Abstract: A seamless steel tube with high strength and toughness, comprising the following chemical elements by mass: 0.1-0.25% of C, 0.1-0.5% of Si, 0.01-0.1% of Al, 0.6-2% of Mn, the balance of Fe and other unavoidable impurities, wherein C+Mn/6?0.35. Also provided is a method for preparing a seamless steel tube.

Abstract: An austenitic stainless steel sheet consists, (mass %), of: C: 0.03 to 0.15%; Si: 0.20 to 2.5%; Mn: 0.2 to 4.5%; P: 0.010 to 0.030%; S: 0.0001 to 0.0010%; Cr: 20.0 to 26.0%; Ni: 10.0 to 15.0%; Cu: 0.01 to 2.0%; Mo: 0.01 to 2.0%; Co: 0.05 to 2.50%; Al: 0.01 to 0.20%; N: 0.1 to 0.6%; V: 0.02 to 0.15%; B: 0.0002 to 0.0050%; Nb: 0 to 0.10%; Ti: 0 to 0.10%; Y: 0 to 0.10%; Ca: 0 to 0.010%; Mg: 0 to 0.010%; and REM: 0 to 0.10%, balance Fe and impurities. Contents of [Mn] and [S] satisfy [Mn]×[S]?0.0020. Sheet thickness is 0.5 mm or smaller, an aspect ratio value L1/L2 satisfies L1/L2?1.5 where L1 and L2 denote major and minor axis lengths of a crystal grain. A surface hardness (HV) is 300 or higher after retention at 600° C. for 400 hours.

Abstract: The present invention relates to a wear resistant steel material which can be suitably used for industrial machinery, structural materials, steel materials for slurry pipes, sour steel materials, mining, transportation and storage fields, etc. in the oil gas industry which require properties such as ductility and wear resistance. More particularly, the present invention relates to a wear resistant steel material excellent in toughness and internal quality, and a method for manufacturing the same.

Abstract: Various embodiments provide a leaching solution monitoring module comprising a first leaching solution distribution system interface, a flow meter in fluid communication with the first leaching solution distribution system interface, the flow meter in fluid communication a 3-way pressure regulator, and a second leaching solution distribution system interface in fluid communication with the 3-way pressure regulator.

Abstract: The present invention relates to an apparatus and an arrangement for the (pyro)metallurgical treatment of electrical and/or electronic scrap or components, which are in particular configured in such a way that substantially uncontaminated electrical and/or electronic scrap or components thereof can be processed without impurities. The apparatus or the arrangement comprises a melting reactor, which has a cooling device. The present invention also relates to the use of the apparatus or the arrangement far the metallurgical treatment of electrical and/or electronic scrap or components and to the obtainment of raw copper or a precursor thereof. The present invention also relates to methods for the (pyro)metallurgical treatment of electrical and/or electronic scrap or components.

Abstract: The invention provides a method for the recovery of a metal-containing product (MProd) comprising: providing a composite material comprising a matrix of oxidised reductant (Ro), a product metal (MP) dispersed in the matrix of oxidised reductant (Ro), and one or more metal compounds (MPCR) of the product metal (MP) in one or more oxidation states dispersed in the matrix of oxidised reductant (Ro); and treating the composite material to at least partially remove the one or more metal compounds (MPCR) from the matrix of oxidised reductant (Ro) to form the metal-containing product (MProd).

Abstract: A copper/molybdenum separation processor is provided featuring a slurry/media mixture stage configured to receive a conditioned pulp containing hydrophobic molybdenite and hydrophilic copper, iron and other minerals that is conditioned with sodium hydrosulfide together with an engineered polymeric hydrophobic media, and provide a slurry/media mixture; and a slurry/media separation stage configured to receive the slurry/media mixture, and provide a slurry product having a copper concentrate and a polymerized hydrophobic media product having a molybdenum concentrate that are separately directed for further processing. The slurry/media mixture stage include a molybdenum loading stage configured to contact the conditioned pulp with the engineered polymeric hydrophobic media in an agitated reaction chamber, and load the hydrophobic molybdenite on the engineered polymeric hydrophobic media.

Abstract: An aluminum alloy foil is provided that is used as a material of a container and that achieves desired heat-resistant properties, enabling the container to withstand repeated use. The aluminum alloy foil is configured so as to: maintain a tensile strength of at least 120 N/mm2 and have an elongation of at least 2.0% when subjected to softening treatment at 150° C. for a maximum of 240 minutes; maintain a tensile strength of at least 100 N/mm2 and have an elongation of at least 3.0% when subjected to softening treatment at 180° C. for a maximum of 240 minutes; and maintain a tensile strength of at least 90 N/mm2 and have an elongation of at least 3.0% when subjected to softening treatment at 200° C. for a maximum of 240 minutes.

Abstract: A steel sheet coated with a metallic coating is provided. The coating includes from 1.0 to 22.0% by weight of zinc, from 0.1 to 1.0% by weight of titanium, from 1.6 to 15.0% by weight of silicon, below 0.5% by weight of magnesium, below 0.05% by weight of La or Ce or both, below 0.2% by weight of Sn and optionally, less than 0.3% by weight of additional elements chosen from Sb, Pb, Ca, Mn, Cr, Ni, Zr, In, Hf or Bi. A balance of the coating includes aluminum and optionally unavoidable impurities and residual elements. A microstructure of the coating does not include Al—Zn binary phases. A coated part is also provided.

Abstract: The disclosure is related to new, formable and strong aluminum alloys for making packaging products such as bottles and cans.

Abstract: A tantalum or tantalum alloy which contains pure or substantially pure tantalum and at least one metal element selected from the group consisting of Ru, Rh, Pd, Os, Ir, Pt, Mo, W and Re to form a tantalum alloy that is resistant to aqueous corrosion. The invention also relates to the process of preparing the tantalum alloy.

Abstract: A cemented carbide material comprising tungsten carbide grains, the content of tungsten carbide in the cemented carbide material being at least 75 weight percent and at most 95 weight percent. The cemented carbide material comprises a binder phase comprising any of cobalt, iron, or nickel, and nanoparticles. Te nanoparticles include material according to the formula CoxWyCz, where x is a value in the range from 1 to 7, y is a value in the range from 1 to 10 and z is a value in the range from 0 to 4. The nanoparticles have a mean grain size of no more than 10 nm and at least 10 percent of the nanoparticles have a size of at most 5 nm. The volume percent of the tungsten carbide grains having a grain size of no more than 1 ?m is less than 4 percent. A method for producing the cemented carbide material is also disclosed.

Abstract: A nodular cast alloy, a casting made therefrom, and a production process therefor, which has a perlitic-ferritic microstructure for cast iron products and has a high strength combined with good ductility and toughness even in the cast state, including, as nonferrous constituents, C, Si, Ni, Mn, Cu, Mg, Cr, Al, P, S and normal impurities, characterized in that the nodular cast alloy in the cast state without subsequent heat treatment achieves a high static strength of a 0.2% offset yield strength of ?600 MPa and a tensile strength of ?750 MPa combined with good ductility of an elongation at break A5 of from 2 to 10%.

Abstract: A hot rolled plate or forging of an austenitic steel not susceptible to relaxation cracking is provided. The hot rolled plate or austenitic steel includes a composition having in percentages by weight: 0.019%?C?0.030%, 0.5%?Mn?2%, 0.1%?Si?0.75%, Al?0.25%, 18%?Cr?25%, 14%?Ni?17%, 1.5%?Mo?3%, 0.001%?B?0.008%, 0.25%?V?0.35%, 0.23%?N?0.27%, the balance being iron and unavoidable impurities, Ni(eq.)?1.11 Cr(eq.)?8.24, Cr(eq)=Cr+Mo+1.5Si+5V+3Al+0.02, Ni(eq)=Ni+30C+x(N?0.045)+0.87; x=30 for N?0.2, x=22 for 0.2<N?0.25, x=20 for 0.25<N?0.35.

Abstract: Mixed magnetic powders for making a magnetic core or body is disclosed, wherein the mixed magnetic powders comprises a first magnetic powder and a second magnetic powder, each of the first magnetic powder and the second magnetic powder being made of a soft magnetic material, wherein the average particle diameter of the first magnetic powder is greater than that of the second magnetic powder, and each of the first magnetic powder and the second magnetic powder has a pre-configured particle size distribution for increasing the density of the magnetic body.

Abstract: A steel sheet has a predetermined chemical composition, and a surface exhibits an absorption peak at which a reflectance is not less than 50% nor more than 85% in a range of wave numbers of 1200 cm?1 to 1300 cm?1 by a Fourier transform-infrared spectroscopy analysis by a reflection absorption spectrometry method, and does not exhibit an absorption peak in a range of wave numbers of 1000 cm?1 to 1100 cm?1, or exhibits an absorption peak at which a reflectance is 85% or more in the range of wave numbers of 1000 cm?1 to 1100 cm?1, wherein Ni of 3 mg/m2 to 100 mg/m2 adheres to the surface.

Abstract: A biocompatible Ti-based alloy having a formula of TiaZrwTabSixSnyCoz is disclosed, wherein a is 40-44, b is 1-5 and the sum of w, x, y, z is 55. The alloy is amorphous. The alloy is applicable to manufacturing ultrafine powder which is used for additive manufacturing. The alloy is characterized in high glass forming ability, low toxicity, and high strength, and the powder thereof has low roughness and high circularity, and is suitable for implantable medical device.

Abstract: Provided is a method of making a polycrystalline shape memory alloy (SMA) by forming an alloy with grains and boundaries between them, exposing the alloy to a two-phase temperature range at which a two-phase equilibrium is achieved in the alloy, converting grains to an austenite phase, and precipitating a face-centered-cubic crystal structure solid solution phase at grain boundaries, then quenching the alloy. Also provided is a polycrystalline SMA with a dual-phase microstructure having grains mostly in an austenite phase, a martensite phase, or in transition between an austenite phase and a martensite phase and grain boundaries containing a face-centered-cubic crystal structure solid solution phase.

Abstract: Techniques are disclosed for casting high-strength and highly formable metal products from recycled metal scrap without the addition of substantial or any amounts of primary aluminum. Additional alloying elements, such as magnesium, can be added to metal scrap, which can be cast and processed to produce a desirable metal coil at final gauge having desirable metallurgical and mechanical properties, such as high strength and formability. Thus, inexpensive and recycled metal scrap can be efficiently repurposed for new applications, such as automotive applications and beverage can stock.

Abstract: The present invention relates to the field of metallurgy of high-strength cast and wrought alloys based on aluminum, and can be used for producing articles used in mission-critical designs operable under load, as well as in the transport field, sports industry and sports equipment, for producing casings for electronic devices, and in other engineering industries and industrial sectors. The technical result aims to enhance mechanical characteristics of the articles produced from the alloy by virtue of the precipitation hardening caused by the formation of secondary phases in the process of the age hardening while providing high workability during casting ingots and castings. The claimed high-strength alloy based on aluminum comprises zinc, magnesium, nickel, iron, copper, and zirconium, wherein it further comprises at least one metal selected from a group comprising titanium, scandium and chrome, with the following component ratios, wt %: zinc 3.8-7.4; magnesium 1.2-2.6; nickel 0.5-2.5; iron 0.3-1.0; copper 0.

Abstract: A copper alloy sheet material has a copper alloy component system that has a high conductivity of 75.0% IACS or more and has both high strength and good stress relaxation resistance characteristics. A copper alloy sheet material has a composition containing, by mass %, from 0.01 to 0.50% of Zr, from 0.01 to 0.50% of Sn, a total content of from 0 to 0.50% of Mg, Al, Si, P, Ti, Cr, Mn, Co, Ni, Zn, Fe, Ag, Ca, and B, with the balance Cu, and unavoidable impurities, and a metal structure having a number density NA Of fine second phase particles having a particle diameter of approximately from 5 to 50 nm of 10.0 per 0.12 mm2 or more and a ratio NB/NA of a number density NB (per 0.012 mm2) of coarse second phase particles having a particle diameter exceeding approximately 0.2 mm and the NA of 0.50 or less.

Abstract: A fabricator resource receives an assembly including a first portion of material and a second portion of material. Initially, the first portion of material in the assembly may have a different modulus of elasticity than the second portion of material. The fabricator resource exposes the assembly to one or more heating/cooling cycles. Exposure of the assembly to the one or more heating/cooling cycles modifies a modulus of elasticity of the first portion of material and a modulus of elasticity of the second portion of material to desired target values (such as substantially same or different values).

Abstract: A fully-dense, fluid tight, low friction coating system is described that is characterized by fluid impermeability and a reduced coefficient of friction. The coating system includes a fully dense, fluid tight underlying layer; and a low friction layer. Unlike conventional materials requiring a sealant, the coating systems of the present invention achieves better fluid tightness and maintains said fluid tightness along one or more sealing surfaces at higher service temperatures and service pressures than previously attainable. The constituents of the fully-dense, fluid tight, low friction coating system are physically and chemically compatible so as to not adversely impact lubricity, wear resistance and corrosion resistance during the service life of a component coated with the fully-dense, fluid tight, low friction coating system.

Abstract: To provide thermal spray slurry capable of forming a thermal sprayed coating having a high adhesion strength on a thermal spray target surface of a substrate, disclosed is thermal spray slurry for forming a thermal sprayed coating on the thermal spray target surface by spraying the thermal spray slurry on the thermal spray target surface of the substrate, the thermal spray slurry containing: thermal spray particles having a 50% particle diameter D50 equal to or larger than 1 ?m and equal to or smaller than 5 ?m in volume-based cumulative particle diameter distribution; and a dispersion medium in which the thermal spray particles are dispersed. In addition, a ratio D10/Ra between a surface roughness Ra (unit: ?m) of the thermal spray target surface and a 10% particle diameter D10 (unit: ?m) of the thermal spray particles in the volume-based cumulative particle diameter distribution satisfies a formula “0.4<D10/Ra?0.9”.

Abstract: Provided is thermal spray slurry capable of forming a dense coating by thermal spraying while suppressing cracks. Thermal spray slurry includes: thermal spray particles having an average particle diameter of 1 ?m or more and 10 ?m or less and a dispersion medium in which the thermal spray particles are dispersed, and has a filling rate of 84 mass % or less, the filling rate being calculated by the following expression, filling rate (mass %)=B/A×100, where A denotes the mass of cake of the thermal spray particles obtained by precipitating the thermal spray particles out of the thermal spray slurry by centrifugation, and B denotes the mass of a dry matter obtained by removing the dispersion medium from the cake.

Abstract: Unique and improved chromium coatings derived from modified chromium-containing slurry formulations are disclosed. The slurry formulation includes a combination of a selected halide activator and buffer material that synergistically interact with each other to form chromium diffusion coatings with improved microstructure in comparison to chromium diffusion coatings produced from conventional chromizing processes. The coatings may be locally applied in a controlled manner with accuracy onto various parts, including those having internal sections with complex geometries, without masking any portion thereof.

Abstract: Systems and methods herein produce an isolated carbon particle embedded diamond-like carbon (DLC) coating having increased toughness, increased hardness, and enhanced wear resistance. In embodiments, a physical vapor deposition (PVD) chamber houses a pure graphite target at a distance from a substrate, and an in-situ synthesis of isolated carbon particles simultaneous with hydrogen-free DLC coating deposition is provided through unbalanced magnetron sputtering by localized injection of helium gas in a pulse mode with different durations. The resultant coating may include carbon while omitting other elements, and the carbon particles form covalent bonding with the host DLC matrix. Processes disclosed herein are easier to control and manipulate as compared to traditional metal doped DLC coatings.

Abstract: A part coated in a protective coating forms a thermal barrier and includes a ceramic first layer. The protective coating further includes a second layer present on the first layer and including a majority by weight of a first feldspar mineral having a melting temperature higher than or equal to 1010° C. and presenting a thickness greater than or equal to 10 ?m.

Abstract: An assembly and a device for vapor deposition are provided in this disclosure, an assembly includes a cell and a housing, the cell is accommodated in the housing, the gaseous materials to be vapor deposited eject from the housing and are vapor deposited onto the substrate. The housing is capable of rotating relative to the cell. The film layer structure can be obtained by controlling the angles of rotation of the housing. Single film layer as well as the composite film layer with various changes of doping ratio can be formed on the substrate of the assembly and the device for vapor deposition in this disclosure.

Abstract: Provided herein are centrifugal evaporation sources. These sources include a manifold body, a crucible, an expansion chamber, a centrifugal separator chamber, and an effusion nozzle.

Abstract: The embodiments of the embodiments of the Nanostructure Lithium Ion Battery are comprised of a multi-layer coaxial assembly formed over a cylindrical core. The multilayers are each comprised of sublayers in order as follows: a copper sublayer with nano “chicken wire” embedded in the copper sublayer for current collection, a nanostructured aluminum substrate sublayer, a nanostructured cathode sublayer, an electrolyte sublayer, a nanostructured anode sublayer, and a copper interlayer sublayer. The nanobatteries are arranged in layered stacks of nanocells. The nanocells stacks are comprised of a plurality of individual octagonal shaped multilayer nanocells. Each nanocell stack is electrically connected to an array of other nanocells stacks via electrode contacts. A lower copper bus serves as the anode current collector and an upper copper bus serves as the cathode current collector. Pass-throughs connect to the appropriate cathode layers in the multilayer nanocell stacks.

Abstract: According to an embodiment of the present invention, the workpiece holding body 20 for surface processing includes the holder 21 and the adhesive sheet 22. The adhesive sheet 22 includes the first surface 22a (the first adhesive layer 221) and the second surface 22b (the second adhesive layer 222), the first surface 22a (the first adhesive layer 221) being bonded to the holder 21 at a first adhesive force, the second surface 22b (the second adhesive layer 222) being capable of holding a workpiece (the component main-body 110) at a second adhesive force, the second adhesive force being higher than the first adhesive force.

Abstract: According to one embodiment, a manufacturing method of a magnetic recording medium includes measuring characteristics of multilayer film including a magnetic recording layer, calculating a residual between an index value to set a sputtering power and the characteristics, acquiring a feedback correction factor by calculating moving average deviations of the residual, and calculating a new index value of each layer in the multilayer film by using a calculation model which estimates the characteristics from calculated film thicknesses using a virtual metrology technique, referring to the feedback correction factor and performing backward calculation with a solver using an electronic calculator.

Abstract: An ink for forming a photothermal conversion layer used to cause at least a portion of a thermal expansion layer of a thermal expansion sheet to swell. The ink includes an inorganic infrared absorbing agent having a higher absorptivity in at least one region of the infrared light spectrum than in the visible light spectrum.

Abstract: A method for manufacturing a nitride semiconductor substrate includes: a preparation step of preparing a sapphire substrate; and a buffer layer forming step of forming an AlN buffer layer on the sapphire substrate, wherein the buffer layer forming step includes: a group III nitride semiconductor forming step of forming a precursor of an AlN buffer layer on the sapphire substrate; and an annealing step of annealing the sapphire substrate on which the precursor of the AlN buffer layer is formed in a gas-tight state in which a principal surface of the precursor of the AlN buffer layer is covered with a cover member (such as a sapphire substrate) for inhibiting a component of the group III nitride semiconductor from dissociating from the principal surface of the formed precursor of the AlN buffer layer.

Abstract: A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.

Abstract: A coating method of an oxide film on an inner surface of an object such as a container or a pipe-shaped object includes steps of connecting a joint part to a connection tube to which an object is to be connected, and bringing an inside of the object into a sealed state, executing introduction of the organometallic gas into the object, evacuating the organometallic gas, introducing the excited humidified gas into the object, and evacuating the humidified gas in the object the evacuating means; and includes repeating the steps to form the oxide film on the inner surface of the object. A coating apparatus is provided with a connecting device for evacuating the object to the joint part, a device for introducing an organometallic gas into the object to fill with the organometallic gas, and a device for introducing an excited humidified gas into the object.

Abstract: CVD Alumina coating has been one of the most important materials for wear resistant application for many years. Recently, texture control in ?-Al2O3 has attracted increasing attention due to the possibility to further improve the anisotropic properties such as thermal conductivity and mechanical properties. The influence of process parameters on textures is complex. In the present application, the influence of nucleation surface condition and H2S on the texture in CVD ?-Al2O3 coatings has been investigated. It has been shown that without the addition of H2S, the crystal orientation in the Al2O3 coatings is primarily dominated by the nucleation surface condition, whereas the effect of reactant composition on texture is minimal. On the other hand, in the presence of H2S during growth, reactant composition also plays an important role in affecting the crystal orientation. This effect is likely due to the strong interaction between the Al2O3 surface and the H2S.

Abstract: A semiconductor manufacturing apparatus includes a reaction chamber configured to perform a process on a semiconductor substrate using a gas mixture comprising a first gas, and a first path configured to exhaust resultant gas that comprises the first gas from the reaction chamber. The semiconductor manufacturing apparatus further includes a first trap provided in the first path and configured to extract at least a portion of the first gas from the resultant gas, and a second path in which the trap is not provided and configured to exhaust the resultant gas from the reaction chamber.

Abstract: A substrate processing apparatus includes a process chamber accommodating a substrate; a gas supply system; and an exhaust system. The supply system includes a vaporizer and a mist filter, the mist filter including a plurality of first plates and a plurality of second plates. Each of the first plates includes a first plate portion having a plurality of first grooves on a surface thereof and a first flow path. Each of the second plates includes a second plate portion having a plurality of second grooves on a surface thereof and a second flow path. When the plurality of first and second plates are arranged alternatively, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line.

Abstract: A gas supply member includes a straight flow path having a straight-line shape and a first end to be supplied with a gas, a gas discharge port branched from the straight flow path and a gas circulation path extending along an extension line of the straight flow path, connected to a second end of the straight flow path, and configured to collect foreign substances contained in the gas supplied to the straight flow path.

Abstract: A processing chamber for processing a substrate is disclosed herein. In one embodiment, the processing chamber includes a liner assembly disposed within an interior volume of the processing chamber, and a C-channel disposed in an interior volume of the chamber, circumscribing the liner assembly. In another embodiment, a process kit disposed in the interior volume of the processing chamber is disclosed herein. The process kit includes a liner assembly, a C-channel, and an isolator disposed in the interior volume. The C-channel and the isolator circumscribe the liner assembly. A method for depositing a silicon based material on a substrate by flowing a precursor gas into a processing chamber is also described herein.

Abstract: Disclosed is an atomic layer deposition system and method, the system including a chamber having a first accommodation space to accommodate a first target substrate, and a first gas supplier mounted in the chamber to supply a first gas to the first target substrate, wherein the first gas supplier includes a first fixed block having a rotation space therein and including a (1-1)st passage provided in a first direction of the rotation space and a (1-2)nd passage provided in a second direction of the rotation space, and a first rotatable pipe having a first gas channel therein, having a pipe shape including at least one first gas outlet at a side thereof, and rotatably mounted in the rotation space of the first fixed block to connect the first gas outlet to the (1-1)st or (1-2)nd passage of the first fixed block.

Abstract: Described herein are methods for forming a conformal Group 4, 5, 6, 13 metal or metalloid doped silicon nitride film. In one aspect, there is provided a method of forming an aluminum silicon nitride film comprising the steps of: providing a substrate in a reactor; introducing into the reactor an at least one aluminum precursor which reacts on at least a portion of the surface of the substrate to provide a chemisorbed layer; purging the reactor with a purge gas; introducing into the reactor an organoaminosilane precursors to react on at least a portion of the surface of the substrate to provide a chemisorbed layer; introducing a nitrogen source and an inert gas into the reactor to react with at least a portion of the chemisorbed layer; and optionally purge the reactor with an inert gas; and wherein the steps are repeated until a desired thickness of the aluminum nitride film is obtained.

Abstract: There is provided a technique that includes: a process chamber in which a process of forming a film containing a main element on a substrate is performed; a first nozzle configured to supply a precursor containing the main element to the substrate in the process chart; a second nozzle separated from the first nozzle and configured to supply the precursor to the substrate in the process chamber; a third nozzle configured to supply a reactant to the substrate in the process chamber; and a plurality of first exhaust ports configured to exhaust an internal atmosphere of the process chamber, wherein each of the plurality of first exhaust ports is disposed at a position which does not face a first gas ejection hole of the first nozzle and a second gas ejection hole of the second nozzle, in a plan view.

Abstract: Embodiments of the disclosure provide a method and apparatus for depositing a layer on a substrate. In one embodiment, the method includes exposing a surface of the substrate disposed within a processing chamber to a fluid precursor, directing an electromagnetic radiation generated from a radiation source to a light scanning unit such that the electromagnetic radiation is deflected and scanned across the surface of the substrate upon which a material layer is to be formed, and initiating a deposition process with the electromagnetic radiation having a wavelength selected for photolytic dissociation of the fluid precursor to deposit the material layer onto the surface of the substrate. The radiation source may comprise a laser source, a bright light emitting diode (LED) source, or a thermal source. In one example, the radiation source is a fiber laser producing output in the ultraviolet (UV) wavelength range.

Abstract: A method of forming a layer of diamond-like carbon on a workpiece includes supporting the workpiece in a chamber with the workpiece facing an upper electrode, and forming a plurality of successive sublayers to form the layer of layer of diamond-like carbon by alternating between depositing a sublayer of diamond-like carbon on the workpiece in the chamber and treating the sublayer with a plasma of the inert gas or an electron beam from the upper electrode.

Abstract: An atomic layer deposition apparatus for forming an atomic layer on a flexible substrate, the apparatus including an unwinding chamber having an unwinding roll for unwinding the flexible substrate, a winding chamber having a winding roll for winding the flexible substrate on which the atomic layer is formed, a plurality of reaction chambers provided between the unwinding chamber and the winding chamber so that the flexible substrate can pass therethrough, a first supply part for storing a gas containing a first precursor, a first supply pipe connected to the first supply part, a second supply part for storing a purge gas, a second supply pipe connected to the second supply part, a third supply part for storing a gas containing a second precursor, a third supply pipe connected to the third supply part, and an exhaust pipe connected to the plurality of reaction chambers.

Abstract: A method of forming a metal pattern includes forming a catalyst adsorption layer by bringing a surface of a substrate into contact with a solution, the substrate having a base region and a plurality of protrusions provided on the base region, the base region includes a first material, the protrusions includes a second material different from the first material, the first and the second material being exposed on the surface, and the solution containing a compound having a triazine skeleton, a first functional group of any one of a silanol group and an alkoxysilyl group, and a second functional group of at least one selected from the group consisting of an amino group, a thiol group, and an azido group, forming a catalyst layer on the catalyst adsorption layer, forming a metal film on the catalyst layer by an electroless plating method, and removing the metal film on the protrusions.

Abstract: A method for increasing corrosion resistance of metallic substrates without use of hexavalent chromium includes chemically treating the substrate to create an oxide layer, mixing graphene nanoplatelets into a non-chromate epoxy-based primer, applying the primer to the oxide layer of the substrate, and applying a topcoat to the primer opposite the oxide layer.