Patents Issued in September 20, 2011
  • Patent number: 8021784
    Abstract: A battery paste composition incorporates and promotes the formation of tetra basic lead sulfate using a micronized TTBLS additive, and eliminates free lead using a special oxide, during paste mixing and drying. Battery plates utilizing the disclosed battery paste composition are produced without the need for curing, and instead can be used in the battery immediately following plate drying.
    Type: Grant
    Filed: June 1, 2006
    Date of Patent: September 20, 2011
    Assignee: Hammond Group, Inc.
    Inventor: David Paul Boden
  • Patent number: 8021785
    Abstract: Provided are a cathode active material with high safety, with high discharge capacity even at high operating voltage, and with excellent cyclic charge and discharge properties, its production method and a non-aqueous electrolyte secondary battery containing the cathode active material. The cathode active material for a non-aqueous electrolyte secondary battery comprises a surface-modified lithium-containing composite oxide particle, wherein the particle is a lithium-containing composite oxide particle represented by the general formula LipNxO2 (wherein N?NiyM1-y-zLz, M contains at least one element selected from Co and Mn, L is an element selected from alkaline earth metal elements, aluminum and transition metal elements other than Ni, Co and Mn, 0.9?p?1.1, 0.9?x<1.1, 0.2?y?0.9, and 0?z?0.3), and a surface layer of the particle contains aluminum, said surface layer within 5 nm having an aluminum content of at least 0.8 as an atomic ratio to a total of Ni and the element M.
    Type: Grant
    Filed: April 10, 2008
    Date of Patent: September 20, 2011
    Assignee: AGC Seimi Chemical Co., Ltd.
    Inventors: Yukimitsu Wakasugi, Takeshi Kawasato, Yukiko Amagasaki, Nozomi Honda
  • Patent number: 8021786
    Abstract: A non-aqueous electrolyte secondary cell superior in resistance against continuous charging at high potential is provided. The non-aqueous electrolyte secondary cell includes: a positive electrode having lithium phosphate and a positive electrode active material comprising lithium cobalt oxide containing at least one selected from Mg, Al, Ti, and Zr; and a separator having pores having an average diameter of 0.05 to 0.2 ?m.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: September 20, 2011
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Atsushi Kaiduka, Masato Iwanaga, Yukihiro Oki
  • Patent number: 8021787
    Abstract: The preservation performance of a nonaqueous electrolyte secondary cell charged to high potential is improved while the initial capacity and the cycle property of the cell are also improved. The nonaqueous electrolyte secondary cell includes: a positive electrode having lithium phosphate and a positive electrode active material containing lithium cobalt compound oxide and lithium manganese nickel compound oxide having a layer structure, the lithium cobalt compound oxide having at least zirconium and magnesium added in LiCoO2; a negative electrode having a negative electrode active material; and a nonaqueous electrolyte having a nonaqueous solvent and an electrolytic salt. The potential of the positive electrode is more than 4.3 V and 5.1 V or less based on lithium. The nonaqueous electrolyte contains vinylene carbonate as the nonaqueous solvent and, as the electrolytic salt, at least one of lithium bis(pentafluoroethane sulfonyl)imide and lithium bis(trifluoromethane sulfonyl)imide at 0.1 M or more and 0.
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: September 20, 2011
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Masato Iwanaga, Kentaro Takahashi, Yukihiro Oki, Yoshihiko Ikeda, Akira Kinoshita, Nobumichi Nishida
  • Patent number: 8021788
    Abstract: Disclosed herein is a secondary battery including an electrode assembly that can be charged and discharged, wherein the electrode assembly includes an electrode (‘safety electrode’) composed of a material that effects an electrochemical reaction when the secondary battery is overcharged (Overcharge reaction material’). The safety electrode according to the present invention is not directly added to components related to the operation of the secondary battery. Consequently, the safety electrode does not deteriorate the performance of the battery during the normal operation of the battery, and the safety electrode consumes the overcharge current through the electrochemical reaction, when the battery is overcharged, whereby the safety of the battery is fundamentally secured.
    Type: Grant
    Filed: May 19, 2007
    Date of Patent: September 20, 2011
    Assignee: LG Chem, Ltd.
    Inventors: Bo Hyun Kim, Kwangho Yoo, Hyunwoo Park, Jisang Yu, Sung Hyun Lim
  • Patent number: 8021789
    Abstract: A microporous membrane having a structure in which its pore size distribution curve obtained by mercury intrusion porosimetry has at least two peaks, which is produced by extruding a combination of a diluent or solvent and a polyolefin resin composition comprising (a) from about 74 to about 99% of a first polyethylene resin having a weight average molecular weight of from about 2.5×105 to about 5×105 and a molecular weight distribution of from about 5 to about 100, (b) from about 1 to about 5% of a second polyethylene resin having a weight average molecular weight of from about 5×105 to about 1×106 and a molecular weight distribution of from about 5 to about 100, and (c) from 0 to about 25% of a polypropylene resin having a weight average molecular weight of from about 3×105 to about 1.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: September 20, 2011
    Assignee: Toray Tonen Specialty Separator Godo Kaisha
    Inventors: Kotaro Takita, Shintaro Kikuchi
  • Patent number: 8021790
    Abstract: A battery structure includes a positive electrode layer, a solid electrolyte layer, and a negative electrode layer disposed in that order, wherein the solid electrolyte layer has a chemical composition, excluding incidental impurities, represented by the formula aLi·bX·cS·dY, where X is at least one element of phosphorus (P) and boron (B), Y is at least one element of oxygen (O) and nitrogen (N), the sum of a, b, c, and d is 1, a is 0.20 to 0.52, b is 0.10 to 0.20, c is 0.30 to 0.55, and d is 0 to 0.30. The solid electrolyte layer includes a portion A in contact with the negative electrode layer and a portion B in contact with the positive electrode layer, and d in the portion A is larger than d in the portion B. A lithium secondary battery includes the battery structure.
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: September 20, 2011
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventor: Nobuhiro Ota
  • Patent number: 8021791
    Abstract: An electrochemical cell includes an anode composed of a salt, a cathode insulated from the anode and a non-aqueous electrolyte in contact with the anode. The electrolyte may include an organic solvent that comprises at least approximately one percent by volume trimethylene carbonate.
    Type: Grant
    Filed: May 30, 2007
    Date of Patent: September 20, 2011
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Edward J. Plichta, Mary A. Hendrickson, Ronald J. Thompson
  • Patent number: 8021792
    Abstract: A fuel cell system (1) including at least one fuel cell (2) having a cathode area (3) and an anode area (4) is disclosed. The cathode area (3) and the anode area (4) have feed conduits (31, 41) and discharge conduits (32, 42). Downstream of the anode area (4) and the cathode area (3), a junction (12) of the discharge conduits (32, 42) is provided. The junction (12) fluidically communicates with an area (13) which includes a material that is catalytically active with respect to a reaction of a fuel for the fuel cell (2) with an oxidant for the fuel cell (2). The feed conduit (31) leading to the cathode area (3) is configured in such a manner that it fluidically communicates with the cathode area (3) in at least two different sites (19, 20) in each of the fuel cells (2). A humidifying device (16) is provided in the feed conduit (41) leading to the anode area (4).
    Type: Grant
    Filed: November 28, 2005
    Date of Patent: September 20, 2011
    Assignee: Daimler AG
    Inventor: Arnold Lamm
  • Patent number: 8021793
    Abstract: A hydrogen producing apparatus according to the present invention includes a hydrogen-generating-material containing vessel 1 for containing a hydrogen generating material, a water containing vessel 2 for containing water, a water supply portion for supplying water from the water containing vessel 2 to the hydrogen-generating-material containing vessel 1, a hydrogen outflow portion for leading out hydrogen from the hydrogen-generating-material containing vessel 1, a gas-liquid separating part 7 for separating water from a mixture of hydrogen and water discharged from the hydrogen-generating-material containing vessel 1, and a water collecting portion for collecting water separated by the gas-liquid separating part 7 into the water containing vessel 2.
    Type: Grant
    Filed: October 30, 2006
    Date of Patent: September 20, 2011
    Assignee: Hitachi Maxell Energy, Ltd.
    Inventors: Toshihiro Nakai, Hiroshi Kashino, Takeshi Miki, Shoji Saibara
  • Patent number: 8021794
    Abstract: A fuel cell has a high heat recovery efficiency for effectively collecting heat discharged from a fuel cell stack. The fuel cell includes a power generating cell and a separator which are alternately laminated to constitute a fuel cell stack. The fuel cell stacks are disposed in the central area of a power generating reaction chamber to form two columns-by-two rows array in a plan view. A cross-shaped fuel reformer is arranged between the opposing sides of the fuel cell stacks.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: September 20, 2011
    Assignees: Mitsubishi Materials Corporation, The Kansai Electric Power Co., Inc.
    Inventors: Katsuya Hirata, Taner Akbay, Takashi Miyazawa, Naoya Murakami
  • Patent number: 8021795
    Abstract: A method for manufacturing a solid oxide electrochemical device comprising disposing electrolyte between a first electrode and a second electrode, applying a bonding agent between the first electrode and a first interconnect, applying a sealing agent between the first electrode and the first interconnect, disposing a second interconnect adjacent to the second electrode, heating the first interconnect, the first electrode, the electrolyte, the second electrode, the second interconnect, the bonding agent, and the sealing agent to at least one intermediate temperature for at least one intermediate length of time, and then to a curing temperature, for a curing time, effective to bond and seal the first electrode to the first interconnect, wherein the at least one intermediate temperature is less than the curing temperature.
    Type: Grant
    Filed: January 30, 2006
    Date of Patent: September 20, 2011
    Assignee: General Electric Company
    Inventors: Xiwang Qi, Rong Fan, Andrew Philip Shapiro, Dacong Weng, Jie Guan, James Daniel Power, Stanley F. Simpson
  • Patent number: 8021796
    Abstract: The present invention relates to the field of electrochemical cells and fuel cells, and more specifically to polymer-electrolyte-membrane fuel cells (PEMFC) and direct methanol fuel cells (DMFC). It is directed to catalyst-coated ionomer membranes (“CCMs”) and membrane-electrode-assemblies (“MEAs”) that contain one or more protective film layers for protection, sealing and better handling purposes. The one or more protective film layers are attached to the surface of said catalyst-coated membranes in such a way that they overlap with a region of the passive non-coated ionomer area, and with a region of the active area that is coated with a catalyst layer. Furthermore, the present invention discloses a process for manufacture of CCMs and MEAs that contain protective film layers. The materials may be used as components for the manufacture of low temperature fuel cell stacks.
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: September 20, 2011
    Assignee: Umicore AG & Co. KG
    Inventors: Ralf Zuber, Klaus Schaack, Sandra Wittpahl, Alexander Kabza, Markus Maier
  • Patent number: 8021797
    Abstract: The invention relates to a bipolar plate, for fuel cells, characterized in comprising a layer of a hydrophobic material which is soluble in a solvent, on the surfaces thereof. Water forms small droplets on the surfaces of the bipolar plate due to said layer, which are loosely held on the surface of the bipolar plate and which can be reliably removed from the fuel cell even with low flow speeds for the operating gases. The thickness of the layer and thus the hydrophobicity thereof and the electrical contact resistance between the bipolar plate and a contacting electrode may be adjusted in a simple manner, by varying the concentration of the hydrophobic material in the solvent.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: September 20, 2011
    Assignee: Siemens Aktiengesellschaft
    Inventor: Albert Hammerschmidt
  • Patent number: 8021798
    Abstract: A fuel cell catalyst containing platinum, zinc, and at least one of nickel and iron.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: September 20, 2011
    Assignees: Freeslate, Inc., Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Martin Devenney, Peter Strasser, Alexander Gorer, Qun Fan, Konstantinos Chondroudis, Daniel M. Giaquinta, Ting He, Hiroyuki Oyanagi, Kenta Urata, Kazuhiko Iwasaki, Hiroichi Fukuda
  • Patent number: 8021799
    Abstract: The embodiments generally relate to a high performance ceramic anode which will increase flexibility in the types of fuels that may be used with the anode. The embodiments further relate to high-performance, direct-oxidation SOFC utilizing the anodes, providing improved electro-catalytic activity and redox stability. The SOFCs are capable of use with strategic fuels and other hydrocarbon fuels. Also provided are methods of making the high-performance anodes and solid oxide fuel cells comprising the anodes exhibiting improved electronic conductivity and electrochemical activity.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: September 20, 2011
    Assignee: The Trustees Of The University Of Pennsylvania
    Inventors: Raymond J. Gorte, John M. Vohs, Michael D. Gross
  • Patent number: 8021800
    Abstract: The present invention provides a hologram recording material which is suitable for volume hologram record and attains high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low shrinkage and high multiplicity in holographic memory record using not only a green laser but also a blue laser; a process for producing the same; and a hologram recording medium having the hologram recording material. A hologram recording material comprising: a metal oxide containing at least Si and Zr as metals, wherein an aromatic carboxylic acid compound is coordinated to Zr; and a photopolymerizable compound. The aromatic carboxylic acid compound is, for example, toluic acid. A hologram recording medium (11) comprising the hologram recording material layer (21).
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: September 20, 2011
    Assignee: TDK Corporation
    Inventors: Atsuko Kosuda, Naoki Hayashida, Jiro Yoshinari
  • Patent number: 8021801
    Abstract: In a method for fabricating a photomask in a semiconductor device, a phase shift layer, a first light blocking layer, an insulating (or intermediate) layer, and a second light blocking layer are deposited on a transparent substrate. A photoresist pattern selectively exposing a surface of the second light blocking layer is formed. A second light blocking pattern exposing a portion of the insulating layer is formed by etching the second light blocking layer using the photoresist pattern as a mask. A critical dimension (CD) of the second light blocking pattern is measured and the CD of the second light blocking pattern is adjusted. A first light blocking pattern and a phase shift pattern are formed by etching the insulating layer, the first light blocking layer, and the phase shift layer using the second light blocking pattern with the adjusted CD as a mask.
    Type: Grant
    Filed: December 5, 2007
    Date of Patent: September 20, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jea-Young Jun
  • Patent number: 8021802
    Abstract: A phase shift mask includes a substrate; a first phase shift pattern formed in a groove shape having a first depth within the substrate so that when a first light with a first wave length is incident, the first light transmitted through a surface of the substrate and the first light transmitted through the groove are destructively interfered and when a second light with a second wave length is incident, the second light transmitted through the surface of the substrate and the second light transmitted through the groove have a phase difference of 180 degrees; and a second phase shift pattern formed in a groove shape having a second depth within the substrate so that when the first light with the first wave length is incident, the first light transmitted through the surface of the substrate and the first light transmitted through the groove have a phase difference of 180 degrees and when the second light with the second wave length is incident, the second light transmitted through the surface of the substrate a
    Type: Grant
    Filed: December 29, 2008
    Date of Patent: September 20, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventor: Goo Min Jeong
  • Patent number: 8021803
    Abstract: A multi-chip reticle, methods of designing and fabricating multi-chip reticles, a system for designing a multi-chip reticle, and a method of fabricating integrated circuit chips using the multi-chip reticle. The multi-chip reticle includes a transparent substrate having two or more separate chip images arranged in an array, each chip image of said two or more chip images having only one type of reticle image, wherein at least two of said two more chip images have different types of reticle images.
    Type: Grant
    Filed: June 12, 2009
    Date of Patent: September 20, 2011
    Assignee: International Business Machines Corporation
    Inventors: Brent Alan Anderson, Jed Hickory Rankin
  • Patent number: 8021804
    Abstract: A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an information storage device in correspondence to the identification marker, a placing orientation determination step of determining a placing orientation of the mask blank with respect to an exposure/writing apparatus, and an orientation correction step of performing rotation control of a rotating apparatus so that an orientation of the mask blank coincides with the determined placing orientation.
    Type: Grant
    Filed: June 25, 2009
    Date of Patent: September 20, 2011
    Assignee: Hoya Corporation
    Inventors: Yasushi Okubo, Hisashi Kasahara
  • Patent number: 8021805
    Abstract: A mask includes mask patterns formed over a frontside of a substrate and a phase grating formed over a backside of the substrate. The mask patterns correspond to a layout of diagonal patterns extending in a direction rotated toward a predetermined direction from an axis of a rectangular coordinate system. The phase grating extends in a direction parallel to the extending direction of the mask patterns. The phase grating includes first and second phase regions alternately arranged over the backside of the substrate with a phase difference of 180° therebetween. The first and second phase regions induce a phase interference that blocks a zero-order light of an exposure light incident to the substrate and allows a primary light to be incident to the mask patterns.
    Type: Grant
    Filed: June 26, 2009
    Date of Patent: September 20, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventors: Sung Hyun Oh, Byung Ho Nam
  • Patent number: 8021806
    Abstract: A photomask blank for manufacturing a phase shift mask having a light-transmitting substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. An etching mask film serving as an etching mask when forming a phase shift part is provided on the front surface side, where the phase shift part is to be formed, of the substrate. A light-shielding film serving to shield exposure light is provided on the back surface side (opposite-side surface) of the substrate.
    Type: Grant
    Filed: June 29, 2009
    Date of Patent: September 20, 2011
    Assignee: Hoya Corporation
    Inventors: Masahiro Hashimoto, Hideaki Mitsui
  • Patent number: 8021807
    Abstract: A reflective mask blank has a substrate, a multilayer reflective film formed on the substrate to reflect exposure light, a protective film formed on the multilayer reflective film, and an absorber film formed on the protective film to absorb the exposure light. The protective film is made of an Ru compound containing Ru and X (X being at least one kind of material selected from Nb and Zr). The protective film has an oxidized surface layer containing X as a main component. A reflective mask is obtained by forming a transfer pattern by patterning the absorber film of the reflective mask blank.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: September 20, 2011
    Assignee: Hoya Corporation
    Inventor: Morio Hosoya
  • Patent number: 8021809
    Abstract: In an embodiment, a device manufacturing method for transferring a pattern from a patterning device onto a substrate includes receiving a design layout information associated with a device, determining the pattern from the design layout information, providing the pattern to a patterning device, determining feed-forward requirement data from the design layout information, wherein the feed-forward requirement data includes at least first feed-forward requirement data related to a first location in the pattern and second feed-forward requirement data related to a second location in the pattern, determining a transfer condition from at least at least the first and the second feed-forward requirement data; and transferring a portion of the pattern from the patterning device onto the substrate based at least in part on the transfer condition.
    Type: Grant
    Filed: December 29, 2008
    Date of Patent: September 20, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Adrianus Cornelis Johannes Van Dijk
  • Patent number: 8021810
    Abstract: An image carrier includes a conductive base material and a photosensitive layer formed on the base material. The photosensitive layer has an outermost surface layer that contains particles having a number-averaged particle sphericality represented by Formula (1) of approximately 0.7 or less: sphericality=4?A/L2 (1), where ? represents the circular constant, A represents the projection area of the particle, and L represents the peripheral length of the projected particle image.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: September 20, 2011
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Hitoshi Takimoto, Kenta Ide, Toru Asahi, Hidemi Nukada, Takahiro Suzuki, Koji Bando
  • Patent number: 8021811
    Abstract: Disclosed is an electrophotographic photoreceptor having a protective overcoat layer including a polyol binder; a hole transport material; a curing agent; and a surface-treated tin oxide particle filler. Also disclosed is a process for forming a photoreceptor that includes providing a photoreceptor substrate; applying a charge generating layer; applying a charge transport layer; and applying a protective overcoating layer over the substrate; such that the protective overcoat layer includes a polyol binder; a hole transport material; a curing agent; and a surface-treated tin oxide particle filler. Also included is a method of forming an image, including the disclosed photoreceptor.
    Type: Grant
    Filed: January 23, 2008
    Date of Patent: September 20, 2011
    Assignee: Xerox Corporation
    Inventors: Kathy L. De Jong, Yu Qi, Vladislav Skorokhod, Nan-Xing Hu, Johann Junginger, Markus Silvestri, John F. Yanus, Kenny-Tuan Dinh
  • Patent number: 8021812
    Abstract: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising slippery polyhedral oligomeric silsequioxane molecules that enhance the physical and mechanical functions and reduce the layers surface contact friction of the imaging member to extend service life.
    Type: Grant
    Filed: April 7, 2008
    Date of Patent: September 20, 2011
    Assignee: Xerox Corporation
    Inventor: Robert C. U. Yu
  • Patent number: 8021813
    Abstract: An electrostatic-image-developing toner includes a phosphonic acid based sequestering agent.
    Type: Grant
    Filed: December 15, 2008
    Date of Patent: September 20, 2011
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Shuji Sato, Eisuke Iwazaki, Atsushi Sugawara, Masanobu Ninomiya, Hiroshi Nakazawa
  • Patent number: 8021814
    Abstract: A toner useful for an oilless fixing method, includes a binder resin; a colorant; and 2.0 to 4.5% by weight of a wax which is soluble in n-hexane, based on a total weight of the toner, wherein the wax is dispersed in the toner, the wax forming wax domain particles (DA) comprising wax domain particles (DS) exposed at a surface of the toner and wax domain particles (DI) encapsulated in the toner and not exposed at the surface of the toner, wherein a weight of the DS is greater than a weight of the DI, wherein the toner from which the DS have been eluted with n-hexane comprises vestigial concavities having an area of 0.01 ??m2 or more on the surface of the toner in an amount of from 1 to 7 pcs/4 ?m2, and wherein 60% or more by number of the DA having a particle diameter of 200 nm or more have a spindle or cylindrical shape having an aspect ratio of 4 or more.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: September 20, 2011
    Assignee: Ricoh Company Limited
    Inventors: Masayuki Hagi, Yoshihiro Mikuriya, Hideaki Yasunaga, Hiroaki Katoh, Kazuoki Fuwa, Yoshitaka Sekiguchi, Satoshi Ogawa, Masahide Inoue
  • Patent number: 8021815
    Abstract: A liquid developer includes a toner particle mainly composed of a resin material, and a nonvolatile insulating liquid, the resin material including an ethylene copolymer, and the insulating liquid including fatty acid triglyceride.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: September 20, 2011
    Assignee: Seiko Epson Corporation
    Inventor: Koji Akioka
  • Patent number: 8021816
    Abstract: A liquid developer includes: an insulating liquid; toner particles constituted by a resin material as a main component; and a dispersing agent expressed by Formula (I): H2N—R—NH—R???(I) (where, R denotes an alkylene group having a carbon number of 2 to 6 and R? denotes an alkyl group having a carbon number of 8 to 24).
    Type: Grant
    Filed: October 31, 2008
    Date of Patent: September 20, 2011
    Assignee: Seiko Epson Corporation
    Inventor: Takashi Teshima
  • Patent number: 8021817
    Abstract: A toner in form of aggregate of resin-containing particles is manufactured by aggregating the resin-containing particles which contain binder resin and the colorant, with the aid of an aggregate dispersant containing a polymer in which anionic polar groups are bonded to a main chain. To be specific, salt of divalent or higher valent metal is added to a slurry of the resin-containing particles so that a metal ion and the anionic polar group are bonded to each other, and a temperature of the slurry is increased so that a bond between the anionic polar group and a water molecule is broken. This decreases water-solubility of the polymer so that the resin-containing particles are aggregated.
    Type: Grant
    Filed: August 1, 2007
    Date of Patent: September 20, 2011
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Keiichi Kikawa, Katsuru Matsumoto, Yasuhiro Shibai
  • Patent number: 8021818
    Abstract: A printing plate to form a precise pattern, a method for manufacturing the printing plate, and a method for fabricating an LCD device using the printing plate in which the printing plate includes a substrate having at least one trench and sidewall elements formed at an inner perimeter of the at least one trench.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: September 20, 2011
    Assignee: LG Display Co., Ltd.
    Inventors: Oh Nam Kwon, Seung Hee Nam
  • Patent number: 8021819
    Abstract: A photosensitive composition, which comprises a compound represented by formula (I): wherein R1 to R13 each independently represents a hydrogen atom or a substituent, and at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X? represents a counter anion; and a pattern-forming method using the photosensitive composition.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: September 20, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Yasutomo Kawanishi
  • Patent number: 8021820
    Abstract: Composition, which comprises a latent activator and a colour former, a process for the preparation of these compositions, substrates coated with these compositions and a process for their preparation, a process for preparing marked substrates using these compositions and marked substrates obtainable by the latter process.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: September 20, 2011
    Assignee: Datalase Ltd.
    Inventors: Karen O'Donoghue, Jonathan Campbell, Ian Street
  • Patent number: 8021821
    Abstract: A photosensitive conductive paste for transferring including a metal powder, an inorganic material powder, a photosensitive resin and a polymerization initiator, and to be applied onto a surface of a transfer support, comprising an acrylic resin or a rosin-based resin.
    Type: Grant
    Filed: January 26, 2009
    Date of Patent: September 20, 2011
    Assignee: Noritake Co., Limited
    Inventors: Atsushi Nagai, Kazutaka Nakayama
  • Patent number: 8021822
    Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units, represented by formula (1). The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution and forms a pattern with a satisfactory mask fidelity and a minimal LER. Herein R1 is H or methyl, m is 1 or 2, and n is 1 or 2.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: September 20, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe
  • Patent number: 8021823
    Abstract: There is provided a positive resist composition, including a base component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a bivalent linking group; B represents a bivalent linking group; and R2 represents an acid dissociable, dissolution inhibiting group).
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: September 20, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hiroaki Shimizu, Tsuyoshi Nakamura, Takahiro Dazai, Daiju Shiono, Tomoyuki Hirano
  • Patent number: 8021824
    Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.
    Type: Grant
    Filed: February 6, 2008
    Date of Patent: September 20, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Jun Iwashita, Sho Abe, Makiko Irie, Takeshi Iwai
  • Patent number: 8021825
    Abstract: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: September 20, 2011
    Assignees: Sumitomo Bakelite Co., Ltd., Promerus, LLC.
    Inventors: Koji Choki, Tetsuya Mori, Ramakrishna Ravikiran, Makoto Fujiwara, Keizo Takahama, Kei Watanabe, Hirotaka Nonaka, Yumiko Otake, Andrew Bell, Larry Rhodes, Dino Amoroso, Mutsuhiro Matsuyama
  • Patent number: 8021826
    Abstract: The present invention provides an organic anti-reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05<m/(m+n)<0.95 and 0.05<n/(m+n)<0.95. The anti-reflection coating using the polymer of the invention has excellent adhesiveness and storage stability, and a very high dry etching rate, and exhibits excellent resolution in both C/H patterns and L/S patterns.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: September 20, 2011
    Assignee: Korea Kumho Petrochemicals Co., Ltd.
    Inventors: Myung-Woong Kim, Joo-Hyeon Park, Young-Taek Lim, Hyung-Gi Kim, Jun-Ho Lee, Jong-Don Lee, Seung-Duk Cho
  • Patent number: 8021827
    Abstract: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer binders and to negative working lithographic printing plates comprising these coatings.
    Type: Grant
    Filed: October 15, 2009
    Date of Patent: September 20, 2011
    Assignee: American Dye Source, Inc.
    Inventors: My T. Nguyen, Marc-Andre Locas
  • Patent number: 8021828
    Abstract: A structure and a photolithography method. The method includes forming a first layer of a first photoresist including a first polymer and a first photosensitive acid generator. A second layer of a second photoresist, including a second polymer having at least one phenyl or phenolic moiety, is formed directly onto the first layer. The second layer is patternwise imaged, resulting in exposing at least one first portion. The first portion is removed, revealing at least one first region of the first layer. A second portion of the second layer remains forming a structure having opaque regions. The structure and first region are exposed. The opaque regions shield from radiation at least one second region of the first layer, resulting in producing acid in the first region and in the structure. The structure and base-soluble regions of the first layer are removed. A structure is also described.
    Type: Grant
    Filed: February 21, 2008
    Date of Patent: September 20, 2011
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Ranee Wai-Ling Kwong, Pushkara R. Varanasi
  • Patent number: 8021829
    Abstract: Provided is a method of forming a photoresist pattern enabling the three dimensional shape of a photoresist pattern to be controlled sufficiently. A photoresist pattern for forming a main magnetic pole layer can be formed by forming a preparatory photoresist pattern having a projected part at a position corresponding to a flare point by selectively exposing and developing a photoresist film, and then heating the preparatory photoresist pattern. In the heating process, the presence of the projected part in the preparatory photoresist pattern relaxes the influence of thermal contraction, and hence the photoresist film is hard to be rounded at the position. Moreover, in the heating process, the preparatory photoresist pattern can be thermally flown and thermally contracted, so that the internal wall in the opening part can be inclined and the projected part can be retreated. Thus, the three dimensional shape of the photoresist pattern approaches a desired three dimensional shape.
    Type: Grant
    Filed: March 2, 2007
    Date of Patent: September 20, 2011
    Assignee: TDK Corporation
    Inventor: Akifumi Kamijima
  • Patent number: 8021830
    Abstract: A liquid plasma expander or resuscitation fluid composition for use in a subject in need thereof, comprising, consisting of; or consisting essentially of: (a) a keratin derivative (preferably alpha keratose, gamma keratose, or combinations thereof, and with basic alpha keratose preferred over acidic alpha keratose); and (b) an electrolyte solution, with the keratin derivative solubilized in the electrolyte solution to form a homogeneous liquid composition. Blood substitutes formed therefrom and methods of making and using the same are also described.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: September 20, 2011
    Assignee: Wake Forest University Health Sciences
    Inventor: Mark E. Van Dyke
  • Patent number: 8021831
    Abstract: The present invention provides a method for determining the chemosensitivity of a cancer cell to a taxane comprising assessing the effect of the taxane on the expression level or activity of one or more cell cycle molecules in a cancer cell. Such a method makes use of an automated analyzer system wherein cell cycle parameters (molecules) such as CDK1 kinase activity, CDK1 expression, CDK2 kinase activity, CDK2 expression, MAD2 expression, Cyclin B1, Cyclin E expression, p21 expression, and CDK6 expression; are assessed. The present invention further provides a method of obtaining a cell cycle profile of a cancer cell that is sensitive to a taxane.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: September 20, 2011
    Assignees: Board of Regents, The University of Texas System, Sysmex Corporation
    Inventors: Naoto T. Ueno, Hideki Ishihara, Tamotsu Sudo, Tomoko Matsushima
  • Patent number: 8021832
    Abstract: The present invention is directed to reagents useful for generating immune responses to Mycobacterium tuberculosis and for diagnosing infection and disease in a subject that has been exposed to M. tuberculosis.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: September 20, 2011
    Assignee: University of Medicine and Dentistry of New Jersey
    Inventor: Maria Laura Gennaro
  • Patent number: 8021833
    Abstract: The importance of interaction between TSG101 and Vps28 in the release of HIV-1 and other viruses is disclosed. Suppressing or interfering in this interaction may inhibit HIV-1 virion release from infected cells. Agents that modulate this interaction include antibodies that bind to Vps28, polypeptides that bind to Vps28, and nucleic acids that may be used in gene therapy to interfere with the expression of wild type Vps28. Administration of such agents in vitro for screening and diagnostic purposes, and in vivo for diagnostic and therapeutic purposes, is disclosed.
    Type: Grant
    Filed: February 12, 2004
    Date of Patent: September 20, 2011
    Assignees: Functional Genetics, Inc., Johns Hopkins University
    Inventors: Xiao-Fang Yu, Bindong Liu, Limin Li
  • Patent number: 8021834
    Abstract: Compositions are provided which include biodegradable microparticles with entrapped or adsorbed antigens, in combination with submicron oil-in-water emulsions. Also provided are methods of immunization which comprise administering to a vertebrate subject (a) a submicron oil-in-water emulsion, and (b) a therapeutically effective amount of a selected antigen entrapped in a microparticle.
    Type: Grant
    Filed: June 30, 2008
    Date of Patent: September 20, 2011
    Assignee: Novartis Vaccines and Diagnostics, Inc.
    Inventors: Derek O'Hagan, Gary Van Nest, Gary S. Ott, Manmohan Singh