Abstract: Techniques are described for compensating for distortion effects caused by projecting images to a surface that is non-perpendicular to a raster-scanning laser projector. Pixel size is modulated such that smaller pixels are projected to farther portions of the surface, and larger pixels are projected to nearer portions. Pixels within a raster scan line may have their lengths modulated through variation of a frequency of light source that generates the pixels, or through adjustment of a scan speed along the line. Pixel heights may be adjusted by modulating the distance between scan lines. Scan speed and distance between scan lines may be modified by controlling micromirrors incorporated into the laser projector for directing the light projection.

Abstract: An illumination system disposed in a projection apparatus includes a solid-state light source group, a cooling module, and an ion fan. The cooling module is thermally coupled to the solid-state light source group. The cooling module is located on a path of a forced convection air generated by the ion fan. The projection apparatus avails prolonging a life time of the illumination system, and the ion fan does not have a magnetic shearing sound of a motor and a wind shearing sound of fan blades to avail reducing an operation noise of the illumination system.

Abstract: A projection image display device includes an indoor unit to be located indoors and an outdoor unit to be located outdoors. The outdoor unit includes a second refrigerant piping that forms a loop refrigerant path in combination with a first refrigerant piping, a cooling device, and a cooling control circuit that controls cooling for R, G, B laser heat sinks by the cooling device. The indoor unit includes a main control circuit that communicates with the cooling control circuit to control the cooling by the cooling device.

Abstract: The present invention provides a multi-projection system and method including direction-changeable audience seats, and the multi-projection system includes a plurality of projection surfaces installed in a single theater; and an audience seat whose direction is changed depending on images projected on the plurality of projection surfaces.

Abstract: A pico projection fixing module includes a bracket main body, plural color light sources, and plural collimator lenses. The bracket main body includes plural assembling seats. The plural assembling seats are arranged side by side. Each of the plural assembling seats includes a first assembling part and a second assembling part beside the corresponding first assembling part. The plural color light sources are installed on the first assembling parts of the plural assembling seats, respectively. The plural collimator lenses are installed on the second assembling parts of the plural assembling seats and aligned with the plural color light sources, respectively. Moreover, plural color light beams from the plural color light sources are projected out through the corresponding collimator lenses. Moreover, plural concave spaces are arranged around bottoms of the plural second assembling parts, respectively, wherein the plural concave spaces are separated from each other.

Abstract: A pixel array display system which has an illumination source with a plurality of emitters in a sparse array, collimators in front of the emitters, a condenser lens downstream of the collimators, an optical homogenizing element downstream from the condenser lens, a relay lens downstream from the optical homogenizing element, a pixel array downstream from the relay lens, a rear group of lens elements of a projection lens downstream from the pixel array, a polarization converter stack downstream from the rear group of lens elements and a front group of lens elements of the projection lens downstream from the polarization converter stack, so that light from the emitters is imaged onto input apertures of the polarization converter stack.

Abstract: A light converging optical system (1) includes a surface-emission light source (11) that emits light from a light emitting surface (12), a collimator lens (13) as a collimator optical system that converts the light emitted from the light emitting surface (12) into approximately parallel light, a condenser lens (4) as a converging lens as a light converging element that converges the light converted into the approximately parallel light, and an integrator rod (7) as a light-intensity-distribution equalizing element that has an incident surface (8) on which the light converged by the condenser lens (4) is incident, equalizes light intensity distribution of incident light, and emits the light from an emission surface (9). Among the light converged on the incident surface (7) of the integrator rod (7), a converging angle of the light converged on a center portion of the incident surface (8) is smaller than a converging angle of the light converged on a corner portion of the incident surface (8).

Abstract: An apparatus for the management of time during a visual presentation such as a talk with slides includes an optical emitter surface and focusing assembly for presentation of a progress plot in circular or linear format onto a presentation display shared by a presentation image. A user interface with policies and rules is operative with a controller for an optical emitter to automatically provide and adjust the brightness and contrast level, select optimal regions for placement of the progress image, and generate the optical image which is displayed in superposition with, or adjacent to, the presentation image.

Abstract: There is provided a projection optical system capable of projecting an image formed on an image forming unit on a projection plane, which has an extremely short projection distance and a small size.

Abstract: A body, preferably a trophy, containing a projector. The projector includes a front face at a base of the body, and a momentary switch that allows for automatic projection of an image when the trophy is lifted from a surface.

Abstract: An imaging apparatus comprising a plurality of pixels each of which includes a photoelectric conversion portion, and a light-condensing portion arranged on the plurality of pixels, wherein the light-condensing portion has an area smaller than an area of the photoelectric conversion portion.

Abstract: The present invention provides a light source apparatus (10) for use with a projector (80) and a method for combining laser beams of different polarization characterized in that an overall efficiency for the reflection and transmission exceeding 97% is achieved. A first white laser light beam (18) having a first polarization is combined with a second white laser light beam (28) having a second polarization that is orthogonal to the first polarization by utilizing a multi narrow-band polarizing beam splitter (20) positioned to receive the first and the second white laser light beams (18, 28). Embodiments of the present invention utilize two laser light sources (12, 22) emitting two sets of laser light beams with multiple wavelengths (14, 15, 16 and 24, 25, 26).

Abstract: Digital photographing apparatus for displaying panoramic images and methods of controlling the digital photographing apparatus are disclosed. A digital photographing apparatus is provided that includes a digital signal processor to enlarge and display a panoramic image based on a target spot set in the panoramic image. Thus, a horizontal or vertical panoramic image may be more easily identified. In addition, a desired portion of the panoramic image may be set, and the panoramic image may be enlarged based on the desired portion, thereby improving satisfaction of a user.

Abstract: A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure.

Abstract: To provide a mask blank for EUVL wherein the incident angle dependence of EUV reflectivity and the film stress in a Mo/Si multilayer reflective film are improved, and a reflective layer-equipped substrate for such a mask blank. The reflective layer-equipped substrate for EUV lithography (EUVL), comprises a substrate, and a reflective layer for reflecting EUV light, formed on the substrate, wherein the reflective layer comprises a second multilayer reflective film having a Mo layer and a Si layer alternately stacked plural times on the substrate, an adjustment layer stacked on the second multilayer reflective film, and a first multilayer reflective film having a Mo layer and a Si layer alternately stacked plural times on the adjustment layer.

Abstract: The present disclosure provides one embodiment of an extreme ultraviolet (EUV) mask. The EUV mask includes a first state and a second state different from each other; a first main polygon and a second main polygon adjacent to the first main polygon; a plurality of sub-resolution assist polygons; and a field. Each of the first and second main polygons, the sub-resolution assist polygons, and the field has an associated state. The state assigned to the first main polygon is different from the state assigned to the second main polygon. The plurality of assist polygons are assigned a same state, which is different from a state assigned to the field.

Abstract: A method for analyzing a photomask comprises the determination of a Bossung plot.

Abstract: The present invention provides an imprint apparatus which performs an imprint process in which an imprint material on a substrate is molded with a mold to form a pattern on the substrate, the apparatus including a controller configured to control the imprint process to form a predetermined layer on the substrate with a target layer, which is formed on the substrate, used as an alignment reference, wherein the controller is configured to select a mold from a plurality of molds prepared for the predetermined layer, such that an overlay error between the target layer and the predetermined layer falls within a tolerance.

Abstract: A method for making three-dimensional nano-structure array is provided. The method includes following steps. A base is provided. A mask layer is located on the base. The mask layer is patterned, and a number of bar-shaped protruding structures is formed on a surface of the mask layer, a lot is defined between each of two adjacent bar-shaped protruding structures of the number of protruding structures to expose a portion of the base. The exposed portion of the base is etched through the slot so that the each of two adjacent bar-shaped protruding structures begin to slant face to face until they are contacting each other to form a protruding pair. The mask layer is removed.

Abstract: The present invention relates to a layer composite comprising an exposed photopolymer film and an adhesive layer which is connected to the photopolymer film at least in certain regions, wherein the photopolymer film comprises crosslinked polyurethane matrix polymers A), crosslinked writing monomers B) and a monomeric fluoroethane additive C), wherein the adhesive layer is in the form of a diffusion barrier for the fluoroethane additive C). The invention also relates to the use of the layer composite for producing chip cards, ID documents or 3D images, as a product protective label, as a label, in banknotes in the form of a strip or window or as holographically optical elements in displays.

Abstract: An auto-repairing photoresist composition comprises 1 to 10 wt % of microcapsule having a capsule wall and a capsule core based on the total weight of the photoresist composition, wherein the capsule wall includes an alkali-insoluble resin, and the capsule core includes: 10 to 60 wt % of a photo-curable unsaturated resin oligomer; 10 to 50 wt % of a photo-curable monomers; 10 to 70 wt % of a first black pigment paste; 0.1 to 10 wt % of a first photo-initiator; and 0.1 to 5 wt % of a coupling agent, based on the total weight of the capsule core. The photoresist composition of embodiments of the present invention can be used for preparation of Black Matrix, and has an auto-repairing property to improve substantially the pass yield of product. A method of preparing the photoresist composition, a color filter substrate, and a display apparatus are also disclosed.

Abstract: A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

Abstract: Embodiments in accordance with the present invention provide for norbornane-type ballast materials, norbornane-type photoactive compounds derived from such ballast materials and alkali-soluble positive-tone polymer compositions that encompass such norbornane-type photoactive compounds and one of a PBO or PNB resin.

Abstract: Various cycloolefinic/maleic anhydride polymers containing maleimide pendant groups and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such polymers encompass norbornene-type repeating units containing maleimide groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

Abstract: A fluorinated ester monomer is provided having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are H or a monovalent hydrocarbon group, or R2 and R3 forms a hydrocarbon ring, R4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.

Abstract: A lithographic process includes the use of a silicon-containing polymer or a compound that includes at least one element selected from the group consisting of: Ta, W, Re, Os, Ir, Ni, Cu or Zn in a resist material for an EUV lithographic process. The wavelength of the EUV light used in the process is less than 11 nm, for example 6.5-6.9 nm. The invention further relates to novel silicon-containing polymers.

Abstract: Provided is a polymer compound that has excellent sensitivity, high resolution, and small line edge roughness and is capable of forming a fine pattern precisely, and less causes post-develop defects. The polymer compound according to the present invention includes a monomer unit (a) and a monomer unit (b). The monomer unit (a) is represented by Formula (a), and the monomer unit (b) includes an alicyclic skeleton containing a polar group. The polar group of the monomer unit (b) is preferably at least one group selected from —O—, —C(?O)—, —C(?O)—O—, —O—C(?O)—O—, —C(?O)—O—C(?O)—, —C(?O)—NH—, —S(?O)—O—, —S(?O)2—O—, —ORa, —C(?O)—ORa, and —CN, where Ra represents, independently in each occurrence, optionally substituted alkyl.

Abstract: Methods and materials directed to solubility of photosensitive material in negative tone developer are described. The photosensitive material may include greater than 50% acid labile groups as branches to a polymer chain. In another embodiment, a photosensitive material, after exposure or irradiation, is treated. Exemplary treatments include applying a base to the photosensitive material.

Abstract: Black-and-white silver halide conductive film element precursors have, on one or both sides and in order, a UV filter layer, non-color hydrophilic photosensitive layer comprising a silver halide, and a hydrophilic overcoat as an outer layer. The one or two UV filter layers individually contains one or more UV absorbing agents in an amount of up 0.5 mmol/m2 and the total amount in the precursor is up to 1 mmol/m2 to prevent crosstalk during imagewise exposure. These precursors can be imagewise exposed and processed to provide conductive film elements with various conductive silver patterns (or grids) with narrow conductive silver lines on one or both sides. Such conductive film elements can be prepared with reduced yellowness as evidenced by reduced b* values. The resulting conductive film elements are highly transparent and can be used in various devices such as display devices.

Abstract: The invention provides a compound for forming an organic film having a partial structure represented by the following formula (i) or (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.

Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.

Abstract: A resist underlayer film-forming composition for forming a resist underlayer film having both dry etching resistance and heat resistance. A resist underlayer film-forming composition comprising a polymer containing a unit structure of Formula (1): In Formula (1), R3 is a hydrogen atom, and both n1 and n2 are 0. A method for producing a semiconductor device comprising the steps of: forming an underlayer film on a semiconductor substrate using the resist underlayer film-forming composition; forming a hard mask on the underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or electron beams and development; etching the hard mask using the resist pattern; etching the underlayer film using the hard mask patterned; and fabricating the semiconductor substrate using the patterned underlayer film.

Abstract: Devices and methods are provided where photoresist is applied on a substrate and at least some regions of the photoresist are dried prior to removing a substrate from a substrate support.

Abstract: Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and an interface between the reflective material and the transparent substrate is a reflective surface. The reticle pattern is on a second surface of the transparent substrate. A reflectivity of the reticle pattern is less than a reflectivity of the reflective material. Methods for forming similar lithography masks and for using similar lithography masks are disclosed.

Abstract: A pupil filter can be designed for any combination of an illumination lens and for various types of lithographic features. The pupil filter can be placed at the pupil plane of a projection optics system. For any given illumination lens providing a pupil fill within a pupil lens, a lithographic mask can be designed for the purpose of printing a one-dimensional array of line and space features or for the purpose of printing a two-dimensional array of contact holes by blocking areas, for each pixel in the pupil fill, the corresponding pixel and diffraction order pixels in the pupil lens unless +1 or ?1 diffraction order pixels fall within the area of the numerical aperture. For the purpose of frequency doubling, the pupil fill area is blocked.

Abstract: A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.

Abstract: A shape defect in a transfer pattern formed over the major surface of a substrate is prevented by using an immersion exposure method. When exposure light is radiated onto a resist, immersion water is held in a first immersion area between each of the lower surfaces of an optical element of a projection optical system and a nozzle portion, and a resist; and when a focus, optical system alignment, or the like, is regulated, the immersion water is held in a second immersion area between each of the lower surfaces of the optical element of the projection optical system and the nozzle portion, and the upper surface of a measurement stage. A transverse spread of the immersion water held in the first immersion area is made smaller than that of the immersion water held in the second immersion area.

Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Abstract: A movable support is configured to hold an exchangeable object. The support includes a movable structure movably arranged with respect to a reference object, an object holder movably arranged with respect to the movable structure and configured to hold the exchangeable object, an actuator configured to move the movable structure with respect to the reference object, and an ultra short stroke actuator configured to move the object holder with respect to the movable structure, wherein a stiffness of the ultra short stroke actuator is substantially larger than a stiffness of the at least one actuator.

Abstract: The invention relates to alignment of an interferometer module for use in an exposure tool. An alignment method is provided for aligning an interferometer to the tool while outside of the too. Furthermore, the invention provides a dual interferometer module, an alignment frame use in the alignment method, and an exposure tool provided with first mounting surfaces for cooperative engagement with second mounting surfaces of an interferometer module.

Abstract: The present embodiments disclose processes for preparing a polyester latex containing an amount of residual organic solvent which is less than 100 ppm by weight of the total weight of the polyester latex.

Abstract: The present invention provides a lithography apparatus for transferring a pattern formed on an original to each of a plurality of shot regions on a substrate, comprising a detection unit configured to detect a mark provided in the shot region and a mark provided on the original, and a control unit configured to control alignment between a target shot region and the pattern of the original such that the mark in the target region detected by the detection unit and the mark on the original are shifted by a positional shift amount which is generated between each mark in the shot region and each mark on the original when an overlay error between the shot region and the pattern of the original falls within an allowable range.

Abstract: An electrophotographic belt which enables the suppression of bleeding of an electrolyte while minimizing influence on its surface smoothness. The electrophotographic belt showing electroconductivity resulting from dissociation of an electrolyte is made of a resin composition containing a crystalline resin as a binder resin, an oil-soluble dye and an electrolyte.

Abstract: The present invention provides a toner that exhibits an excellent low-temperature fixability and an excellent ejected paper adhesiveness during high-speed printing, without affecting the long-term storage stability, in which the toner has a toner particle that contains a resin component, wherein the toner has, in a DSC curve measured with a differential scanning calorimeter, a glass transition temperature of at least 50° C. and not more than 65° C. and a cold crystallization peak during cooling of at least 40° C. and not more than 70° C., and has an endothermic peak in a DSC curve measured with a differential scanning calorimeter for the resin component of at least 70° C. and not more than 95° C.

Abstract: A toner set is used in a printing system that is capable of recycling a print medium and includes a first image forming portion which forms a toner image on the medium with a decolorable toner which is decolored by being heated at a temperature Te (° C.) or higher, a second image forming portion which forms a toner image on the medium with a non-decolorable toner and forms an image on the medium with at least one of the toners, and a decoloring apparatus provided with a heating portion which heats the medium on which a toner image is formed by the image forming apparatus at the temperature Te (° C.) or higher. When heated by the decoloring apparatus, the decolorable toner may be decolored without causing hot offset.

Abstract: Provided is a toner having excellent long-term storage stability and exhibiting both low-temperature fixability and uniform gloss in high-speed printing. A toner has a toner particle that contains a crystalline polyester resin A, an amorphous polyester resin B and a colorant, wherein the crystalline polyester resin A has a polyester molecular chain having a nucleating agent segment at the terminal end thereof, and an SP value Sa ((cal/cm3)1/2) of the crystalline polyester resin A ranges from 9.00 to 11.50, and the amorphous polyester resin B has a specific functional group.

Abstract: An image forming apparatus includes a generation unit configured to generate correlation data indicating a relationship between a relative position of a first image and a second image corresponding to a first speed and a relative position of the first image and the second image corresponding to a second image forming speed; a controller configured to, in a case where an image forming unit forms an image at the second speed, correct a relative position of the first image and the second image based on first information and on correlation data; and a prohibition unit configured to prohibit formation of the measurement image at the second speed in a case where a housing unit does not house a predetermined recording material corresponding to the second speed.

Abstract: Fluorescing highlights can be provided in selected portions of non-color image areas of a printed toner image using fluorescing dry toner particles, such as fluorescing magenta and fluorescing yellow dry toner particles. Before fixing, each fluorescing dry toner particle comprises a polymeric binder phase and a fluorescing colorant that emits at one or more ?max wavelengths of at least 420 nm and up to and including 690 nm and that is dispersed within the polymeric binder phase.