Abstract: The invention is a process for manufacturing a nano aluminum/alumina metal matrix composite and composition produced therefrom The process is characterized by providing an aluminum powder having a natural oxide formation layer and an aluminum oxide content between about 0.1 and about 4.5 wt. % and a specific surface area of from about 0.3 and about 5 m2/g, hot working the aluminum powder, and forming a superfine grained matrix aluminum alloy. Simultaneously there is formed in situ a substantially uniform distribution of nano particles of alumina. The alloy has a substantially linear property/temperature profile, such that physical properties such as strength are substantially maintained even at temperatures of 250° C. and above.

Abstract: An object of the present invention is to provide a wire rod for a steel wire, which is excellent in low cycle fatigue characteristics and is useful as a material for a high-strength steel wire such as a wire rope or a PC steel wire, and to provide a steel wire that can exhibit such characteristics. A wire rod for a steel wire of the present invention comprises by mass: C: 0.70 to 1.3%; Si: 0.1 to 1.5%; Mn: 0.1 to 1.5%; N: 0.001 to 0.006%; Al: 0.001 to 0.10%; Ti: 0.02 to 0.20%; B: 0.0005 to 0.010%; P: 0% or more and 0.030% or less; and S: 0% or more and 0.030% or less, with the balance being iron and inevitable impurities, wherein, the wire rod having pearlite as a main phase and a hydrogen diffusion coefficient D in steel at 300° C. satisfies formula (1) below: D?2.5×10?7(cm2/sec)??(1).

Abstract: The disclosure is directed to an alloy steel suitable for rapid nitriding, having a steel composition including by weight (%): Carbon: from 0.2 to 0.4; Manganese: from 0.50 to 1.60; Silicon: from 0.50 to 2.0; Chromium: from 0.40 to 1.5; Vanadium: from 0.03 to 0.30; Aluminum: from 0.07 to 0.30; and a balance of iron and other residual elements, where amounts of nickel and molybdenum are limited.

Abstract: The invention relates to a duplex ferritic austenitic stainless steel having high formability utilizing the TRIP effect and high corrosion resistance with the high pitting resistance equivalent. The duplex stainless steel contains less than 0,04 weight % carbon, 0,2-0,8 weight % silicon, 0,3-2,0 weight % manganese, 4,0-19,0 weight % chromium, 2,0-5,0 weight % nickel, 4,0-7,0 weight % molybdenum, less than 4,5 weight % tungsten, 0,1-1,5 weight % copper, 0,14-0,23 weight % nitrogen, the rest being iron and inevitable impurities occurring in stainless steels. Further, the co-effect of the chromium, molybdenum and tungsten contents in weight % is in the range of 20<(Cr+Mo+0,5 W)<23,5, where the ratio Cr/(Mo+0,5W) is in the range of 2-4,75.

Abstract: A method of making a small diameter elongated steel article such as wire or strip is disclosed. The method includes the step of melting a steel alloy having the following weight percent composition. C 0.88-1.00 Mn 0.20-0.80 Si 0.50 max. P 0.050 max. S 0.010-0.100 Cr 0.15-0.90 Ni 0.10-0.50 Mo 0.25 max. Cu 0.08-0.23 V 0.025-0.15? N 0.060 max. O 0.040 max. and the balance is iron and usual impurities. The method includes melting the alloy, atomizing the molten alloy to make a pre-alloyed metal powder, consolidating the metal powder to substantially full density, and then hot working the consolidated metal powder to form an intermediate elongated article. The method further includes a multi-step heat treating process. A small diameter, elongated steel article having enhanced machinability is also disclosed.

Abstract: An iron-based alloy for use in a plasma transferred wire arc thermal spray apparatus includes a high sulfur steel alloy in a stainless and non-stainless forms including a high aluminum and high titanium content. The alloy has significant improvements in the elimination of spray coating cracking, reduction of machining cost, and improved lubrication performance.

Abstract: A system and method of verifying that a part is heat treated to strengthen the part. The part is marked with a thermo-chromatic composition before heat treating. The part is then heat treated to strengthen the part and change the color of the thermo-chromatic composition to indicate successful completion of the heat treating process. A detector may act to prevent the inclusion of a non-heat treated part in an assembly by disabling an assembly tool. A controller may also provide data related to the completion of the heat treating process to be recorded in a database.

Abstract: This copper alloy for electronic devices includes Mg at a content of 3.3 at % or more and 6.9 at % or less, with a remainder substantially being Cu and unavoidable impurities. When a concentration of Mg is given as X at %, an electrical conductivity ? (% IACS) is in a range of ??{1.7241/(?0.0347×X2+0.6569×X+1.7)}×100, and a stress relaxation rate at 150° C. after 1,000 hours is in a range of 50% or less.

Abstract: The present invention relates to a NiIr-base heat-resistant alloy which includes a Ni—Ir—Al—W-base alloy which contains Ir: 5.0 to 50.0 mass %, Al: 1.0 to 8.0 mass %, W: 5.0 to 20.0 mass %, and the balance is Ni, and a ?? phase having an L12 structure precipitating and dispersing in a matrix as an essential strengthening phase, and a ratio (Y/X) of a peak intensity (Y) of (201) plane of the Ir3W phase observed in the range of 2?=48° to 50° to a peak intensity (X) of (111) plane of the ?? phase observed in the range of 2?=43° to 45° in X-ray diffraction analysis is 0.5 or less. The alloy exhibits good high-temperature property stably.

Abstract: Disclosed herein are embodiments of alloys which can be particularly advantageous in twin wire arc spray methods for coating of a substrate. In some embodiments, a plurality of alloys can be used to form both hard and soft particles on a surface. In some embodiments, chromium can be minimized or eliminated.

Abstract: A time for doping an electrode material on an electrode sheet with a lithium ion can be reduced. The electrode manufacturing apparatus includes a processing chamber 200 to and from which the electrode sheet is loaded and unloaded; and a lithium thermal spraying unit 210 configured to dope a carbon material C with the lithium ion by forming a lithium thin film on the carbon material of the electrode sheet W loaded into the processing chamber while melting and spraying lithium-containing powder. Further, the lithium thermal spraying unit 210 includes a lithium-containing powder supply unit 250 configured to discharge the lithium-containing powder toward the electrode material of the electrode sheet, and at least one heating gas supply unit 260 configured to supply a heating gas that melts the lithium-containing powder discharged from the lithium-containing powder supply unit.

Abstract: A technique may include controlling, by a computing device, a vacuum pump to evacuate a vacuum chamber to high vacuum. The technique also may include controlling, by the computing device, a coating material source to provide a coating material to a plasma spray device, the coating material having a first composition including a first amount of a metal oxide and a second amount of silica. The second amount of silica may be greater than an amount of silica in a metal silicate including the first amount of metal oxide. The technique further may include controlling, by the computing device, the plasma spray device to deposit an environmental barrier coating on a substrate in the vacuum chamber using plasma spray physical vapor deposition, wherein the coating comprises the metal silicate.

Abstract: The present invention relates to a method for the production of a particle-containing aerosol, which includes comminutating a particle-containing cylinder. These aerosols are for example particularly suitable for use in the form of an aerosol stream in a coating process. The present invention further relates to particle-containing cylinders which can be dispersed and converted into aerosol form by simple methods.

Abstract: The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.

Abstract: A method for selective carburization of an article using low pressure induction carburization includes: providing or procuring an article including a surface; subjecting the article to directed induction heating, wherein a first portion of the surface of the article is inductively heated to a temperature that exceeds a carburizing temperature, while a second portion of the surface of the article remains at a temperature below the carburizing temperature; and simultaneously with subjecting the article to directed induction heating, subjecting the article to low pressure carburization, thereby selectively carburizing the first portion of the surface of the article while not carburizing the second portion of the surface of the article.

Abstract: Low temperature gas carburization of stainless steel using acetylene as the carburizing specie is carried out under soft vacuum conditions in the presence of hydrogen or other companion gas. Carburization is made to go faster by including HCl or other carbon-free, halogen-containing activating compound in the carburizing gas being fed to the carburization reactor.

Abstract: Provided is a steel sheet for soft-nitriding treatment which has a chemical composition consisting of, in mass %, C: more than or equal to 0.02% and less than 0.07%, Si: less than or equal to 0.10%, Mn: 1.1 to 1.8%, P: less than or equal to 0.05%, S: less than or equal to 0.01%, Al: 0.10 to 0.45%, N: less than or equal to 0.01%, Ti: 0.01 to 0.10%, Nb: 0 to 0.1%, Mo: 0 to 0.1%, V: 0 to 0.1%, Cr: 0 to 0.2%, and the balance: Fe and impurities, satisfies [Mn+Al>1.5], and has a total content of Ti, Nb, Mo, V, and Cr present as precipitates in the steel sheet of less than 0.03% in mass %. The steel sheet for soft-nitriding treatment has a metal structure in which a ferrite area ratio is more than or equal to 80%, and a ferrite dislocation density at a position of 50 ?m from a surface of the steel sheet is 1×1014 to 1×1016 m?2.

Abstract: A method of manufacturing an article comprises performing ion assisted deposition (IAD) to deposit a protective layer on at least one surface of the article, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 ?m and an average surface roughness of 10 micro-inches or less.

Abstract: The present invention provides a mask for production of an organic EL element, an apparatus for producing an organic EL element, and a method for producing an organic EL element which can give reduced luminance unevenness and eased restrictions in the production apparatus. The mask of the present invention includes first to fourth opening regions arranged in a staggered pattern, the first, second, third, and fourth opening regions arranged in the given order in a first direction, the first, second, third, and fourth opening regions respectively including first, second, third, and fourth mask openings in a second direction perpendicular to the first direction, the mask including no mask openings on the side of the first opening region opposite to the third opening region, the first and second mask openings each having a shorter length in the first direction than each of the third and fourth mask openings.

Abstract: The present invention provides a deposition mask including: a mask layer having an aperture pattern that is formed in conformity with a transparent electrode to be formed on a display surface of a display panel, with the same shape and size as the transparent electrode; and a support layer having plural support lines formed on one surface of the mask layer across the aperture pattern. In the mask, an arrangement pitch for the support lines of the support layer is set so as to reduce moire fringes or diffraction fringes that appear due to shadows of the support lines, which are transferred onto the transparent electrode as unevenness in deposition thickness.

Abstract: A vacuum deposition substrate comprising at least one of a plurality of patterned recesses, raises, or openings. The at least one of a plurality of patterned recesses, raises, or openings further define a geometry of a medical device.

Abstract: A vacuum evaporation apparatus comprises a carbon nanotube film structure within an evaporating source, a depositing substrate, and a vacuum room. The evaporating source and the depositing substrate are located in the vacuum room. The depositing substrate and the evaporating source are faced to and spaced from each other. The evaporating source includes an evaporating material, a carbon nanotube film structure, a first electrode, and a second electrode. The first electrode and the second electrode are spaced from each other and electrically connected to the carbon nanotube film structure. The carbon nanotube film structure is a carrier to carrying the evaporating material. The evaporating material is located on a surface of the carbon nanotube film structure.

Abstract: A vacuum evaporation method includes steps of: providing an evaporating source and a depositing substrate; spacing the depositing substrate and the evaporating source from each other in a vacuum room and vacuumizing the vacuum room; and inputting electrical signals to the carbon nanotube film structure from the first electrode and the second electrode to gasify the evaporating material to form a deposited layer on the depositing substrate.

Abstract: A vacuum evaporation method includes steps of: providing an evaporating source and a depositing substrate; spacing the depositing substrate and the evaporating source from each other in a vacuum room and f the vacuum room; and inputting an electromagnetic signal to the carbon nanotube film structure by an electromagnetic signal input device to gasify the evaporating material to form a deposited layer on the depositing substrate.

Abstract: A vacuum evaporating source comprises an evaporating material and a carbon nanotube film structure. The evaporating material is located on a carbon nanotube film structure surface. The carbon nanotube film structure is a carrying structure for the evaporating material.

Abstract: A vacuum evaporation apparatus comprises a carbon nanotube film structure within an evaporating source, a depositing substrate, a vacuum room, and an electromagnetic signal input device. The evaporating source and the depositing substrate are located in the vacuum room. The depositing substrate and the evaporating source are faced to and spaced from each other. The evaporating source includes an evaporating material, a carbon nanotube film structure, a first electrode, and a second electrode. The carbon nanotube film structure is a carrier to carrying the evaporating material. The evaporating material is located on a surface of the carbon nanotube film structure. The electromagnetic signal input device inputs an electromagnetic signal to the carbon nanotube film structure.

Abstract: Provided is a sputtering target having extremely low occurrence of arcing or nodules, and a method for manufacturing such a sputtering target. A flat plate-shaped or cylindrical target material (3, 13) is obtained by processing a material composed of an oxide sintered body. In doing so, a grindstone having a specified grade is used to perform rough grinding of a surface of the material that will become a sputtering surface (5, 15) one or more times in accordance to the grade of the grindstone, after which zero grinding is performed one or more times so that the surface roughness of the sputtering surface (5, 15) has an arithmetic mean roughness Ra of 0.9 ?m or more, a maximum height Rz of 10.0 ?m or less, and RzJIS roughness of 7.0 ?m or less. A sputtering target (1, 11) is obtained by bonding the obtained target material (3, 13) to a backing body (2, 12) by way of a bonding layer (4, 14).

Abstract: Provided is an oxide sintered body that, when used to obtain an oxide semiconductor thin film by sputtering, can achieve a low carrier concentration and a high carrier mobility. Also provided is a sputtering target using the oxide sintered body. The oxide sintered body contains, as oxides, indium, gallium, and at least one positive divalent element selected from the group consisting of nickel, cobalt, calcium, strontium, and lead. The gallium content, in terms of the atomic ratio Ga/(In+Ga), is from 0.20 to 0.45, and the positive divalent element content, in terms of the atomic ratio M/(In+Ga+M), is from 0.0001 to 0.05. The amorphous oxide semiconductor thin film, which is formed using the oxide sintered body as a sputtering target, can achieve a carrier concentration of less than 3.0×1018 cm?3 and a carrier mobility of at least 10 cm2V?1 sec?1.

Abstract: Methods of fabricating magnetic devices are described herein. Methods involve exposing a magnetic film, such as a CoFeB film, to a reducing agent before, during, or after depositing a metal oxide film using atomic layer deposition or chemical vapor deposition. Some methods include exposing the magnetic film in cycles involving exposure to a reducing agent, exposure to a magnesium-containing precursor, and exposure to an oxidant. Methods are suitable for depositing a magnesium oxide layer on a CoFeB layer to form part of a magnetic tunnel junction.

Abstract: A method for MOCVD gas showerhead pretreatment, which includes: providing a reaction chamber, an evacuating system located at bottom of reaction chamber and a gas showerhead fixed on top of reaction chamber. The gas showerhead includes the cooling plate at the bottom and gas supplying system on the top; the processing steps include filling high-pressure pretreatment gas into reaction chamber-exhausting pretreatment gas-filling air-exhausting air and many other procedures; circulating above procedures until accomplishment of pretreatment on gas showerhead in the reaction chamber and other exposed components.

Abstract: A counterflow mixing device for a process chamber is disclosed, comprising an injection tube that introduces a fluid in a manner counter to a flow of a post-plasma gas mixture traveling downward from a plasma source. The invention allows for proper mixing of the fluid as well as avoiding recombination of generated ions and radicals.

Abstract: A plasma processing method is provided. In the plasma processing method, a plurality of types of mixed gases is supplied to a plurality of areas on a film deposited on a surface of a substrate. The plurality of types of mixed gases contains a plurality types of noble gases. The plurality of types of mixed gases has different mix proportions of the plurality types of noble gases from each other. The plurality of types of mixed gases is converted to plasma. A plasma process is performed by using the mixed gases converted to the plasma on the film.

Abstract: Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time.

Abstract: A shower head according to an embodiment includes: a mixing chamber mixing a plurality of process gases; a shower plate provided below the mixing chamber, the shower plate including a plurality of longitudinal flow paths and a lateral cooling flow path provided between the longitudinal flow paths, a mixed gas of the process gases flowing through the longitudinal flow paths, a cooling medium flowing through the lateral cooling flow path; and an outer circumferential portion cooling flow path provided around the shower plate.

Abstract: Techniques are provided to improve the quality of the thin films deposited on substrates. A substrate transporting mechanism is configured to transport a plurality of substrates arranged in a line along a transport path extending in a first container from an entrance to an exit, and to load and unload substrates into and out of a second container in order. The driving units to drive the substrate transporting mechanism are configured to be detachable from the substrate transporting mechanism provided in the first container and are respectively provided in a substrate loading chamber and a substrate unloading chamber.

Abstract: A method of providing a coating on a conductor. The coating has a first layer containing palladium and a second layer containing gold from the conductor side. The first layer has an inner layer on the conductor side and an outer layer arranged nearer to the second layer than the inner layer, and the outer layer has a higher phosphorus concentration than the inner layer.

Abstract: A method is disclosed for electroless plating of thin metal film directly onto a substrate. The method includes the steps of: cleaning the substrate to remove organic material; etching a surface of the substrate to remove an oxygen-containing surface layer; soaking and rinsing the substrate in a plurality of baths following etching; and electroless plating the metal onto the substrate.

Abstract: Disclosed is a zirconium-based metal pretreatment coating composition that includes a metal chelator that chelates copper in the metal pretreatment coating composition and thereby improves adhesion of paints to a metal substrate coated with the pretreatment coating composition and the chelating agent is present in a sufficient amount to ensure that in the deposited pretreatment coating on the metal substrate the average total atomic % of copper to atomic % of zirconium is equal to or less than 1.1. The pretreatment coating composition is useful for treating a variety of metal substrates.

Abstract: There are provided methods and methods and compositions for suppressing corrosion of a corrodible metal surface that contacts a water stream in a water system. The method comprises introducing into the water stream a treatment composition, the treatment composition including a Tin(II) corrosion inhibitor and a hydroxycarboxylic acid promoter.

Abstract: A corrosion protection cathode using an external power supply in which a reinforcing layer formed of a fiber base material is laminated with an adhesive layer on one surface of a conductive layer formed of a graphite sheet, and an electrolyte layer of an electrolyte-containing resin formed in a sheet shape and having adhesive power such that the layer is capable of being adhered to the conductive layer and to a surface layer of an object to be protected from corrosion is adhered by the adhesive power thereof to the other surface of the conductive layer, wherein the conductive layer always has a resistance value of 4? or less between any two points on the surface thereof on a side that comes into contact with the electrolyte layer.

Abstract: An electrochemical reaction device comprises: an electrolytic solution tank including a first region, a second region, and a path; a reduction electrode disposed in the first region; an oxidation electrode disposed in the second region; and a power source connected to the reduction electrode and oxidation electrode; and a plurality of ion exchange membranes separating the first region and the second region.

Abstract: A method of manufacturing a photoelectrode of an embodiment includes: preparing a stack including a first electrode layer having a light transmitting electrode, a second electrode layer having a metal electrode, and a photovoltaic layer disposed between the electrode layers; immersing the stack in an electrolytic solution containing an ion including a metal constituting a catalyst layer which is to be formed on the first electrode layer; and passing a current to the stack through the second electrode layer to electrochemically precipitate at least one selected from the metal and a compound containing the metal, onto the first electrode layer, thereby forming the catalyst layer.

Abstract: A device for producing an organic hydride 10 of an aspect of the present invention has an electrochemical cell provided with an anode 12 on a surface of an electrolyte membrane 11 and a cathode including a cathode catalyst layer 13 and a cathode diffusion layer 14 on another surface of the electrolyte membrane 11. A gap is provided between the anode 12 and the electrolyte membrane 11. The anode 12 has a network structure with an aperture ratio of 30 to 70%, and has an electrical supply supporting material formed of an electronic conductor and the electrode catalyst held by the electrical supply supporting material.

Abstract: An electrodialytic buffer generator is described. The buffer generator may include a central buffer-generating channel having an inlet and outlet, a second chamber, and a third chamber. The buffer-generating channel, the second chamber, and the third chamber may each include an electrode. The buffer generator may also include a first ion exchange barrier and a second ion exchange barrier. The first ion exchange barrier can be disposed between the second chamber and the buffer-generating channel. The second ion exchange barrier can be disposed between the third chamber and the buffer-generating channel.

Abstract: A hydrogen generation electrode is used for an artificial photosynthesis module that decomposes an electrolytic aqueous solution into hydrogen and oxygen with light. The hydrogen generation electrode has a conductive layer, an inorganic semiconductor layer that is provided on the conductive layer and has a pn junction, and a functional layer that covers an inorganic semiconductor layer. The steam permeability of the functional layer is 5 g/(m2·day) or less.

Abstract: The invention provides a system and a process that allow for the selective electrochemical conversion of carbon dioxide to carbon monoxide with high energy efficiency, using a cathode comprised of tin in combination with an anode comprised of platinum. The electrolysis system may be comprised of a single or two compartment cell and may employ an organic electrolyte or an ionic liquid electrolyte. The invention permits the storage of solar, wind or conventional electric energy by converting carbon dioxide to carbon monoxide and liquid fuels.

Abstract: An electrode includes a base material, and a catalyst layer provided on the base material, the catalyst layer including a plurality of catalyst units having a porous structure. The catalyst layer has a first catalyst layer provided near the base material, the first catalyst layer including a plurality of the catalyst units dispersed at a first dispersion degree. The catalyst layer has a second catalyst layer provided above the first catalyst layer, the second catalyst layer including a plurality of the catalyst units dispersed at a second dispersion degree. The second dispersion degree is different from the first dispersion degree.

Abstract: The present invention discloses porous covalent organic frameworks (COF) supported noble metal-free nanoparticles which are useful as electrocatalysts for a water splitting system, and to the process for preparation of such electrocatalysts. The covalent organic frameworks (COF) supported noble metal-free nanoparticles have general formula (I): COF_AxBy(M)n??(Formula I) wherein COF is selected from a Tris (4-formylphenyl)amine terephthaldehyde polymer or a benzimidazole-phloroglucinol polymer; ‘A’ and ‘B’ each independently represent a transition metal selected from the group consisting of Ni, Co, Fe, Mn, Zn, and mixtures thereof; or ‘A’ and ‘B’ together represent a transition metal selected from the group consisting of Ni, Co, Fe, Mn, Zn, and mixtures thereof; ‘M’ represents hydroxide or a nitride ion; ‘x’ and ‘y’ represent the weight % of the metal loadings; or a ratio of x:y is between 0:1 and 1:0; and ‘n’ is an integer 1 or 2 or 3.

Abstract: A hydrogen generation method includes generating a driver signal wherein the driver signal is a pulsed DC signal, processing the driver signal to generate a chamber excitation signal and applying the chamber excitation signal to a hydrogen generation chamber to generate hydrogen from a feedstock contained within the chamber wherein the hydrogen generation chamber includes at least one hollow cylindrical anode configured to contain the feedstock, and at least one cathode positioned within the at least one hollow cylindrical anode.

Abstract: The invention relates to an electrode material, preferably an inert anode material comprising at least a metal core and a cermet material, characterized in that: said metal core contains at least one nickel (Ni) and iron (Fe) alloy, said cermet material comprises at least as percentages by weight: 45 to 80% of a nickel ferrite oxide phase (2) of composition NixFeyMzO4 with 0.60 ?x?0.90; 1.90?y?2.40; 0.00?z?0.20 and M being a metal selected from aluminum (Al), cobalt (Co), chromium (Cr), manganese (Mn), titanium (Ti), zirconium (Zr), tin (Sn), vanadium (V), niobium (Nb), tantalum (Ta) and hafnium (Hf) or being a combination of these metals, 15 to 45% of a metallic phase (1) comprising at least one alloy of nickel and copper.