Abstract: A visible laser beam projection system for a vehicle projects visible laser beam onto an instrument panel in a vehicle compartment. The instrument panel is provided with highly reflecting portions, which are scattered on the upper surface of the instrument panel. The highly reflecting portions having a diffuse reflectivity for the wavelength of a visible laser beam higher than that of other portions of the instrument panel The visible laser beam is projected to the highly reflecting portions.

Abstract: An image display system that includes: a projector; and a screen device that displays a projection image being a projection result from the projector. In the image display system, the screen device includes a plurality of light diffusion units each having characteristics of light transmission and characteristics of light diffusion, and among the plurality of light diffusion units, the projection image is diffused by a second light diffusion unit after passing through a first light diffusion unit.

Abstract: A hologram element that forms a predetermined illumination pattern on an irradiated surface by diffracting incident light is disclosed. The illumination pattern is formed by making light in a first wavelength region diffracted in a first region, and the illumination pattern is formed by making light in a second wavelength region different from the first wavelength region diffracted in a second region on the same plane as the first region.

Abstract: A medical apparatus according to the present invention includes a first heating area in which a first heating unit is provided, a second heating area that is arranged to be superimposed on the first heating area and in which a second heating unit is provided, a first cooling fan that cools the first heating area, and a second cooling fan that has an air current direction substantially orthogonal to an air current direction of the first cooling fan and cools the second heating area.

Abstract: A projector is provided which includes a distance measuring unit which can accurately measure distances to a plurality of points on a surface of a screen using light rays. The projector of the invention has the distance measuring unit for measuring distances to the plurality of points on the surface of the screen, which includes a plurality of light ray units for irradiating light rays onto the screen and one light receiving element for receiving the light rays which are reflected on the surface of the screen, and a tilt angle calculation unit for calculating a tilt angle of the screen relative to the projector based on the distances to the plurality of points on the surface of the screen which are measured by the distance measuring unit.

Abstract: A light source device includes a discharge lamp and a reflection mirror having a plurality of concave curved surfaces. Each of the plurality of concave curved surfaces is an ellipsoidal surface. A first focal point of each of the ellipsoidal surfaces is disposed at the light emitting center of the discharge lamp. A second focal point of each of the ellipsoidal surfaces is disposed, when viewed from a predetermined first direction perpendicular to a system optical axis passing through the light emitting center, on the opposite side of the system optical axis to the ellipsoidal surface, and when viewed from a second direction perpendicular to the system optical axis and the first direction, on the side where the ellipsoidal surface is present with reference to the system optical axis.

Abstract: According to one embodiment, an illumination apparatus for a display includes first and second light sources, a lighting control unit which lights the first and second light sources successively, and a light path switching unit which switches light paths between each of the light sources and a projection lens among a first state in which light from the first light source of the first and second light sources is emitted to the projection lens, a second state in which light from the second light source of the first and second light sources is emitted to the projection lens, and a third state in which light from either one of the first and second light sources is emitted to the projection lens.

Abstract: An LED illumination system includes control circuitry and first, second and third colored LEDs. The control circuitry sequentially drives the first, second and third colored LEDs in a color cycle frame with relative duty cycles having a known relationship that achieves a color balance. The control circuitry also operates to introduce at least one spoke period in the color cycle frame, during which the first, second and third LEDs are driven in a manner that is controlled to provide brightness adjusting light that matches the color balance achieved by the relative duty cycles of the first, second and third LEDs during sequential driving thereof.

Abstract: A method includes detecting a person located between a projector and a surface on which a first image is projected by the projector, and automatically blacking out a portion of the first image, so that light from the projector does not fall on the face of the person.

Abstract: A micro-mirror based projection display system in an enclosure with minimum chin and depth measurements is disclosed. A solid-state laser light source generates light of multiple primary colors that is modulated by a digital micro-mirror device. The projection optics of the system include a telecentric rear group of glass lenses with spherical surfaces, followed by a pair of aspheric lenses formed of plastic. A folding mirror is disposed between the aspheric lenses, to reduce the depth of the enclosure, and an aspheric mirror projects the image onto a TIR Fresnel projection screen. The aspheric lenses are magnifying, to reduce the magnification required of the aspheric mirror, and the aspheric lenses and mirror are clipped to reduce enclosure volume.

Abstract: An object of the present invention is to provide an image projector capable of projecting a high-quality image while realizing small size. In the image projector, a light flux is deflected two-dimensionally by turning a reflector for reflecting a light flux emitted from a light source around a second axis almost orthogonal to a first axis as a center by resonant drive while turning the reflector around the first axis as a center by non-resonant drive. Shape of one or more optical surfaces of a projection optical system for projecting an image onto a projection plane by guiding light onto the projection plane includes a shape for performing a correction for maintaining scanning speed of the light flux along one scan direction on the projection plane almost constant and a shape for performing a correction for suppressing a distortion in an image along the other scan direction almost orthogonal to the one scan direction on the projection plane.

Abstract: An optical element and a projection system using the same are provided. The optical element comprises a light-condensing part for condensing lights from a light source, and the light-condensing part includes a reflecting surface and a refracting surface, and a light-guide part, coupled to an output end of the light-condensing part, for uniformly emitting the lights condensed by the light-condensing part. The optical element and the projection system of the present invention are capable of providing an enhanced light uniformity and a high light-coupling efficiency.

Abstract: A projector comprises a light machine, a housing accommodating the light machine, a circuit board disposed above the light machine, a semi-sealed shell covering the circuit board, a copper post supporting the semi-sealed shell and connecting the housing and the semi-sealed shell, and at least one contact element contacting the copper post to prevent electromagnetic interference.

Abstract: The invention relates to a device and to a method for optically detecting and receiving, in particular for digitising, interconnected sheets (10) along a margin (6), in particular a book (7), comprising a bearing and/or securing device (8) for the sheets (10) and a receiving device (1) which comprises two angular imaging surfaces (2) which have a common vertex edge (3) and which are arranged in relation to each other, in addition to at least one receiving unit (19). The bearing and/or securing device (8) and the receiving device (1) are arranged in a displaceable manner in relation to each other, such that the vertex edge (3) of receiving device (1) and the margin (6) of the sheets (10) can be joined together. The receiving device (1) comprises traction means (15, 16) which are used to catch at least one sheet (10?) when removing the vertex edge (3) of the receiving device (1) from the margin (6) of the sheets (10).

Abstract: An exposure apparatus performs a multiple exposure of a substrate and comprises: a first station that exposes the substrate; a second station that exposes the substrate that was exposed at the first station; movable members each of that holds the substrate and is capable of moving between the first station and the second station; and a first detection system that is disposed in the first station and acquires alignment information about the substrate.

Abstract: A stage apparatus which can highly accurately measure the position of a stage, while achieving a high throughput, and an exposure apparatus provided with the stage apparatus. A stage apparatus is provided with: air-conditioning apparatuses (28X, 28Y) that supply temperature controlled air (down flow), which comes from a +Z direction to a ?Z direction, to a light path of a laser beam radiated from a laser interferometer onto moving mirrors (26X, 26Y) provided on a wafer stage (WST); and an air conditioning apparatus (29) that supplies temperature controlled air (lower layer side flow), which comes from a ?Y direction to a +Y direction, to a space lower than the light path of the laser beam. Furthermore, an air conditioning apparatus (34), which supplied temperature controlled air to a light path of an autofocusing sensor composed of an irradiation optical system (33a) and a light receiving optical system (33b), is provided.

Abstract: A uniformity correction system may be used as an actuator for the correction of asymmetry scan-integrated illumination pupil fill that varies in the non-scanning direction of a lithography system. Instead of minimizing asymmetric opaque element insertion, opaque elements are inserted into an illumination beam to introduce an additional pupil asymmetry into the illumination beam. The compensating pupil asymmetry substantially nulls the original pupil asymmetry. To introduce the pupil asymmetry, a first opaque element can be moved into or out of the illumination beam in tandem with a second, opposing opaque element. Iterative feedback of both uniformity and pupil asymmetry ensure that both are substantially simultaneously optimized.

Abstract: Apparatus and methods for heating a substrate in a pressurized environment inside of a thermal processing system. The substrate is placed in a gaseous environment inside a processing chamber of the thermal processing system. The substrate is supported in the gaseous environment. The gas pressure inside the processing chamber is increased above atmospheric pressure, which increases the temperature of the gaseous environment. Heat is transferred from the pressurized gaseous environment to the substrate for thermally processing a layer on the substrate.

Abstract: There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).

Abstract: An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

Abstract: A radiation source for generating electromagnetic radiation includes an anode, a cathode, and a discharge space. The anode and the cathode are configured to create a discharge in a substance in the discharge space to form a plasma so as to generate the electromagnetic radiation. The radiation source also includes a fuel supply constructed and arranged to supply at least a component of the substance to a location near the discharge space. The fuel supply is located at a distance from the anode and the cathode. The radiation source also includes a further supply constructed and arranged to create and/or maintain a cooling and/or protective layer on or near the anode and/or cathode.

Abstract: A lithographic system is arranged to project a pattern from a patterning device onto a substrate. The patterning device includes a first pattern on a first region of the patterning device and a second pattern on a second region of the patterning device. A filter arrangement selectively reduces transmission through the second region of the patterning device of radiation, so as to reduce the intensity of one or more images of the second pattern caused by a portion of the radiation beam which is indirectly incident on the second region of the patterning device.

Abstract: An optical component of the lithographic apparatus is moved. A substrate support is moved so as to be synchronous with the motion of the optical component. A momentary position of the optical component is measured. A momentary position of the substrate support is measured at a first sampling rate. The measured momentary position of the optical component is compared with a desired momentary position of the optical component to generate an optical component position error signal in accordance with a difference between the two optical component positions. The measured momentary position of the substrate support is compared with a desired momentary position of the substrate support to generate a substrate support position error signal in accordance with a difference between the two substrate support positions. The momentary position of the optical component is adjusted so as to compensate for the difference between the two substrate support positions.

Abstract: An angularly resolved scatterometer uses a broadband radiation source and an acousto-optical tunable filter to select one or more narrowband components from the broadband beam emitted by the source for use in measurements. A feedback loop can be used to control the intensity of the selected narrowband components to reduce noise.

Abstract: An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near the plate and includes a plurality of light converging portions, with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.

Abstract: Post-etching line width localities that occur due to resist film thickness localities can be corrected continuously, without the need for an expensive mask. After a resist applied to a thin film on a substrate is scanned and exposed by an exposure machine, which is selectively turned on and off by image data, the resist and the thin film are developed and etched to produce a pattern having a desired line width. Before the resist is exposed, a film thickness of the resist on the substrate is measured at each of plural locations on the substrate. The measured film thickness is reflected in a predetermined relationship between a pre-exposure film thickness of the resist and a post-etching corrective line width, for thereby determining a corrective line width amount at each of the plural locations on the substrate.

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract: According to one exemplary embodiment, a laser beam formatting module for use in a lithographic system to fabricate a semiconductor wafer comprises an aperture plate having, for example, a circular aperture and capable of being situated between a laser source and a target, and a lens assembly, in a light path between the aperture plate and the target. The laser beam formatting module can produce a substantially uniform laser beam intensity across a target during fabrication of a semiconductor wafer in a laser-produced plasma (LPP) lithographic process using, for example, extreme ultraviolet light (EUV). In one embodiment, a laser beam formatting module improves energy conversion efficiency, reduces out-of-band radiation emission, avoids heating of reflective optics, and eliminates the need for an out-of-band radiation filter.

Abstract: An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being different from the first coefficient of thermal expansion. At least one of the module components is adapted to provide at least a reduction of forces introduced into the optical element upon a thermally induced position change in the relative position between the optical element and the optical element holder, the position change resulting from a temperature situation variation in a temperature situation of the plurality of module components.

Abstract: A method for measuring a spherical aberration or a coma aberration of a projection optical system of an exposure apparatus configured to transfer an image of a pattern formed on an original plate onto a substrate through the projection optical system. The method for measuring the spherical aberration includes obtaining a focal position of the projection optical system under a first measurement condition, obtaining a focal position of the projection optical system under a second measurement condition different from the first measurement condition, and measuring the spherical aberration of the projection optical system based on a difference of the focal position obtained under the first and the second measurement conditions.

Abstract: In one embodiment, a system is disclosed that includes an illuminator having a source that produces light waves having a first wavelength, and a mask. The mask includes at least one partly opaque area and at least one opening within the opaque area includes a slanted, sub-resolution feature that redistributes a portion of the light passing through the open area to an off-axis location. A method of forming a device by way of photolithography might include forming unresolvable features on a mask and projecting light through the mask. Other systems, methods, and apparatus are disclosed.

Abstract: An illumination system for illuminating a reticle that moves along a scanning direction in a microlithographic projection exposure apparatus has an optical axis and an optical component producing an illumination angle distribution of the projection light. In accordance with the illumination angle distribution, a plurality of poles is illuminated in a pupil plane of the illumination system. The poles form an arrangement that is only mirror-symmetrical with respect to an axis that is orthogonal to the optical axis of the illumination, but neither parallel nor perpendicular to the scanning direction.

Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

Abstract: The some aspects of the present invention provides a substrate holding apparatus that comprises: a base part; a support part that is formed on the base part and supports a rear surface of the substrate; a first circumferential wall that: is formed on the base part; has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds a first space that is between the substrate, which is supported by the support part, and the base part; a second circumferential wall that: is formed on the base part; has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and surrounds the first circumferential wall; a third circumferential wall that: is formed on the base part; has a third upper sure that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall; a fluid flow port that

Abstract: A stage apparatus including: a movement member movable with a plate member placed on a placement surface; and a fixing apparatus that fixes said plate member to said placement surface in parallel with said movement member passing through a prescribed first region.

Abstract: The present invention provides a method for forming a substrate for use in calibrating a metrology tool in order to compensate for orientation-dependent variations within the metrology tool.

Abstract: A chromatically dispersive lens configuration may be utilized in optical pens for chromatic range sensing. The lens configuration may include a negative power doublet lens and a positive power lens portion. The Abbe numbers of lenses included in the positive power lens portion may be between the Abbe numbers of the two portions of the doublet lens. The relationship between the Abbe numbers of the materials used in two portions of the doublet lens is generally opposite to their relationship as used in standard doublet lenses of similar geometry. The doublet lens may have a negative spherical aberration which effectively cancels a positive spherical aberration that arises in the positive lens portion. In one embodiment all of the lens elements in the lens configuration are spherical lenses. The lens configuration can be implemented with dimensions which fit a standard commercial optical pen, while providing improved range sensing performance.

Abstract: A method for estimating motion with at least one laser radar is disclosed. The method involves scanning a first range image at a first time, locating a plurality of object features in the first range image, scanning a second range image at a second time, receiving motion data for a time period between the first and second times, and locating the plurality of object features in the second range image based, at least in part, on the motion data to determine an orientation of the object. Based on the orientation of the object, the method estimates motion by comparing the location of the plurality of object features in the first scanned range image to the location of the plurality of object features in the second scanned range image.

Abstract: “A method for 3D imaging of an actively illuminated target region includes emitting intensity-modulated light at a variable modulation frequency into the target region, the emitted light is scattered/reflected in the target region depending on the optical properties of the objects or beings present therein, a scattered and/or reflected fraction of the light is detected during an integration time interval by phase-sensitive integration in each pixel of an imaging sensor, the modulation phase between the emitted and the detected light is determined and spatially resolved, and distance information is calculated based on the spatially resolved modulation phase and an average frequency of the modulation frequency.

Abstract: An absolute distance meter for measuring a distance to a target may include a synthesizer including a first quadrature modulator and structured to receive a reference signal having a reference frequency and output a first signal having a first frequency and a second signal having a second frequency, a laser structured to output a laser beam, wherein the laser beam is modulated by the second signal, an optical system for directing the laser beam toward the target, a reference phase calculating system structured to calculate a reference phase based on signals having the first frequency and the second frequency, a target optical detector structured to receive at least a portion of the laser beam returned from the target and structured to output a measured electrical signal having the second frequency based on the at least a portion of the laser beam, and a measure phase calculating system structured to calculate a measure phase based on the measured electrical signal and the first signal.

Abstract: A method and system for simultaneously measuring strain and temperature characteristics of an object involves the attachment to the object of a pair of optical fibers having different refractive indices, the fibers being connected together at least one end thereof, and directing laser light into at least one end of the fibers. The Brillouin frequency of each of the fibers is measure and the strain and temperature characteristics are calculated based on the coefficients of strain and temperature and the measured Brillouin frequencies of the fibers.

Abstract: The present invention relates to a particle measuring method for irradiating light to a surface of a substrate to scatter the light so as to measure a condition of particles on the substrate based on the scattered light. The particle measuring method according to the present invention comprises the steps of: heating a certain liquid to obtain a steam; supplying the steam onto a substrate so that a content of the steam is absorbed by each particle, while a temperature of the substrate is maintained in such a manner that the steam does not condense on the substrate; cooling the substrate before the particle dries so that the content absorbed by the particle is solidified, while preventing generation of solidified substance on regions of the surface of the substrate to which no particle adheres; and irradiating light to the substrate to scatter the light and detecting the scattered light, under a condition in which the content absorbed by the particle has been solidified.

Abstract: A system and method for measuring coating thickness upon a substrate containing directionally oriented elements is disclosed. A near infrared light is directed upon the coating and reflected near infrared light is collected to determine the coating thickness. A pair of stacked and crossed diffuser elements is placed between the light source and the sample, and between the sample and the reflected near infrared light collector to improve the accuracy of the measurement, especially for coating thickness of less than about 2 mils and for coatings on substrates containing directionally oriented components. Each diffuser element is formed of a polytetrafluoroethylene fluoropolymer (PTFE) film.

Abstract: A fingerprint ID system providing function of compressed volume of the fingerprint ID system is comprised of adding a reflection device group between fingerprint plane of the device pervious to light and imaging plane of an image sensor; and the device pervious to light and a flat reflection plane group is integrated into one device for reducing the size of the fingerprint ID system and significantly upgrading automated precision assembly and easier alignment of devices to effectively reduce production cost and shorten production cycle.

Abstract: A color filter with low color shift is defined by a light leakage spectrum in the dark state. The color filter is disposed between two polarizing plates so as to measure a first spectrum of dark state a(?), wherein the polarizing directions of the polarizers are orthogonal to each other. A second spectrum of dark state b(?) while the color filter is removed, and then a ratio spectrum of light leakage intensity I(?)=(a(?)/b(?)) is determined. A maximum value P1 in the ratio spectrum of light leakage intensity is determined in a wavelength region in which the ratio spectrum of light leakage intensity of green photoresist overlaps that of a blue photoresist. A maximum value P2 in the ratio spectrum of light leakage intensity is determined in a wavelength region in which the ratio spectrum of light leakage intensity of red photoresist locates.

Abstract: The invention relates to a method for optical inspection of the hirsuteness of a surface. The method comprises directing a light beam (B) to the surface (2) of a wooden piece (1) under study in a direction (D), which deviates from the normal to the surface. The surface is imaged with a camera (8) having an image plane (9) formed by several optoelectronic light-sensitive pixels by imaging at predetermined intervals the surface of the wooden piece moving relative to the camera, each image being in the form of electronic image data. The image data of two consecutive electronic images are subtracted from each other, yielding a set of pixel-related difference data describing the wooden surface under study, and the difference data are used for stating varitions in the surface roughness of the surface under study.

Abstract: Disclosed herein is a 3D shape measurement method and apparatus using a stereo moiré technique. The 3D shape measurement method measures the 3D shape of an object to be measured using a digital pattern projector and first and second cameras. The method includes a first step of projecting a phase-shifted fringe pattern onto the object to be measured using the digital pattern projector, a second step of acquiring four fringe images using each of the first and second cameras, and then acquiring two pieces of phase information using a moiré technique, and a third step of acquiring a pair of corresponding points, which satisfy stereo phase conditions for making all 2? ambiguity constants as integers, using the two pieces of phase information and then measuring the 3D shape of the object using the corresponding points.

Abstract: A semiconductor defect inspection apparatus using a method of comparing an inspected image with a reference image includes the following: (1) a light source and an illuminating optical system, (2) plural defect optical imaging systems and photo detectors for scattered light detection, (3) a substrate holder and a stage for a scan, (4) means for obtaining the misalignment information on an adjacent die image using the inspection image of a defect optical imaging system with the highest spatial resolution, and means for transmitting the misalignment information to all the defect inspection image processing units, (5) means for correcting misalignment information so that a design and adjustment condition of each optical imaging system may be suited, and means for calculating a difference image between dies based on the corrected misalignment information, and (6) a defect detection and image processing unit for performing defect determination and detection processing based on the difference image between the dies

Abstract: A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

Abstract: An elevating drive mechanism and an advancing drive mechanism are controlled, by means of control processing of the start of photomultiplier tube idling, such that the vertical irradiation position of a laser beam falls on a reflective plate and, during idling, laser beam is irradiated via reflective plate on photodetectors, which are photomultiplier tubes. When idling has come to an end and the inspection start of the following wafer occurs, a diagnosis of photomultiplier tubes is carried out. In case, as a result of the diagnosis, it is determined that photomultiplier tubes have degraded, an alarm is given that the photomultiplier tubes have degraded.