Abstract: The invention relates to a stainless steel intended for cutting tool bodies or holders for cutting tools and a cutting tool body made of the stainless steel. The stainless steel includes the following, in weight %: C 0.14-0.25, N 0.06-0.15, Si 0.7-1.2, Mn 0.3-1.0, Cr 12-15, Ni 0.3-0.8, Mo 0.05-0.4, V 0.05-0.4, Al 0.001-0.3, and optional components and balance Fe apart from impurities.

Abstract: There is provided a precipitation hardening stainless steel powder including, in percentage by mass: Si: ?1.0%; Mn: ?1.8%; Ni: 3.0 to 8.5%; Cr: 12.0 to 20.0%; Mo: 0.1 to 2.5%; Cu: 1.0 to 5.0% and/or Ti+Al: 1.0 to 5.0%; Nb+Ta?5C or Nb?5C; N?350 ppm; and the balance being Fe and incidental impurities. A sintered compact fabricated from the steel powder has a martensite content of 90% or more. The precipitation hardening stainless steel powder provides a sintered compact that exhibits high strength after aging.

Abstract: An essentially lead free steel having, in percent by weight (wt-%): Carbon: 0.39-0.43%; Manganese: 0.75-1.00%; Silicon: 0.15-0.35%; Chromium: 0.80-1.05%; Molybdenum: 0.15-0.25%; at least one of Tellurium: 0.003-0.090 wt-%, Selenium: 0.080-0.2 wt-%, Sulfur: 0.065-0.09% wt-%, and Bismuth: 0.03-0.1 wt-%; and the balance being Fe and normally occurring scrap steel impurities. A method for manufacturing an essentially lead free steel by subjecting a hot-rolled steel product to a heat treatment in which the steel product is subjected to a first temperature for a first duration; the steel product is subjected to a second temperature for a second duration, wherein the second temperature is less than the first temperature; and the steel product is subjected to a third temperature for a third time period, wherein the third temperature is greater than the second temperature; and cooling the steel product. After the heat treatment the steel is cold worked to the desired size.

Abstract: Metal ingots for forming single-crystal shape-memory alloys (SMAs) may be fabricated with high reliability and control by alloying thin layers of material together. In this improved method, a reactive layer (e.g., aluminum) is provided in thin flat layers between layers of other materials (e.g., copper and layers of nickel). When the stacked layers are vacuum heated in a crucible to the melting temperature of the reactive layer, it becomes reactive and chemically bonds to the other layers, and may form eutectics that, as the temperature is further increased, melt homogeneously and congruently at temperatures below the melting temperatures of copper and nickel. Oxidation and evaporation are greatly reduced compared to other methods of alloying, and loss of material from turbulence is minimized.

Abstract: An aluminum alloy contains, in mass percent, Zn: 2.5% or more and less than 5.0%, Mg: 2.2% or more and 3.0% or less, and Ti: 0.001% or more and 0.05% or less, Cu: 0.10% or less, Zr: 0.10% or less, Cr: 0.03% or less, Fe: 0.30% or less, Si: 0.30% or less, and Mn: 0.03% or less, the remainder being composed of Al and unavoidable impurities. In addition, the tensile strength is 380 MPa or more; the electrical conductivity is 38.0% IACS or more; and the metallographic structure is composed of a recrystallized structure.

Abstract: An article includes a silicon oxycarbide-based layer that has Si, O, and C in a covalently bonded network. The silicon oxycarbide-based layer has first and second opposed surfaces. A calcium-magnesium alumino-silicate-based layer is interfaced with the first surface of the silicon oxycarbide-based layer.

Abstract: A thermal barrier coating includes a microstructure and a composition including: a ceramic based compound comprising gadolinia and zirconia. The coating includes a nano-structure having a porosity of at most 50% by volume of the coating.

Abstract: The valve seat includes an iron-based sintered alloy subjected to oxidation treatment, which is obtained by subjecting an iron-based sintered alloy including: 4 mass % to 15 mass % of Co particles; and hard particles each containing at least one compound of an intermetallic compound, a carbide, a silicide, a nitride, or a boride that has one or more kinds of elements selected from group 4a to 6a elements in a periodic table, and having a hardness of from 600 HV to 1,600 HV to oxidation treatment, and which has an oxide mainly including triiron tetraoxide (Fe3O4) and cobalt oxide (CoO) formed on a surface and in an interior of the iron-based sintered alloy. The iron-based sintered alloy subjected to oxidation treatment has an area ratio of the oxide of from 5% to 25% in a cross section thereof in a state prior to installation on the cylinder head.

Abstract: A mask plate, a method for fabricating the same, a display panel and a display device are disclosed. The mask plate includes a shielding plate having an opening; the opening is surrounded by side sections along a thickness direction of the shielding plate. The opening includes: a notch disposed at an intersecting region between at least some of the side sections and a surface of the shielding plate, wherein an area of the opening close to the surface of the shielding plate is larger than that of the opening away from the surface of the shielding plate. The notch increases an area of a marginal region of a film layer evaporated on a base substrate and increases a flatness of the marginal region, thereby decreasing the possibility of fracture of the metal film layer to be formed thereafter due to a high step and increasing a defect-free of the products.

Abstract: The invention concerns a two- or three-dimensional body having an anti-ice coating comprising at least one rare earth metal oxide, a method for the production thereof, and the use of this anti-ice coating for preventing the formation of ice on, or for reducing the adherence of ice to, at least one surface of the two- or three-dimensional body or for lowering the freezing point.

Abstract: A method of preparing an ultra-flat metal surface involves providing a layer of a crystalline metallic material on an ultra-flat substrate surface that is relatively harder than the metallic material layer and then impinging the metallic material layer with incoming metal atoms that are deposited as an additive crystalline layer thereon, wherein at least a lattice constant of the additive crystalline layer is different enough from a lattice constant of the crystalline metallic material layer resulting in a reduction of roughness of the surface of the metallic material layer adjacent to the substrate surface. The metallic material layer having an ultra-flat surface then is separated by template stripping or other technique from the substrate surface for further use of the ultra-flat surface.

Abstract: The present invention provides a sputtering target configured from tungsten carbide or titanium carbide, characterized in having a purity of 4N or higher and a density of 98% or higher. Specifically, an object of the present invention is to provide a sputtering target configured from tungsten carbide or titanium carbide, wherein the purity is maintained high, and the target has a high density and a uniform and high hardness and is capable of stable high speed deposition and less generation of particles.

Abstract: Methods for finishing a sputtering target to reduce particulation and to reduce burn-in time are disclosed. The surface of the unfinished sputtering target is blasted with beads to remove machining-induced defects. Additional post-processing steps include dust blowing-off, surface wiping, dry ice blasting, removing moisture using hot air gun, and annealing, resulting in a homogeneous, ultra-clean, residual-stress-free, hydrocarbon chemicals-free surface.

Abstract: Disclosed is a multi-layer coating formed by repeatedly and sequentially laminating first coating layers composed of TiN and second coating layers composed of TiAgN on a surface, and a method of forming the same.

Abstract: A rotating magnetron sputtering cathode apparatus comprising a radio frequency power supply, a power delivery assembly, a cylindrical rotating cathode, a shaft and a drive motor, wherein the power delivery assembly comprises a magnetic field source positioned within the cathode and an electrode extending within said cathode to transmit radio frequency energy to target material on the outer surface of the cathode. The electrode is electrically isolated from the shaft, and is formed from non-ferrous materials, and the shaft is mechanically connected to the cathode such that they remain electrically isolated while the cathode rotates about the magnetic field source and a portion of the electrode. The power supply is adapted to supply radio frequency energy at frequencies of 1 MHz or higher and is electrically connected to the electrode.

Abstract: An apparatus may include an extraction assembly comprising at least a first extraction aperture and second extraction aperture, the extraction assembly configured to extract at least a first ion beam and second ion beam from a plasma; a target assembly disposed adjacent the extraction assembly and including at least a first target portion comprising a first material and a second target portion comprising a second material, the first target portion and second target portion being disposed to intercept the first ion beam and second ion beam, respectively; and a substrate stage disposed adjacent the target assembly and configured to scan a substrate along a scan axis between a first point and a second point, wherein the first target portion and second target portion are separated from the first point by a first distance and second distance, respectively, the first distance being less than the second distance.

Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

Abstract: Arranged in the middle of an upper communication sleeve 21 is a first shutter 25 that is moved back and forth in a horizontal open-close direction to open and close a first communication path 23 that makes the inside of a first bobbin chamber 11 and the inside of a furnace body 3 communicate with each other. Arranged in a middle of a lower communication sleeve 53 is a second shutter 57 that is moved back and forth in a horizontal open-close direction to open and close a second communication path 55 that makes a second bobbin chamber 33 and the inside of the furnace body 3 communicate with each other.

Abstract: A group of inventions is related to process equipment to process surfaces in mass production, particularly, vacuum process equipment to apply thin film coatings with set optical, electrical and other parameters. The technical result is to ensure a capability of processing flexible large substrates, as well as small substrates with a high degree of coating uniformity, with an ability to utilize a wide range of technologies and process devices, as well as to have a highly effective useful operation of applied materials. The proposed technical result is obtained by a method of applying thin film coatings on substrates, which are placed on rotating drums, which consequently move along the processing zones with the same constant linear and angular speeds. Furthermore, a ratio between the linear and angular speeds of the drum is selected so that each surface point of the drum will complete at least two full revolutions while passing through the processing zone.

Abstract: A hydrophobic structure includes a base and a hydrophobic layer. The base defines a plurality of gaps. The hydrophobic layer is formed on an outer surface of the base and inner surfaces of the base surrounding each gap.

Abstract: A mask frame assembly and a manufacturing method of the same are provided. The mask frame assembly includes a frame unit having a plurality of frames to form an opening, a deposition mask extended in a first direction and fixed to the frame unit, and a gap adjusting unit installed between one frame and another frame disposed adjacent to the one frame among the plurality of frames, wherein the gap adjusting unit adjusts a distance between the one frame and the another frame.

Abstract: A method of making a fibrous part is provided. The method may comprise forming a porous structure with an annular geometry. A first entrance channel and a second entrance channel may be formed with the entrance channels defined by a surface of the preform. The entrance channels may also extend in a radial direction from an inner diameter of the annular porous structure partially across the surface. An exit channel may be formed between the entrance channels and defined by the surface. The exit channel may extend in a radial direction from an outer diameter of the annular porous structure partially across the surface.

Abstract: The present invention discloses the method for forming the coating having the composite coating particle size and the coating formed thereby, comprising the steps of: receiving, from a powder supply portion, a plurality of powders within a first powder particle size range, and transporting the powders using a transport gas; and forming a coating in which a plurality of first particles within a first coating particle size range and a plurality of second particles within a second coating particle size range, which is larger than the first coating particle size range, by causing the transported powders to collide with a substrate inside a process chamber at the speed of 100 to 500 m/s so as to be pulverized.

Abstract: In a method of forming a diamond film, substrate, or window, a silicon substrate is provided and the diamond film, substrate, or window is CVD grown on a surface of the silicon substrate. The grown diamond film, substrate, or window has an aspect ratio ?100, wherein the aspect ratio is a ratio of a largest dimension of the diamond film, substrate or window divided by a thickness of the diamond film. The silicon substrate can optionally be removed or separated from the grown diamond film, substrate, or window.

Abstract: A tool has a main part of hard metal, cermet, ceramic, steel, high-speed steel, and a single or multilayer wear protection coating applied onto the main part by CVD and which has a thickness from 3 ?m to 25 ?m. The wear protection coating has at least one Ti1-xAlxCyNz layer with stoichiometric coefficients 0.70?x<1.0?y<0.25 and 0.75?z<1.15 and a thickness from 1.5 ?m to 17 ?m. The T1-xAlxCyNz layer has a lamellar structure with lamellae with thickness of no more than 150 nm, preferably no more than 100 nm, particularly preferably no more than 50 nm. Lamellae are made of periodically alternating regions of the Ti1-xAlxCyNz layer with alternatingly different stoichiometric proportions of Ti and Al, having the same crystal structure (crystallographic phase), and the Ti1-xAlxCyNz layer has at least 90% vol. % of face centered cubic (fcc) crystal structure.

Abstract: Clamping assemblies for sealing an annular chamber and reaction chamber of a reactor system are disclosed. The clamping assemblies may include actuators that are symmetrically arranged in two or more independently controllable groups of actuators.

Abstract: A semiconductor substrate processing apparatus includes a vacuum chamber having a processing zone in which a semiconductor substrate may be processed, a process gas source in fluid communication with the vacuum chamber for supplying a process gas into the vacuum chamber, a showerhead module through which process gas from the process gas source is supplied to the processing zone of the vacuum chamber, and a substrate pedestal module. The substrate pedestal module includes a platen made of ceramic material having an upper surface configured to support a semiconductor substrate thereon during processing, a stem made of ceramic material having an upper stem flange that supports the platen, and a backside gas tube made of ceramic material that is located in an interior of the stem.

Abstract: The invention provides an improved method for producing cathode diffusion barrier layer, and a SOFC with high efficiency and longevity. It comprises depositing a pure ceria or aliovalently doped ceria layer, by ALD, on the electrolyte layer of the sintered half cell. The surface of a electrolyte onto which film is to be deposited is exposed to a dose of vapor from one or more lanthanide first precursors. Any excess of unreacted vapor from that precursor is removed. Next, a vapor dose of the second precursor is brought to the surface and allowed to react. A second purge completes the ALD cycle, which is repeated to build up thicker films. This ceria layer forms a cathode diffusion barrier layer on top of which a cobaltite based cathode layer is applied by screenprinting, and the cathode diffusion barrier layer and cathode layer are heated together to form a SOFC.

Abstract: Described herein are systems and methods using same for the storage and delivery of chemical precursors that are used in the manufacture of a semiconductor device. In one aspect, the storage system comprises the chemical precursors and a container and the systems have an inlet jet design. The chemical precursor has a low vapor pressure less than about 50 Torr-absolute at container temperature set for delivery. The delivery system further contains a carrier gas. The inlet jet design can deliver the carrier gas at a certain pressure and a certain low rate to impinge upon the surface of the chemical precursors to produce a vapor or droplets of the chemical precursor. The vapor or droplets of the chemical precursor then combine with the carrier gas to provide a precursor-laden fluid stream which will be passed to and used in the processing tool.

Abstract: A chemical vapor deposition apparatus includes: a reaction chamber in which deposition materials are housed a gas supply tube provided in the reaction chamber and a rotary drive device that rotates the gas supply tube about a rotation axis. A an inside of the gas supply tube is divided into a first gas flowing section and a second gas flowing section both of which extend along the rotation axis. A first gas ejection port ejects a first gas flowing in the first gas flowing section into the reaction chamber, and a second gas ejection port ejects a second gas flowing in the second gas flowing section into the reaction chamber. The first port and the second port form an ejection port pair in a plane perpendicular to the rotation axis.

Abstract: An apparatus and a method for a thermal treatment, in particular a coating of a substrate, includes a heating device which is regulated by a regulating device which interacts with a first temperature sensor device. In order to counteract a temperature drift of the first temperature sensor device, a second temperature sensor device is used to detect the temperature drift and recalibrate the first temperature sensor device. The second temperature sensor device is used to measure the surface temperature of a substrate. This measured value is compared with a desired value, and if the desired value deviates from the measured actual value, a correction factor is formed and is used to apply the measured value used to regulate the heating device to the first temperature sensor device in order to bring the actual temperature value measured by the second temperature sensor device closer to the associated desired temperature value.

Abstract: Tubulars are immersed in electroless nickel coating solution to coat the tubulars. Prior to the coating step the tubulars are blasted with a clean medium and washed and rinsed in alkaline solution. The tubulars are arranged in a bunk for washing, rinsing and coating. LLDPE stretch wrap applied to outer portions of the tubulars prevents coating of the outer portions. The tubulars are electrically separated from the bunk and the coating solution tank, and the tank is provided with anodic protection to prevent coating of the tank. The bunk is provided with a header assembly to provide solution flow through the tubulars via nozzles on the header assembly in addition to flow caused by the vortex effect created by velocity of fluid exiting the nozzles. The bunk is arranged in the solution tank so that the tubulars are at an angle to horizontal to efficiently remove hydrogen gas. Solution flow to the header assembly is filtered to remove particulates.

Abstract: A method for metalizing a polymer substrate and a polymer article prepared thereof. First, a polymer substrate having a base polymer and at least one metal compound dispersed in the base polymer is provided. Then, a surface of the polymer substrate is irradiated with an energy beam such that a water contact angle of the surface of the polymer substrate is at least 120°. The surface of the polymer substrate is then subjected to chemical plating.

Abstract: A method for making electrically-conductive articles utilizes a non-aqueous metal catalytic composition that includes: (a) a silver complex comprising reducible silver ions, (b) a silver ion photoreducing composition, (c) a photocurable component, non-curable polymer, or combination of a photocurable component and a non-curable polymer, and (d) nanoparticles of a semi-conducting metal oxide in an amount of at least 0.1 weight %. This composition can be disposed on a substrate, uniformly or in a patternwise fashion. The composition can be dried and then exposed to suitable radiation to reduce the reducible silver ions to silver particles that can then be electrolessly plated with a metal to provide an electrically-conductive article.

Abstract: A method for plating a work piece. An electroless layer of material is applied to the work piece using an electroless plating process. The method includes creating a barrier in electrical conductivity in the work piece to divide the work piece into a first segment and a second segment which are substantially electrically insulated from one another, prior to electroplating the work piece. A plurality of methods are disclosed for dividing the work piece into the first and second segments.

Abstract: The present invention provides corrosion inhibiting compositions that incorporate at least one bis-imidazoline compound. In the practice of the present invention, a tetramine admixture enriched with respect to linear tetramine is used to prepare the bis-imidazoline compound. “Enriched” means at least 70 weight percent and up to 100% of the tetramine species included in the admixture includes a linear tetramine such as L-TETA.

Abstract: A photoelectrode (100) of the present invention includes a conductive layer (12) and a photocatalytic layer (13) provided on the conductive layer (12). The conductive layer (12) is made of a metal nitride. The photocatalytic layer (13) is made of at least one selected from the group consisting of a nitride semiconductor and an oxynitride semiconductor. When the photocatalytic layer (13) is made of a n-type semiconductor, the energy difference between the vacuum level and the Fermi level of the conductive layer (12) is smaller than the energy difference between the vacuum level and the Fermi level of the photocatalytic layer (13). When the photocatalytic layer (13) is made of a p-type semiconductor, the energy difference between the vacuum level and the Fermi level of the conductive layer (12) is larger than the energy difference between the vacuum level and the Fermi level of the photocatalytic layer (13).

Abstract: A method including breaking down a component with a recycler to reduce the component to a recycled material composition that includes an original material of the component and debris that attached to the component during prior use, applying the recycled material composition within an additive manufacturing device to create a recycled component, and producing the recycled component from the additive manufacturing device, the recycled component material composition includes both the original material of the component and the debris attached to the component.

Abstract: The invention concerns an electrochemical reactor or modular unit designed to obtain a pure gas mixture of hydrogen and oxygen through the water electrolysis process. The electrochemical reactor includes a containment cabinet that is defined by four walls which form a prismatic cube with a base, and it is open at its upper surface. Within it, a number of conductive or semi-conductive plates are housed in parallel and insulated from each other, connecting all the cells by means of soldered electric connection, located at the ends of the cube, as well as other devices used for the dehumidification of gas and the refrigeration of condensed water. Its internal configuration is designed to allow for easy replenishment of water, while maintaining the isolation of the cells during operation. The abovementioned electrolysis occurs inside the cube.

Abstract: Provided are an anode for an ion exchange membrane electrolyzer which enables an aqueous solution of an alkali metal chloride to be electrolyzed at a lower voltage than a conventional anode and allows the concentration of an impurity gas included in an anode gas to be reduced and an ion exchange membrane electrolyzer using the same. The anode is an anode for an ion exchange membrane electrolyzer to be used in an ion exchange membrane electrolyzer that is separated by an ion exchange membrane into an anode chamber and a cathode chamber. The anode for an ion exchange membrane electrolyzer comprises at least one perforated flat metal plate 1 (expanded metal 1) and the thickness of the perforated flat metal plate 1 (expanded metal 1) ranges from 0.1 to 0.5 mm and the ratio of the short way SW to the long way LW (SW/LW) ranges from 0.45 to 0.55. The short way SW is preferably not more than 3.0 mm.

Abstract: A sliding engine component may include a substrate having a surface coated with a first electroplated metallic layer and a second electroplated metallic layer. The first metallic layer may be disposed between the substrate and the second metallic layer. The first metallic layer and the second metallic layer may have a grained structure. The grained structure of each of the first metallic layer and the second metallic layer may have an aspect ratio between a mean grain size perpendicular to the substrate surface and a mean grain size parallel to the substrate surface. The aspect ratio of the second metallic layer may be less than the aspect ratio of the first metallic layer.

Abstract: The present invention relates to a cyanide-free copper-preplating electroplating solution, wherein the electroplating solution is prepared from following components in mass percent: 1-60% of complexing agent, 0.5-30% of copper salt and the balance of water, wherein the complexing agent has a general formula MxHyPnO3n+1Rz, wherein M is any one or more of alkali metal ions and NH4+, R is acyl, the copper salt has a general formula Cux/2HyPnO3n+1Rz, x, n and z are positive integers, y is 0 or a positive integer and x+y+z=n+2. A preparing method comprises: (1) preparing a complexing agent: mixing alkali, carbonate or bicarbonate containing M, phosphoric acid and an acidic salt of monoprotic organic acids or polybasic organic acids containing an R group for reacting according to a molar ratio, then carrying one step polymerization on a reaction solution at 100-800° C. for 0.

Abstract: A method for plating a work piece. An electroless layer of material is applied to the work piece using an electroless plating process. The method includes creating a barrier in electrical conductivity in the work piece to divide the work piece into a first segment and a second segment which are substantially electrically insulated from one another, prior to electroplating the work piece. A plurality of methods are disclosed for dividing the work piece into the first and second segments.

Abstract: A method for electrochemically processing a microfeature workpiece includes contacting the first surface of the microfeature workpiece with a plating electrolyte in a plating chamber, wherein the plating electrolyte includes at least one metal ion, flowing the plating electrolyte from a first plating electrolyte inlet at the first end of the workpiece to a second plating electrolyte outlet at the second end of the workpiece across the center point of the workpiece, and electrochemically depositing the at least one metal ion onto the first surface of the workpiece. Another method for electrochemically processing a microfeature workpiece includes contacting a first surface of the microfeature workpiece with a plating electrolyte having at least one metal ion, heating the second surface of the workpiece using a heating method, and electrochemically depositing the at least one metal ion onto the first surface of the workpiece.

Abstract: To produce a chromium-containing multilayer coating on an object, alternate layers of nickel phosphorus alloy and trivalent chromium are deposited on the object until a desired thickness of coating has been reached. The coated object is then subjected to one or more heat treatments to improve the mechanical and physical properties of the coating and to produce multiphase layers comprising layers containing crystalline Ni and crystalline Ni3P and layers containing crystalline Cr.

Abstract: To produce a trivalent chromium based coating on an object, a layer of nickel phosphorus alloy is deposited on the object, an intermediate layer of another metal or metal alloy or ceramic is deposited on the NiP layer, and a chromium layer is deposited from a trivalent chromium bath on the intermediate layer. The coated object is subjected to one or more heat treatments to harden the coating and to produce multiphase layers including at least one layer containing crystalline Ni and crystalline Ni3P and at least one layer containing crystalline Cr. The intermediate layer can consist of copper, molybdenum, a metal alloy or a non-metallic solid, such as an oxide, nitride or carbide of a metal.

Abstract: An apparatus for electroplating metal on a semiconductor substrate with improved plating uniformity includes in one aspect: a plating chamber configured to contain an electrolyte and an anode; a substrate holder configured to hold the semiconductor substrate; and an ionically resistive ionically permeable element comprising a substantially planar substrate-facing surface and an opposing surface, wherein the element allows for flow of ionic current towards the substrate during electroplating, and wherein the element comprises a region having varied local resistivity. In one example the resistivity of the element is varied by varying the thickness of the element. In some embodiments the thickness of the element is gradually reduced in a radial direction from the edge of the element to the center of the element. The provided apparatus and methods are particularly useful for electroplating metal in WLP recessed features.

Abstract: An apparatus for producing a silicon single crystal by a Czochralski method with a chamber having a heater therein to heat a raw material and to cool the chamber by a coolant, including: measuring an inlet temperature, outlet temperature, and flow rate in a passage of the coolant to cool the chamber with flowing in the chamber; calculating a removed heat quantity from the chamber based on the measured values of the inlet temperature, outlet temperature, and flow rate; controlling heater power based on the value of the removed heat quantity. This provides an apparatus which can pull a single crystal in a crystal diameter and a crystal pulling rate closer to the target values by controlling the heater power based on a removed heat quantity from the chamber calculated by the measured values of temperatures and a flow rate of the coolant.

Abstract: An apparatus for producing diamond and performing real time in situ analysis, comprising: a housing, a reaction chamber, the reaction chamber being structurally connected to the housing, the reaction chamber comprising of an enclosed area adapted to house the growing of diamonds, a radiating means, the radiating means being mounted above the reaction chamber within the housing, the radiating means adapted to emit microwave into the reaction chamber to effect the growth of diamonds within the reaction chamber, a dielectric cover being provided at the top of the reaction chamber and adapted to allow the radiation wave from the radiating means to enter the reaction chamber, a recording means mounted within the annual housing and above the reaction chamber, a measuring mechanism arranged at the periphery of the reaction chamber, a microscope adjacently arranged on the outside of the reaction chamber.

Abstract: The present invention provides a fabricating method for natural cellulose fiber blended with nano silver. The fabricating method comprises following steps: Firstly, prepare nano silver colloidal sol by reduction titration for mixture of polyvinyl alcohol (PVA), silver nitrate (AgNO3) and sodium borohydride (NaBH4). Secondly, prepare mixing cellulose serum by blending agitation for mixture of wood pulp, N-methylmorpholine N-oxide (NMMO) and stabilizer. Thirdly, produce spinning dope by blending and dehydrating the nano silver colloidal sol and mixing cellulose serum. Fourthly, produce fibrous tow by Dry-Jet Wet Spinning method in association with coagulation, regeneration in coagulation bath, and water rinse. Finally, obtain final product of natural cellulose fiber blended with nano silver by post treatments of dry, oil and coil in proper order.