Patents Issued in May 1, 2018
  • Patent number: 9957611
    Abstract: Provided is a removal device for a semiconductor manufacturing apparatus according to an embodiment including a reservoir being connectable to a reaction chamber where a film is formed on a substrate and storing a byproduct derived from an exhaust gas exhausted from the reaction chamber, a vacuum generator driven by a driving gas, and a suction pipe having one connected to the reservoir and the other connected to the vacuum generator and suctioning the byproduct.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: May 1, 2018
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Hirokazu Hayashi
  • Patent number: 9957612
    Abstract: Disclosed herein is a delivery device comprising a chamber; a gas inlet; a gas outlet; and a dip tube contained within the chamber and having an upper portion and a lower portion, the upper portion of the dip tube being in fluid communication with the gas inlet and being operative to permit the entry of a carrier gas; the lower portion of the dip tube extending into the chamber, the lower portion of the dip tube terminating in an outlet end; and a sleeve; where the sleeve has a first end and a second end; the first end being in an interference fit with the lower portion of the dip tube; and where the sleeve vibrates upon being subjected to a disturbance.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: May 1, 2018
    Assignee: CERES TECHNOLOGIES, INC.
    Inventors: Egbert Woelk, Ronald L. DiCarlo, Deodatta Vinayak Shenai-Khatkhate
  • Patent number: 9957613
    Abstract: A laminate includes: a base material having a top surface; an under coat layer formed on at least a part of the top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having an OH group; and an atomic layer deposition film formed in a membranous shape to cover an exposed surface of the under coat layer, the atomic layer deposition film being formed by a precursor as a material thereof. At least a part of the precursor is coupled to the OH group of the organic polymer.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: May 1, 2018
    Assignee: TOPPAN PRINTING CO., LTD.
    Inventors: Hiroshi Koyama, Jin Sato, Mitsuru Kano
  • Patent number: 9957614
    Abstract: The present disclosure relates to a novel ruthenium compound, a method for preparing the ruthenium compound, a precursor composition for depositing a ruthenium-containing film including the ruthenium compound, and a method for depositing a ruthenium-containing film by using the precursor composition.
    Type: Grant
    Filed: May 26, 2015
    Date of Patent: May 1, 2018
    Assignee: UP Chemical Co., Ltd.
    Inventors: Won Seok Han, So Young Kim, Wonyong Koh
  • Patent number: 9957615
    Abstract: Apparatus for improving substrate temperature uniformity in a substrate processing chamber are provided herein. In some embodiments, a substrate support processing chamber may include a chamber body having a bottom portion and a sidewall having a slit valve opening to load and unload substrates, a pin lift mechanism, disposed in a pin lift mechanism opening formed in the bottom portion of the chamber body, having a plurality of substrate support pins coupled to the pin lift mechanism, a movable substrate support heater having substrate support portion and a shaft, and a cover plate disposed about the shaft of the movable substrate support, wherein the cover plate covers the pin lift mechanism and pin lift mechanism opening.
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: May 1, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Gwo-Chuan Tzu, Kazuya Daito, Sang-Hyeob Lee
  • Patent number: 9957616
    Abstract: The present invention is directed providing a technique capable of reducing a time for stabilizing a temperature in a processing chamber. The technique includes: a substrate support configured to support a substrate; a thermal insulation unit disposed below the substrate support; a processing chamber configured to accommodate the substrate support and where the substrate is processed; a first heating unit disposed around the processing chamber and configured to heat an inside of the processing chamber from a lateral side thereof; and a second heating unit disposed between the substrate support and the thermal insulation unit inside the processing chamber, the second heating unit including a heater having a substantially annular shape and a suspending member extending downward from the heater, wherein a diameter of the heater is smaller than that of the substrate.
    Type: Grant
    Filed: February 24, 2016
    Date of Patent: May 1, 2018
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hitoshi Murata, Yuichi Wada, Takashi Yahata, Hidenari Yoshida, Shuhei Saido
  • Patent number: 9957617
    Abstract: A deposition system which is configured to enable improved temperature uniformity of a heated substrate may include a susceptor provided in a chamber to hold a substrate, a reflection housing provided outside the chamber, a heating module including light sources provided in the reflection housing, and a reflection control module provided in the reflection housing between the heat sources and the chamber. The reflection control module may be configured to reflect light, which propagates along a first trajectory from the light sources toward a center region of the substrate, to propagate along a second trajectory toward an edge region of the substrate, thereby providing improved substrate irradiance uniformity and thus improved substrate temperature uniformity. Improved substrate temperature uniformity may result in improved thickness uniformity of layers provided on the substrate in a deposition process.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: May 1, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Bongjin Kuh, Beom Seok Kim, Woocheol Jeong, Sunghwi Cho, Woosung Ha
  • Patent number: 9957618
    Abstract: Described herein are reactors capable of sequentially or simultaneously depositing thin-film polymers onto a substrate by oxidative chemical vapor deposition (oCVD), initiated chemical vapor deposition (iCVD), and plasma-enhanced chemical vapor deposition (PECVD). The single-unit CVD reactors allow for the use of more than one CVD process on the same substrate without the risk of inadvertently exposing the substrate to ambient conditions when switching processes. Furthermore, the ability to deposit simultaneously polymers made by two different CVD processes allows for the exploration of new materials. In addition to assisting in the deposition of polymer films, plasma processes may be used to pretreat substrate surfaces before polymer deposition, or to clean the internal surfaces of the reactor between experiments.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: May 1, 2018
    Assignee: Massachusetts Institute of Technology
    Inventors: Dhiman Bhattacharyya, Karen K. Gleason, Miles C. Barr
  • Patent number: 9957619
    Abstract: A phosphate solution for a zinc or zinc-based alloy plated steel sheet, and a zinc or zinc-based alloy plated steel sheet using the same are provided. The phosphate solution for a zinc or zinc-based alloy plated steel sheet contains a molybdenum (Mo) ion, a calcium (Ca) ion and a phosphate ion. A zinc or zinc-based alloy plated steel sheet includes a base steel sheet, a zinc-based or zinc alloy-based plating layer formed on the base steel sheet, and a phosphate film formed on the zinc-based or zinc alloy-based plating layer. The phosphate film contains a molybdenum compound, Ca and a phosphate. A pitting phenomenon occurring at the time of treating a steel sheet with a phosphate is prevented, and excellent corrosion resistance is exhibited on a phosphate film.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: May 1, 2018
    Assignee: POSCO
    Inventors: Young-Jin Kwak, Kyung-Hoon Nam, Yong-Hwa Jung, Tae-Yeob Kim, Dong-Yoeul Lee, Seok-Won Cho, Young-Ra Lee, Mun-Jong Eom, Woo-Sung Jung, Seok-Jun Hong, Jae-Kyu Min, Hong-Kyun Sohn
  • Patent number: 9957620
    Abstract: Methods for simultaneously decarboxylating carbohydrate acids and reducing carbohydrate aldehydes in a divided electrochemical cell having a central compartment separate from the anode and cathode are disclosed using a cation membrane and a bipolar membrane. The improved methods are more cost-efficient and environmentally friendly.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: May 1, 2018
    Assignee: DFI USA, LLC
    Inventors: J. David Genders, Jonathan A. Stapley
  • Patent number: 9957621
    Abstract: There are provided electrochemical methods and systems to form one or more organic compounds or enantiomers thereof selected from the group consisting of substituted or unsubstituted dioxane, substituted or unsubstituted dioxolane, dichloroethylether, dichloromethyl methyl ether, dichloroethyl methyl ether, chloroform, carbon tetrachloride, phosgene, and combinations thereof.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: May 1, 2018
    Assignee: Calera Corporation
    Inventors: Thomas A. Albrecht, Dennis Solas, Margarete K. Leclerc, Michael Joseph Weiss, Ryan J. Gilliam, Kyle Self
  • Patent number: 9957622
    Abstract: A method for converting carboxylic acids (including carboxylic acids derived from biomass) into hydrocarbons. The produced hydrocarbons will generally have at least two oxygen containing substituents (or other substituents). In one example of application, the electrolysis converts alkali salts of carboxylic acids into diols which can then be used as solvents or be dehydrated to produce dienes, which can then be used to produce elastic polymeric materials. This process allows custom synthesis of high value chemicals from renewable feed stocks such as carboxylic acids derived from biomass.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: May 1, 2018
    Assignee: FIELD UPGRADING LIMITED
    Inventors: James Mosby, Sai Bhavaraju, Mukund Karanjikar
  • Patent number: 9957623
    Abstract: There are provided methods and systems for an electrochemical cell including an anode and a cathode where the anode is contacted with a metal ion that converts the metal ion from a lower oxidation state to a higher oxidation state. The metal ion in the higher oxidation state is reacted with hydrogen gas, an unsaturated hydrocarbon, and/or a saturated hydrocarbon to form products.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: May 1, 2018
    Assignee: Calera Corporation
    Inventors: Ryan J Gilliam, Bryan Boggs, Kyle Self, Margarete K Leclerc, Alexander Gorer, Michael J Weiss, John H Miller, Samaresh Mohanta
  • Patent number: 9957624
    Abstract: Electrochemical devices comprising electrocatalyst mixtures include at least one Catalytically Active Element and, as a separate constituent, one Helper Catalyst. The electrocatalysts can be used to increase the rate, modify the selectivity or lower the overpotential of chemical reactions. These electrocatalysts are useful for a variety of chemical reactions including, in particular, the electrochemical conversion of CO2. Chemical processes employing these catalysts produce CO, HCO?, H2CO, (HCOO)?, HCOOH, CH3OH, CH4, C2H4, CH3CH2OH, CH3COO?, CH3COOH, C2H6, (COOH)2, or (COO?)2. Devices using the electrocatalysts include, for example, a CO2 sensor and a CO2 electrolyzer.
    Type: Grant
    Filed: August 2, 2016
    Date of Patent: May 1, 2018
    Assignee: Dioxide Materials, Inc.
    Inventors: Richard I. Masel, Zengcai Liu, Brian Rosen
  • Patent number: 9957625
    Abstract: The invention relates to an electrode unit for an electrochemical device, comprising a solid electrolyte (3) and a porous electrode (7), the solid electrolyte (3) dividing a compartment for cathode material and a compartment for anode material and the porous electrode (7) being extensively connected to the solid electrolyte (3), with a displacer (23) being accommodated in the anode material compartment, where the displacer (23) is manufactured from a stainless steel or from graphite foil and bears resiliently against the internal geometry of the solid electrolyte (3) in such a way that the displacer (23) does not contact the solid electrolyte over its full area, or with the displacer comprising an outer shell (62) of stainless steel or graphite, and a core (64) of a nonferrous metal, the nonferrous metal being thermoplastically deformable at a temperature which is lower than the temperature at which the stainless steel is thermoplastically deformable, and where for production the shell (62) of stainless steel
    Type: Grant
    Filed: June 11, 2013
    Date of Patent: May 1, 2018
    Inventors: Günther Huber, Jesus Enrique Zerpa Unda, Michael Lutz, Peter Heidebrecht, Domnik Bayer, Wolfgang Jabczynski, Anna Katharina Dürr, Katrin Freitag
  • Patent number: 9957626
    Abstract: A hydrogen production system that achieves highly-efficient hydrogen production even when hydrogen is produced by using the plurality of cell stacks is provided. A hydrogen production system includes a plurality of cell stacks provided within a reaction containment, the cell stacks generating hydrogen by high temperature steam electrolysis by supplying steam to the plurality of cell stacks, a first flow path guiding the steam to each of the cell stacks, a second flow path causing a carrier gas containing air as a main component to flow into the reaction containment, and a flow regulation device provided at an inlet of the steam in each of the cell stacks, the flow regulation device regulating a flow rate of the steam caused to flow into each of the cell stacks to be uniform.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: May 1, 2018
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yuko Kawajiri, Hisao Watanabe, Ryoji Yoshimura, Seiji Fujiwara, Hiroyuki Yamauchi, Masafumi Komai, Masahiko Yamada, Tsuneji Kameda, Masato Yoshino, Takatoshi Asada, Shigeo Kasai
  • Patent number: 9957627
    Abstract: Broadly, the present disclosure relates to sidewall features (e.g. inner sidewall or hot face) of an electrolysis cell, which protect the sidewall from the electrolytic bath while the cell is in operation (e.g. producing metal in the electrolytic cell).
    Type: Grant
    Filed: September 8, 2015
    Date of Patent: May 1, 2018
    Assignee: Alcoa USA Corp.
    Inventors: Xinghua Liu, Robert A. DiMilia, Joseph M. Dynys, Jeffrey S. Martello
  • Patent number: 9957628
    Abstract: The present invention relates to a system for direct detection of current supplied to the electrodes of electrolytic cells, particularly useful in non-ferrous metal electrowinning or electrorefining plants. The current distribution on a practically unlimited number of electrodes can be obtained through direct measurement on the electrode hanging bars without requiring the manual intervention of plant staff.
    Type: Grant
    Filed: June 17, 2014
    Date of Patent: May 1, 2018
    Assignee: INDUSTRIE DE NORA S.P.A.
    Inventor: Felix Prado Pueo
  • Patent number: 9957629
    Abstract: A modified electroplated nickel-based metallic alloy coating and method of forming the same is provided. The electroplated coatings exhibit unique microstructure and composition which improves performance over conventional metallic materials. The coatings have significantly higher strength at elevated service temperatures.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: May 1, 2018
    Assignee: PRAXAIR S.T. TECHNOLOGY, INC.
    Inventors: John Foster, Zhihong Tang, Kevin Garing, Bradley J. Burton, Thomas F. Lewis, III
  • Patent number: 9957630
    Abstract: According to one embodiment, a pattern transfer mold includes a base body, first and second stacked bodies, first and second electrodes. The base body includes a base unit including a first surface, a first protrusion provided on the first surface and having a first side surface, and a second protrusion provided on the first surface, separated from the first protrusion, and having a second side surface opposing the first side surface. The first stacked body is provided on the first side surface, and includes first conductive layers and a first insulating layer. The second stacked body is provided on the second side surface, separated from the first stacked body, and includes second conductive layers and a second insulating layer. The first electrode is electrically connected to at least one of the first conductive layers. The second electrode is electrically connected to at least one of the second conductive layers.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: May 1, 2018
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yongfang Li, Ryoichi Inanami, Akiko Mimotogi, Takashi Sato, Masato Saito, Koichi Kokubun
  • Patent number: 9957631
    Abstract: An electroplating apparatus applies an electroplated coating to a female thread formed on a pipe end portion of a steel pipe. The apparatus includes an inner seal member, a capsule, a discharge outlet, an opening, a cylindrical insoluble anode, a plating solution supply tube, and a plurality of nozzles. The seal member divides the interior of the steel pipe at a location longitudinally inward of a region on which the female thread is formed. The capsule is attached to the pipe end portion. The outlet is designed to discharge a plating solution inside the capsule therefrom. The opening facilitates discharge of the solution inside the capsule. The anode is disposed in the inside of the pipe end portion. The supply tube projects from an end of the anode. The nozzles eject a plating solution between the outer surface of the anode and the inner surface of the pipe end portion.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: May 1, 2018
    Assignees: NIPPON STEEL & SUMITOMO METAL CORPORATION, VALLOUREC OIL AND GAS FRANCE
    Inventors: Masanari Kimoto, Kazuya Ishii, Masahiro Oshima, Tatsuya Yamamoto
  • Patent number: 9957632
    Abstract: Methods for electrochemical deposition of a metal coating on a metal substrate are described. The method may use an ionic liquid as an electrolyte, and the substrate may comprise a first metallic element. Method steps may include pretreating the substrate by etching in an ionic liquid containing metal ions of a second metallic element, removing metal ions of the first metallic element from the substrate, wherein the metal ions of the first metallic element are received by the ionic liquid, depositing a transition layer on the substrate from the ionic liquid, wherein metal ions of the first and second metallic elements are incorporated in the transition layer, and depositing a coating on the transition layer by electrochemical deposition from an ionic liquid containing ions of the second metallic element.
    Type: Grant
    Filed: June 6, 2013
    Date of Patent: May 1, 2018
    Assignee: ONDERZOEKSCENTRUM VOOR AANWENDING VAN STAAL N.V.
    Inventors: Joost Remi Margueritte De Strycker, Philippe Jose Gaston Hubert Verpoort, Eva Diaz Gonzales, Krista Godelieve Oscar Van Den Bergh, Robbie Van De Coevering
  • Patent number: 9957633
    Abstract: A plating processing method of a gripping surface of a gripping tool includes: temporarily and evenly fixing a plurality of first diamond grains having a uniform first grain diameter; adhering the first diamond grains by depositing a metal containing nickel on a gripping surface in a uniform thickness after the first diamond grains have been temporarily fixed; placing a plurality of second diamond grains having a second grain diameter on a metal surface of the gripping surface on which first diamond grains are not present; and adhering the second diamond grains by further depositing a metal containing nickel within a second plating solution on the metal surface in a uniform thickness that does not exceed the first diameter grain and the second diameter grain until a position relationship between the metal surface and the second diamond grains is not displaced even when the gripping tool is moved.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: May 1, 2018
    Assignee: Just Co., Ltd.
    Inventor: Takashi Konno
  • Patent number: 9957634
    Abstract: Provided are a film formation device and a film formation method for forming a metal film, with which metal films with a desired thickness can be continuously formed on surfaces of a plurality of substrates. A film formation device 1A includes at least a positive electrode 11, a negative electrode 12, a solid electrolyte membrane 13 arranged on a surface of the positive electrode 12, between. the positive electrode and a substrate to serve as the negative electrode, and a power supply unit E adapted to apply a voltage across the positive electrode 11 and the substrate B. A voltage is applied across the positive electrode 11 and the substrate B to deposit metal on a surface of the substrate from metal ions contained in the solid electrolyte membrane 13, whereby a metal film F made of metal is formed, The positive electrode 11 is made of a porous body that allows a solution L containing metal ions to pass therethrough and supplies the metal ions to the solid electrolyte membrane 13.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: May 1, 2018
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Motoki Hiraoka, Hiroshi Yanagimoto, Yuki Sato, Takayasu Yoshioka
  • Patent number: 9957635
    Abstract: An apparatus and a method suited for metal plating aircraft engine components that allows the creation a local environment for plating by covering a localized area to be plated so that the localized area to be plated is sealed from remaining parts of the component, thereby eliminating the need for masking remaining parts of the component prior to plating.
    Type: Grant
    Filed: April 29, 2014
    Date of Patent: May 1, 2018
    Assignee: PRATT & WHITNEY CANADA CORP.
    Inventor: Jerome James
  • Patent number: 9957636
    Abstract: A crystallizer for growing a crystalline sheet from a melt may include a cold block having a cold block surface that faces an exposed surface of the melt, the cold block configured to generate a cold block temperature at the cold block surface that is lower than a melt temperature of the melt at the exposed surface. The system may also include a nozzle disposed within the cold block and configured to deliver a gas jet to the exposed surface, wherein the gas jet and the cold block are interoperative to generate a process zone that removes heat from the exposed surface at a first heat removal rate that is greater than a second heat removal rate from the exposed surface in outer regions outside of the process zone.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: May 1, 2018
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Peter L. Kellerman, Brian Mackintosh, Frederick M. Carlson, David Morrell, Ala Moradian, Nandish Desai, Dawei Sun, Frank Sinclair
  • Patent number: 9957637
    Abstract: A method of adjusting conditions for epitaxial growth includes a first measurement step for measuring the thickness profile of a wafer before forming an epitaxial film; a second measurement step for measuring the thickness profile of an epitaxial wafer and the film thickness profile of the epitaxial film after an epitaxial growth step before a polishing step; a third measurement step for measuring the thickness profile of an epitaxial wafer and the film thickness profile of an epitaxial film; and a step for adjusting conditions for epitaxial growth using the thickness profiles and the film thickness profiles measured in the first, second, and third measurement steps.
    Type: Grant
    Filed: May 13, 2014
    Date of Patent: May 1, 2018
    Assignee: SUMCO CORPORATION
    Inventor: Akira Fukui
  • Patent number: 9957638
    Abstract: A method for manufacturing a silicon carbide semiconductor device includes: preparing a silicon carbide single crystal substrate having a flatness with an average roughness of 0.2 nm or less; gas-etching a surface of the silicon carbide single crystal substrate under an atmosphere of a reducing gas; and forming a silicon carbide layer on the gas-etched surface of the silicon carbide single crystal substrate, wherein an etching rate of the gas etching is made in a range of 0.5 ?m/hour or faster to 2.0 ?m/hour or slower.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: May 1, 2018
    Assignee: Mitsubishi Electric Corporation
    Inventors: Akihito Ohno, Yoichiro Mitani, Takahiro Yamamoto, Nobuyuki Tomita, Kenichi Hamano
  • Patent number: 9957639
    Abstract: The present invention provides a method for producing an epitaxial silicon carbide wafer comprising epitaxially growing SiC on an SiC substrate to produce an epitaxial SiC wafer during which further reducing stacking faults and comet defects than the conventional technologies to obtain an epitaxial SiC wafer having a high quality epitaxial film. The method for producing the epitaxial silicon carbide wafer is characterized in that a pre-growth atmosphere gas flowing into the growth furnace before the start of epitaxial growth contains hydrogen gas and has a balance of an inert gas and unavoidable impurities, and the hydrogen gas is contained in 0.1 to 10.0 vol % with respect to the inert gas.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: May 1, 2018
    Assignee: NIPPON STEEL & SUMITOMO METAL CORPORATION
    Inventors: Takashi Aigo, Wataru Ito, Tatsuo Fujimoto
  • Patent number: 9957640
    Abstract: A single crystal diamond has a surface. In the single crystal diamond, a measurement region is defined in the surface, the measurement region includes a portion exhibiting a transmittance that is highest in the single crystal diamond and a portion exhibiting a transmittance that is lowest in the single crystal diamond, the measurement region has a plurality of square regions that are continuously arranged and each have a side having a length of 0.2 mm, and an average value of transmittances in each of the plurality of square regions is measured, wherein assuming that the average value of the transmittances in one square region is defined as T1 and the average value of the transmittances in another square region adjacent to the one square region is defined as T2, a relation of ((T1?T2)/((T1+T2)/2)×100)/0.2?20 (%/mm) is satisfied throughout the measurement region.
    Type: Grant
    Filed: April 16, 2014
    Date of Patent: May 1, 2018
    Assignees: Sumitomo Electric Industries, Ltd., Sumitomo Electric Hardmetal Corp.
    Inventors: Yoshiki Nishibayashi, Akihiko Ueda, Hitoshi Sumiya, Yutaka Kobayashi, Yuichiro Seki, Toshiya Takahashi
  • Patent number: 9957641
    Abstract: An epitaxial wafer includes a silicon carbide film having a first main surface. A groove portion is formed in the first main surface. The groove portion extends in one direction along the first main surface. Moreover, a width of the groove portion in the one direction is twice or more as large as a width of the groove portion in a direction perpendicular to the one direction. Moreover, a maximum depth of the groove portion from the first main surface is not more than 10 nm.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: May 1, 2018
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Taro Nishiguchi, Jun Genba, Hironori Itoh, Tomoaki Hatayama, Hideyuki Doi
  • Patent number: 9957642
    Abstract: A fibrous pant stalk decorticator is disclosed. The decorticator includes a feeding device a breaker roll having a first plurality of blades, and a skutcher roll having a second plurality of blades. The skutcher is positioned such that the first and second pluralities of blades overlap. A plurality of air outlets pass through the blades and are configured to provided pressurized air to the fibrous plant stalk as it is passed through the decorticator.
    Type: Grant
    Filed: June 8, 2015
    Date of Patent: May 1, 2018
    Assignee: Bastlab, LLC
    Inventor: Michael Dyas
  • Patent number: 9957643
    Abstract: The invention relates to a process for producing gel-spun ultra high molecular weight polyethylene (UHMWPE) fibres having high tensile strengths and improved creep rates wherein the UHMWPE used in said process is characterized by a difference in the phase angle according to Formula 1 ??=?0.001??100??(1) of at most 42°, wherein ?0.001 is the phase angle at an angular frequency of 0.001 rad/sec; and ?100 is the phase angle at an angular frequency of 100 rad/sec as measured with a frequency sweep dynamic rheological technique at 150° C. on a 10% solution of UHMWPE in paraffin oil, provided that ?100 is at most 18°. The invention further relates to gel-spun UHMWPE fibres produced thereof. The gel-spun UHMWPE fibres of the invention have a tensile strength of at least 4 GPa, and a creep rate of at most 5×10?7 sec?1 as measured at 70° C. under a load of 600 MPa.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: May 1, 2018
    Assignee: DSM IP ASSETS B.V.
    Inventors: Joseph Arnold Paul Maria Simmelink, Paulus Antonius Maria Steeman
  • Patent number: 9957644
    Abstract: The invention provides a composition for the production of a fiber having organic solvent resistance, a fiber obtained by spinning the composition, and a biocompatible material containing the fiber. The composition contains (A) a polymer compound containing a unit structure represented by the formula (1) wherein each symbol is as described herein, (B) a crosslinking agent, (C) an acid compound, and (D) a solvent.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: May 1, 2018
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makiko Umezaki, Takahiro Kishioka, Taito Nishino, Ayako Otani
  • Patent number: 9957645
    Abstract: A method for synthesizing polyacrylonitrile (PAN) polymer with a narrow molecular weight distribution is disclosed. The preferred PAN polymer has a PDI (Mw/Mn) of about 2 or less. Such PAN polymer is synthesized by controlled/living radical polymerization using a special RAFT (Reversible Addition-Fragmentation Chain Transfer) agent. Also disclosed is a method for producing carbon fibers from PAN polymer with low PDI.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: May 1, 2018
    Assignee: CYTEC INDUSTRIES INC.
    Inventors: Longgui Tang, Alan D. Thomas, Billy D. Harmon
  • Patent number: 9957646
    Abstract: A drum inter-storage of yarn for a textile machine and associated method of control includes a driven rotary drum with a compensatory rotary arm. The rotary drum is coupled with a first drive formed by an electric motor, and a compensatory rotary arm is coupled with a second drive formed by an electric motor, whereby both motors are connected to a control device. The invention also relates to a method of controlling the drum inter-storage of yarn at an operating unit of a textile machine.
    Type: Grant
    Filed: August 1, 2016
    Date of Patent: May 1, 2018
    Assignee: Rieter CZ s.r.o.
    Inventors: Jiri Sloupensky, Vladimir Kluson, Evzen Pilar
  • Patent number: 9957647
    Abstract: A false-twisted low-fused polyester yarn has a non-untwisted part having a twist in a false-twist direction, an over-untwisted part having a twist in a direction opposite to the false-twist direction, and a non-twisted crimped part having no twist, alternately disposed along the longitudinal direction of the yarn, the average length of the non-untwisted part being no more than 7 mm, the average length of the over-untwisted part being at least 7 mm, and the degree of fusion-bonding in the yarn longitudinal direction being no more than 50%.
    Type: Grant
    Filed: June 21, 2013
    Date of Patent: May 1, 2018
    Assignee: Toray Industries, Inc.
    Inventors: Hiroaki Date, Naoki Oda, Tomoko Ito, Kouji Nishiya
  • Patent number: 9957648
    Abstract: A woven information bearing device comprising a plurality of woven elements arranged to define a woven information bearing pattern, wherein the woven elements include N woven information bearing elements, N being an integer number; and wherein said N woven information bearing elements define N or more than N data elements.
    Type: Grant
    Filed: April 17, 2015
    Date of Patent: May 1, 2018
    Assignee: SINOWIDE TRADING LIMITED
    Inventors: Tak Wai Lau, Wing Hong Lam
  • Patent number: 9957649
    Abstract: A sock structure includes a sock body in which a wearer's foot is wrapped. A cuff is provided in an upper end of the sock body, and a toe and a heel are respectively formed at a front end and a rear end of the sock body. An instep is formed at an upside of the sock body, and a contracted opening section is formed in the instep adjacent to the toe. The contracted opening section includes a stitching line by which the contracted opening section is closed and seamed. Depending on the contracted opening section designed on the instep adjacent to the toe, the stitching line stays above the foot toes of a person who wears the sock body and prevents the foot toes from discomfort or injury induced by friction between the foot toes and the stitching line when the sock body is worn on a foot.
    Type: Grant
    Filed: September 23, 2015
    Date of Patent: May 1, 2018
    Inventor: Tsung-Yuan Liu
  • Patent number: 9957650
    Abstract: The tactile sewing system comprises a plurality of fabric pieces with tactile guides that enable the blind, visually and otherwise impaired to independently hand sew fabric using their sense of touch. The tactile sewing system generally comprises a plurality of fabric pieces, each having a tactile border strip defining a tactile edge of the fabric piece whereby the tactile edge can be used by a user to tactilely guide the sewing of a seam at the edge without the need to visually guide the sewing of the seam. In some embodiments, the tactile sewing system is configured in a kit comprising components such as a needle and thread.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: May 1, 2018
    Inventor: Tammy L. Roussell
  • Patent number: 9957651
    Abstract: A sewing data generating unit acquires embroidery frame information and a mark alignment region displayed on a display unit for guiding multiple marks that define an embroidery region of the embroidery frame. When the marks are all positioned within the mark alignment region displayed on the display unit, the sewing data generating apparatus acquires an image of the embroidery frame and a sewing target mounted on a base cloth mounted on the embroidery frame. The sewing data generating apparatus performs image analysis based on a correspondence between the acquired information with respect to the embroidery frame and the marks in the acquired image, so as to determine the embroidery region of the embroidery frame. The sewing data generating apparatus generates outline data for the sewing target based on the determined embroidery region. This allows an applique to be sewn at an accurate position without a need to prepare dedicated data.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: May 1, 2018
    Assignee: Janome Sewing Machine Co., Ltd.
    Inventor: Takeshi Kongo
  • Patent number: 9957652
    Abstract: An apparatus for an improved manner for cleaning a hat by steam including a compartment for steam cleaning a baseball style hat and other style hats. The hat is placed on a hat mold and placed inside the compartment. Water is added to a water reservoir and heated by a heating element to convert the water to steam. Steam flows into the compartment and performs a cleaning operation on the hat.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: May 1, 2018
    Inventors: Brent Fouch, Brad Steiner
  • Patent number: 9957653
    Abstract: An apparatus and a method of operating a laundry treating appliance treating laundry according to a cycle of operation including determining a rotational speed of the drum corresponding to a predetermined movement of the laundry within the drum and setting an operating parameter for the cycle of operation based on the determined rotational speed of the drum corresponding to the predetermined movement of the laundry.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: May 1, 2018
    Assignee: Whirlpool Corporation
    Inventors: Farhad Ashrafzadeh, Ryan R. Bellinger
  • Patent number: 9957654
    Abstract: A washing machine actively resolving unbalancing is provided. The washing machine includes: a drum accommodating laundry and configured to be rotatable; a balancing unit moving along the circumference of the drum and changing the center of gravity of the drum; and a wireless power transmission unit wirelessly supplying power to the balancing unit.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: May 1, 2018
    Assignee: LG ELECTRONICS INC.
    Inventors: Jin Moo Park, Dong Won Kim, Byung Wook Min, Jeong Kyo Seo
  • Patent number: 9957655
    Abstract: The present invention relates to a laundry treating apparatus (100) including a cabinet (1) having an introduction opening (11) for placing in, and taking out laundry there through, a tub (2) in the cabinet (1) having a tub opening (21) in communication with the introduction opening (11), a dram (3) rotatably provided in the tub (2) to have a drum opening (31) in communication with the tub opening (21) for holding the laundry, and a drum supporter (H, L) for levitating the dram (3) within the tub (2) with repulsive force between a permanent magnet provided to the tub (2) and a permanent magnet provided to the drum (3).
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: May 1, 2018
    Assignee: LG Electronics Inc.
    Inventors: Ikuma Fukui, Masahito Shimono, Yongsu Kim
  • Patent number: 9957656
    Abstract: A washing machine including a cabinet having a first introduction port, a tub, which is provided in the cabinet and which has a second introduction port that is concentrically positioned with respect to the first introduction port, a cabinet door attached to the cabinet to open and close the first introduction port, a tub door attached to the tub to open and close the second introduction port, and a lock-releasing unit, which is attached to the cabinet to release a locked state of the cabinet door and the tub door.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: May 1, 2018
    Assignee: LG ELECTRONICS INC.
    Inventors: Mingyu Jo, Seungchul Park, Dongwon Kim
  • Patent number: 9957657
    Abstract: An appliance lock includes a housing and a lid movable between an open and closed positions. First and second sliders supported for movement by the housing. A striker is attachable to the other of the appliance body and lid. The striker is connectable with the housing upon movement of the lid to the closed position. The striker has a first portion for engaging and moving the first slider from a first position to a second position upon lid movement to the closed position. The striker has a second portion for engaging and moving the second slider from a first position to a second position upon lid movement to the closed position. The first and second sliders being in the second positions enables activation of the appliance. Structure minimizes the ability to move the first and second sliders to the second position by substantially anything but the striker.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: May 1, 2018
    Assignee: EMZ-HANAUER GMBH & CO. KGAA
    Inventors: Albert Otto Dirnberger, Markus Michael Lang
  • Patent number: 9957658
    Abstract: A washing machine having a breathing lamp set and a method for controlling the same are provided. The breathing lamp set is disposed on an outer wall or inner wall of a housing of the washing machine and is composed of a plurality of breathing lamps. The washing machine further includes a controller, configured to change, according to work process changes of the washing machine, a quantity ratio of lighted breathing lamps to dimmed breathing lamps among the plurality of breathing lamps in the breathing lamp set. The method for controlling the washing machine having the breathing lamp set includes step S1: changing, by the controller, the quantity ratio of lighted breathing lamps to dimmed breathing lamps among the plurality of breathing lamps in the breathing lamp set, so as to discriminately display different work states of the washing machine.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: May 1, 2018
    Assignee: FOSHAN HAIER DRUM WASHING MACHINE CO., LTD.
    Inventors: Kai Zhu, Yanli Wang, Yongchao Chen, Tao Huang, Chunke Bi
  • Patent number: 9957659
    Abstract: A fabric treating machine includes a spray nozzle for spraying water supplied from a water supply passage into an inner tub and a spray nozzle combining unit for combining the spray nozzle with a case. Fabric loaded in the inner tub can be effectively soaked through the spray nozzle. Furthermore, a spray direction of the spray nozzle can be accurately adjusted when the spray nozzle is fitted in the case, and thus the spray nozzle can be easily fitted in the case and water sprayed through the spray nozzle can be prevented from overflowing.
    Type: Grant
    Filed: December 27, 2013
    Date of Patent: May 1, 2018
    Assignee: LG ELECTRONICS INC.
    Inventors: Kyu Bum Lee, Young Jong Kim, Young Bae Park
  • Patent number: 9957660
    Abstract: A washing machine including: a cabinet; a tub mounted inside the cabinet to receive washing water; a rotating drum mounted inside the tub to load laundry therein; and an injection unit to inject washing water inside of the rotating drum. The injection unit includes: a plurality of nozzles spaced away from each other to inject washing water inside of the rotating drum at different positions; and a connector configured to include a plurality of passages so that a flow path of washing water diverges into the plurality of nozzles. Washing water may be injected by the spaced nozzles over a wide area inside the drum.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: May 1, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang Wook Kim, Hong Seok Ko, Yongjie Jin, Jae Sin Kim, Kyung Up Lim