing.

Abstract: An image processing apparatus configured to print a sheet to instruct outputting an image includes an analysis unit configured to analyze an image stored in an image storage unit, a conversion unit configured to convert a size of the image according to a result of the analysis performed by the analysis unit, and a printing unit configured to print the image converted by the conversion unit onto the sheet.

Abstract: An operation screen generating apparatus includes: an image-in-work-screen generating unit that displays a subject image on a work screen, which is displayed at an aspect ratio same as that of a print area, in a display position and at a display magnification designated by user operation; and an image-in-confirmation-screen generating unit that displays in enlargement, on a confirmation screen prepared separately from the work screen, a reference line representing an outer edge position of the work screen and a subject image located near an outside and an inside of the reference line.