Abstract: The present invention provides a tunable optical frequency converter based on an amplitude modulator, which comprises a laser, a first optical isolator, a circulating frequency conversion module. Said circulating frequency conversion module is composed of an optical coupler, an amplitude modulator, an optical amplifier, a second optical isolator, a first optical circulator, an optical fiber Bragg grating, a second optical circulator, a tunable filter and a tunable attenuator. Light outputted by said laser is inputted to said circulating frequency conversion module to conduct frequency converting repeatedly after passing through the first optical isolator, and then separated by a tunable filter and a second optical circulator, then the frequency converted light is outputted from the port of the circulating frequency conversion module.

Abstract: The present invention provides a tunable optical frequency converter based on a phase modulator, which comprises a laser, a first optical isolator and a circulating frequency shift module. Said circulating frequency shift module is composed of an optical coupler, a phase modulator, an optical amplifier, a second optical isolator, a first optical circulator, an optical fiber Bragg grating, a second optical circulator, a tunable filter and a tunable attenuator. Light outputted by said laser is inputted to said circulating frequency shift module to conduct frequency converting repeatedly after passing through the first optical isolator, and then separated by a tunable filter and a second optical circulator, then the frequency converted light is outputted from the port of the circulating frequency shift module.

Abstract: The invention relates to a method and corresponding devices for reducing mode instability in an optical waveguide (1), a light signal becoming unstable in the optical waveguide (1) beyond an output power threshold and energy being transformed from a basic mode into higher order modes. The invention proposes a reduction in temperature variation (2) along the optical waveguide (1) and/or a reduction in changes in the optical waveguide (1) that are caused by spatial temperature variation as a result of mode interference.

Abstract: Disclosed are a camera module and a method for assembling the camera module, the camera module including a cover part having an opening formed therein and a lens guide formed in the opening to prevent removal of a lens to an outside, a lens mounted to the opening of the cover part, and a back cap coming into close contact with the lens and mounted to the opening.

Abstract: A projection system includes a light source, an imaging unit, a control unit, a storage unit, and a projecting unit. The light source applies light beam having a predetermined wavelength. The imaging unit captures a subject to which the light beam is applied. The control unit generates image data for projection based on the captured image. The storage unit stores plural pieces of figure information each representing image data of an object having a predetermined figure. The projecting unit projects a projection image onto the subject. The control unit selects figure information from the stored figure information, based on a degree of similarity with an image of a captured region responding to the light beam. The control unit generates the image data for projection such that an image including a figure indicated by the selected figure information is projected onto the region responding to the light beam.

Abstract: A switching power source for driving a light emitting element, a pulse-drive switching element connected in parallel to the light emitting element, a photodetector for detecting an intensity of an output light output from the light emitting element, a current detecting element for detecting a current flowing from the switching power source, and an operation processing unit that controls an operation of the switching power source by performing a feedback loop operation based on a detection result from the photodetector and a feedback loop operation based on a detection result from the current detecting element are provided to stabilize an emission waveform even when the light emitting element is subjected to a pulsed emission.

Abstract: A projector can prevent a flicker from being caused by rotation of a rotating phosphor plate. The projector includes a solid-state light source that emits excitation light, a rotating phosphor plate that converts the excitation light into phosphor light, a liquid-crystal light modulating device that modulates the light from the rotating phosphor plate, a projection optical system that projects the modulated light onto a screen, and a control device that controls the solid-state light source and the rotating phosphor plate so as to satisfy any one of a conditional expression A=B, a conditional expression A=2B, and a conditional expression |A?B| is greater than or equal to 20 and |A?2B| is greater than or equal to 20, where A represents a pulse width modulation control frequency in hertz of the solid-state light source and B represents a rotation frequency in hertz of the rotating phosphor plate.

Abstract: A projection display apparatus includes a polarization beam splitter, a first phase compensation plate including two layers, and a light modulator. Each layer has a constant axial angle, and an optical axis of each layer inclines with respect to the x axis in an xz plane. The axial angle of the layer closer to the polarization beam splitter among the two layers is larger than the axial angle of the layer farther from the polarization beam splitter. 20°??max??min?80° is satisfied where ?max is a maximum value of the axial angle and ?min is a minimum value of the axial angle. 40°??ave?70° is satisfied where ?ave is an average value of axial angles of the two layers.

Abstract: A projector and a method for operating the projector are provided, in which an optical module alternately emits first image information and second image information at intervals, and an optical path switch is installed to be switched on or off from a traveling path of the first and second image information emitted from the optical module.

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

Abstract: A reflective mask includes a substrate and a multilayer reflective film formed on the substrate. An absorption pattern is formed on the multilayer reflective film. A recess is formed in the multilayer reflective film in a peripheral region of the absorption pattern.

Abstract: A structure having an optical slit therein. The structure includes a substrate having an opening therethrough and a metal layer disposed on the substrate, such metal layer having a photolithographically formed slit therein, such slit being narrower than the opening and being disposed over the opening, portions of the metal layer disposed adjacent the slit being suspended over the opening and other portions of the metal layer being supported by the substrate.

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.

Abstract: Methods of forming a semiconductor device using a photoresist additive and methods of making a photoresist composition using the photoresist additive are disclosed. The photosensitive additive includes a polymer; at least one photo-acid generator (PAG); and at least one additive compound comprising a base and an acid-labile group (ALG). The at least one additive compound undergoes intramolecular cyclization to from a cyclic amide compound in the presence of acid. The at least one additive compound also neutralizes acid generated by the PAG without consuming the acid and does not absorb much light in the exposure areas.

Abstract: A method that forms a film of photoresist composition on a substrate and exposes a first and second region of the film to radiation through a first and second mask having a first and second image pattern, respectively. The photoresist composition includes a polymer comprising at least one acid labile group, a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and of generating a second amount of acid upon exposure to a second dose of radiation, and a photosensitive base generator capable of generating a first amount of base upon exposure to the first dose of radiation and of generating a second amount of base upon exposure to the second dose of radiation. The photosensitive acid generator includes (trifluoro-methylsulfonyloxy)-bicyclo[2.2.1]hept-5-ene-2,3-dicarboximide (MDT), N-hydroxy-naphthalimide dodecane sulfonate (DDSN), or a combination thereof. The photosensitive base generator includes a quaternary ammonium salt.

Abstract: As a negative actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in sensitivity, resolution and pattern profile and reduced in line edge roughness (LER), scum and development defect, a negative actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a polymer compound containing (a) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation and (b) a repeating unit having a phenolic hydroxyl group, and (B) a crosslinking agent, is provided.

Abstract: The present invention provides a photosensitive resin composition comprising an (a) component: an acid-modified epoxy resin, a (b) component: a photopolymerizable monomer having an ethylenically unsaturated group, a (c) component: a photopolymerization initiator, a (d) component: an epoxy resin, and an (e) component: an inorganic filler, wherein the (a) component comprises an acid-modified bisphenol novolak type epoxy resin and further the photosensitive resin composition satisfies a predetermined condition, and provides a photosensitive film, a permanent resist and a method for producing a permanent resist using the same.

Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3 and R2 is H or an acid labile group. A resist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.

Abstract: A resist composition includes a high-molecular weight compound having a constituent unit (a0) represented by a general formula (a0-1), an acid generator component (B) which generates an acid upon exposure, and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, and a mixing ratio of the component (D1) to the component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B). In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group.

Abstract: Molecular glass based planarizing compositions for lithographic processing are disclosed. The processes generally include casting the planarizing composition onto a surface comprised of lithographic features, the planarizing composition comprising at least one molecular glass and at least one solvent; and heating the planarizing composition to a temperature greater than a glass transition temperature of the at least one molecular glass. Exemplary molecular glasses include polyhedral oligomeric silsesquioxane derivatives, calixarenes, cyclodextrin derivatives, and other non-polymeric large molecules.

Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.

Abstract: A method for forming a flexographic plate includes providing a halftone image; detecting an edge region of image features and an interior region of image features; applying fine pixel mask pattern to the edge regions; applying coarse pixel mask pattern to the interior regions; combining the fine patterned edge and the coarse patterned interior into a patterned image; and imaging the flexographic plate.

Abstract: The present invention relates to customizing individual workpieces, such as chip, flat panels or other electronic devices produced on substrates, by direct writing a custom pattern. Customization can be per device, per substrate, per batch or at some other small volume that makes it impractical to use a custom mask or mask set. In particular, it relates to customizing a latent image formed in a patterning sensitive layer over a substrate, merging standard and custom pattern data to form a custom pattern used to produce the customized latent image. A wide variety of substrates can benefit from the technology disclosed.

Abstract: Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a ?max of at least 150 nm and up to and including 450 nm. The -A- recurring units are present in the reactive polymer in an amount of up to and including 98 mol % based on total reactive polymer recurring units. The -B- recurring units comprise pendant groups that provide crosslinking upon generation of the aromatic sulfonic acid groups in the -A- recurring units. The -B- recurring units are present in an amount of at least 2 mol %, based on total reactive polymer recurring units.

Abstract: The present invention provides a composition for developing a photoresist containing a carboxyl group (—COOH) and a method of developing a photoresist using the composition. The composition includes: a first solution including a salt containing a monovalent cationic component; and a second solution including a salt containing a bivalent cationic component. The composition for photoresist development is advantageous in that the developing depth of a photoresist can be controlled, and the developed surface of a photoresist is flat, thereby enabling the photoresist to be developed to realize precise three-dimensional packaging.

Abstract: Electrically-conductive articles are prepared to have electrically-conductive silver metal electrode grids and electrically-conductive silver connector wire patterns (BUS lines) on one or both supporting sides of a transparent substrate. The electrically-conductive silver connector wire patterns are designed with one silver main wire that comprises two or more adjacent silver micro-wires in bundled patterns. These bundled patterns and silver micro-wires are designed with specific dimensions and configurations to provide optimal fidelity (or correspondence) to the mask image used to provide such images in a silver halide emulsion layer. The electrically-conductive articles are provided by imagewise exposure, development, and fixing of corresponding silver halide-containing conductive film element precursors containing photosensitive silver halide emulsion layers. The electrically-conductive articles can be used as parts of various electronic devices including touch screen devices.

Abstract: An optical imaging device, including an imaging unit and a measuring device. The imaging unit includes a first optical element group having at least one first optical element, which contributes to the imaging. The measuring device determines an imaging error, which occurs during the imaging, using a capturing signal. The measuring device includes a measurement light source, a second optical element group and a capturing unit. The measurement light source emits at least one measurement light bundle, The second optical element group includes an optical reference element and a second optical element, which guide the measurement light bundle onto the capturing unit, to generate the capturing signal. Each second optical element has a defined spatial relationship with a respective one of the first optical elements, The second optical elements differ from the first optical elements. The measuring device determines the imaging error with the capturing signal.

Abstract: A lithography method based on the projection of cells, notably direct-write electron-beam lithography. One of the main limitations of the methods of this type in the prior art is the writing time. To overcome this limitation, according to the method of the invention, the size of the cells is increased to the maximum aperture of the lithography device. Advantageously, this size increase is obtained by modifying the size of the apertures of the projection stencil level closest to the substrate to be etched. Advantageously, a strip is added to the outside of the block to be etched onto which is radiated a dose calculated to optimize the process energy latitude. Advantageously, this strip is spaced apart from the edge of the block to be etched. Advantageously, the projected cells are not adjoining.

Abstract: An illumination optical apparatus is able to adjust each of pupil luminance distributions at respective points on a surface to be illuminated to being almost uniform, while maintaining or adjusting an illuminance distribution on the surface to be illuminated to being almost uniform. The illumination optical apparatus illuminates the surface to be illuminated (M, W), with a light beam from a light source (1). The apparatus is provided with a pupil distribution forming device (1-4) for forming a pupil luminance distribution with a predetermined luminance distribution on an illumination pupil plane; and an adjuster (8, 9) for independently adjusting each of pupil luminance distributions about respective points on the surface to be illuminated. The adjuster has a plurality of adjustment surfaces each of which is disposed in an optical path between the pupil distribution forming device and the surface to be illuminated and has a predetermined transmittance distribution or reflectance distribution.

Abstract: Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after providing the first diffraction pattern. Meanwhile, one such method includes providing a first diffraction pattern onto a portion of an optical system, wherein a semiconductor article is imaged using the first diffraction pattern. A second diffraction pattern is also provided onto the portion of the optical system, but the second diffraction pattern is not used to image the semiconductor article.

Abstract: An exposure apparatus includes a first mark-forming unit further upstream than an irradiation region for exposure light in a direction of conveyance of a member to be exposed. A mark for meandering detection is detected, and a detection unit detects the mark for meandering detection in a direction intersecting a direction of movement of the member to be exposed. A second mark-forming unit is moved so as to negate an amount of meandering by the member to be exposed, computed on the basis thereof, and an alignment mark is formed rectilinearly in a relative fashion with respect to the member to be exposed. This enables highly accurate, stable exposure whereby, even in a case where the member is supplied continuously, an alignment mark for mask position adjustment can be changed in accordance with the meandering of the member to be exposed and the position of the mask with respect to the member to be exposed can be accurately adjusted.

Abstract: A projection exposure apparatus for projection lithography comprises a light source for generating illumination light. An illumination optical unit guides the light to an object field. A catadioptric projection optical unit with at least one curved mirror images an object in the object field onto a substrate in an image field. An object displacement drive- and a substrate displacement drive serve to displace the object and the substrate. A compensation device serves to compensate aberrations of the projection optical unit, which are caused by an arching of the object or the substrate. The compensation device comprises a wavelength manipulation device for manipulating a wavelength of the illumination light during the projection exposure. The result of this is a projection exposure apparatus in which the imaging quality of the projection optical unit is optimized, particularly taking into account a field curvature.

Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.

Abstract: An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions.

Abstract: A projection exposure system (10) for microlithography. The system includes projection optics (12) configured to image mask structures into a substrate plane (16), an input diffraction element (28) which is configured to convert irradiated measurement radiation (21) into at least two test waves (30) directed onto the projection optics (12) with differing propagation directions, a detection diffraction element (34; 28) which is disposed in the optical path of the test waves (30) after the latter have passed through the projection optics (12) and is configured to produce a detection beam (36) from the test waves (30) which has a mixture of radiation portions of both test waves (30), a photo detector (38) disposed in the optical path of the detection beam (36) which is configured to record the radiation intensity of the detection beam (36), time resolved, and an evaluation unit which is configured to determine the lateral imaging stability of the projection optics (12) from the radiation intensity recorded.

Abstract: A microlithographic projection exposure apparatus includes a projection light source, a heating light source, a catoptric projection lens and a reflecting switching element, which can be arranged outside of the projection lens and can be displaced between a first position and a second position via a drive. Only the projection light can enter the projection lens in the first position of the switching element, and only the heating light can enter the projection lens in the second position of the switching element.

Abstract: A charge-transporting layer includes a matrix-domain structure. The domain contains a polyester resin A. The matrix contains a charge-transporting substance and at least one of a polyester resin C and a polycarbonate resin D.

Abstract: An electrophotographic photoreceptor includes a conductive substrate, and a photosensitive layer provided on the conductive substrate, and an outermost surface layer of the electrophotographic photoreceptor is constituted with a polymerized product or crosslinked product of a composition including at least one selected from reactive compounds represented by the formulae (I) and (II) and a non-reactive charge transporting material, a content of the non-reactive charge transporting material in the composition is from 5% by weight to 40% by weight based on the weight of the outermost surface layer, and a content of the unreacted reactive compound in the outermost surface layer after forming the outermost surface layer is 3% by weight or less based on the weight of the outermost surface layer.

Abstract: A photoconductor, which contains an electrically conductive support, and at least a photoconductive layer provided over the electrically conductive support, wherein the photoconductive layer contains a compound represented by the following general formula (1): where R1, R2, R3, R4, R5 and R6 are each independently a hydrogen atom, a halogen atom, an alkyl group, an aralkyl group, an alkoxy group, or an aralkyloxy group; n, a, b, c, and d are each independently an integer of 1 to 4 and m is 1 or 2; and a plurality of R1, R2, R3, R4, R5 or R6 may be the same or different when n, m, a, b, c, or d is an integer of 2 or greater.

Abstract: An alcohol-soluble organic coating including a hole transport material formed on a surface of organic photoconductor is provided. The coating comprises a cationic alternate fluorene-based copolymer with phosphonium salt terminal groups embedded in an in-situ cross-linked polymer.

Abstract: Electrostatic latent image developing toner includes at least a binder resin and a releasing agent. In the electrostatic latent image developing toner, a maximum thermal expansion coefficient difference (Swmax?Srmax), which is a difference between a maximum value (Swmax) of a thermal expansion coefficient of the releasing agent and a maximum value (Srmax) of a thermal expansion coefficient of the binder resin, is 1 or more, and a temperature at which the thermal expansion coefficient of the releasing agent reaches a maximum is 60° C. or more to 75° C. or less.

Abstract: A toner T1 develops an electrostatic latent image, the toner T1 having relieved charge-up characteristics, improved development characteristics, and improved transfer characteristics. The toner T1 may ensure high charge stability against environmental condition changes, and an appropriate amount of charges at a high printing speed, may reduce background contamination on a photoreceptor, may prevent undesirable fusing onto a blade even after prolonged printing, and may have high transfer efficiency and high image uniformity. The toner T1 may have effective flowability and transportability, and may have good storage stability, so as to be unlikely to cause blocking when stored for an extended time.

Abstract: A magnetic one-component developing toner including a plurality of toner particles is provided. Each of the plurality of toner particles contains a binder resin including a polyester resin; and a magnetic powder. Water absorptions of the toner and the magnetic powder shown in an environment of 10° C. and 20% RH and in an environment of 28° C. and 80% RH respectively fall in predetermined ranges.

Abstract: A magnetic toner containing: magnetic toner particles containing a binder resin and a magnetic body; and inorganic fine particles, as described in the specification, present on the surface of the magnetic toner particles. A coverage ratio A of the magnetic toner particles' surface by the inorganic fine particles, as described in the specification, and a coverage ratio B of the magnetic toner particles' surface by the inorganic fine particles each of which is fixed to the magnetic toner particles' surface, as described in the specification, have prescribed values and a prescribed relationship in the magnetic toner. The alumina fine particles and/or titania fine particles are present on the surface of the magnetic toner particles as described in the specification.

Abstract: There is provided a toner, including toner mother particles which contain a binder resin, a colorant, and a wax, wherein a difference between a density of the wax in a solid state and a density of the wax in a liquid state is not less than 0.11 g/cm3; the density of the wax in the liquid state is not more than 0.835 g/cm3; and a heat quantity of the wax per unit mass which is obtained from an endothermic peak area at a low temperature side measured by a differential scanning calorimetry is not less than 190 mJ/mg.

Abstract: An electrostatic image developer having little change in charge amount, no generation of fog and excellent environmental stability under all of low temperature and low humidity environment, normal temperature and normal humidity environment, and high temperature and high humidity environment is provided. Disclosed is an electrostatic image developer comprising a colored resin particle containing a binder resin and a colorant, and an external additive, wherein the external additive contains an alumina fine particle in plate-like shape subjected to a hydrophobicity-imparting treatment having a number average primary particle diameter of 20 to 120 nm and an aspect ratio of 3 to 15, and a content of the alumina fine particle is in the range from 0.05 to 1 part by mass with respect to 100 parts by mass of the colored resin particle.