Abstract: Optical constructions are disclosed. A disclosed optical construction includes a reflective polarizer layer, and an optical film that is disposed on the reflective polarizer layer. The optical film has an optical haze that is not less than about 50%. Substantial portions of each two neighboring major surfaces in the optical construction are in physical contact with each other. The optical construction has an axial luminance gain that is not less than about 1.2.

Abstract: A light emitting device comprising a light emitting element and a secondary optical element is disclosed. The secondary optical element has a light output surface, a light incident surface and a bottom surface. The bottom surface is extended from the light incident surface and connected to the light output surface. The light output surface comprises a planar portion, and a convex curved surface portion. The planar portion is in the center of the light output surface, and the convex curved surface portion is around the planar portion. The light incident surface is a concave curved surface comprising a first curved surface and a second curved surface, which form a concave opening for receiving the light emitting element. The first curved surface is in the center of the light incident surface, and the second curved surface is connected to the bottom surface.

Abstract: Provided is a photoalignment film. The photoalignment film may have a fibrous layer that is formed by stacking fibers including a photoalignment material having optical anisotropy in one direction in a state where longitudinal axes of the fibers are arranged in the one direction. The fibrous layer may have a bent surface according to a difference in stacking height between the fibers.

Abstract: The present invention provides an array substrate, a manufacturing method thereof and a display device, relates to the field of liquid crystal display technology, and can solve the problem of low aperture ratio of the existing array substrate. The array substrate of the present invention comprises: a light filtering layer provided on a substrate a thin film transistor formed thereon, a planarization layer covering the light filtering layer, and a pixel electrode provided above the planarization layer, the array substrate further comprises: a third electrode layer connected to a drain of the thin film transistor and extending onto the light filtering layer; and a contacting via penetrating through the planarization layer and provided above a portion of the third electrode layer on the light filtering layer, the pixel electrode being connected to the third electrode layer through the contacting via.

Abstract: A liquid crystal display (LCD) panel, a display apparatus and a method for driving the display apparatus capable of providing a LCD panel having good display quality are provided. The liquid crystal display panel comprises: a first substrate (11) and a second substrate (21) opposite to each other, a pixel array provided on the first substrate (11), and a liquid crystal layer (3) between the first substrate (11) and the second substrate (21). The liquid crystal display panel further comprising a first common electrode (12) disposed on a side of the first substrate (11) close to the liquid crystal layer (3) and a second common electrode (22) disposed on a side of the second substrate (21) close to the liquid crystal layer (3). A first pixel electrode (1) and a second pixel electrode (2) are disposed on the first substrate (11). The second common electrode (22) has no overlap region directly facing the first pixel electrode (1) and/or the second pixel electrode (2).

Abstract: A pixel structure of display panel includes a first substrate, a second substrate, a liquid crystal layer, a first pixel electrode, an insulation layer, a second pixel electrode and a common electrode. The first substrate has a plurality of alignment regions. The second substrate and the first substrate are disposed opposite to each other. The first pixel electrode is a patterned electrode, which includes a plurality of branch electrodes disposed in the alignment regions. The insulation layer is disposed between the first pixel electrode and the liquid crystal layer. The second pixel electrode is a patterned electrode disposed in at least one boundary of each of the alignment regions. The common electrode is disposed on the second substrate.

Abstract: A liquid crystal display according to the present invention is of the lateral electric field type and includes an array substrate having a plurality of pixels arranged in a matrix state, a counter substrate disposed opposite to the array substrate, and liquid crystal enclosed between the array substrate and the counter substrate by a sealing material. The liquid crystal display has a display area for an image and a frame area surrounding the display area. The liquid crystal display further includes an inspection circuit or a protection circuit disposed in the frame area of the array substrate, and a counter electrode disposed in the frame area of the counter substrate and overlapped with entirety of the inspection circuit or the protection circuit in a planar view. The counter electrode is equal in electric potential to a common electrode of the array substrate.

Abstract: A display device includes an array substrate, an opposite substrate, a printed circuit board, and a conductive member. The array substrate includes pixel electrodes. The opposite substrate faces the array substrate, is coupled with array substrate, and includes a light blocking layer disposed in a non-pixel area of the array substrate. The printed circuit board includes a ground terminal and output terminals to apply a driving signal to the array substrate through the output terminals. The conductive member electrically connects the light blocking layer to the ground terminal.

Abstract: A display device is provided that inhibits color mixture between adjacent subpixels and allows for obtaining a high-quality image. The display device includes a display area on which a light-blocking metal layer, a black matrix, and a plurality of subpixels are arranged, wherein the plurality of subpixels are arranged adjacent to one another via a black matrix as seen vertically from above, the black matrix and the light-blocking metal layer are arranged to overlap each other as seen vertically from above, and the light-blocking metal layer 130 is arranged on the bank of an organic flattened film.

Abstract: A pixel array of a liquid crystal display is discussed. The pixel array can include a first pixel including a first pixel electrode charged to a first data voltage, an upper common electrode which is positioned opposite the first pixel electrode and forms an electric field, a lower common electrode applying a common voltage to the upper common electrode, and a first storage capacitor for holding the first data voltage during a predetermined period, and a second pixel including a second pixel electrode charged to a second data voltage, the upper common electrode, the lower common electrode, and a second storage capacitor for holding the second data voltage during a predetermined period. The first and second storage capacitors are located in a storage area between the first and second pixels, which are positioned adjacent to each other in a horizontal direction.

Abstract: A display panel, an array substrate, and a method for manufacturing the same are provided. The array substrate comprises a plurality of pixel units each having a gate line and a common line. The gate line comprises a first line segment and a second line segment. An electric connection structure is disposed in the interrupted region between the first line segment and the second line segment, so that the first line segment and the second line segment are electrically connected with each other through the electric connection structure, and the common line extends through said interrupted region in a direction perpendicular to the gate line, and is in insulated contact with the first line segment and the second line segment. The present disclosure can improve the uniformity of the optimum common voltage, thereby improving the product quality.

Abstract: In the technical field of display, a display device for solving the technical problem of H-block caused by the resistance of the wire on array is provided. The display device comprises a substrate and at least two chip on films for transmitting the gate driving signal. At least two fanouts are formed on the substrate, and each of the chip on films is connected with a corresponding one of the fanouts. Adjacent chip on films are connected with each other through a wire on array. In two adjacent fanouts, the resistance of the former fanout is larger than that of the latter fanout. The present disclosure can be applied to display devices, such as liquid crystal television, liquid crystal display, cell phone, and tablet PC, and the like.

Abstract: An electrochromic device including a substrate, an electrolyte placed between a first optically-active electrochromic electrode and a second optically-passive electrochromic electrode, and a quantity X of cations. The first electrode is capable of storing a quantity of cations equal to Y while the second electrode is capable of storing a quantity of cations equal to Z. The first electrode and the second electrode are respectively associated with a first current collector and with a second current collector. The device includes a quantity of cations X such that Y<X<0.30 Z.

Abstract: An electrochromic device including an electrochromic stack and a support, the electrochromic stack successively including: a first current collector; a first electrochromic electrode; an electrolyte; a second electrochromic electrode; a second current collector. The support and the electrochromic stack are separated by a dielectric layer and a heating system in contact with the support. Further, the heating system is sized to modify at least one of the optical characteristics of the electrochromic device.

Abstract: An all-solid electrochromic device with controlled infrared reflection or emission is provided, in particular of electro-controllable type, comprising a stack successively comprising from a back face (3) as far as a front face (1) exposed to infrared radiation (2): a substrate (4) made of an electron-conducting material, or a substrate made of a non-electron-conducting material coated with a layer made of an electron-conducting material, forming a first electrode; a layer made of a first proton storage electrochromic material (5); a layer of a proton-conducting and electron-insulating electrolyte (6); a bilayer comprising a layer of a non-electrochromic, sub-stoichiometric tungsten oxide WO3-y forming a second electrode; said tungsten oxide WO3-y layer being arranged underneath a layer with variable infrared reflection of a second electrochromic material with variable proton intercalation rate, chosen from among crystallized tungsten oxide HxWO3-c and hydrated crystallized tungsten oxide HxWO3.

Abstract: An electronic paper display device includes a substrate, a protection sheet, an e-ink (electronic-ink) layer, a first electrode layer, and a second electrode layer. The e-ink layer is located between the substrate and the protection sheet. The e-ink layer has a display area and a surrounding area. The display area is surrounded by the surrounding area. The first electrode layer is located between the e-ink layer and the substrate, and the first electrode layer is corresponding to the display area in position. The second electrode layer is located between the e-ink layer and the substrate, and the second electrode layer is corresponding to the surrounding area in position.

Abstract: Electrophoretic displays with an electrophoretic medium having charged pigmented microparticles are disclosed. The microparticles are charged linking molecules polymerized with chromophores of various colors so that microparticles in a variety of colors may be produced. Methods for producing the microparticles and using the microparticles in an electrophoretic display are also disclosed. Such microparticles may be provided separately, or kits may be provided for producing the microparticles.

Abstract: A diaphragm device includes a diaphragm mechanism, a connector, an identification unit for identifying a control mode of a signal communicated via the multiple terminals on the basis of voltage of the signal, and a control unit, wherein the switching unit switches the communication path so that a pulse signal capable of driving the pulse signal driven actuator is generated for generating the pulse signal on the basis of the signal, and output to the pulse signal driven actuator if the control mode of the signal is identified as one based on a control mode incapable of directly driving the pulse signal driven actuator; and the switching unit switches the communication path so that the signal is output to the pulse signal driven actuator if the control mode of the signal is identified as a first control mode based on a pulse signal directly driving the pulse signal driven actuator.

Abstract: A cover or shell for a camera is disclosed and described. The cover can have multiple openings for accessing various portions of the camera so that the camera can be operated without substantially removing the cover.

Abstract: The device and method are intended for the standardization of picture taking without contact with the subject. Two light beamers converging at a distance within the range of camera focus are enabling reproducible viewing conditions via superimposition of the spots of the beamers on the subject and the light of the beamers are extinguished during picture taking in order not to bias the image. The device is constituted of a body 3 adaptable to a camera 1 with objective 2 and is including two light beamers 4A and 4B whose beams 5A and 5B are converging at a distance D within the focus range of the camera as well as a mechanism to extinguish the light beamers during picture taking. It can be improved by enabling the covering of the focus ring 2 and zoom ring 8 of camera 1.

Abstract: A dual-aperture camera with two camera modules that include each a voice coil motor (VCM) actuator coupled to respective lens barrels and a magnetic shield plate positioned tightly between the two camera modules. The shield plate reduces or even prevents magnetic interference during operation of each VCM actuator to move its respective lens barrel. In some embodiments, the magnetic shield plate is rectangular and has a length and a height that are not larger than the length and height of either camera module. The magnetic shield plate may be made of any ferromagnetic material. Exemplarily, it may be made of grey iron or FeCo.

Abstract: An imaging device includes an optical information acquiring section that acquires optical information of a photographing optical system to form an image in the imaging element, an optical function calculating section that calculates an optical function to determine the correction function based on the optical information, a pixel function calculating section that calculates a pixel function to determine the correction function based on the pixel outputs of pixels positioned around focus detecting pixels, and a correction function selecting section (2172d) that selects the correction function to correct the pixel output to be output from the focus detecting pixels corresponding to current frame, based on the optical function, the pixel function and the optical information.

Abstract: A projector includes an image formation apparatus that forms an image, a lens barrel that accommodates a projection lens that projects the formed image, and a light blocking portion that is configured as a member separate from the lens barrel, is located in a position between the image formation apparatus and the lens barrel, and blocks light to be incident on the lens barrel. The configuration of the projector allows blockage of light incident on the lens barrel and hence prevention of distortion of the lens barrel.

Abstract: A light source module adapted to a projector includes a light source, a light combining system, a first cooling fan, a second cooling fan, a first guide duct and a second guide duct. The light source includes a first light emitting device and a second light emitting device. The light combining system is disposed between the first light emitting device and the second light emitting device. The first cooling fan is disposed on the first light emitting device. The second cooling fan is disposed on the second light emitting device. The first guide duct is connected to the first cooling fan and guides a cooling airflow provided by the first cooling fan to the second light emitting device. The second guide duct is connected to the second cooling fan and guides a cooling airflow provided by the second cooling fan to the first light emitting device.

Abstract: The image projection apparatus combining lights from first and second light sources to project an image. First and second usable times of a first light source in the apparatus installed respectively in first and second installation positions have a relation that, when the power for the first light source is fixed, the second usable time is shorter than the first usable time. The second usable time shorter than a third usable time of the second light source in the second installation position. The power controller sets, in the second installation position, the power for the first light source to be lower than the power for first light source in the first installation position and set the power for the second light source to be equal to or higher than the power for the second light source in the first installation position.

Abstract: A stiffening strip at selected edges of a screen may enable the use and mounting of a high-elastic modulus substrate screen material. Such screen materials may be engineered to provide polarization-preserving characteristics, and be applied to or part of the high-elastic modulus substrate. Furthermore, the stiffening strip may enable the use of screen vibration techniques to reduce speckle in display applications that use projection screens, particularly those display applications using illumination sources prone to speckle such as laser-based projection. The screen vibration may be provided by a vibrating device attached to the stiffening strip.

Abstract: A mask, comprising an opaque region, a first semi-transparent region, and a second semi-transparent region. The transmittance of the second semi-transparent region is less than that of the first semi-transparent region. The mask solves the over-etching problem caused by the difference between the thicknesses of photoresist in different regions.

Abstract: A mask for photolithography and methods of manufacturing a mask and a semiconductor device are provided. The method of manufacturing a mask may comprise providing a substrate, forming a phase shift material layer on the substrate, forming a light blocking layer on the phase shift material layer, and forming a main pattern and a sub pattern on the substrate by patterning the phase shift material layer and the light blocking layer. The light blocking layer may be removed on the main pattern left on the light blocking layer remaining on the sub pattern. A semiconductor device may be manufactured using the mask to form a photoresist pattern on a semiconductor wafer. The pattern of the photoresist may be used to etch an object layer of the semiconductor wafer.

Abstract: The present invention provides a photo-mask for manufacturing structures on a semiconductor substrate, which comprises a photo-mask substrate, a first pattern, a second pattern and a forbidden pattern. A first active region, a second active region are defined on the photo-mask substrate, and a region other than the first active region and the second active region are defined as a forbidden region. The first pattern is disposed in the first active region and corresponds to a first structure on the semiconductor substrate. The second pattern is disposed in the second active region and corresponds to a second structure on the semiconductor substrate. The forbidden pattern is disposed in the forbidden region, wherein the forbidden pattern has a dimension beyond resolution capability of photolithography and is not used to form any corresponding structure on the semiconductor substrate. The present invention further provides a method of manufacturing semiconductor structures.

Abstract: A binary photomask blank has a light-shielding film on a transparent substrate, the light-shielding film composed mainly of transition metal M and Si, or M, Si and N, and having an optical density of at least 3.0. The light-shielding film includes a layer containing M, Si and N so as to meet the formula: B?0.68×A+0.23 wherein A is an atomic ratio M/Si and B is an atomic ratio N/Si, and has a thickness of up to 47 nm. The binary photomask blank has a thin light-shielding film capable of fully shielding exposure light.

Abstract: According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.

Abstract: A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, in which L11 is selected from a single bond, a C1-C10 alkylene group, a C2-C10 alkenylene group, and a C2-C10 alkynylene group; and R11 is selected from a C6-C15 aryl group, or a C6-C15 aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C1-C10 alkyl group, a C1-C10 alkoxy group, and a C6-C15 aryl group.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by a specific formula (1), and an ionic compound (B) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.

Abstract: A photosensitive polyimide composition; the composition comprises a base agent and a curing agent comprising a photoinitiator. By applying an aliphatic diamine monomer, which has a long carbon chain, and a grafting monomer, which has a main carbon chain having a double bond and an epoxy group at two ends respectively, to a method of making the base agent, a mixture of the base agent and the curing agent can be screen printed to form a photosensitive polyimide film on a copper foil. Also, the photosensitive polyimide film can be exposed under low exposure energy, and can be developed to a solder-resistant polyimide thin film by a weak alkaline developer after exposed. In addition, the solder-resistant polyimide thin film has low dielectric constant, low dielectric loss, good flame resistance, good solder resistance, and good pencil hardness. Accordingly, the photosensitive polyimide composition is applicable to high density flexible printed circuit boards.

Abstract: There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.

Abstract: The invention provides a compound for forming an organic film having a partial structure represented by the following formula (vii-2), wherein R1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L8? represents the partial structure represented by the following formula (i), 0?o<1, 0<p?1 and o+p=1, wherein the ring structures Ar3 represent a substituted or unsubstituted benzene ring or naphthalene ring; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and L0 represents a divalent organic group.

Abstract: A light irradiating apparatus that may include: an ultraviolet light emission lamp configured to emit vacuum ultraviolet light toward a workpiece to be disposed in an atmosphere of a treatment gas including oxygen; a light passing window adapted to be disposed between the workpiece and the ultraviolet light emission lamp and configured to allow the vacuum ultraviolet light from the ultraviolet light emission lamp to pass therethrough, in which the light passing window has a light-exiting surface; and a spacer adapted to be disposed between the light passing window and the workpiece, to apply a pressing force onto the workpiece and to form a gap that allows a distance from the light-exiting surface of the light passing window to a surface of the workpiece to be of a uniform size over the entire surface of the workpiece.

Abstract: A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises photosensitive non-aromatic heterocyclic groups each of these groups comprising a carbon-carbon double bond in conjugation with an electron withdrawing group, as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern.

Abstract: A substrate having a protective film formed on a front surface and a recess in a back surface opposite the front surface is prepared. A resist pattern is formed on the protective film. The protective film is etched using plasma while applying a bias voltage, using the resist pattern as a mask. The bias voltage is increased according to the manner of decrease in the dielectric constant of a region of the substrate corresponding to a covered region of the front surface at which the protective film is present.

Abstract: Various embodiments provide systems and methods for extreme ultraviolet (EUV) lithography light source. An exemplary system can include a laser radiation apparatus configured to provide laser radiation. The system can further include an EUV light excitation source material configured to receive the laser radiation to generate an EUV light. The laser radiation can generate droplets from the EUV light excitation source material. The system can further include a collector configured to collect the EUV light. The collector can include a plurality of reflective mirrors surrounding the EUV light excitation source material. The plurality of reflective mirrors can be movable. The collector can further include a mirror control system synchronized with the laser radiation apparatus and configured to set the plurality of reflective mirrors to be in one of a reflective state for reflecting the EUV light and a non-reflective state for preventing contamination by the droplets.

Abstract: According to one embodiment, an exposure method is disclosed. The method includes irradiating a first light and a second light on a mask including a plurality of light transmitting portions arranged in a periodic pattern. The first light has a peak of intensity at a first wavelength. The second light has a peak of intensity at a second wavelength. The first wavelength is shorter than a distance between the mask and a substrate disposed to be separated from the mask. The second wavelength is longer than the first wavelength. The method includes irradiating a first interference light transmitted through the light transmitting portions and a second interference light transmitted through the light transmitting portions on the substrate.

Abstract: An asymmetry compensation method used in a lithography overlay process and including steps of: providing a first substrate, wherein a circuit layout is disposed on the first substrate, a first mask layer and a second mask layer together having an x-axis allowable deviation range and an y-axis allowable deviation range relative to the circuit layout are stacked sequentially on the circuit layout, wherein the x-axis allowable deviation range is unequal to the y-axis allowable deviation range; and calculating an x-axis final compensation parameter and an y-axis final compensation parameter base on the unequal x-axis allowable deviation range and the y-axis allowable deviation range.

Abstract: The overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.

Abstract: The present disclosure provides a focus metrology method and photolithography method and system. The focus metrology method includes recognizing at least one relevant region and at least one irrelevant region on a workpiece surface, measuring a height of the relevant region and determining a focal length for an exposure process based on the measured height of the relevant region.

Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

Abstract: An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.

Abstract: An electrophotographic photoreceptor comprising at least a photosensitive layer on a conductive support, wherein the photosensitive layer contains a specific compound and a specific charge-transporting substance.

Abstract: A photoconductor and method of forming a photoconductor for an electrophotographic device comprising forming a charge generation material comprising a plurality of quantum dots, and forming an active region comprising one or more photoconductor layers comprising the charge generation material including the surface modified quantum dots.

Abstract: A multilayer laminate such as a label assembly having high opacity and desirable appearance characteristics is described. The laminate includes a facestock layer, an adhesive layer, and a liner layer. The facestock layer includes a print-receiving top coat layer that includes a combination of titanium dioxide and one or more optical brighteners. The combination of these materials avoids build up of static charges upon laser printing on the facestock.

Abstract: Composite materials such as composite particles have a solid non-elastomeric continuous phase made of an organic polymer having a glass transition temperature of at least 25° C. Dispersed within this solid non-elastomeric continuous phase are many multi-compartment porous chemically crosslinked elastomeric particles that have a mode particle size of at least 1 ?m and up to and including 10 ?m. The composite particles can be used as toner particles in electrophotographic imaging methods to provide fused toner images and especially stacked fused toner images.