Abstract: An optical device includes a movable unit that supports a glass plate, axis portions that swingably support the movable unit around a swing axis, a support unit that supports the axis portions and, a permanent magnet that is provided in the movable unit, and a coil that is disposed to face the permanent magnet, and a coil support unit that is supported by the support unit and supports the coil. A conductive wire is wound around the coil and a drawn wire is drawn from the side of the inner circumference of the coil. The coil support unit includes a through hole overlapping the inner circumference of the coil and the drawn wire is inserted through the through hole.

Abstract: An optical device includes a glass plate, a movable unit that supports the glass plate, axis portions that swingably support the movable unit around a swing axis, a support unit that supports the axis portions and, a permanent magnet that is provided in the movable unit, and coils that are disposed to face the permanent magnet and generate a magnetic field to be applied to the permanent magnet. The movable unit includes a through hole that the permanent magnet is inserted into and a protrusion portion that protrudes inside the through hole to support the permanent magnet.

Abstract: The invention provides a system and method that reduces the precision of the manual alignment process. Users select correspondences between projectors or components of a projector, to form a common coordinate. Using models of the display system, and projectors, the common coordinate system can be mapped quickly to the entire display. The process avoids a need to measure screen points, and allows the user to move significantly fewer points. Alternatively, the invention allows introduction of machine-vision style algorithms into manual calibration techniques to improve performance. This overcomes the tediousness of prior systems by introducing models of the display into the manual alignment process, allowing selection of a small number of points on each projector, and avoiding selection of precisely measured screen points. The system conversely finds correspondences between projectors, allowing mapping of the projectors into a common coordinate system, and quick warping of the coordinate system to the screen.

Abstract: A projector includes a shell, a projection lens, an optical engine module, a power supply module a light source module and a fan. The shell defines an air inlet, an air outlet and forms a first room, a second room and a third room. The first room and the second room communicate with the air inlet. The third room communicates with the air outlet. The projection lens and the optical engine module are positioned in the first room. The power supply module is positioned in the second room. The light source module is positioned in the third room. Heated air in the first room can flows to the second room. Heated air in the second room can flows to the third room. The fan is positioned in the third room to expel heated air from within the shell.

Abstract: A projector includes a base and a cover configured to be attached on the base. The base is equipped with a cooling fan, a light module and a cooling member. An air inlet and an air outlet are located on the two sides of the light module. The cooling member is aligned with the air outlet and close to the cooling fan. The cooling member guides the airflow to flow to the cooling fan. The air inlet, the air outlet, the cooling member, and the cooling fan define an air path, and the airflow is guided out of the projector under an action of the cooling fan.

Abstract: A lighting device includes a plurality of light source devices and a holding member (first lamp unit and second lamp unit) holding the plurality of light source devices. The light source device has a light source and a storing body for storing the light source. The storing body has a plurality of openings introducing cooling gas and the holding member (first lamp unit and second lamp unit) includes a diverging device guiding the cooling gas to at least one opening among the plurality of openings.

Abstract: A light source device includes a light emitting tube including a light emitting part, a reflector adapted to reflect light emitted from the light emitting tube, a housing body adapted to house the light emitting tube and the reflector, and a plurality of inlet ports adapted to guide a cooling gas to the light emitting tube from respective directions different from each other.

Abstract: An optical path changing device includes: a reflective member that reflects a light beam incident thereto, in a predetermined reflection direction; and a housing holding the reflective member. The housing has a first surface and a second surface with the reflective member interposed therebetween in a direction orthogonal to the reflection direction. The first surface and the second surface have openings, respectively, and a cooling gas is circulated from the opening in the first surface to the opening in the second surface.

Abstract: An illumination device includes: a first light source device and a second light source device that emit light in directions opposite to each other in a first direction; a reflective portion that is disposed between the first light source device and the second light source device, and reflects the light emitted from the first light source device and the second light source device in a second direction crossing the first direction; and a cooling device that is disposed on one side of the reflective portion in a direction crossing the first direction and the second direction, and blows cooling air to the first light source device and the second light source device.

Abstract: Alight source device unit includes a light source device including a light source and an outflow port constituting part having a plurality of first outflow ports for making a cooling air flow out, a flow channel constituting part including an inlet port constituting part having a plurality of first inlet ports communicated with the first outflow ports and adapted to introduce the cooling air, and an opening and closing part adapted to selectively open and close the first inlet ports, the first inlet ports are arranged in a periphery of a central axis (a stationary shaft), and the opening and closing part includes a rotary member rotates around the stationary shaft in accordance with a posture of the light source device to thereby selectively open and close the first inlet ports.

Abstract: An optical path changing device, that is accommodated in an accommodation section of a projector having a plurality of light sources and that aligns a traveling direction of an incident light beam and emits the light beam, includes: a reflective member that aligns and reflects a light beam incident from each of the plurality of light sources in a predetermined reflection direction; a housing holding the reflective member; and a mounting section (guide rail) which is detachably mounted in the accommodation section.

Abstract: A color splitting/combining prism splits apart illumination light from a projector and combines together projection light from the projector. A part of the illumination light that is not used as the projection light passes through the color splitting/combining prism as OFF-light via an image display element in a direction different from the projection light. The color splitting/combining prism includes a dichroic film of which a cutoff wavelength, at which the dichroic film exhibits a transmittance of 50% when splitting two different colors between reflection and transmission, is provided in a wavelength range in which wavelength separation is possible for all of the illumination light, the projection light, and the OFF-light that are incident at different incidence angles respectively.

Abstract: A stereoscopic imager comprises a lens having a front lens assembly, a rear lens assembly, and two sampling lenses. The sampling lenses are disposed on opposite sides of the optical axis of the lens, between the front and rear lens assemblies, and proximate an aperture plane of the lens. The stereoscopic imager can comprise a first aperture and a second aperture, which apertures can be variable apertures. The first and second apertures are disposed within the aperture plane of the lens and substantially in line with the first and second sampling lenses. The sampling lenses can be abaxial with the apertures. The lens can form a double Gauss lens for suppressing optical aberration and coupling to a small imaging sensor. The two sampling lenses allow the imager to form on the sensor two images with differing perspectives of an object in the field of view of the lens.

Abstract: Pattern classification based proximity corrections for reticle fabrication are provided. A digital layout of a circuit design and proximity compensation data generated based on measurements of formed reticle elements are obtained. The proximity compensation data includes proximity correction values to correct for proximity effects of a reticle-formation process to form a reticle for use in fabricating a circuit of the circuit design. Based on a pattern classification of one or more patterns in the digital layout of the circuit design, at least one proximity correction is applied to the digital layout of the circuit design to facilitate correcting for proximity effects of the reticle-formation process, the at least one proximity correction being determined based on one or more of the proximity correction values of the obtained proximity compensation data. Additional adjustments to the digital layout are also provided according to aspects described herein.

Abstract: Aspects of the invention relate to techniques for determining pattern optical similarity in lithography. Optical kernel strength values for a first set of layout features and a second set of layout features are computed first. Based on the optical kernel strength values, optical similarity values between the first set of layout features and the second set of layout features are then determined. Subsequently, calibration weight values for the first set of layout features may be determined based on the optical similarity values, which, along with the first set of layout features, may be employed to calibrate lithography process model parameters.

Abstract: A photomask blank and/or photomask includes a light transmitting substrate, a highly reflective material layer disposed on the light transmitting substrate, and a transfer pattern layer disposed on the highly reflective material layer. The highly reflective material layer reflects light to be transmitted through the light transmitting substrate, with a predetermined reflectivity.

Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating two opposite surfaces of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring a birefringence distribution on the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable group or unacceptable group, based on the measured birefringence distribution.

Abstract: The present disclosure relates to an extreme ultraviolet (EUV) pellicle having a pellicle film connected to a pellicle frame. In some embodiments, the EUV pellicle has a substrate, and an adhesive material disposed onto the substrate. A pellicle frame is connected to the substrate by way of the adhesive material. The pellicle frame is configured to mount the substrate to an extreme ultraviolet (EUV) reticle.

Abstract: A composition for nanoimprint including a cycloolefin-based copolymer; a polymerizable monomer; and a photoinitiator. The polymerizable monomer of the present invention may include a polyfunctional monomer, and the cycloolefin-based copolymer may include a constituent unit having a cyclic olefin and a constituent unit having an acyclic olefin.

Abstract: A radiation-sensitive resin composition comprises: a polymer having a structural unit that comprises an acid-labile group; a radiation-sensitive acid generator; and a salt that comprises an onium cation, and HCO3?, CO32? or a combination thereof. The onium cation is preferably a sulfonium cation, an ammonium cation, an iodonium cation, a phosphonium cation, a diazonium cation or a combination thereof. The onium cation is preferably a cation represented by formula (b-1) or formula (b-2). The acid generated from the radiation-sensitive acid generator is preferably a sulfonic acid, an imide acid, an amide acid, a methide acid or a combination thereof.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.

Abstract: Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.

Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.

Abstract: An electron beam resist underlayer film-forming composition includes a polymer containing a unit structure having a lactone ring and a unit structure having a hydroxy group. The polymer may be a polymer obtained by copolymerizing a monomer mixture containing a lactone (meth)acrylate, a hydroxyalkyl (meth)acrylate, and phenyl (meth)acrylate or benzyl (meth)acrylate. A method for producing a semiconductor device including: applying the electron beam resist underlayer film-forming composition onto a substrate and heating the applied composition to form an electron beam resist underlayer film; coating the electron beam resist underlayer film with an electron beam resist; irradiating the substrate coated with the electron beam resist underlayer film and the electron beam resist with an electron beam; developing the substrate; and transferring an image onto the substrate by dry etching to form an integrated circuit element.

Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specifiction and * is a linking point.

Abstract: A method of patterning a thin film is provided. The method includes coating a thin film layer and photoresist on a surface of a substrate; forming a first partially cured zone by performing a first exposing process of the photoresist with a mask, wherein exposing energy applied to the photoresist of the first partially cured zone is less than a photosensitive threshold of the photoresist; forming a cured zone on the first partially cured zone by performing a second exposing process of the photoresist with the mask, wherein a width of the cured zone is less than a width of the first partially cured zone, and exposing energy applied to the photoresist of the cured zone is equal to or greater than the photosensitive threshold of the photoresist; developing the photoresist; etching the thin film layer that is not covered by the photoresist; and removing the photoresist of the cured zone.

Abstract: A pattern is formed by coating a resist composition comprising a fluorine-containing polymer, a base resin, an acid generator, and an organic solvent, baking the composition at 50-300° C. in an atmosphere of a solvent having a boiling point of 60-250° C., exposure, and development. In immersion lithography, the resist film is improved in water repellency and water slip, and LWR after pattern formation is reduced. In EB or EUV lithography, outgassing is suppressed and LWR is reduced.

Abstract: There is provided a polymer-containing coating liquid which is applied to a resist pattern and which is used in place of a conventional rinsing liquid. A coating liquid that is applied to a resist pattern comprising a polymer having a structural unit of Formula (1): (wherein R1 is a C1-12 organic group, and X is an organic group of Formula (2): (wherein R2 and R3 are each independently a linear or branched alkylene group having a carbon atom number of 1 to 3, R2 is bonded to an oxygen atom in Formula (1), R4 is a C1-4 alkoxy group, an allyloxy group, or a hydroxy group, and p is 0, 1, or 2)), and a solvent containing water and/or alcohols.

Abstract: Disclosed is a method and apparatus for mitigation of photoresist line pattern collapse in a photolithography process by applying a gap-fill material treatment after the post-development line pattern rinse step. The gap-fill material dries into a solid layer filling the inter-line spaces of the line pattern, thereby preventing line pattern collapse due to capillary forces during the post-rinse line pattern drying step. Once dried, the gap-fill material is depolymerized, volatilized, and removed from the line pattern by heating, illumination with ultraviolet light, by application of a catalyst chemistry, or by plasma etching.

Abstract: An image exposure system of a 3D printing device having a spatial light modulator, a light source, a projection lens, a micro-displacement driving mechanism and a controller. The spatial light modulator is provided with a plurality of micromirrors for adjusting the reflective direction of light illuminating the micromirrors according to a control signal; the light source generates a light beam illuminating the spatial light modulator; the projection lens is aligned with a first direction of the spatial light modulator so that a micro light spot array formed through the micromirror by the light source projected onto the surface of a light-sensitive material, the micro-displacement driving mechanism is connected with the spatial light modulator, and can drive the spatial light modulator to move in third and fourth directions that are perpendicular to each other, in order to finely adjust the position on the surface of the light-sensitive material onto which the micro light spot array is projected.

Abstract: A liquid immersion exposure apparatus includes a nozzle member having a recovery port and an opening via which an exposure beam passes. A projection system includes a first element closest to an image surface and a second element which is second closest to the image surface. The first element has a first surface facing the image surface, a second surface facing a lower surface of the second element, an inclined outer surface extending upwardly and radially outwardly from the first surface and facing an inner surface of the nozzle member, and a flange portion provided above the inclined outer surface. A support member supports the flange portion of the first element. A substrate stage has a holder for holding a substrate to be exposed and moves the substrate below and relative to the nozzle member and the projection system.

Abstract: Disclosed is a method of monitoring a focus parameter during a lithographic process. The method comprises acquiring first and second measurements of, respectively first and second targets, wherein the first and second targets have been exposed with a relative best focus offset. The method then comprises determining the focus parameter from first and second measurements. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.

Abstract: A method for use in planning metrology measurements, the method comprising: providing inverse total measurement uncertainty (TMU) analysis equations for upper and lower confidence limits TMUUL and TMULL of the TMU being independent on prior knowledge of measurements by a tool under test (TuT) and a reference measurement system (RMS), thereby enabling estimation of input parameters for said equations prior to conducting an experiment of the TMU analysis; and determining at least one of a total number N of samples to be measured in the TMU analysis and an average number ns of measurements per sample by the RMS.

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract: An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.

Abstract: An imprint apparatus which forms a pattern of an imprint material in a region to be processed on a substrate by using a mold includes an observing unit configured to include a light source which emits first light and a receiving unit which receives the first light which is emitted from the light source, is reflected by the region to be processed, and passes through the mold; a deforming unit configured to thermally deform the region to be processed by illumination with second light; and a combining member which combines the first light of the light source and the second light from the deforming unit and guides the first light and the second light to the region to be processed.

Abstract: An overcoat layer and method to make an overcoated photoconductor drum of an electrophotographic image forming device using irradiation such as with electron beam (EB) or ultraviolet (UV) light is provided. The photoconductor drum is then cured using EB dose of between 10 and 100 kiloGrays (kGy), preferably between 20 and 40 kGys or UV irradiation with an exposure of between 0.1 and 2 J/cm2. The unique overcoat layer of the present invention is formed having a biphasic morphology comprised of a highly cured crosslinked phase and a second phase enriched in uncured material. The desired amount of uncured uncrosslinked material found in the second phase of the biphasic structure, is between 2-70 wt % range, with particularly good combination of long-life and electrical performance when present at the 5-50 wt % level, and the best performance at the 15-40 wt % level.

Abstract: A toner comprising a toner particle containing a crystalline polyester resin and an amorphous polyester resin, wherein, in a cross-sectional observation of the toner by transmission electron microscopy (TEM), the number-average diameter (D1) of major axis lengths of the crystalline polyester resin dispersed up to a depth of 0.30 ?m from a toner surface is 40 nm to 110 nm, and the number-average diameter (D1) of major axis lengths of the crystalline polyester resin dispersed deeper than 0.30 ?m from the toner surface is 1.25 to 4.00 times the number-average diameter (D1) of the major axis lengths of the crystalline polyester resin dispersed up to a depth of 0.30 ?m from the toner surface.

Abstract: A toner comprising a toner particle containing an amorphous polyester resin, a crystalline polyester resin and a wax, wherein in a cross-section of the toner by transmission electron microscopy (TEM), domains of the wax and crystals of the crystalline polyester resin are present, the area occupied by the domains of the wax is 0.5% to 8.0% and the area occupied by the crystals of the crystalline polyester resin is 0.5% to 8.0% of the cross-sectional area of the toner, the number-average diameter Dw of the domains of the wax is 60 nm to 240 nm, the aspect ratio of the crystals of the crystalline polyester resin is 5.0 to 25.0, and the number-average diameter Dc of major axis lengths of the crystals of the crystalline polyester resin is 0.8 to 2.0 times the Dw.

Abstract: This invention provides a toner excellent in color development properties. The purpose can be achieved by using a toner containing a compound having a specific structure.

Abstract: A carrier includes a resin layer including Al and Sn and covering the surface of the carrier. A detectable amount of Al is from 1.0% to 12.1% by atom and a ratio (Al/Sn) of the detectable amount of Al to that of Sn is from 2.0 to 50.0 when the carrier is subjected to an X-ray photoelectron spectroscopic (XPS) analysis.

Abstract: An electro-conductive member for electrophotography contributing to stable formation of high-quality electrophotographic images under a variety of environments is provided. The electro-conductive member has an electro-conductive substrate, an elastic layer on the substrate, and an electro-conductive surface layer covering a surface of the elastic layer, wherein the electro-conductive surface layer contains a matrix in which a urethane resin and a silicon oxide exist in a non-phase-separated state, and the matrix has a peak of a Si—N bond derived from a polysilazane in a wavelength region from 800 cm?1 or higher and 950 cm?1 or lower in an infrared absorption spectrum of the matrix.

Abstract: An image forming device includes: a charging unit configured to apply charging bias voltage to a charging member and charge a surface of an image carrying body; an exposure unit configured to expose the surface of the image carrying body, and form an electrostatic latent image; a developing unit configured to apply developing bias voltage to a developer carrying body, and develop the electrostatic latent image; and a control unit configured to control timing to start applying the developing bias voltage relative to timing to start applying the charging bias voltage, wherein the control unit performs control such that the larger an absolute value of the charging bias voltage is, the shorter an interval from timing to start applying the charging bias voltage to timing to start applying the developing bias voltage becomes, and such that the smaller the absolute value is, the longer the interval becomes.

Abstract: An image forming apparatus includes: a rotating polygonal mirror having reflection surfaces, and to reflect a luminous flux at each reflection surface so as to scan a photosensitive member; a detection unit configured to detect the luminous flux; a measurement unit configured to measure an interval between time points at which the detection unit detects the luminous flux; a storage unit configured to store correction value data for correcting an image signal for each reflection surface relative to a reference reflection surface; and a specification unit configured to select a characteristic value from among a plurality of values that are obtained from results of measurements, and to specify the reference reflection surface based on the characteristic value. The plurality of values include results of predetermined operations performed on two or more intervals measured by the measurement unit.

Abstract: An image forming apparatus including: a light irradiating unit configured to irradiate a photosensitive member charged by a charging unit with light to form an electrostatic latent image; a processing unit configured to generate M-bit (M is an integer not less than 2) density data indicating a density based on the input image data, to generate (M+N)-bit processing data based on the M-bit density data and N-bit (N is an integer not less than 1) correction data, to convert the processing data into a plural-bit binary drive data corresponding to a value of the processing data, and to serially output the plural-bit drive data bit by bit to generate a drive signal; and a drive unit configured to drive the light irradiating unit based on the drive signal.

Abstract: An exposure device capable of precisely focusing light on a scanned surface to accomplish a good image quality is provided. The exposure device includes a substrate on which a plurality of light sources are arranged along a main-scanning direction, a lens array including a plurality of lenses configured to focus light emitted by the plurality of light sources on a scanned surface, and a housing configured to support the substrate and the lens array such that a certain spacing is maintained between the plurality of light sources and the plurality of lenses. At least a portion of the substrate is spaced apart from the housing along a sub-scanning direction.

Abstract: An image forming apparatus includes an image bearer; a charging member to charge the surface of the image bearer; an irradiating member to irradiate the surface of the image bearer to form an electrostatic latent image on the surface of the image bearer; an developing member to develop the electrostatic latent image with a toner to form a visible toner image on the surface of the image bearer; and a transferring member to transfer the toner image onto a transfer material. The image bearer includes a charge generation layer including an asymmetrical disazo pigment and a metal-free phthalocyanine pigment, and a charge transport layer. The irradiating member forms the electrostatic latent image at an irradiation energy greater than a half decay exposure of the image bearer and not greater than 2.5 times of the half decay exposure. The image bearer is not discharged every image forming process.

Abstract: A powder container includes a powder chamber for containing powder for forming images, a powder outlet formed in a face of the powder container, and a shutter assembly to open and close the powder outlet and including first and second shutters. The first shutter is movable between a sealing position to close the powder outlet and an open position to open the powder outlet and includes a pressed member to cancel retention of the first shutter at the sealing position. The second shutter includes a pressing projection that interferes with the pressed member of the first shutter and is movable between a shielding position to cover the pressed member without interference between the pressing projection and the pressed member and a releasing position to press the pressed member with the pressing projection.

Abstract: A toner case includes a case main body, an attachment member, and a sealing member. The case main body is configured to contain a toner. The attachment member is configured to partition an inside space of the case main body so as to adjust toner capacity. The sealing member is arranged between the case main body and the attachment member. The case main body includes a first engagement part. The attachment member includes a second engagement part configured to engage with the first engagement part via the sealing member.

Abstract: Provided is a magnetic carrier, including: a ferrite core particle; and a coating resin, in which: the coating resin has a surface resin layer and a resin composition in the stated order from a surface side thereof; the resin composition contains a resin, and an inorganic particle or carbon black that is subjected to a hydrophilic treatment; the surface resin layer contains a resin, is free of the inorganic particle or the carbon black, and has a thickness of from 0.01 ?m or more to 4.00 ?m or less; and a moisture percentage change between a moisture percentage when the magnetic carrier is left to stand under an environment of 30° C. and 80% RH for 24 hours, and a moisture percentage when the magnetic carrier is left to stand under an environment of 23° C. and 5% RH for 24 hours after the standing is 0.030 mass % or less.