Abstract: A super-oscillatory lens (10) having a pre-defined pattern to spatially modulate the light beam in amplitude and/or phase which has a blocking element (6) formed integrally with the lens, or as a separate component adjacent to the lens, which is opaque to the light beam to cause diffraction of the light beam around the blocking element and formation of a shadow region (20). The lens and blocking element focus the light beam to form an elongate needle-shaped focus (15) in the shadow region (20). In any application in which it is necessary to scan a small spot over a surface, compared with a conventional objective lens focus the elongate shape of the focus relaxes the requirement on a feedback loop to maintain a constant separation between a scan head and a surface being scanned. The elongate shape is also ideal shape for materials processing applications.

Abstract: A differential TWE MZM includes a differential driver, first and second capacitors, and first and second terminations. The differential driver includes a first differential output and a second differential output that collectively form a differential pair. The first differential output is DC coupled to a first arm optical phase shifter of a TWE MZM. The second differential output is DC coupled to a second arm optical phase shifter of the TWE MZM. The first capacitor AC couples the second differential output to the first arm optical phase shifter. The second capacitor AC couples the first differential output to the second arm optical phase shifter. The first and second terminations are coupled to, respectively, the first or second arm optical phase shifter.

Abstract: An optical modulation apparatus includes an optical modulation unit that includes a plurality of ring optical modulators which are coupled in cascade to each other and the ring optical waveguides of which have round-trip lengths different from each other, and a controller that performs, for at least one of the ring optical modulators, first resonance wavelength adjustment control to adjust the resonance wavelength of the ring optical modulator to one input light wavelength, performs second resonance wavelength adjustment control to specify the ring optical modulator that exhibits a minimum current amount required for the adjustment of the resonance wavelength of the ring optical waveguide to the one input light wavelength from among the ring optical modulators and adjust the resonance wavelength of the specified ring optical modulator to the one input light wavelength, and performs modulation driving control for the specified ring optical modulator.

Abstract: The liquid crystal grating substrate includes a base substrate, and several bar-like signal electrodes and several bar-like common electrodes formed at an identical layer on the base substrate. The signal electrodes and the common electrodes are arranged alternately and parallel to each other. The liquid crystal grating substrate further includes a signal electrode input line connected to a first end of the signal electrode and a common electrode input line connected to a second end of the common electrode. Respective first ends of the signal electrode and the common electrode are arranged close to one side of the base substrate, respective second ends of the signal electrode and the common electrode are arranged close to the other side of the base substrate opposite to the side, and the signal electrode input line and the common electrode input line are arranged at a layer identical to the signal electrode.

Abstract: An adaptive photo thermal lens comprising at least one cell, each cell provided with at least one photo absorbing particle, a thermo-optical material in thermal contact with the cells and at least one controllable light source for illuminating the photo absorbing particles, the light source having at least one spectral component which can be absorbed by the photo-absorbing particles and being controllable in wavelength and/or power and/or polarization.

Abstract: Disclosed is a method for fabricating a wavelength conversion device that is capable of suppressing unintended and random polarization reversal due to heating thereby achieving higher wavelength conversion efficiency. The method includes: forming an insulating layer on one place of a crystal substrate naturally and uniformly polarized in a thickness direction; forming an insulating layer pattern with line-and-space by photolithography; then supplying conductive fluid to both planes of the crystal substrate to apply voltage to the crystal substrate, thereby a wavelength conversion device that is periodically polarization-reversed is fabricated. When temperature of the crystal substrate decreases after heating, an ionizer supplies ions to a surface of the crystal substrate, negative ions collect on +z plane, and positive ion collect on ?z plane, thereby unintended and random polarization reversal is suppressed.

Abstract: A focal-plane shutter includes: a board including an opening; a shutter opening and closing the opening; a drive lever provided with a drive pin and swinging; a drive arm provided with an engagement hole engaged with the drive pin, swinging about a center same as a swing center of the drive lever, driving the shutter, and made of a synthetic resin; and a restriction portion defining a swinging range of the drive lever.

Abstract: The invention speeds up operation of an interchangeable lens. The interchangeable lens, which is removably mounted on a camera body, includes a communication control microcomputer, a lens driving circuit and a lens driving actuator. A body-side microcomputer and the communication control microcomputer of the interchangeable lens are connected and are capable of communicating with each other. Lines are provided in such a manner that the lens driving circuit and body-side microcomputer can communicate directly. A command from the body-side microcomputer is input to the lens driving circuit. This allows the lens driving circuit to be controlled directly and makes it possible to control the interchangeable lens at high speed.

Abstract: Disclosed is a system for improving chroma key compositing technique in photography and/or videography. The system comprises at least a first flashlight arranged to be directed towards an object to be photographed, a chrome backdrop in front of which the object is to be photographed, and at least a first reflecting surface arranged partly in front of the first flashlight in such a manner that part of the light from the first flashlight is directed to the object to be photographed and part of the light from the first flashlight is reflected towards the chrome backdrop. The first reflecting surface has essentially the same colour as the chrome backdrop.

Abstract: A holding assembly for a camera, such as a smartphone, which may be hung from a wide variety of surfaces to position the camera for taking pictures that include the camera's user. The length of a rod at which the end of the camera may be attached is adjustable to set the camera at the appropriate height. The adjustable rod has a handle at one end and may have a C-shaped hook adjacent to the handle. At the other end of the assembly is a mount for the camera. Alternatively, the holding assembly may fold open to attach the camera to one section and the support surface to another section. The holding assembly may be attached to the support surface on an upper section by a sticky gel that doesn't damage a surface and the camera may be attached to the lower section with magnets or gel.

Abstract: An imaging optical system, which images an image on one conjugate surface of an enlargement side conjugate surface and a reduction side conjugate surface onto the other conjugate surface, includes, in order from the reduction side conjugate surface to the enlargement side conjugate surface, a refractive optical system and a reflective optical system. The refractive optical system forms an intermediate real image at an intermediate imaging position inside the refractive optical system. The reflective optical system includes a convex mirror disposed closest to the enlargement side conjugate surface. The predetermined conditional expression is satisfied.

Abstract: An image projection apparatus includes: a grid portion provided on a housing of the apparatus and having a plurality of grids through which air flows in or out of the apparatus. The grid portion includes an edge portion of the grid portion, and a central portion of the grid portion, having a thickness thicker than a thickness of the edge portion of the grid portion.

Abstract: A light source module adapted to a projector includes a light source, a light combining system, a first cooling fan, a second cooling fan, a first guide duct and a second guide duct. The light source includes a first light emitting device and a second light emitting device. The light combining system is disposed between the first light emitting device and the second light emitting device. The first cooling fan is disposed on the first light emitting device. The second cooling fan is disposed on the second light emitting device. The first guide duct is connected to the first cooling fan and guides a cooling airflow provided by the first cooling fan to the second light emitting device. The second guide duct is connected to the second cooling fan and guides a cooling airflow provided by the second cooling fan to the first light emitting device.

Abstract: Provided is an illuminating optical device that can reduce lowering of luminance in a display mode for enhancing color reproducibility. A multiple number of light source units (11, 19, 20) each emit a different color of light. Color wheel (28) includes multiple transmissive regions that each transmit a different color of light and that moves the point on which the incident light from each light source unit falls, over the transmissive regions as the wheel rotates. A storage (50) stores a multiple number of lighting pattern information items each item providing a lighting pattern to turn on each light source unit in a different period of lighting. A controller (60) receives a select signal for selecting one of the multiple lighting patterns to turn on each light source unit in accordance with the lighting pattern information that provides the lighting pattern selected by the select signal.

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

Abstract: A method of digitally printing a solder mask. The method includes providing a solder mask ink composition including: 1) a resin and 2) a solvent in an amount of at least 20% by weight relative to the total weight of the solder mask ink composition. The composition has a viscosity that is less than 1000 cps at a shear rate of 10 s?1 and a temperature of 25° C. An aerosol stream is generated from the solder mask ink composition with a pneumatic atomizer using an atomization gas. The aerosol stream is directed through a nozzle and focused using a sheath gas onto a substrate while changing the position of the nozzle with respect to the substrate to selectively deposit a solder mask pattern. The solder mask pattern is cured.

Abstract: An imprinting device to transfer the mold pattern on a die to a molding target includes a casing forming a pressure-adjusting chamber, a stage supporting the die and the molding target, a frame encircling a circumference of the stage, first moving means moving the casing and the stage in a direction coming close to each other or becoming distant from each other, second moving means moving the casing and the frame in a direction coming close to each other or becoming distant from each other, pressure-adjusting means that adjusts the pressure of a fluid in the pressure-adjusting chamber, and decompression means which decompresses a decompression chamber formed by the stage, a frame, and the die or the molding target, and which eliminates a fluid present between the die and the molding target.

Abstract: Fabrication of a circuit structure is facilitated, in which a first exposure of a multi-layer structure is performed using a first mask, which defines positioning of at least one edge of an element to be formed above a substrate of the multi-layer structure. A second exposure of the multi-layer structure is performed using a second mask, which defines positioning of at least one other edge of the element. At least some material of the multi-layer structure is removed using, at least in part, the defined positioning of the at least one edge and the at least one other edges of the element, to form the element above the substrate. In some examples, multiple elements are formed, the multiple elements being hardmask elements to facilitate an etch process to etch a substrate material.

Abstract: There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0) shown below. In the formula, A? represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; R1 represents a lactone-containing cyclic group, an —SO2— containing cyclic group or a carbonate-containing cyclic group; and W2 represents a group which is formed by polymerization reaction of a group containing a polymerizable group.

Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z? are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.

Abstract: A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I): in the formula (I), A individually and independently represents a single bond, an alkylene group, or an arylene group, B individually and independently represents an organic group having diphenyl phosphine, hydrogen atom, an alkyl group, an aryl group, or —OR, in which R is a C1-C6 alkyl group or a phenyl group, at least one B is the organic group having diphenyl phosphine and at least one B is —OR. When B is —OR, A connected to B is the single bond. A film formed by the photosensitive resin composition has good refractivity and adhesivity to molybdenum.

Abstract: A fluorine-containing compound represented by a following general formula (1) is provided. [In the general formula (1), X represents a halogen atom or an alkoxy group, R1 represents a branched chain or cyclic alkyl group having 3 to 10 carbon atoms, and Rf1 and Rf2 represent fluorinated alkoxy groups. n represents an integer of 0 or greater.

Abstract: Disclosed is a resist underlayer composition including a compound including a moiety represented by the following Chemical Formula 1 and a solvent. In the above Chemical Formula 1, A1 to A3, X1, X2, L1, L2, Z, and m are the same as defined in the specification.

Abstract: A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises photosensitive non-aromatic heterocyclic groups each of these groups comprising a carbon-carbon double bond in conjugation with an electron withdrawing group, as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern.

Abstract: The present invention relates to a method for modifying line edge roughness on a lithographically-produced feature in a material, the method comprising applying a block copolymer to an area on the feature having line edge roughness, the block copolymer comprising a charged hydrophilic polymer block and a non-charged hydrophilic polymer block.

Abstract: A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.

Abstract: An apparatus for measuring positions of marks on a substrate, includes an illumination arrangement for supplying radiation with a predetermined illumination profile across a pupil of the apparatus, an objective lens for forming a spot of radiation on a mark using radiation supplied by said illumination arrangement, a radiation processing element for processing radiation that is diffracted by the mark, a first detection arrangement for detecting variations in an intensity of radiation output by the radiation processing element and for calculating therefrom a position of the mark, an optical arrangement, a second detection arrangement, wherein the optical arrangement serves to direct diffracted radiation to the second detection arrangement, and wherein the second detection arrangement is configured to detect size and/or position variations in the radiation and to calculate therefrom a defocus and/or local tilt of the mark.

Abstract: A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.

Abstract: The invention relates to a method for locally deforming an optical element for photolithography in accordance with a predefined deformation form comprising: (a) generating at least one laser pulse having at least one laser beam parameter; and (b) directing the at least one laser pulse onto the optical element, wherein the at least one laser beam parameter of the laser pulse is selected to yield the predefined deformation form.

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract: A reflective optical element of an optical system for EUV lithography and an associated manufacturing method. The reflective optical element (20) includes a multilayer system (23, 83) for reflecting an incident electromagnetic wave having an operating wavelength in the EUV range, the reflected wave having a phase ?, and a capping layer (25, 85) made from a capping layer material. The method includes determining a dependency according to which the phase of the reflected wave varies with the thickness d of the capping layer, determining a linearity-region in the dependency in which the phase of the reflected wave varies substantially linearly with the thickness of the capping layer, and creating a thickness profile in the capping layer such that both the maximum thickness and the minimum thickness in the thickness profile are in the linearity-region.

Abstract: A reflective mirror is provided with a base and a multilayer film including first layers and second layers laminated alternately on the base and capable of reflecting at least a portion of the incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion which has a second thickness different from the first thickness and which is provided at a position rotationally symmetric to that of the first portion about the optical axis of the reflective mirror relative.

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Abstract: An image projection apparatus comprises a light projector (605) which projects an image onto a surface (603) of an object. A focussing processor (609) is arranged to focus the image on an image plane (607) and a controller (611) dynamically varies the position of the image plane (607) relative to the surface (603). The movement may be a predetermined periodic movement and the surface may specifically be a non-planar surface. The movement may result in a blurring effect independent of distance, and may specifically provide a blurring effect that can be pre-compensated by pre-filtering of the image to be projected. The invention may allow improved quality of a projected image, such as e.g. of an image projected on a non-planar or moving surface.

Abstract: An exposure apparatus is provided for performing a column scan-exposure process. The exposure apparatus includes a base for supporting the exposure apparatus; and a reticle stage configured for holding a reticle having at two mask pattern regions and carrying the reticle to move reciprocally along a scanning direction. The exposure apparatus also includes a wafer stage configured for holding a wafer and carrying the wafer to move reciprocally along the scanning direction. Further, the exposure apparatus includes a control unit configured to control the reticle stage and the wafer stage to cooperatively move to cause the at least two mask pattern regions of the reticle on the reticle stage to be continuously and sequentially projected on at least two corresponding exposure shots of the wafer on the wafer stage along the scanning direction to perform a column scan-exposure process.

Abstract: A lithography metrology method is provided. Focus sensitivity data and dose sensitivity data of sample patterns to be formed on a substrate are acquired. At least one focus pattern selected in descending order of focus sensitivity from among the acquired focus sensitivity data of the sample patterns is determined. At least one low-sensitivity focus pattern in ascending order of the focus sensitivity from among the acquired dose sensitivity data of the sample patterns is selected, and at least one dose pattern selected in descending order of dose sensitivity from among the at least one low-sensitivity focus pattern is determined. A split substrate having a plurality of chip regions is prepared. A plurality of focus split patterns having a shape corresponding to the at least one focus pattern and a plurality of dose split patterns having a shape corresponding to the at least one dose pattern in the plurality of chip regions are formed.

Abstract: The present invention may include measuring tool induced shift (TIS) on at least one wafer of a lot of wafers via an omniscient sampling process, randomly generating a plurality of sub-sampling schemes, each of the set of randomly generated sub-sampling schemes having the same number of sampled fields, measuring TIS at each location of each of the randomly generated sub-sampling schemes, approximating a set of TIS values for each of the randomly generated sub-sampling schemes utilizing the TIS measurements from each of the randomly generated sub-sampling schemes, wherein each set of TIS values for each of the randomly generated sub-sampling schemes is calculated utilizing an interpolation process configured to approximate a TIS value for each location not included in a randomly generated sub-sampling scheme, and determining a selected sub-sampling scheme by comparing each of the calculated sets of TIS values to the measured TIS of the omniscient sampling process.

Abstract: A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport region and a plurality of vertical transport regions in a casing. The horizontal transport region is provided at the upper portion of the casing to extend in the X direction. A plurality of exposure devices are arranged below the horizontal transport region to be lined up in the X direction. A transport mechanism is provided in the horizontal transport region. The transport mechanism is configured to be capable of transporting a substrate between the processing section and the plurality of exposure devices.

Abstract: There is provided a scan and step exposure system to enable to perform the exposure on a large-sized subject to be exposed such as a film and a wafer, which was difficult to perform circuit patterning process on at one time, by transferring an exposure module by step feed way or making it moved continuously like scanning way in such way that an exposure subject is adsorbed on a chuck tray drawn out of the system body and the chuck tray is put into the body and placed under a mask holder, and a glass base having a film mask having circuit patterns adsorbed thereon is mounted on the mask holder, and the distance between the glass base and the exposure subject is controlled while moving the mask holder up and down, and the exposure process is performed while moving the exposure module located above the mask holder in the transverse direction continuously by scan way or by step feed way.

Abstract: The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus comprising a stage holding the substrate and being movable; a measurement unit configured to irradiate a side surface of the stage with light and measure a position of the stage, a generation unit configured to generate a flow of gas in a space where the stage moves, a detection unit configured to detect respective positions of sample shot regions formed on the substrate, and a control unit configured to determine an order of detecting the sample shot regions by the detection unit such that detection by the detection unit is performed sequentially from a sample shot region closer to the measurement unit with respect to sample shot regions located on a downstream side of the flow of the gas from a center of the substrate.

Abstract: A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.

Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.

Abstract: An apparatus according to the present invention comprises a membrane layer and a supporting supportive mesh, wherein the membrane layer and the supportive mesh form a monolithic structure that absorbs less than ten percent of EUV (Extreme Ultraviolet) light passing through it in which the membrane layer is composed of a metal-ceramic composite.

Abstract: The present invention provides a lithography apparatus including a plurality of detectors each configured to detect a mark on the substrate, and a controller configured to control a patterning so that a first operation and a second operation are alternately performed, the first operation irradiating the substrate with a beam while scan movement of the substrate is performed in a first direction, the second operation performing step movement of the substrate in a second direction different from the first direction, wherein the controller is configured to cause, in the first operation, at least one of the plurality of detectors to detect the mark, and the plurality of detectors are arranged, in the second direction, at an interval which is a positive integer multiple of a distance of the step movement.

Abstract: The present invention provides a measuring apparatus for measuring a position of an alignment mark formed on a substrate and including a first mark having position information in a first direction and a second mark having position information in a second direction different from the first direction, the apparatus including a detector configured to detect an image of the alignment mark, a controller configured to control movement of a stage for holding the substrate and detection by the detector, and a processor configured to obtain a position of the alignment mark whose image is detected by the detector, wherein the controller is configured to cause the detector to detect the image of the alignment mark with the stage moving in the first direction, and cause the detector to detect the image of the alignment mark with the stage moving in the second direction.

Abstract: To provide a toner from which an image having a stable image density can be obtained with reduced occurrence of pollution of members, even when a toner container is filled with a larger amount of toner than a conventional amount for long-term use. A toner including a toner particle and an external additive containing an organic-inorganic composite fine particle and an inorganic fine particle A; wherein the organic-inorganic composite fine particle includes a resin particle and an inorganic fine particle B, the resin particle has a surface with a convex derived from the inorganic fine particle B; has a specific number average particle diameter (D1) and a specific shape factor SF-2; and has a specific fixed state to the toner particle; the organic-inorganic composite fine particle has a specific unit diffusion index on the toner particle surface; the inorganic fine particle A has a specific BET specific surface area.

Abstract: An electrostatic-image developing toner contains toner particles and particles of a metallic salt of a fatty acid deposited on the toner particles. The particles of the metallic salt of the fatty acid contain 0.0035% to 0.07% by mass of sulfur element.

Abstract: A resin composition for a toner including a polyester resin and a colorant, wherein the polyester resin has A(10)-A(180) of 70 or greater, where A(10) (%) is a transmittance of light having a wavelength of 500 nm through a mixture of 20 parts by mass of the polyester resin added to 80 parts by mass of ethyl acetate and stirred at 25° C. for 10 minutes, and A(180) (%) is the transmittance after the mixture is left to stand for 3 hours.