Patents Issued in March 29, 2016
  • Patent number: 9298077
    Abstract: A reaction assembly 18 for a stage assembly 10 that moves a device 26 along a first axis includes a base countermass 40 and a first transverse countermass 42. The stage assembly 10 includes a stage 14 and a stage mover 16 that includes a moving component 38 that is coupled to the stage 14 and a reaction component 36 that is secured to the base countermass 40. The first transverse countermass 42 is guided to allow for movement along a first transverse axis 50 and the first transverse countermass 42 is coupled to the base countermass 40 so that movement of the base countermass 40 along the first axis causes the first transverse countermass 42 to move along the first transverse axis 50.
    Type: Grant
    Filed: October 5, 2012
    Date of Patent: March 29, 2016
    Assignee: Nikon Corporation
    Inventor: Douglas C. Watson
  • Patent number: 9298078
    Abstract: A method and apparatus for generating three dimensional image information using a single imaging path having an associated field of view. Two images are selectively received through respective portions of the single imaging path, each portion having a perspective viewpoint within the field of view. The two images together are operable to represent three dimensional spatial attributes of objects within the field of view. To create a change in the representation of the three dimensional spatial attributes, an extent of the two portions of the imaging path are varied to cause the perspective viewpoints to change location. While varying the extent of the portions, compensating for changes in transmission allows an image intensity associated with each of the two images to be maintained at a generally uniform image intensity level.
    Type: Grant
    Filed: July 10, 2009
    Date of Patent: March 29, 2016
    Assignee: STEROPES TECHNOLOGIES, LLC
    Inventor: Thomas N. Mitchell
  • Patent number: 9298079
    Abstract: Described herein are implementations of various technologies for a method and apparatus for a method and apparatus for displaying sonar images. In one implementation, sonar images that are currently being recorded may be displayed on a regular pane. Further, condensed sonar images that had previously been recorded and that are currently being recorded may be displayed on a preview pane, while recording the sonar images.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: March 29, 2016
    Assignee: Navico Holding AS
    Inventors: Steve Thomas, Aaron Coleman
  • Patent number: 9298080
    Abstract: An improvement is achieved in the performance of a semiconductor device. A method of manufacturing the semiconductor device includes an exposure step of subjecting a resist film formed over a substrate to pattern exposure using EUV light reflected by the top surface of an EUV mask which is a reflection-type mask. In the exposure step, the EUV mask is held with the cleaned back surface thereof being in contact with a mask stage. In the EUV mask, the water repellency of the side surface thereof is higher than the water repellency of the top surface thereof. After the exposure step, the resist film subjected to the pattern exposure is developed to form a resist pattern.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: March 29, 2016
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventor: Toshihiko Tanaka
  • Patent number: 9298081
    Abstract: A scattering enhanced thin absorber for a EUV reticle and a method of making thereof is disclosed. Embodiments include forming a multilayer on the upper surface of a substrate, forming a capping layer over the multilayer, forming one or more diffuse scattering layers over the capping layer, and etching the diffuse scattering layers to form a stack.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: March 29, 2016
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Lei Sun, Obert Reeves Wood, II
  • Patent number: 9298082
    Abstract: The present disclosure relates to a mask plate, an exposure method thereof, and a liquid crystal display panel including the mask plate. On the mask plate, a plurality of pattern regions is arranged in a gradient variation from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask. The method for exposing the mask plate comprises the following steps of, (a) providing an exposure mask in a horizontal state, and measuring the deformation degree of the exposure mask; (b) arranging, on the mask plate, a plurality of pattern regions, the dimensions of which change in a gradient manner from the center of the mask plate to the edges thereof according to the deformation degree of the exposure mask; and (c) completing the exposure of the mask plate. The mask plate according to the present disclosure can compensate the effect of deformation of the exposure mask on the exposure area of the mask plate.
    Type: Grant
    Filed: January 21, 2014
    Date of Patent: March 29, 2016
    Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Meng Li, Jinjie Wang
  • Patent number: 9298083
    Abstract: An extreme ultraviolet photomask comprises a reflective layer over a substrate, a capping layer over the reflective layer, a hard mask layer over the capping layer, and an absorber. The absorber is in the hard mask layer, the capping layer and the reflective layer.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: March 29, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ching-Hsu Chang, Hung-Chun Wang, Boren Luo, Wen-Chun Huang, Ru-Gun Liu
  • Patent number: 9298084
    Abstract: A method, system or computer usable program product for preventing odd cycles caused by design modifications to a double patterning layout including utilizing a processor to identify a set of double patterning cycles in the layout for storage in a memory; receiving a set of design modifications to the layout; utilizing the processor to identify from the set of double patterning cycles a subset of double patterning cycles affected by the set of design modifications; utilizing the processor to identify from the set of design modifications a subset of design modifications which may cause odd cycles in the subset of double patterning cycles; and providing a notification of the subset of design modifications.
    Type: Grant
    Filed: July 10, 2014
    Date of Patent: March 29, 2016
    Assignee: Synopsys Inc.
    Inventor: Jianfeng Luo
  • Patent number: 9298085
    Abstract: A method for repairing a mask is disclosed. A mask, having at least one defect need to be repaired, is received. The mask includes a transmissive mask or a reflective mask. A location and size of the defect is determined. A repair hard mask (RHM) is formed over the mask. Various configuration of the RHM are disclosed. A repairing process is performed, with the RHM over the mask, to repair the defect.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: March 29, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsun-Chuan Shih, Yuan-Chih Chu
  • Patent number: 9298086
    Abstract: The invention relates to a method for forming a relief layer (216) employing a stamp (206) having a stamping surface (208) including a template relief pattern. A solution comprising a siliconoxide compound (200) is sandwiched between a substrate surface (202) and the stamp surface (208) and dried while sandwiched. After removal of the template relief pattern the relief layer obtained has a high inorganic mass content making it robust and directly usable for a number of applications such as semiconductor, optical or micromechanical.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: March 29, 2016
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventor: Marcus Antonius Verschuuren
  • Patent number: 9298088
    Abstract: A photosensitive composition useful for fabricating organic electronic devices comprises a fluorinated solvent a fluorinated sensitizing dye and a copolymer. The copolymer comprises at least two distinct repeating units, including a first repeating unit having a fluorine-containing group and a second repeating unit having a solubility-altering reactive group. The presence of the fluorinated sensitizing dye improves photosensitivity.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: March 29, 2016
    Assignee: Orthogonal, Inc.
    Inventors: Douglas Robert Robello, Charles Warren Wright
  • Patent number: 9298089
    Abstract: Provided is a composition for resist patterning comprising a thiol; at least one -ene monomer; at least one polymerization initiator; and, optionally, a metal oxide used in an amount of 0.1 to 50 wt. % per weight of the composition; the thiol and -ene monomer are used in a stoichiometric ratio with a refractive index between 1.6 and 1.8. The composition is used in a patterning process wherein the composition is dispensed to the substrate, is covered with a mask, and is cured, e.g., by UV radiation, at room temperature with light having a wavelength in the range of 200 nm to 450 nm. The process may be carried out with thermal annealing.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: March 29, 2016
    Assignee: Abeam Technologies, Inc.
    Inventors: Carlos Pina Hernandez, Christophe Peroz, Stefano Cabrini
  • Patent number: 9298090
    Abstract: A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A? represents —N?—SO2—RD, —COO?, —O? or —SO3?. —SO3? does not directly bond to a carbon atom having a fluorine atom. RD represents a linear or branched monovalent hydrocarbon group, or the like. X+ represents an onium cation.
    Type: Grant
    Filed: March 6, 2015
    Date of Patent: March 29, 2016
    Assignee: JSR CORPORATION
    Inventors: Hirokazu Sakakibara, Masafumi Hori, Taiichi Furukawa, Koji Ito
  • Patent number: 9298091
    Abstract: The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: March 29, 2016
    Assignee: CHI MEI CORPORATION
    Inventor: Ching-Yuan Tseng
  • Patent number: 9298092
    Abstract: A method of making a relief image printing element from a photosensitive printing blank is provided. The method comprising the steps of: 1) providing a photosensitive printing blank comprising a backing layer, at least one layer of photoresin on top of the backing layer and a removable coversheet on top of the at least one layer of photoresin; 2) imaging the photosensitive printing blank through the removable coversheet using a laser to create a relief image therein; and 3) removing the removable coversheet.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: March 29, 2016
    Inventors: Jonghan Choi, Chouaib Boukaftane, Kerry O'Brate
  • Patent number: 9298093
    Abstract: Polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 31, 2011
    Date of Patent: March 29, 2016
    Inventors: Young Cheol Bae, Matthew M. Meyer, Jibin Sun, Seung-Hyun Lee, Jong Keun Park
  • Patent number: 9298094
    Abstract: The present invention provides a resist pattern-forming composition capable of forming a resist pattern excellent in etching resistance. The invention also provides a resist pattern formation method using that composition. The composition comprises pure water and a water-soluble resin having aromatic group-containing substituents in its side chain. The composition also contains a free acid or an acid group combined with the water-soluble resin.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: March 29, 2016
    Assignee: MERCK PATENT GMBH
    Inventors: Toshira Okamura, Georg Pawlowski, Masahiro Ishii
  • Patent number: 9298095
    Abstract: The present invention provides a rinse solution for lithography and a pattern formation method using the solution. They can improve the pattern collapse, surface roughness and surface defects. The solution contains at least a sulfonic acid a nonionic surfactant having an alkyleneoxy group and water.
    Type: Grant
    Filed: March 22, 2012
    Date of Patent: March 29, 2016
    Assignee: MERCK PATENT GMBH
    Inventors: Xiaowei Wang, Georg Pawlowski, Yuriko Matsuura
  • Patent number: 9298096
    Abstract: An alkaline development-type curable resin composition having an excellent strength against tearing, breaking, distortion and torsion, and excellent toughness, a cured product of the curable resin composition, a printed circuit board having the cured product, and a process for manufacturing the cured product are disclosed. A curable resin composition is obtained, which contains (A) a thermoplastic resin, (B) a thermosetting component, (C) an alkali-soluble component, and at least one of (D-1) a photopolymerization initiator and (D-2) a photo-base generator, the thermoplastic resin (A) having two or more glass transition points including two glass transition points Tgx and Tgy, which satisfy Tgx>30° C. and Tgy<0° C. and the thermosetting component (B) having a glass transition point Tgz, which satisfies Tgz?Tgy+20° C. Moreover, a cured product of the curable resin composition, a printed circuit board having the cured product, and a process for manufacturing the cured product are obtained.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: March 29, 2016
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Kazuya Okada, Shuichi Yamamoto, Shoji Minegishi, Daichi Okamoto, Xiaozhu Wei
  • Patent number: 9298097
    Abstract: The disclosure relates to a projection exposure apparatus for EUV microlithography which includes an illumination system for illuminating a pattern, and a projection objective for imaging the pattern onto a light-sensitive substrate. The projection objective has a pupil plane with an obscuration. The illumination system generates light with an angular distribution having an illumination pole which extends over a range of polar angles and a range of azimuth angles and within which the light intensity is greater than an illumination pole minimum value. From the illumination pole toward large polar angles a dark zone is excluded within which the light intensity is less than the illumination pole minimum value, and which has in regions a form corresponding to the form of the obscuration of the pupil plane.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: March 29, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Marc Bienert, Heiko Feldmann, Aksel Goehnermeier, Oliver Natt, Johannes Ruoff
  • Patent number: 9298098
    Abstract: A light exposer according to an embodiment of the present invention includes an exposure beam generator generating an exposure beam, and a vacuum chamber passing the exposure beam generated by the exposure beam generator and including a first fly eye lens having a plurality of convex lens like fly eyes. The exposure beam generator includes an oscillator including an oscillator pumping chamber, a first prism and a second prism, and a first exposure beam diameter changing lens positioned before the first prism and enlarging a diameter of the exposure beam.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: March 29, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Tsunemitsu Torigoe, Chang Hoon Kim, Kab Jong Seo
  • Patent number: 9298099
    Abstract: An exposure apparatus is provided for performing an unidirectional scan-exposure. The exposure apparatus includes a base and a wafer stage group having a plurality of wafer stages on the base for holding wafers and successively moving from a first position to a second position of the base cyclically. The exposure apparatus also includes an alignment detection unit above the first position for detecting wafer stage fiducials at the first position and alignment marks on a wafer on the wafer stage to align the wafer. Further, the exposure apparatus includes a reticle stage on the second position for loading a cylindrical reticle and causing the cylindrical reticle to rotate around the center axis of the reticle stage and an optical projection unit between the reticle stage and the base for projecting light passing through the cylindrical reticle onto exposure regions on a wafer on the wafer stage.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: March 29, 2016
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventors: Qiang Wu, Yanlei Zu, Huayong Hu, Yiming Gu
  • Patent number: 9298100
    Abstract: The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The disclosure also generally relates to projection exposure installations that include such im-aging optical systems, methods of using such projection exposure installa-tions, and components made by such methods.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: March 29, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hans-Juergen Mann
  • Patent number: 9298101
    Abstract: A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: March 29, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thorsten Rassel, Markus Hauf
  • Patent number: 9298102
    Abstract: A projection lens for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength ?<260 nm has a multiplicity of optical elements having optical surfaces which are arranged in a projection beam path between the object plane (OS) and the image plane. Provision is made of a wavefront manipulation system for dynamically influencing the wavefront of the projection radiation passing from the object plane to the image plane.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: March 29, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Heiko Feldmann
  • Patent number: 9298103
    Abstract: An exposure apparatus is provided for performing a unidirectional scan-exposure. The exposure apparatus includes a base and a plurality of wafer stages on the base for loading/unloading wafers and successively moving from a first position to a second position of the base cyclically. The exposure apparatus also includes alignment detection units above the first position of the base for detecting alignment marks on the wafer and aligning the wafers and a cylindrical reticle system above the second position of the base. Further, the exposure apparatus includes an optical projection unit between the cylindrical reticle system and the base for projecting light onto the wafers for an exposure. Further, the exposure apparatus also includes an illuminator box and a main control unit.
    Type: Grant
    Filed: September 8, 2013
    Date of Patent: March 29, 2016
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventors: Qiang Wu, Chang Liu, Jing'an Hao
  • Patent number: 9298104
    Abstract: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: March 29, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Siegfried Alexander Tromp, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre
  • Patent number: 9298105
    Abstract: In a lithographic apparatus, slippage of a patterning device is substantially eliminated during movement of a patterning device stage by providing a magnetostrictive actuator to apply an accelerating force to the patterning device to compensate for forces that would otherwise tend to cause slippage when the patterning device stage moves.
    Type: Grant
    Filed: October 28, 2014
    Date of Patent: March 29, 2016
    Assignee: ASML Holding N.V.
    Inventor: Darya Amin-Shahidi
  • Patent number: 9298106
    Abstract: A wafer stage system with reciprocating wafer stage actuation control may include a wafer stage, a motor configured to actuate the wafer stage in a first and/or second direction along an axis, a first reciprocating mechanism configured to decelerate the wafer stage after the wafer stage is actuated to a desired position in the first direction, the first reciprocating mechanism configured to store energy captured while decelerating the wafer stage in the first direction, the first reciprocating mechanism configured to accelerate the wafer stage in the second direction, and a second reciprocating mechanism configured to decelerate the wafer stage after the wafer stage is actuated to a desired position in the second direction, the second reciprocating mechanism configured to store energy captured while decelerating the wafer stage in the second direction, the second reciprocating mechanism further configured to accelerate the wafer stage in the first direction.
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: March 29, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Upendra Ummethala, Marek Zywno, Layton Hale
  • Patent number: 9298107
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: March 29, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • Patent number: 9298108
    Abstract: An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: March 29, 2016
    Assignee: NIKON CORPORATION
    Inventors: Masahiko Yasuda, Taro Sugihara
  • Patent number: 9298109
    Abstract: An EUV lithography apparatus (1) includes: a light source (15) for generating radiation (17) for the illumination of particles (P) present in the gas phase and present in the EUV lithography apparatus (1) along a light area (18), and a detector, for detecting radiation (17a) from the light source (15) that is scattered at the illuminated particles (P) in a test region (19) captured by the detector. Also, a method for detecting particles (P) in an EUV lithography apparatus (1) includes: producing a light area (18) for illuminating the particles (P) present in the gas phase, detecting radiation (17a) scattered at the illuminated particles (P) in a test region (19), and determining a number (N) of particles in the test region (19) on the basis of the detected radiation (17a).
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: March 29, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Vera Butscher, Dirk Heinrich Ehm
  • Patent number: 9298110
    Abstract: A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: March 29, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jens Arno Steinhoff, Vadim Yevgenyevich Banine, Richard Joseph Bruls, Erik Roelof Loopstra, Hendrik Antony Johannes Neerhof, Adrianus Johannes Maria Van Dijk, Andrei Mikhailovich Yakunin, Luigi Scaccabarozzi
  • Patent number: 9298111
    Abstract: An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: March 29, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Viktor Kulitzki, Bernhard Gellrich, Stefan Xalter, Yim-Bun Patrick Kwan, Peter Deufel, Andreas Wurmbrand
  • Patent number: 9298112
    Abstract: A method of manufacturing a positively-charged single-layer electrophotographic photoreceptor including the steps of: producing a photosensitive layer application liquid containing a good solvent with respect to a binding resin and at least one organic solvent having a boiling point of 70° C. or higher; and forming a photosensitive layer by coating a photosensitive layer support base having a wall thickness of 0.7 mm or less, with the photosensitive layer application liquid and then drying the photosensitive layer application liquid.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: March 29, 2016
    Assignee: KYOCERA Document Solutions Inc.
    Inventors: Yasufumi Mizuta, Sakae Saito, Kazunari Hamasaki, Keizo Kimoto, Syoji Itsumi, Hiroshi Takemoto
  • Patent number: 9298113
    Abstract: An electrophotographic photoconductor, including: an electroconductive substrate; and at least a photoconductive layer and a surface layer in this order over the electroconductive substrate, wherein the surface layer includes a resin having no charge transport properties, and first inorganic fine particles, and wherein the first inorganic fine particles are inorganic fine particles having surfaces modified with at least one of a primary amino group and a secondary amino group, and a volume resistivity of the first inorganic fine particles is 1×108 ?·cm or less.
    Type: Grant
    Filed: January 15, 2014
    Date of Patent: March 29, 2016
    Assignee: Ricoh Company, Ltd.
    Inventors: Toshihiro Ishida, Hiroshi Ikuno, Tetsuya Toshine, Naohiro Toda, Takafumi Iwamoto, Kazuhiro Egawa
  • Patent number: 9298114
    Abstract: Oxotitanium phthalocyanine nanoparticles in the crystal form of phase-Y (Y-TiOPc) having particle diameters of 2˜4 nm, preparation, and applications thereof are disclosed. The preparation method comprises the following steps: mixing a concentrated sulfuric acid solution of TiOPc with water or dilute sulfuric acid, or water or dilute sulfuric acid with a surfactant dissolved therein, or an aqueous solution of a low molecular weight organic compound to form a suspension or hydrosol; adding into the resulting suspension or hydrosol chlorinated hydrocarbons to extract TiOPc into an organic phase, so as to form a colloidal solution of Y-TiOPc nanoparticles; and then, washing and drying the above nanoparticles to give rise to a powder of the Y-TiOPc nanoparticles. Such a nanoparticle powder can disperse in chlorinated hydrocarbons to form stable colloidal solutions, thereby providing an alternative approach for solving the problem of poor dispersibility for Y-type TiOPc.
    Type: Grant
    Filed: March 5, 2012
    Date of Patent: March 29, 2016
    Assignee: PEKING UNIVERSITY
    Inventors: Yuan Wang, Dejian Liang, Wenlian Peng
  • Patent number: 9298115
    Abstract: In an electrophotographic photosensitive member including a charge-generating layer, the charge-generating layer has a matrix-domain structure; in the matrix-domain structure, the domain contains a charge-generating substance, and the matrix contains a binder resin and a fluoranthene compound.
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: March 29, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junpei Kuno, Takeshi Murakami, Tsutomu Nishida, Masataka Kawahara, Kaname Watariguchi
  • Patent number: 9298116
    Abstract: An electrostatic charge image developing toner includes a plurality of toner particles each having a toner core, organic particles adhering to a surface of the toner core, and a shell layer covering the toner core and the organic particles. The shell layers contain a thermosetting resin.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: March 29, 2016
    Assignee: KYOCERA Document Solutions Inc.
    Inventors: Ken Maetani, Tomoyuki Ogawa
  • Patent number: 9298117
    Abstract: Methods herein include mixing at least one polyester resin with at least one solvent to form a resin mixture, adding water to cause phase inversion and form a polyester latex, adding at least one buffering agent to the phase inverted mixture to stabilize the phase inverted mixture, and subsequent to the buffering agent addition, substantially removing the at least one solvent from the phase inverted mixture.
    Type: Grant
    Filed: January 28, 2014
    Date of Patent: March 29, 2016
    Assignee: XEROX CORPORATION
    Inventors: Zhen Lai, Chieh-Min Cheng
  • Patent number: 9298118
    Abstract: An object of the present invention is to provide an azo compound capable of improving the dispersibility of an azo pigment in a non-water-soluble solvent. The object of the present invention is achieved with an azo compound wherein a coloring matter moiety having a diketone azo structure and a polymer are bonded to each other.
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: March 29, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masashi Kawamura, Yasuaki Murai, Waka Hasegawa, Yuki Hasegawa, Takayuki Toyoda, Taiki Watanabe, Masanori Seki, Chiaki Nishiura, Ayano Mashida, Masashi Hirose
  • Patent number: 9298119
    Abstract: A carrier is provided. The carrier includes a particulate magnetic core, and a cover layer located on the surface of the particulate magnetic core and including a resin and a filler. When determined from observation of cross-section of the carrier, the shape factor SF2 of the carrier is from 120 to 160, the ratio of the average domain diameter of the particulate magnetic core to the number average particle diameter of the filler is from 1:1 to 1:0.003, and the area ratio of the filler in the cover layer is from 30 to 85%.
    Type: Grant
    Filed: January 29, 2014
    Date of Patent: March 29, 2016
    Assignee: Ricoh Company, Ltd.
    Inventors: Shigenori Yaguchi, Koichi Sakata, Hitoshi Iwatsuki, Toyoaki Tano, Hiroyuki Kishida, Kenichi Mashiko, Hiroshi Tohmatsu
  • Patent number: 9298120
    Abstract: Non-uniform charged potential of a surface of a photosensitive member is suppressed even when a temperature of a charging member newly mounted to an image forming apparatus by exchange is lower than a temperature inside the image forming apparatus. The image forming apparatus includes the photosensitive member, a charge portion, an applying portion for applying a charging bias voltage to the charge portion, a toner image forming portion for forming a toner image on the photosensitive member, a transfer portion, a fixing portion, a first casing accommodating them, and a second casing having a recording material accommodating portion for accommodating a recording material.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: March 29, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masami Hano, Masahiro Makino
  • Patent number: 9298121
    Abstract: An optical scanning device includes a light source configured to emit a light beam; a rotary deflector configured to perform optical scanning by reflecting and deflecting the light beam emitted from the light source while rotating; an optical system forming member configured to form a path of the light beam; and a resonator having a resonance frequency corresponding to a sound generated by rotational drive of the rotary deflector. The rotary deflector is installed in a closed space. The resonator is installed so that the sound within the closed space is absorbed.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: March 29, 2016
    Assignee: RICOH COMPANY, LIMITED
    Inventors: Kazunori Watanabe, Yoshinobu Sakaue, Susumu Narita, Hiroshi Johno
  • Patent number: 9298122
    Abstract: An image forming apparatus includes: a pseudo-halftone processing unit that processes input image data to output image data of first resolution; a resolution converting unit that converts the image data of the first resolution into image data of second resolution that is higher than the first resolution; a modulation-signal generating unit that generates a modulation signal obtained by modulating the image data of the second resolution according to a clock signal; and a light-source driving unit that drives a light source according to the modulation signal. The pseudo-halftone processing unit converts a region of pixels having the same pixel value into a parallel line pattern that is formed with a plurality of parallel lines oblique relative to a direction of arrangement of pixels. The resolution converting unit generates the image data o in which each edge of the lines forming the parallel line pattern is smoothed.
    Type: Grant
    Filed: May 2, 2014
    Date of Patent: March 29, 2016
    Assignee: RICOH COMPANY, LIMITED
    Inventors: Muneaki Iwata, Masaaki Ishida, Atsufumi Omori, Hayato Fujita
  • Patent number: 9298123
    Abstract: The device comprises: a light emission control unit forming an latent image on a photoconductor; a correction value calculation unit calculating a correction pattern for correcting a transfer position where a developer image of the latent image transfers to a conveying member; and an angle adjustment processing unit that determines an angle of an oblique line pattern included in the correction pattern on the basis of a detection signal of an angle adjustment pattern including a plurality of continuous oblique line patterns, wherein the light emission control unit controls a light to emit so that a plurality of oblique line patterns having different inclinations relative to a conveying direction of the conveying member are continuously formed to draw the angle adjustment pattern, and controls the light to emit so that an oblique line pattern having the determined angle is formed in the correction pattern to draw the correction pattern.
    Type: Grant
    Filed: November 7, 2014
    Date of Patent: March 29, 2016
    Assignee: RICOH COMPANY, LTD.
    Inventors: Masatoshi Murakami, Tatsuya Miyadera
  • Patent number: 9298124
    Abstract: When an edge effect or sweeping occurs in a developing material, pixels, among a plurality of pixels that configure image data, will arise in which a developing material consumption amount rises beyond an original consumption amount. A CPU corrects the developing material consumption amount for the pixels, among the plurality of pixels that configure the image data, in which the developing material consumption amount will rise beyond the original consumption amount.
    Type: Grant
    Filed: January 14, 2015
    Date of Patent: March 29, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Go Araki, Norihito Naito
  • Patent number: 9298125
    Abstract: An image forming apparatus includes a latent image bearing member, a charging unit, a charging power source, a latent image writing unit, a development unit, a transfer unit, a toner detector, and a controller. The controller causes a background fog pattern to be formed on a surface of the latent image bearing member. In addition to the background fog pattern, the controller causes a latent image to be developed to form a toner image used for position identification on the surface of the latent image bearing member. The controller identifies a time when the toner image used for position identification has entered a detection range of the toner detector based on a change in outputs of the toner detector to determine a time when each of sections of the background fog pattern enters the detection range based on the identified time.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: March 29, 2016
    Assignee: Ricoh Company, Ltd.
    Inventors: Hiroyuki Sugiyama, Takamasa Ozeki, Tomoko Takahashi, Yoshinori Nakagawa, Masahiko Shakuto, Ryuji Yoshida, Taichi Urayama, Ryusuke Mase, Shotaro Hoshi
  • Patent number: 9298126
    Abstract: A developing device includes a housing, a development roller, and a roller gear. The roller gear is disposed at one axial end of the development roller and transmits a rotational drive force to the development roller. The development roller includes a sleeve and a coating layer. The coating layer is formed by dipping the sleeve in a dipping bath with the sleeve directed axially vertically. The development roller is mounted to the housing such that a lower axial end of the development roller at the time of the dipping is an opposite axial end to the one axial end at which the roller gear is disposed.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: March 29, 2016
    Assignee: KYOCERA Document Solution Inc.
    Inventors: Tamotsu Shimizu, Akihiro Watanabe, Chikara Ishihara, Yasuhiro Tauchi, Masashi Fujishima, Yu Sasaki, Hiroaki Sakai, Yasuhiro Oishi, Yukimasa Watanabe
  • Patent number: 9298127
    Abstract: A developing device includes a developer bearer and a regulation member. The developer bearer bears developer on a surface thereof. The developer bearer is rotatable forward and in reverse. The regulation member is disposed in contact or non-contact with the surface of the developer bearer to regulate amount of the developer on the developer bearer. In a non-development period, when the developer bearer rotates in a direction of reverse rotation opposite to a direction of forward rotation in which the developer bearer rotates in a development period, the developer bearer stops a series of rotating operations after the developer bearer rotates in the direction of forward rotation as a last rotating operation. A total rotation amount of forward rotation is set to be greater than a total rotation amount of reverse rotation in the series of rotating operations.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: March 29, 2016
    Assignee: Ricoh Company, Ltd.
    Inventors: Yoshio Sakagawa, Shin Murayama, Yasuhide Matsuno