Abstract: Provided is a display device including a display substrate, an opposite substrate and a liquid crystal layer. The display substrate has a plurality of pixel areas and a first side curved along a first direction. The opposite substrate faces the display substrate and is coupled to the display substrate to be curved along the first direction. The liquid crystal layer is disposed between the display substrate and the opposite substrate. In each of the plurality of pixel areas, a plurality of domains are arranged in a second direction intersecting with the first direction, and a side of at least one of the plurality of domains is tilted with respect to the first side.

Abstract: An array substrate comprises a substrate, a passivation layer on a surface of the substrate, a first organic film on a surface of the passivation layer and provided with a groove, a common electrode disposed on a surface of the first organic film outside the groove, and a pixel electrode disposed in the groove. A vertical projection of the common electrode on the surface of the passivation layer does not overlap with a vertical projection of the pixel electrode on the surface of the passivation layer.

Abstract: A gate line (40) has a two-layered structure comprising a lower gate line (40a) made of material identical to a pixel electrode (70), and positioned in the same layer as the pixel electrode (70), and an upper gate line (40b) layered on the lower gate line (40b), and made of material having a higher electrical conductivity than the transparent conductive material. According to this structure, it is possible to reduce the number of times performing exposure processes in manufacturing an in-plane switching type liquid crystal panel.

Abstract: A pixel structure is provided. The pixel structure includes a scan line, a data line, an active device, a pixel electrode, and a common electrode. The active device is electrically connected to the scan line and the data line. The pixel electrode is electrically connected to the active device. The pixel electrode includes multiple first layer pixel electrode patterns and multiple second layer pixel electrode patterns. The common electrode includes a plurality of first layer common electrode patterns and a plurality of second layer common electrode patterns. A fringe electric field is between each first layer pixel electrode pattern and corresponding portion of second layer common electrode patterns, and between each first layer common electrode pattern and corresponding portion of second layer pixel electrode patterns. A horizontal electric field is between each second layer pixel electrode pattern and the adjacent portion of second layer common electrode patterns.

Abstract: A liquid crystal display panel and a fan-out area thereof are provided. The fan-out area is arranged in a peripheral circuit area of the liquid crystal display panel and includes a middle wire and multiple fan-out wires arranged at two sides thereof. The middle wire and the fan-out wires each are disposed with at least one first wire pattern. Along each of directions toward the middle wire, widths of the first wire patterns of different wires are successively increased and/or lengths of the first wire patterns are successively decreased. The first wire patterns of a same wire have same width and length. Accordingly, the present invention can reduce the resistance differences among the wires in the fan-out area, color washout and non-uniform brightness caused by the resistance differences can be relieved or avoided, and is beneficial to the narrow border design of the liquid crystal display panel.

Abstract: A liquid crystal display includes a lower substrate and an upper substrate facing each other, a liquid crystal layer provided between the lower substrate and the upper substrate, a plurality of pixel electrodes provided on the lower substrate, extended in a substantially horizontal direction, and including a thin film transistor forming region and a display area, a reference voltage line extended in a substantially vertical direction along a center of the display area, a gate line provided on the lower substrate and extended in the substantially horizontal direction between neighboring pixel electrodes of the plurality of pixel electrodes, a data line provided on the lower substrate and crossing the gate line, and a shield electrode overlapping the gate line and including a curved portion which is disposed on an edge portion of the pixel electrode and overlaps the data line.

Abstract: A display device of which frame can be narrowed and of which display characteristics are excellent is provided. In a display device including a switch portion or a buffer portion, a logic circuit portion, and a pixel portion, the pixel portion includes a first inverted staggered TFT and a pixel electrode which is connected to a wiring of the first inverted staggered TFT, the switch portion or the buffer portion includes a second inverted staggered TFT in which a first insulating layer, a semiconductor layer, and a second insulating layer are interposed between a first gate electrode and a second gate electrode, the logic circuit portion includes an inverter circuit including a third inverted staggered thin film transistor and a fourth inverted staggered thin film transistor, and the first to the fourth inverted staggered thin film transistors have the same polarity. The inverter circuit may be an EDMOS circuit.

Abstract: A pixel structure and manufacturing method therefor, an array structure, a display panel and a display device. And the pixel structure includes data lines; scan lines; pixel units formed by intersecting the data lines with the scan lines, where each pixel unit corresponds to one data line and one scan line; a TFT and a pixel electrode disposed in each of pixel units, where the pixel electrode includes slits, at least one of which includes at least one corner area at an end thereof; where the pixel electrode in a row is electrically connected to a TFT in a pixel unit, the pixel unit is disposed in the same row as and adjacently at one side of the pixel electrode, and at least one corner area of the pixel electrode extends toward the TFT electrically connected to the pixel electrode.

Abstract: A 3D display apparatus is provided, which comprises: a display, a camera configured to track human-eye position information of human eyes, and a processor electrically connected with the camera and configured to generate a control signal according to the human-eye position information. Preferably, the display comprises a dynamic grating, which is electrically connected with the processor and configured to, according to the control signal, control bright and dark stripes of the dynamic grating to change in position adaptively according to positions of human eyes. Thereby, the 3D display apparatus of the present disclosure utilizes the camera to track human-eye position information and then utilizes the control unit to change positions of bright and dark stripes of the grating according to the human-eye position information so as to adapt to different observing positions of the user's two eyes, thus achieving a 3D image effect.

Abstract: A method for controlling an electrochromic device is provided. The method includes applying a constant supply current to the electrochromic device and determining an amount of charge transferred to the electrochromic device, as a function of time and current supplied to the electrochromic device. The method includes ceasing the applying the constant supply current, responsive to a sense voltage reaching a sense voltage limit and applying one of a variable voltage or a variable current to the electrochromic device to maintain the sense voltage at the sense voltage limit, responsive to the sense voltage reaching the sense voltage limit. The method includes terminating the applying the variable voltage or the variable current to the electrochromic device, responsive to the determined amount of charge reaching a target amount of charge.

Abstract: A method of and device for controlling a reflective color of a photonic crystal display device, capable of precisely controlling the distance between particles to display RGB full colors covering desired wavelength ranges. The method and device include using a mixed dispersion medium containing two or more kinds of solvents having different dielectric constants as a dispersion medium for a photonic crystal in a composition for a photonic crystal display device of which colors are controlled through the application of an electric field.

Abstract: A front plane laminate useful in the manufacture of electro-optic displays comprises, in order, a light-transmissive electrically-conductive layer, a layer of an electro-optic medium in electrical contact with the electrically-conductive layer, an adhesive layer and a release sheet. This front plane laminate can be prepared as a continuous web, cut to size, the release sheet removed and the laminate laminated to a backplane to form a display. Methods for providing conductive vias through the electro-optic medium and for testing the front plane laminate are also described.

Abstract: An optical semiconductor device including: a substrate having a principal surface; first and second optical waveguides disposed on the principal surface of the substrate, the first and second optical waveguides extending in a first direction, the second optical waveguide being arranged adjacent to the first optical waveguide in a second direction intersecting with the first direction; first and second signal electrodes disposed on the first and second optical waveguides; a resistor disposed on the principal surface, the resistor being arranged between the first optical waveguide and the second optical waveguide, the resistor being electrically connected to the first signal electrode and the second signal electrode; a resin layer disposed on the principal surface, top surfaces of the first and second signal electrodes, and the resistor; and a capacitor disposed on the resin layer, the capacitor being electrically connected to the resistor through an opening of the resin layer.

Abstract: Systems and methods for providing a noncollinear optical parametric amplifier (NOPA). Two approaches for classes of NOPA are described: phase-mask NOPA and Wollaston NOPA.

Abstract: This invention provides a signal processing method of multiple micro-electro-mechanical system devices. The signal processing method includes: providing at least two MEMS devices; applying driving or modulating signals of different frequencies to the MEMS devices such that the MEMS devices generate respective MEMS signals with respective frequencies; and combining the MEMS signals with respective frequencies into one or more multi-frequency signals and outputting the multi-frequency signals, wherein a number of the multi-frequency signals is less than a number of the MEMS signals with respective frequencies. This invention also provides a combo MEMS device integrating two or more MEMS devices and two or more vibration sources.

Abstract: An image stabilization apparatus comprises: a first optical correction unit; a second optical correction unit that is arranged at a position different from the first optical correction unit in an optical axis direction of the first optical correction unit; and a control unit configured to execute a first control mode in which camera shake is optically corrected by shifting the first optical correction unit in a direction that is different from an optical axis based on a camera shake correction signal calculated from output from a camera shake detection unit, and in which the second optical correction unit is shifted in a direction different from the optical axis to correct aberration that occurs due to shifting the first optical correction unit in a direction different from the optical axis.

Abstract: An asymmetric aperture device for a camera is provided that improves light gathering properties by increasing both the light gathering opening of the aperture and the number of light producing light sources placed on the aperture. An asymmetric aperture design is provided that utilizes a significantly larger portion of the camera lens. The tradeoff between the competing objectives of maximizing camera depth of field and maximizing the production of useful focus-condition information within the camera image is optimized. More illumination is provided without significantly increasing the lateral size of the illuminator pattern.

Abstract: A screw based coupler mechanism can include a head, a shank, and/or a helical ridge wrapped around the shank. The shank can include an electronic connector with one or more electronic pin outs. The shank can be configured to be physically and electronically mated to an electronic device. The electronic device can include a base and a hollow region surrounded by a matching helical ridge which securely mate the component to the shank. In one embodiment, the electronic device can be a panoramic camera which can be secured to a screw based coupler of a mounting platform.

Abstract: A teleconverter includes a master lens apparatus-side mount on which a master lens apparatus is mounted, a camera body-side mount on which a camera body is mounted, and a converter lens unit that has a negative refracting power for mounting the master lens apparatus thereon to obtain a lens system having a focal length longer than that of the master lens apparatus, the converter lens unit including a first lens group on the master lens apparatus side and a second lens group on the camera body side with an on longest air separation interposed between them, the first lens group has positive refracting power, and the second lens group has negative refracting power, with satisfaction of the following condition (1): ?1.53<f1/f<?0.66??(1) where f is the focal length of a whole system of the converter lens unit, and f1 is the focal length of the first lens group.

Abstract: An imaging device includes a main body, a light pipe, a shell, and a lens assembly. The light pipe is attached to the main body. The shell is configured to couple to the main body; thereby an accommodating space is defined between the shell and the main body. The lens assembly has an external sleeve and a lens. The lens is movably coupled to the accommodating space by the external sleeve, thereby enabling adjustment of a distance between the lens and the light pipe.

Abstract: An imaging device includes a base, an illuminating device, a first housing element, and a second housing element. The first housing element defines a cutout. The first housing element further includes at least one fixing piece from an edge of the first housing element. The second housing element is similar configuration to the first housing element. When the first housing element is fixed to the second housing element, the two cutouts defines an engaging hole, the illuminating device extends from the engaging hole from the base, the two fixing pieces engage with the illuminating device to fix the illuminating device to the base.

Abstract: A light source device includes a wavelength conversion element adapted to emit a second light in a first wavelength range due to irradiation of a first light, and a wavelength separation element to which the second light is input, and the wavelength separation element generates a third light reduced in light intensity of a component in a second wavelength range among a component in the first wavelength range compared to the second light.

Abstract: There is provided a light source unit which includes an excitation light source configured to emit light in a first wavelength range, a wavelength conversion member on which the light in the first wavelength range is incident from an incident side thereof and which is made up of a member formed to include a luminescent material mixed therein which emits light in a second wavelength range having its wavelength peak on a longer wavelength side than a wavelength peak of the light in the first wavelength range, and a first optical filter which is provided at an output side of the wavelength conversion member which lies opposite to the incident side and which transmits a light component of the light in the second wavelength range which has a wavelength shorter than a third wavelength lying in a wavelength range of the light in the second wavelength range.

Abstract: A discharge lamp driving device includes: a discharge lamp driving unit which supplies drive power to a discharge lamp having electrodes; a storage unit which stores information with respect to the discharge lamp; and a control unit which controls the discharge lamp driving unit, wherein the control unit is configured to execute a stationary lighting driving in which first drive power is supplied to the discharge lamp and a high-power driving in which second drive power that is higher than the first drive power is supplied to the discharge lamp, and the control unit sets first execution information of the high-power driving on the basis of first information with respect to the high-power driving stored in the storage unit, at a predetermining setting timing, and controls the discharge lamp driving unit according to the first execution information.

Abstract: A projection apparatus for projecting a first image and a second image is disclosed. The projection apparatus has a casing, a light source module providing an illumination beam, a light valve device, a first prism, a second prism, a third prism, a fourth prism, a first projection lens, and a second projection lens. The illumination beam enters the first prism, the second prism, the third prism, the fourth prism, and the light valve device. The illumination beam is reflected and converted into a first image beam and a second image beam. The first image beam enters the first prism and is totally reflected to the first projection lens to form the first image. The second image beam enters the third prism and is totally reflected to the second projection lens to form the second image.

Abstract: A screen includes: a diffraction member and a scattering member. The diffraction member selectively diffracts image light and orients this light towards a viewer. In order for the image light to be scattered to a higher degree than ambient light that enters the scattering member on the side opposite of the viewer, the degree to which the scattering member scatters polarized light varies according to the polarization direction of the light. Thus, regardless of the positional relationship of the screen and a projector, which projects image light, it is possible to use a relatively simple industrial manufacturing process that can ensure the following to a satisfactory extent: brightness of the screen in the front direction, a wide viewing angle, and visual clarity through the screen.

Abstract: A method of producing a Pepper's Ghost Illusion comprising using a reflective and semi transparent foil formed from a polymeric composite, the polymeric composite including a flame retardant.

Abstract: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as ?, and circumference ratio is taken as ?, then the conditions for D?(?×L)/? are satisfied.

Abstract: A mask assembly including a first mask and a second mask is provided. The first mask includes a plurality of first main features parallel to each other, a plurality of first sub-resolution assistant features (SRAFs) and a plurality of second SRAFs. The second SRAFs are separately disposed at one side of the first main features. The first SRAFs are separately disposed between the first main features and the second SRAFs. An extension direction of the first main features is parallel to an extension direction of the second SRAFs. The second mask includes a plurality of second main features parallel to each other. When the first mask and the second mask are placed at a predetermined position above a negative-type development photoresist layer for performing exposure respectively, the second main features intersect with the first main features and the second main features overlap with the first SRAFs.

Abstract: On a photomask used for exposure processing, a plurality of pattern regions on which predetermined patterns are formed using a light shielding material are provided, and calibration marks are formed at positions corresponding to at least two opposite sides of each pattern region. During exposure processing, a deformation state of the photomask is detected based on calibration marks formed on the photomask and marks formed on a substrate stage, and a projection condition for projecting a pattern formed on the photomask on the substrate is corrected based on the detection result.

Abstract: The present invention discloses a nanoimprint apparatus and method useful in the cost-effective mass production of nanostructures over large areas on various substrates or surfaces, especially suitable for non-flat substrates or curved surfaces. The nanoimprint apparatus is composed of a wafer stage, a vacuum chuck, a substrate, a UV-curable nanoimprint resist and the like. The method implementing large-area nanopatterning based on the apparatus includes the following steps: (1) pretreatment, (2) imprinting, (3) curing, (4) demolding, (5) post treatment and (6) transferring of imprinted patterns. By utilizing the apparatus and the approach, large-area, and/or high-aspect-ratio micro/nanostructures can be mass produced, especially on a non-flat substrate or a curved surface or a fragile substrate at low cost and high throughput.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1) (in the formula, M11 represents a single bond or a divalent linking group; Q11 represents an alkyl group, a cycloalkyl group, or an aryl group).

Abstract: A patterned photoresist is provided atop a substrate. A hardening agent is applied to the patterned photoresist to provide a polymeric coated patterned photoresist. The polymeric coated patterned photoresist is baked to provide a hardened photoresist, and subsequent the baking step, the polymeric coating is removed from the hardened photoresist by rinsing. The hardened photoresist can be removed anytime during the patterning of the substrate by an aqueous resist developer.

Abstract: A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.

Abstract: A photoresist composition comprising a resin which has no acid-labile group and which comprises a structural unit represented by formula (I); and a structural unit represented by formula (a4); a resin which has an acid-labile group; and an acid generator.

Abstract: A non-ionic compound includes a group represented by formula (Ia): wherein R2 represents a group having a C5 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site.

Abstract: This invention provides a composition containing an organometallic compound having a chromophore moiety in the metal polymer backbone which allows a wider range of n/k values such that substrate reflectivity can be controlled under various conditions.

Abstract: The invention teaches a system and method for catalyzing on a substrate. The system includes a light source and a digital light patterning device which is controlled by a controller coupled to a computer. The digital patterning device includes an array of liquid crystals, each of which being electronically controlled by the computer through the controller. When a liquid crystal is on, the light from the light source passes through the liquid crystal. When it is off, the light is blocked. According to the visual image pattern presented in the computer's interface, the array, wherein some crystals are on and some are off, shows a light pattern which is consistent with the visual image pattern on the computer screen. Accordingly, the patterned light is shed onto a substrate where the light catalyzes a chemical reaction proximate a substrate.

Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Abstract: An EUV lithography system has an EUV beam path and a monitor beam path. The EUV beam path includes a mirror system having plurality of mirror elements, the orientations of which can be changed. The monitor beam path includes a monitor radiation source, a screen and a spatially resolving detector. The mirror system is arranged in the monitor beam path between the monitor radiation source and the screen.

Abstract: The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical system; and a phase modulating member which is arranged in the optical path on the illumination target surface side with respect to the polarization converting member and which transmits light from the pupil intensity distribution so as to convert linearly polarized light thereof polarized in a first direction, into required elliptically polarized light and maintain a polarization state of linearly polarized light polarized in a second direction (X-direction or Y-direction) obliquely intersecting with the first direction, in order to reduce influence of retardation caused by a subsequent optical system between the polarization converting member and the illumination targe

Abstract: A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure.

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.

Abstract: An exposure apparatus includes a projection system; a liquid supply system configured to supply liquid to a space under the projection system; a liquid recovery system configured to recover the supplied liquid via a recovery opening; a separator fluidically connected to the recovery opening, which separates one of the liquid and gas, which has been collected via the recovery opening, from the other; a flow-meter fluidically connected to the recovery opening; a stage system configured to move a movable member on which a substrate is held; and a measurement system having a light receiving part which receives a measurement light through a light-transmissive member provided at the movable member and through the liquid between the projection system and the light-transmissive member.

Abstract: An optical system illuminating a surface to be illuminated includes a wavefront splitting type integrator configured to split the wavefront of incident light to form a plurality of light sources on the exit surface side, and an optical element whose surface is polished in a scanning direction using a polishing tool. The optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction. The arrangement direction of the plurality of light sources in a plane perpendicular to the optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion.

Abstract: A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points in a pupil plane of the illumination source; changing a polarization state of each pixel group and determining an incremental effect on each of the plurality of critical dimensions resulting from the change of polarization state; calculating a first plurality of sensitivity coefficients for each of the plurality of critical dimensions using the determined incremental effects; selecting an initial illumination source; iteratively calculating a lithographic metric as a result of a change of polarization state using the calculated first plurality of sensitivity coefficients, the change of the polarization state of the pixel group in the initial illumination source creating a modified illumination source; and adjusting the initial illumination source based on the iterative results of calculations.

Abstract: Arranging an application apparatus, an exposure apparatus, a developing apparatus, and similar apparatus together within a large yellow room makes it difficult to change a layout in association with a change of a recipe and to streamline a layout area and similar parameter. A yellow room system includes: a plurality of portable unit process apparatuses 50 that each have the same standardized outer shape and include a yellow room configured to shield a exposure light to a photosensitive material formed on a workpiece; conveyance containers 11 and 25 that convey the workpiece between the unit process apparatuses and itself is formed as the yellow room; and a light-shielding coupling structure that couples the unit process apparatus, which is formed on a docking port 56 disposed in the upper portion of a front chamber 80 of the unit process apparatus 50, and the conveyance containers together.

Abstract: A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma.

Abstract: An electrophotographic photoreceptor includes a single layer type photosensitive layer which includes a binder resin, a charge generating material, a hole transport material, a first electron transport material represented by the formula (1), and a second electron transport material represented by the formula (2), wherein X1 represents an oxygen atom or ?C(CN)2; R11 to R17 independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group; and R18 represents an alkyl group, -L111-O—R112, an aryl group, or an aralkyl group; provided that L111 represents an alkylene group, and R112 represents an alkyl group, wherein X2 represents an oxygen atom or ?C(CN)2; R21 to R27 independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group; and R28 represents an alkylene group having 4 to 20 carbon atoms or the like.

Abstract: An electrophotographic photosensitive member wherein a charge generating layer of the electrophotographic photosensitive member includes a gallium phthalocyanine crystal in which an organic compound is contained, wherein the organic compound is at least one compound selected from the group consisting of dimethylsulfoxide, N,N-dimethylformamide, N-methylformamide, N-propylformamide, N-vinylformamide and N-methylpyrrolidone, the content of the organic compound is 0.1% by mass or more and 2.0% by mass or less based on a gallium phthalocyanine in the gallium phthalocyanine crystal, and a charge transporting layer of the electrophotographic photosensitive member includes a polycarbonate resin having structural units represented by formulae (1) and (2).