Abstract: Multi-layer electrochromic structures comprising an anodic electrochromic layer comprising a lithium nickel oxide composition on a first substrate, the anodic electrochromic layer comprising lithium, nickel and a Group 5 metal selected from niobium, tantalum and a combination thereof, wherein (i) the atomic ratio of lithium to the combined amount of nickel, niobium and tantalum in the anodic electrochromic layer is at least 0.4:1, respectively, (ii) the atomic ratio of the combined amount of niobium and tantalum to the combined amount of nickel, niobium and tantalum in the anodic electrochromic layer is at least about 0.025:1, respectively, and (iii) the anodic electrochromic layer exhibits an interplanar distance (d-spacing) of at least 2.5 ? as measured by X-ray diffraction (XRD), comprises at least 0.05 wt. % carbon, and/or has a coloration efficiency absolute value of at least 19 cm2/C.

Abstract: An electrochromic device includes an electrochromic stack. Openings are formed in the electrochromic stack that allow light to pass through without being tinted.

Abstract: Thin-film devices, for example, multi-zone electrochromic windows, and methods of manufacturing are described. In certain cases, a multi-zone electrochromic window comprises a monolithic EC device on a transparent substrate and two or more tinting zones, wherein the tinting zones are configured for independent operation.

Abstract: The embodiments described herein provide an electrochromic device. In an exemplary embodiment, the electrochromic device includes (1) a substrate and (2) a film supported by the substrate, where the film includes transparent conducting oxide (TCO) nanostructures. In a further embodiment, the electrochromic device further includes (a) an electrolyte, where the nanostructures are embedded in the electrolyte, resulting in an electrolyte, nanostructure mixture positioned above the substrate and (b) a counter electrode positioned above the mixture. In a further embodiment, the electrochromic device further includes a conductive coating deposited on the substrate between the substrate and the mixture. In a further embodiment, the electrochromic device further includes a second substrate positioned above the mixture.

Abstract: A variable reflectance mirror reflective element for a vehicular exterior rearview mirror assembly includes a front substrate and a rear substrate, with an electrochromic medium disposed therebetween. A mirror reflector is disposed at a third surface of the rear substrate and includes a stack of thin films and has a sheet resistance of less than about 5 ohms per square. Light that reflects off of the mirror reflector and passes through the electrochromic medium and the front substrate exhibits a substantially non-spectrally selective reflectance characteristic to a person viewing the exterior mirror reflective element when no voltage is applied to the electrochromic medium. At least a portion of the mirror reflector extends out under the seal towards a perimeter edge of the rear substrate. An electrical connection, which may include a conductive epoxy, is made to the portion of the mirror reflector outboard of the perimeter seal.

Abstract: The invention is directed to an electrophoretic fluid which can improve display performance such as switching speed, vertical bistability and the ghosting effect, and also reduce display defects. The electrophoretic fluid comprises charged pigment particles dispersed in a mixture of isoparaffins.

Abstract: An electro-optic display comprising at least two separate layers of electro-optic material, with one of these layers being capable of displaying at least one optical state which cannot be displayed by the other layer. The display is driven by a single set of electrodes between which both layers are sandwiched, the two layers being controllable at least partially independently of one another. Another form of the invention uses three different types of particles within a single electrophoretic layer, with the three types of particles being arranged to shutter independently of one another.

Abstract: An electronic ink display of a device has a set of charged pigment particles suspended within a fluid. The charged pigment particles and the fluid are positioned between a first surface and a second surface of the display. An electrical charge is able to be applied that causes the charged pigment particles to move within the fluid. Movement of the charged particles results in the charged pigment particles being rearranged to form text or images viewable through the first surface. A luminescent substance is positioned between the first surface and the second surface. When activated, the luminescent substance emits visible light that is transmitted through the first surface.

Abstract: According to one embodiment, a liquid crystal optical device includes an optical unit and a control unit. The optical unit includes a first substrate unit, a second substrate unit, and a liquid crystal layer. The first substrate unit includes a first substrate having a first surface, and first elongated electrodes provided on the first surface. The second substrate unit includes a second substrate having a second surface opposing the first surface, first opposing electrodes provided between the first and second substrates and a second opposing electrode provided between the first and second substrates. The liquid crystal layer is provided between the first and second substrate units. The control unit is electrically connected to the first elongated electrodes, and the first and second opposing electrodes. The control unit implements a first operation of forming a first voltage distribution and a second operation of forming a second voltage distribution.

Abstract: Methods and apparatus for optimising, improving or maximising the efficiency of an acousto-optic lens (AOL) system are disclosed. Data relating to efficiency is used to select drive frequencies of the acousto-optic devices (AODs) forming the AOL, thereby both increasing the usable field of view and reducing a prior art patternation problem. Preferably according to the invention, drive frequencies are selected that maximise efficiency of transmission through the AOL. When scanning, the centre of each scan is optimised to be of maximum efficiency.

Abstract: A wavelength convertor includes a beam splitter which splits a pulsed laser beam at wavelength ?p into a first higher power pulse portion and a second low power pulse portion. A fiber super continuum (SC) generator is coupled to receive the second pulse portion which converts the second pulse portion into a SC pulse having a bandwidth of >100 nm including a narrow spectral portion at wavelength ?s. An optical parametric amplifier (OPA) having a periodically poled material is included with domains arranged to provided quasi-phase matching for amplification at ?s and pumping at ?p. The arrival of the SC pulse portion at ?s and the first pulse portion at the OPA is synchronized to overlap in time. The OPA is seeded by the SC pulse portion at ?s and pumped by the first pulse portion to provide an amplified OPA seed at ?s.

Abstract: A high-speed terahertz analog-to-digital converter (ADC) is provided. The ADC is comprised of an interferometer, a modulator and an array of detectors. The interferometer is configured to receive a carrier signal and guide a spoofed surface plasmon polariton (SSPP) wave in each of its two arms. The SSPP waves are emitted from the free end of each arm into a propagation space and combined in the space to form an interference wave. The modulator modulates the carrier signal in at least one of two arms with a modulating signal, where the radiation pattern of the interference wave in a far field of the propagation space is shifted in accordance with the amplitude of the modulating signal. The array of detectors are spatially separated from the interferometer by the propagation space and arranged to receive the interference wave.

Abstract: A control apparatus controls an imaging apparatus that includes a focus detection unit configured to detect a focus state of an image forming optical system. The control apparatus includes a collectively setting unit configured to read initial setting values corresponding to a selected operation mode from a storage unit, and set setting values of a plurality of setting items to initial setting values, and a setting value changing unit configured to individually change setting values of the setting items set by the collectively setting unit and store the changed setting values in the storage unit. An operation of the focus detection unit is controlled by the operation mode in which the setting values have been changed by the setting value changing unit.

Abstract: A composite plastic member includes a first stacked body comprised of a plurality of chromium layers stacked on a plastic substrate; and a second stacked body comprised of a plurality of chromium nitride layers stacked on the first stacked body. Each of the first and second stacked bodies is formed such that a lower-hardness layer having a lower hardness than upper and lower layers which contact with and sandwich the lower-hardness layer therebetween and a higher-hardness layer having a higher hardness than upper and lower layers which contact with and sandwich the higher-hardness layer therebetween are alternately stacked in a stacking direction; and a thickness of a higher-hardness chromium nitride layer is not more than 40% of a thickness of a lower-hardness chromium nitride layer in the second stacked body. The composite plastic member has high wear resistance and satisfactory sliding performance, and the conductivity and excellent outer appearance.

Abstract: An electronic apparatus includes a first unit, a second unit held by the first unit, and a third unit held by the first unit via the second unit. The first unit has a first rotation regulating portion that regulates the rotation of the second unit in a first direction, a second rotation regulating portion that regulates the rotation of the third unit in the first direction, and a third rotation regulating portion that regulates the rotation of the second unit and the third unit in a second direction opposite to the first direction.

Abstract: Disclosed herein is a rig for multi-camera photographing. The rig for multi-camera photographing includes a cover frame, a center base plate fixed and installed in a center line over the cover frame, and a left rotational movement plate and a right rotational movement plate disposed on the left and right sides of the center base plate and disposed in such a way as to rotatably move around rotational movement shafts protruded over the cover frame.

Abstract: A movable-mirror drive mechanism of a camera includes a main mirror held by a main-mirror holding frame rotatable between a viewfinder light-guiding position and a retracted position; a sub-mirror held by a sub-mirror holding frame that is rotatably supported by the main-mirror holding frame, wherein the sub-mirror holding frame is positioned in a jutting-out position when the main mirror is in the viewfinder light-guiding position, and the sub-mirror holding frame is retracted with the main mirror when the main mirror is in the retracted position; and a vibration control member which rotates in association with rotation of the main-mirror holding frame and holds the sub-mirror holding frame in the jutting-out position to prevent the sub-mirror holding frame from rotating toward the sub-mirror retracted position when the main mirror rotates to the viewfinder light-guiding position.

Abstract: This invention provides a system and method for projection of an image on any surface, employing a lightweight (typically polymer) housing that removably encloses a slide holder allowing for quick change of the slide. The housing includes a central channel, and allows for the mounting of a conventional camera-mounting-base lens at a front end and the insertion of a standard form factor photographic strobe/flash in the rear end. Light from the strobe passes down the channel, through the slide and is projected by the lens onto the surface. This housing is mountable on a standard tripod. The housing is straightforward to use, with the strobe effect being provided directly by the strobe unit. The system and method avoids the need of a camera body and desirably enables the user to employ one or more lenses, which are often less expensive and already available in a photographer's equipment inventory.

Abstract: With a view to providing a light source device and a projector which can rearrange the light collection balance even in the event that the number of illuminated light emitting elements changes as a result of a change in the environment where they are used or in the specifications thereof, a light source device includes a holder 79 having element accommodating portions 79a which each accommodate one of a plurality of light emitting elements and an adjusting portion for moving mechanisms including an optical system such as reflection mirrors and the holder 79 which translate in parallel a center of a whole of optical axes of pencils of light emitted from the plurality of light emitting elements when light is not emitted from part of the plurality of light emitting elements.

Abstract: A projector includes a light source unit, a light modulator that modulates light exited from the light source unit, a polarizer or a wave plate provided on the light modulator, a cooling unit that supplies cooling air to the light modulator, and a turbulent flow plate disposed between the light modulator and the polarizer or the wave plate in a path along which the cooling air from the cooling unit flows toward the light modulator, the turbulent flow plate having a fin that tapers from a base end toward a tip.

Abstract: A light source device includes a plurality of solid-state light sources, and a base member on which the plurality of solid-state light sources are provided, wherein each of the solid-state light sources includes a stem on which a light-emitting element is provided and terminals connected to the light-emitting element, and the base member includes a hole portion into which one of the terminals is inserted and a planar portion that is in contact with the stem.

Abstract: A projector includes a plurality of light sources, an integrator lens and an overlapping lens, a light guide optical system, a light control device, a light modulation device, and a projection optical system, the light control device includes a pair of light-blocking members opposed to each other across a light path of the light emitted from the light sources in one direction in which the plurality of partial areas is arranged on the integrator lens, and a control device adapted to move the light-blocking members into and out of the light path, and the control device moves the pair of light-blocking members into and out of the light path so that the light entering the overlapping lens has a shape with a symmetric property in accordance with lighting and extinction states of the plurality of light sources.

Abstract: A light emitting device includes a laminated body having an active layer, a first cladding layer, and a second cladding layer, the active layer constitutes an optical waveguide, the optical waveguide includes a first portion connecting a first exit section and a first reflecting section to each other, a second portion connecting the first reflecting section and a second reflecting section to each other, and a third portion connecting the second reflecting section and a second exit section to each other, and a current density in the first portion and a current density in the third portion are higher than a current density in the second portion.

Abstract: A wavelength conversion and filtering module that includes a plurality of optical regions is provided. The optical regions are adapted to move, and at least one of the optical regions includes a reflection unit, a wavelength conversion unit, a prism sheet, and a filter unit. The wavelength conversion unit is located between the reflection unit and the prism sheet. The prism sheet is located between the wavelength conversion unit and the filter unit. A light source system is also provided.

Abstract: An optical system for LED light projectors utilizing a Fresnel or planar-convex lens that permits a considerable energy saving and an elevated quality of the illumination either in FLOOD or SPOT mode is described. The optical system has a mirror having a particular three-dimensional surface constructed by rotating a parabola and taking sectors so as to obtain a surface that is more closed than a pure parabola. A reflecting optical system for projectors utilizing a Fresnel or planar-convex lens is also described.

Abstract: An image capture device includes: a plurality of microlenses; an image capture element in which a plurality of element groups including a plurality of photoelectric conversion elements that receive light fluxes and that output image signals are arranged; a generation unit that extracts a plurality of region image signals respectively corresponding to a plurality of different partial regions upon the pupil surface of the photographic optical system, and that generates a plurality of sets of image data corresponding to the partial regions as a plurality of sets of viewpoint image data whose viewpoint positions are different with each other; and a reception unit that receives a viewpoint number selection operation to select a number of viewpoints; wherein the generation unit generates the sets of viewpoint image data by extracting the region image signals whose number is equal to a number of selected viewpoints.

Abstract: A method and system for fracturing or mask data preparation is disclosed in which a desired substrate pattern for a substrate is input. A plurality of charged particle beam shots is then determined which will form a reticle pattern on a reticle, where the reticle pattern will produce a substrate pattern on the substrate using an optical lithography process, wherein the substrate pattern is within a predetermined tolerance of the desired substrate pattern. A similar method and a similar system for forming a pattern on a reticle are also disclosed.

Abstract: A lithography system for an extreme ultra violet (EUV) mask is provided. The lithography system includes a coupling module. The coupling module includes at least one mask contact element configured to touch a peripheral area of the EUV mask. The lithography system also includes an ammeter having an end electrically connected to the EUV mask through the at least one mask contact element and another end connected to a ground potential. The ammeter includes a sensor configured to measure a current conducting from the EUV mask to the ground potential and a compensation circuit configured to provide a compensation current that is opposite to the current measured by the sensor.

Abstract: The invention is directed to a mask plate, an exposure system comprising a mask plate and an exposing method. The mask plate comprises a light transmitting region, a light shielding region, and a light reflecting region for reflecting exposure light to the light shielding region, with the pattern of the light from the transmitting region and reflecting region corresponding to the pattern of the region exposed to a first and a second substrate respectively. When exposure light irradiates on the mask plate, it passes through the light transmitting region and exposes the first substrate. The light reflecting region reflects the exposure light to a principal reflection structure which further reflects the light for exposing the second substrate. The first and second substrate may be exposed via the same mask plate to minimize waste of exposure light to save production time and efficiency.

Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.

Abstract: A reticle and a method of fabricating the reticle are provided. In various embodiments, the reticle includes a substrate, a patterned first attenuating layer, a patterned second attenuating layer, and a patterned third attenuating layer. The patterned first attenuating layer is disposed on the substrate. The patterned second attenuating layer is disposed on the patterned first attenuating layer. The patterned third attenuating layer is disposed on the patterned second attenuating layer. A first part of the patterned first attenuating layer, a first part of patterned second attenuating layer, and the patterned third attenuating layer are stacked on the substrate as a binary intensity mask portion.

Abstract: A reflective photomask blank, a reflective photomask and an integrated circuit device manufactured by using a reflective photomask, include a multi-layered reflection layer; a capping layer on the multi-layered reflection layer and including a first transition metal; a passivation film contacting at least a portion of the capping layer on a side opposite to the multi-layered reflection layer and including a second transition metal and a nitrogen (N) atom; and a light absorption pattern covering a portion of the capping layer.

Abstract: A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).

Abstract: There is provided a pellicle having a frame 12, a film 11 and an adhesive 13 for bonding the film 11 to the frame 12, and this adhesive 13 is a silicone compound having a low outgassing tendency and high heat resistance; in a better mode case, it can maintain its adhesive strength at temperatures 100-200 degrees C. and it exhibits results of TML being 1.0% or lower and CVCM being 0.1% or lower when tested in accordance with ASTM E595-93; thus this pellicle is useful for EUV light exposure lithography.

Abstract: A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.

Abstract: A system and method for depositing a photoresist and utilizing the photoresist are provided. In an embodiment a deposition chamber is utilized along with a first precursor material comprising carbon-carbon double bonds and a second precursor material comprising repeating units to deposit the photoresist onto a substrate. The first precursor material is turned into a plasma in a remote plasma chamber prior to being introduced into the deposition chamber. The resulting photoresist comprises a carbon backbone with carbon-carbon double bonds.

Abstract: The present specification provides a photosensitive resin composition comprising an alkali-soluble binder, a crosslinkable compound, a photopolymerization initiator, a solvent, a coloring agent and an epoxy adhesion promoter. The photosensitive resin composition has excellent insulating properties and light-shielding properties and shows excellent chemical resistance in an etching process and a stripping process. Thus, the photosensitive resin composition can be formed into a thin bezel layer having a gradual taper, and thus can provide an integrated touch sensor that makes it possible to prevent short circuits from occurring in metal wiring and minimize any decrease in resistance resulting from high-temperature processing.

Abstract: A resist composition including a polymeric compound having a structural unit derived from an acrylate ester containing a lactone-containing cyclic group having a group represented by general formula (a0-r-1) on the side chain and optionally having the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent: in formula (a0-r-1), Ra3 and Ra4 each independently represents a hydrogen atom or a non-aromatic hydrocarbon group optionally having a substituent, provided that Ra3 and Ra4 are optionally mutually bonded to form a ring with the carbon atom bonded to Ra3 and the nitrogen atom bonded to Ra4; and * represents a valence bond.

Abstract: Described herein is a solution-processable composition for preparing a photopatternable material. The solution-processable composition generally includes (a) an oligomeric siloxane component that includes, based on its total weight, between about 40% by weight and about 100% by weight one or more cage-structured polyhedral oligomeric silsesquioxanes that are functionalized with one or more crosslinkable moieties such as cycloaliphatic epoxy moieties, (b) a polymerization initiator; (c) one or more thermosettable polymers that collectively are present in an amount between about 1% by weight and about 20% by weight based on the total weight of the oligomeric siloxane component; and (d) a solvent.

Abstract: The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are resistant to thermo-oxidative chain degradation.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: A Wynn-Dyson imaging system with reduced thermal distortion is disclosed, wherein the reticle and wafer prisms are made of glass material having a coefficient of thermal expansion of no greater than about 100 ppb/° C. The system also includes a first IR-blocking window disposed between the reticle and the reticle prism, and a second matching window disposed between the wafer and the wafer prism to maintain imaging symmetry. The IR-blocking window substantially blocks convective and radiative heat from reaching the reticle prism, thereby reducing the amount of thermally induced image distortion in the reticle image formed on the wafer.

Abstract: In the present invention, photolithography processing is performed on a substrate to form a resist pattern over the substrate, and a treatment agent is caused to enter a side surface of the resist pattern and metal is caused to infiltrate the side surface of the resist pattern via the treatment agent, the formed resist pattern has a high etching selection ratio with respect to a film to be treated on the substrate so as to suppress a so-called pattern collapse, therefore.

Abstract: A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.

Abstract: An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.

Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.

Abstract: According to one embodiment, a spatial light modulator unit is used in the illumination optical system for illuminating an illumination target surface with light from a light source and comprises: a spatial light modulator with a plurality of optical elements arrayed in a predetermined plane and controlled individually; a spatial light modulation element which applies spatial light modulation to the incident light from the light source and which makes rays of intensity levels according to positions of the respective optical elements, incident on the plurality of optical elements; and a control unit which individually controls the plurality of optical elements on the basis of information about the intensity levels of the rays incident on the respective optical elements.

Abstract: A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimization criterion. These control commands are applied to the optical elements, before the mask is illuminated.

Abstract: A deflection mirror (1, 501, etc.) for a microlithography projection exposure apparatus for illuminating an object field in an object plane of the projection exposure apparatus (1067) using the deflection mirror with grazing incidence. This deflection mirror has a substrate (3, 503, etc.) and at least one layer system (5, 505, etc.), and during operation light impinges on said mirror at a multiplicity of angles of incidence, wherein the layer system is designed such that, for light having a wavelength of less than 30 nm, for an angle of incidence of between 55° and 70°, the variation of the reflectivity is less than 20%, in particular less than 12%.

Abstract: To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus is provided with a base material, a first holding portion formed on the base material for holding the substrate, and a second holding portion formed on the base material for holding a plate member by surrounding the circumference of a processing substrate held by the first holding portion. The second holding portion holds the plate member so as to form a second space on the side of the rear surface of the plate member. On the rear surface of the plate member, an absorbing member is arranged for absorbing the liquid entered from a gap between the substrate held by the first holding portion and the plate member held by the second holding portion.