Abstract: A system and method for optimizing (designing) a mask pattern, in which SMO and OPC are collaboratively used to exert a sufficient collaborative effect or are appropriately used in different manners. The method for designing a source and a mask for lithography includes a step (S1) of selecting a set of patterns; a step of performing source mask optimization (SMO) using the set of patterns, under an optical proximity correction (OPC) restriction rule which is used for selectively restricting shifting of an edge position of a polygon when OPC is applied to the set of patterns; and a step (S3, S4) of determining a layout of the mask for lithography, by applying OPC to all patterns constituting the mask for lithography using the source optimized through the SMO.

Abstract: A semiconductor layout pattern includes a device layout pattern, a plurality of rectangular first dummy patterns having a first size, a plurality of rectangular second dummy patterns having second sizes, and a plurality of bar-like third dummy patterns having varied third sizes. The pattern densities are smartly equalized by positioning the second dummy patterns.

Abstract: A method of controlling distortion of an exposure process is provided. The method includes aligning an exposure mask with a wafer, forming a first test pattern on the wafer by performing a first exposure with the exposure mask and a first illumination system, forming a photoresist layer on an entire surface of the wafer including the first test pattern, performing a second exposure with the exposure mask and a second illumination system to form a second test pattern overlapping with the first test pattern, extracting a distortion value between the first test pattern and the second test pattern, and correcting the exposure mask or fabricating a corrected exposure mask using the distortion value.

Abstract: A mask includes a doped substrate having a first region, a second region and a third region. The doped substrate in the first region has a first thickness to define a first mask state and in the second region has a second thickness to define a second mask state. The second thickness is different than the first thickness. The mask also includes an absorption material layer disposed over the third region to define a border region.

Abstract: In a method of cleaning a photomask, a wiper tape is guided from a wiper tape supplying reel, over a cleaning head, and then onto a wiper tape collecting reel. A section of the wiper tape over the cleaning head is brought into contact with an adhesive residue on a surface of the photomask. A relative movement is caused between the photomask and the section of the wiper tape to remove the adhesive residue from the surface of the photomask.

Abstract: A green photoresist composition capable of emitting infrared light, a method of preparing the green photoresist composition capable of emitting infrared light, a color filter including green sub-pixels formed from the green photoresist composition capable of emitting infrared light, and a display device including the color filter. The green photoresist composition capable of emitting infrared light includes, based on the total weight of the composition, 2% to 20% of a color mixed material, 30% to 90% of a solvent, 2% to 20% of an alkali-soluble resin, 2% to 20% of an ethenoid unsaturated monomer, 0.01% to 1% of photoinitiator, and 0.005% to 0.02% of other additives; wherein the color mixed material includes a colorant and a surface-modified infrared light-emitting material at a weight ratio of 36:1 to 1:1.

Abstract: A positive photosensitive siloxane resin composition includes a) a siloxane copolymer obtained by performing hydrolysis and condensation polymerization of i) at least one reactive silane represented by the following Chemical Formula 1 and ii) at least one 4-functional reactive silane represented by the following Chemical Formula 2 under a catalyst, the copolymer having a polystyrene-converted weight average molecular weight Mw of 1,000 to 20,000, b) a 1,2-quinonediazide compound, and c) a solvent, (R1)nSi(R2)4-n??[Chemical Formula 1] Si(R3)4??[Chemical Formula 2] wherein R1s may each independently be any one of an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 15 carbon atoms, R2 may be an alkoxy group having 1 to 4 carbon atoms, phenoxy, or acetoxy, R3s may each independently be any one of an alkoxy group having 1 to 4 carbon atoms, phenoxy, or an acetoxy group, and n may be a natural number of 1 to 3.

Abstract: A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom can be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a C2 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-A4b-, * represents a binding site to an oxygen atom in —O—CO—, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, and “a” represents 0 or 1.

Abstract: A photoresist composition and methods of using the same are disclosed. The photoresist includes a polymer backbone, an acid labile group (ALG) chemically bonded to the polymer backbone, a photo-acid generator (PAG), a solvent, and a silicon-containing unit that is chemically bonded to one of: the ALG and a crosslinker. A method of using the photoresist composition includes forming a layer of the photoresist over a substrate, performing an exposing process to the photoresist layer; and developing the photoresist layer, thereby forming a patterned photoresist layer. The patterned photoresist layer includes the silicon-containing unit.

Abstract: The purpose of the present invention is to provide: a resin composition, a cured product of which has extremely low residual stress and exhibits excellent adhesion to a metal substrate such as a Pt, LT or Ta substrate after a wet heat test in the fields of semiconductors and MEMS/micromachine applications; a laminate of this resin composition; and a cured product of this resin composition or the laminate. The present invention is a photosensitive resin composition which contains an epoxy resin (A), a compound having a phenolic hydroxyl group (B) and a cationic photopolymerization initiator (C), and wherein: the epoxy resin (A) has a weighted average epoxy equivalent weight of 300 g/eq. or more; 20% by mass or more of the epoxy resin (A) is an epoxy resin represented by formula (1) and having an epoxy equivalent weight of 500-4,500 g/eq.; and the compound having a phenolic hydroxyl group (B) contains a phenolic compound having a specific structure.

Abstract: The present invention provides a composition for forming a resist underlayer film, containing an organic solvent and either or both of a compound shown by the following general formula (1) and a condensate of the compound. There can be provided a composition for forming a resist underlayer film that is capable of forming an underlayer film, especially for use in a three-layer resist process, that can reduce reflectance, has high pattern-bend resistance, and prevents line fall and wiggling after etching of a high aspect line especially thinner than 60 nm, and a patterning process using the same.

Abstract: A method of manufacturing a substrate includes applying solder resist ink containing a mixing resin of epoxy-based resin and acrylic-based resin on at least one surface of a substrate body to form a solder resist layer, and irradiating a predetermined portion of the solder resist layer with ultraviolet rays and controlling an amount of irradiation of the ultraviolet rays irradiated to the predetermined of the solder resist layer to form the predetermined portion in transmissivity that transmits light.

Abstract: A method of forming a fine pattern comprises depositing a modifying layer on a substrate. A photoresist layer is deposited on the modifying layer, the photoresist layer having a first pattern. The modifying layer is etched according to the first pattern of the photoresist layer. A treatment is performed to the etched modifying layer to form a second pattern, the second pattern having a smaller line width roughness (LWR) and/or line edge roughness (LER) than the first pattern. The second pattern is then etched into the substrate.

Abstract: A method for fabricating a pattern on a semiconductor substrate, comprising the steps of: (a) providing the semiconductor substrate having a photosensitive layer thereon; (b) transmitting the semiconductor substrate to an exposure apparatus including several tubes; (c) providing the supporting assembly to support the tubes, where the supporting assembly includes a first supporting rod having several first parallel recesses, a second supporting rod disposed opposite to the first supporting rod, a bridging member connected to one end of the first supporting rod or one end of the second supporting rod; and a rolling member received by the bridging member; (d) providing a photomask to the exposure apparatus; and (e) transferring the pattern from the photomask to the photosensitive layer.

Abstract: An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

Abstract: An exposure method and apparatus exposes an object with an exposure beam via a projection optical system and a liquid of a liquid immersion area formed under the projection optical system. A first stage on which the object is held and a second stage are moved relative to each other so that the second stage approaches the first stage that is placed facing the projection optical system, the second stage having an upper surface contactable with a liquid immersion area. The first and second stages that have approached each other are moved with respect to the projection optical system so that the second stage is placed facing the projection optical system instead of the first stage. For relative movement of the first and second stages in the approaching, driving of the first and second stages is controlled based on outer periphery positional information of the first stage.

Abstract: A set of original model candidates are first divided into groups of original model candidates. Child model candidates are generated by performing crossover on each of the groups of original model candidates without mutation. From the original model candidates and the child model candidates, a set of new model candidates are derived, which includes: selecting a group of new model candidates from each group of the original model candidates and the corresponding child model candidates, selecting an additional new model candidate if adding the additional new model candidate increases overall diversity, and performing niche clearing to keep a number of the new model candidates in each of niches from exceeding a maximum number. The dividing, generating and deriving operations are then iterated. Model caching may be performed by restricting the crossover to the model term level or above.

Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

Abstract: While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved.

Abstract: A lithographic apparatus includes a reflector to redirect a radiation beam, e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system includes a non-compensating actuator device and a compensating actuator device to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.

Abstract: A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.

Abstract: An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the driving apparatus. The controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in the same row, the third and fourth shot regions being arranged in different rows.

Abstract: An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine movement stage when the fine movement stage is holding the liquid with the projection optical system, and moves along with the fine movement stage while maintaining the proximity state, and then holds the liquid with the projection optical system after the movement. Accordingly, a plurality of stages will not have to be placed right under the projection optical system interchangeably, which can suppress an increase in footprint of the exposure apparatus.

Abstract: A focusing and leveling apparatus, including: an illumination light source (201) for emanating a light beam; an illumination lens group (202), a projecting unit, an object (209) being measured, a detecting unit, a refractive unit, a relay lens group and a photoelectric detector (220), disposed sequentially in this order in a transmission path of the light beam. The projecting unit includes projection slits (203) defining a plurality of non-linearly arranged marks, such that after passing sequentially through the illumination lens group (202), the projecting unit, the object (209) being measured and the detecting unit, the light beam emanated by the illumination light source (201) becomes a plurality of non-linearly arranged sub-beams corresponding to the plurality of marks. The refractive unit is so configured that after passing through the refractive unit, the plurality of sub-beams form a plurality of linearly arranged light spots.

Abstract: An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.

Abstract: A process cartridge includes an electrophotographic photosensitive member and a gap retaining member, where the electrophotographic photosensitive member includes a first region having an undercoat layer, a charge generating layer, and a charge transporting layer on a support in this order and a second region having an undercoat layer and a charge transporting layer on a support in this order, the undercoat layer contains a metal oxide particle and any one of an urethane resin, an amino resin, and a polyamide resin as a binder resin, and the charge transporting layer contains a charge transporting substance and at least one selected from the group consisting of a polycarbonate resin and a polyester resin, and where the gap retaining member comes into contact with a surface of the second region of the electrophotographic photosensitive member.

Abstract: An electrophotographic photosensitive member includes an electroconductive support, and an intermediate layer, charge generation layer containing a charge generation material, and a charge transport layer containing a charge transport material sequentially disposed on the electroconductive support, wherein the intermediate layer contains a compound having two or more diarylphosphine oxide structures and a resin.

Abstract: An electrophotographic recording media containing a base substrate coated on at least one side with an image-receiving layer that contains a polymeric polyolefin resin and more than about 20 wt % of inorganic pigments dispersed into said resin. Also disclosed is a method of 5 making such recording media and process for producing an image on said electrophotographic recording media.

Abstract: Provided is a toner, including: a toner particle containing a binder resin and a colorant; and an inorganic fine particle, in which the toner particle has an average circularity of 0.960 or more, and in which the toner satisfies the formula (1) and the formula (2). Fp(A)?25.0 nN??Formula (1) (Fp(B)?Fp(A))/Fp(A)?0.

Abstract: Environmentally friendly toner particles are provided which may include a bio-based amorphous polyester resin including camphoric acid, optionally in combination with a crystalline resin. Methods for providing these toners are also provided.

Abstract: To provide a toner, containing: a binder resin; a colorant; a releasing agent; and a crystalline polyester resin, wherein the toner satisfies the following formulae (1) to (3): 40° C.?X?55° C. Formula (1) 85° C.?Y?92° C. Formula (2) 35° C.?Y?X?50° C. Formula (3) where X is an onset temperature and Y is an endset temperature of an endothermic peak on a differential scanning calorimetry (DSC) curve of the toner as measured by a differential scanning calorimeter (DSC).

Abstract: A support material toner particle for use in xerographic additive manufacturing includes a polyvinyl alcohol (PVA) polymer and blend-additives including a chitosan and a polyvinylpyrrolidone (PVP), the amount of blend-additives is selected to adjust the Tg of the PVA polymer to be within about 1° C. to about 20° C. of a desired build material toner Tg. A xerographic toner system includes a build toner material and a support toner material, the support toner material includes a polyvinyl alcohol (PVA) polymer and blend-additives including a chitosan and a polyvinylpyrrolidone (PVP), the amount of blend-additives is selected to adjust the Tg of the PVA polymer to be within about 1° C. to about 20° C. of the build material toner Tg. A method of making a support toner material includes blending polyvinyl alcohol with blend additives including a chitosan and polyvinylpyrrolidone and forming support toner particles after the blending step.

Abstract: Provided is a toner including toner particles each containing: a binder resin, a crystalline polyester, and a colorant, in which: the colorant includes a compound represented by the following formula (1); and the binder resin and the crystalline polyester satisfy the following formula (2): in the formula (1), R1, R2, and R3 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and Ar represents an aryl group. ?SP=|SP1?SP2|?0.43??Formula (2).

Abstract: An electrostatic latent image developing toner includes a plurality of toner particles each including a core and a shell layer. The shell layer is disposed over a surface of the core. The shell layer is substantially formed by a resin. The shell layer has a surface including a plurality of spot regions and a sheet region that is more hydrophobic than the spot regions. The spot regions each are more chargeable than the sheet region.

Abstract: Provided is a toner, comprising a toner particle having a core-shell structure composed of a core particle and a shell phase on a surface of the core particle, the core particle containing a resin X and a colorant, the shell phase being derived from a resin fine particle containing a resin Y, in which a relationship among a SP value of the resin X, a SP value of the resin Y, and a SP value of an organic solvent falls within a specific range, and a relationship between a number-average particle diameter of the resin fine particle when the resin fine particle is dispersed in water and a number-average particle diameter of the resin fine particle when the resin fine particle is dispersed in the organic solvent falls within a specific range.

Abstract: A method of making a liquid electrophotographic (LEP) paste is disclosed herein. A base paste is made by forming a dispersion of a pigment and a non-polar carrier, adding a transparent resin dispersion to the pigment dispersion to form a dispersion mixture, and homogenizing the dispersion mixture. The transparent resin dispersion includes a polymer dispersed in a non-aqueous carrier. The homogenizing may be accomplished by agitating the dispersion mixture at a frequency of less than 1 kHz, thereby forming the paste.

Abstract: Liquid electrophotographic compositions, methods of manufacturing liquid electrophotographic compositions, methods of printing using liquid electrophotographic compositions and printed articles are disclosed.

Abstract: A curable liquid developer containing a curable insulating liquid and a toner particle that contains a pigment and a resin, wherein the viscosity of the curable insulating liquid at 25° C. is at least 1 mPa·s and not more than 100 mPa·s, and when A (mPa·s) is the viscosity of the curable liquid developer at 25° C. in a case where the toner particle concentration in the curable liquid developer is 50 mass %, and B (mPa·s) is the viscosity of the curable liquid developer at 25° C. in a case where the toner particle concentration in the curable liquid developer is 1 mass %, the value of A?B is not more than 1,000 mPa·s.

Abstract: Herein is disclosed a liquid electro photographic (LEP) printing composition comprising: a first resin component comprising an ethylene acrylic acid resin, an ethylene methacrylic acid resin or combinations thereof; and a second resin component present in an amount of about 20% to about 80% by weight of total solids content of the composition, the second resin component having a melting point of from about 50° C. to about 75° C., which is below the melting point of the first resin component, or from about 140° C. to about 180° C., which is above the melting point of the first resin component.

Abstract: A destaticizing brush includes a grounding member, a conductive brush member, and an adhesive tape member. The conductive brush member is bent back in a U-turn shape along an outer periphery of the grounding member in a direction in which a longitudinal direction intersects the grounding member such that the conductive brush member is in electric contact with the grounding member. An outer periphery of the conductive brush member that has been bent back and the grounding member are adhered in an integrated manner with the adhesive tape member, and at least one end of the conductive brush member is exposed from the adhesive tape member.

Abstract: An image forming apparatus includes an image forming portion configured to form a toner image. The image forming portion includes: a photosensitive body; a charging device; an exposure device; a toner supply device; and a transfer device. A continuously printed amount, which has been attained by the image forming portion while the image forming portion has formed toner images continuously with a time interval between every two successive image-forming timings having a length shorter than or equal to a prescribed length, is determined. A charging voltage to be applied to the charging device is set based on a sum of a reference charging voltage and a correction value, the reference charging voltage being determined based on a target surface potential of the photosensitive body, the correction value being determined based on the continuously printed amount.

Abstract: A field effect (FE) electric charger device that electrically charges a surface of a charge-target member, the FE electric charger device including: an electric charger element; a power source supplying the electric charger element with current; and a lead electrode generating an electric field upon voltage application and causing the electric charger element to discharge. In the FE electric charger device, the electric charger element has a density no smaller than 0.4 g/cm3, and includes a plurality of filaments each including a plurality of sp2 carbon molecules bonded together.

Abstract: A light source device includes a light source configured to emit a laser beam; a lens through which the laser beam emitted from the light source passes; and a holder member for holding the light source and the lens; wherein the holder member is provided with an opening through which the laser beam is outputted; wherein the lens is bonded with the holder member at whole circumference of the opening by an adhesive material without contact with the holder member.

Abstract: A light source device includes a semiconductor laser configured to emit a laser beam, the semiconductor laser including a stem provided with a cut-away portion; and a holder member including a cylindrical portion configured to hold the semiconductor laser, wherein an inner surface of the cylindrical portion has a surface opposing the stem, and wherein the opposing surface includes a contact portion disposed at a position corresponding to the cut-away portion and contacting the stem and a spaced portion spaced from the stem.

Abstract: A light-beam-scanning apparatus includes first and second array-light sources including plural light-emitting units and a light-receiving unit; first and second light-source-control units for controlling light emission of the light-emitting units; a write-control unit for controlling the light-source-control units; a deflection unit for deflecting a direction of light emitted from the light-emitting units; and a synchronization-detection element for generating a synchronization-detection signal according to the light deflected by the deflection unit incident onto the synchronization-detection element. Initialization of the light-emitting units of the second array-light source is performed after initialization of the first array-light source is performed; and when the initialization of the light-emitting units of the first array-light source is being performed, a signal for causing the light-emitting units of the second array-light source not to emit light is input to the second light-source-control unit.

Abstract: A relationship between a light amount of an exposure portion and a surface potential according to a use amount, a first detection light amount corresponding to a prescribed surface potential in the relationship where a use amount of a photosensitive member is a first use amount and a second detection light amount corresponding to the prescribed surface potential in the relationship where the use amount of the photosensitive member is a second use amount, which is greater than the first use amount, are acquired. The exposure portion changes, as an electrostatic image forming light amount, a first image forming light amount representing a setting value under the first use amount to a second image forming light amount representing a setting value under the second use amount on the basis of a ratio of the first detection light amount to the second detection light amount.

Abstract: An electrophotographic device member R is used in an electrophotographic device. The electrophotographic device member R has a surface layer 1. The surface layer 1 has a matrix polymer 11 forming a skeleton of the surface layer 1 and a surface modifier 12 contained in the matrix polymer 11. The surface modifier 12 is composed of a copolymer containing, in its molecule, a first polymerization unit derived from a (meth)acrylate having a silicone group 121 and a second polymerization unit derived from a (meth)acrylate having a fluorine-containing group 122.