Abstract: According to an aspect, a display device has a first electrode, a second electrode and liquid crystal layer. When a voltage is not applied to the first and second electrodes, the major axes of the liquid crystal molecules are oriented in a third direction. When a voltage is applied between the first and second electrodes, the major axes are oriented so as to rise in a direction perpendicular to a first substrate while rotating clockwise in a vicinity of one of long sides of comb tooth portion that face each other and counterclockwise in a vicinity of the other of the long sides. An angle between an electrode base-side portion of a long side of each comb tooth portions and the third direction is larger than an angle between a distal end-side portion of the long side of each comb tooth portions and the third direction.

Abstract: An in-plane switching liquid crystal display has a plurality of protrusion electrodes. Each of the protrusion electrodes has a protrusion body with a surface coated with an electrically conductive layer made from a metal oxide. An adhesion-enhancement medium is provided between the electrically conductive layer and the surface of the protrusion body. The adhesion-enhancement medium comprises a metal such as aluminum or molybdenum or a metal alloy containing molybdenum and at least one of niobium, tantalum, titanium, zirconium, tungsten, aluminum and nitride or a metal alloy containing aluminum and at least one of niobium, tantalum, titanium, zirconium, tungsten, molybdenun and nitride. The protrusion body can have the shape of a rectangle, triangle, bell, rectangle with a round top, or a cross sectional area having a top portion with a round or flat head and a bottom portion with a waist portion, smaller than the basewidth.

Abstract: The present application discloses an array substrate and its fabricating method thereof, the array substrate including a substrate, a gate electrode, a gate insulating layer, a channel layer, an insulating layer, and a passivation layer sequentially formed on the surface of the substrate; an oxide semiconductor layer constituting the channel layer and a plurality of first IPS electrodes spaced apart from the oxide semiconductor layer is further provided on the gate insulating layer; the insulating layer covers the oxide semiconductor layer and the oxide semiconductor layer and the plurality of first IPS electrodes; the passivation layer covers the channel layer and formed with trenches, the trenches located on a side of each of the first IPS electrode and extending to the gate insulation layer; a second IPS electrodes corresponding to the first IPS electrodes and connected to the first IPS electrodes are formed on the passivation layer.

Abstract: An electro-optic assembly including a first and second substrate and a layer of electro-optic material disposed between the substrates. Each substrate includes a two-phase, light-transmissive, electrically-conductive layer comprising a first phase made of a highly electronically-conductive matrix and a second phase made of a polymeric material composition having a controlled volume resistivity.

Abstract: A display device including a substrate and an electrode positioned over the substrate. The electrode includes a first conductive layer, a second conductive layer disposed on the first conductive layer, and a third conductive layer disposed on the second conductive layer. The second conductive layer includes Ag and an alloy element, and the alloy element has a smaller atomic radius than Ag. A thickness of the second conductive layer is in a range of 20 ? to 60 ?. The second conductive layer has a transmittance of 85% or more in the range of 20 A to 60 A. The content of the alloy element of the second conductive layer is in a range of 2 wt % to 35 wt %.

Abstract: The present disclosure provides an array substrate and a liquid crystal display panel. The array substrate includes a plurality of gate line unit and a plurality of data and common signal multiplexing line, the adjacent data and common signal multiplexing lines and a gate line unit form a pixel region, a first switch unit, a second switch unit, a common electrode and a pixel electrode are arranged in the pixel region, the switch unit includes a gate electrode, a source electrode and a drain electrode. The source electrodes connect the same data and common signal multiplexing line, the data and common signal multiplexing line receives the data and common multiplexing signal, the data and common multiplexing signal, the first gate electrode and the second electrode are used to control the first switch unit and the second switch unit not open at same time.

Abstract: An electrochromic element, includes: a pair of electrodes (3, 5); and an electrochromic layer (7) disposed between the pair of electrodes (3, 5), the electrochromic element being controlled in transmittance by pulse width modulation, in which: the electrochromic layer (7) contains at least one of two or more kinds of anode electrochromic materials, or two or more kinds of cathode electrochromic materials; and all of one of the anode electrochromic materials and the cathode electrochromic materials have an equal molecular length, or have a molecular length ratio of (large molecular length)/(small molecular length) of 1.4 or less, the electrochromic element being such that even when a driving environment temperature changes, its gradation can be controlled under a state in which its absorption spectrum is retained.

Abstract: An optical modulator including a flexible printed circuit performing an electrical connection with an external circuit substrate, in which the flexible printed circuit includes a plurality of first pads and the like provided on one surface of the flexible printed circuit along one side of the flexible printed circuit, a plurality of second pads and the like provided on the other surface of the flexible printed circuit at locations that respectively correspond to the plurality of first pads, and a plurality of metal films and the like provided at locations that respectively correspond to the first pads on a side surface of the flexible printed circuit along the one side of the flexible printed circuit.

Abstract: Methods, systems, apparatuses, and computer program products are provided for a backlight assembly for a display device. The backlight assembly includes a transparent waveguide layer, a plurality of light sources, and a tunable grating layer. The light sources are arranged along an edge of the waveguide layer. Each light source transmits light into the waveguide layer through the edge. The grating layer is coupled to the waveguide layer, and has multiple rows. Each row of the grating layer is segmented into a series of cells so the grating layer is sectioned into an array of cells. Each cell is independently controllable to either not extract incident light received from within the waveguide layer, or to extract the incident light for emission from the backlight assembly. In another configuration, the waveguide layer is not present, and the light sources transmit light directly into an edge of the grating layer.

Abstract: A Pancharatnam Berry Phase (PBP) color corrected structure is presented that comprises a plurality of switchable gratings and a plurality of PBP active elements. Each switchable grating has an inactive mode when reflects light of a specific color channel, of a set of color channels, and transmits light of other color channels in the set of color channels, wherein the specific color channel is different for each of the plurality of switchable gratings, and to have an active mode to transmit light that is inclusive of the set of color channels. The PBP active elements receive light output from at least one of the plurality of switchable gratings. Each of the PBP active elements is configured to adjust light of a different color channel of the set of color channels by a same amount to output light corrected for chromatic aberration for the set of color channels.

Abstract: A variable focal length (VFL) lens system is provided including a tunable acoustic gradient (TAG) lens and an optical focus monitoring configuration for providing a focus monitoring signal that reflects a focus state with high accuracy and without significant latency. An input illumination pattern is transmitted through the TAG lens to provide a corresponding output illumination pattern that has a size and intensity that depends on the optical power of the TAG lens. An optical focus signal detector portion includes a filtering configuration and a focus photodetector that provides a focus output signal that varies in relation to the total light energy that the focus photodetector receives, wherein the filtering configuration receives the output illumination pattern and limits the amount of included focus detection light that reaches the focus photodetector. A focus monitoring signal is provided based on the focus output signal provided by the focus photodetector.

Abstract: A photonic crystal all-optical D-type flip-flop includes an optical switch unit, a photonic crystal structure unit including two signal-input ends, a signal-output end and an idle port, a wave absorbing load and a reference-light source; the clock signal-input port of the photonic crystal structure unit is connected with a clock control signal; a second port of the photonic crystal structure unit is an intermediate signal-input port, said intermediate signal-input end of the photonic crystal structure unit is connected with a first intermediate signal-output end of the optical selector switch; a logic signal is connected with the first signal-input end of the optical switch unit; the absorbing load is connected with a second intermediate signal-output end of the optical switch unit; said reference-light source is connected with a second signal-input end of the optical switch unit, which is a reference-light input end connecting with the output end of said reference-light source.

Abstract: An ocular lens consists of a positive first lens group, a positive or negative second lens group, and a positive third lens group, in order from an observation object side. The first lens group consists of a positive meniscus lens with a convex surface toward an eye-point side. The second lens group includes a negative lens and a positive lens, and the number of lenses constituting the second lens group is three or less. The third lens group consists of a positive meniscus lens with a convex surface toward the eye-point side. The following conditional expression relating to a focal length of the whole system and a distance on an optical axis from a lens surface closest to the observation object side to a lens surface closest to the eye-point side is satisfied: 0.8<f/TL<1.1.

Abstract: This application relates to the field of aerial vehicle technologies, and provides a motor, a gimbal, and an unmanned aerial vehicle. The motor includes: a first and a second connection terminals, where the first connection terminal includes a circuit board including a coil circuit; the second connection terminal includes a permanent magnet adjacent to the coil circuit, wherein there is a gap between the permanent magnet and the coil circuit, and the permanent magnet has an axial magnetization structure; one of the first and the second connection terminals is fixedly connected to a lens module and sleeved over the lens module, and the other is movably connected to the lens module and sleeved over the lens module. In the foregoing manner, the overall size and weight of the motor are greatly reduced, and therefore, the motor has the advantages of a compact structure, a small size, and a light weight.

Abstract: A camera slider has a base and a tubular hollow arm pivotally attached to the base. A counterweight carriage is supported on the arm on carriage rollers. An electric drive motor moves the counterweight carriage linearly on top of the arm. A slider counterweight is movable from a first position, wherein the counterweight carriage is at or adjacent to a first end of the arm and the slider counterweight is at or adjacent to a second end of the arm, and a second position wherein the counterweight carriage is at the second end of the arm, opposite from the first end, and the slider counterweight is at or adjacent to the first end of the arm.

Abstract: In embodiments, a roll axis assembly may include a camera mounting plate to mount with a camera such that an optical axis of the camera is approximately parallel with the camera mounting plate and coincident with a first axis of the apparatus. The roll axis assembly may further include a roll motor coupled with the camera mounting plate, the roll motor to rotate the camera mounting plate around the first axis. The apparatus may further include a pan/tilt axis assembly coupled with the roll axis assembly, the pan/tilt axis assembly to rotate the camera mounting plate around a second axis of the apparatus that is perpendicular to the first axis of the apparatus and also perpendicular to the camera mounting plate. Other embodiments may be described and/or claimed.

Abstract: The multi-camera mount includes a base plate having a center portion and a plurality of L-shaped brackets. Each L-shaped bracket includes a horizontal portion extending radially outward from the center portion, and a vertical portion. The horizontal portion includes a proximal end connected to the center portion of the base plate and an opposing distal end. The vertical portion includes a first end connected to the distal end of the horizontal portion and an opposing second end. The multi-camera mount also includes a plurality of adjustable support members, each adjustable support member being pivotally attached to the second end of the vertical portion of the corresponding L-shaped bracket. Further, the multi-camera mount may also include an actuating mechanism including a motor having a drive shaft and a worm gear mounted on the drive shaft, the worm gear configured for allowing for finer and remote adjustments of each camera module.

Abstract: A projector includes: an exterior housing configuring an exterior; a projection optical device which projects an image toward a projection surface; and a plurality of operation buttons which, being disposed in such a way as to be exposed to the outside of the exterior housing, an image opening for allowing the image projected from the projection optical device to pass through is formed in one sidewall, among sidewalls configuring the exterior housing, which intersects in a vertical direction, the projection optical device includes a reflecting mirror which reflects the image, and projects it through the image opening, and the plurality of operation buttons are disposed on a side of the one sidewall farther from the projection surface than the image opening.

Abstract: An aerial panoramic oblique photography apparatus includes a pod body provided with at least two nadir cameras and a plurality of oblique cameras. The at least two nadir cameras are arranged in a transverse direction, and the shooting regions of adjacent nadir cameras of the at least two nadir cameras are partially overlapping. Since the aerial panoramic oblique photography apparatus is provided with at least two transversely arranged nadir cameras, a plurality of stripes of aerial images is obtained for each aerial oblique photo-shooting operation. This can increase photo-shooting efficiency, reduce the number of flight, and lower photo-shooting cost. The combination of at least two nadir cameras and a plurality of oblique cameras can capture texture of the sides of urban buildings from multiple angles. Three-dimensional real scenery model of a city can be established more efficiently and completely.

Abstract: A method, of seeding an optical proximity correction (OPC) process, includes: receiving, at an input device of a computer, a subject pre-OPC design-signature for a subject pre-OPC design package; selecting, by the processor and via interaction with an OPC database operatively connected to the computer, one amongst archived post-OPC design packages based on relatedness between the subject pre-OPC design-signature and archived post-OPC design-signatures corresponding to the archived post-OPC design packages, and thereby retrieving the selected archived post-OPC design packages; and generating one or more seeds for the OPC process based on the selected archived post-OPC design package.

Abstract: A manufacturing method of a photomask according to the embodiment sets an exposure condition applied when a resist is formed into a three-dimensional target shape by using a photomask including a plurality of light-shielding areas. Subsequently, the method sets a hypothetical target shape obtained by correcting a target shape based on a development characteristic of the resist for the exposure condition. Subsequently, the method creates a pattern of the photomask corresponding to the hypothetical target shape. Subsequently, the method simulates a prediction shape of the resist when the pattern is used. Subsequently, the method calculates a cost function related to an error between the prediction shape and the hypothetical target shape. Subsequently, the method adjusts the pattern based on a result of the calculation of the cost function.

Abstract: An imprint lithography method includes disposing a mask layer on a base substrate in first and in second areas, reducing a thickness of the mask layer in the first area, disposing a first planarization layer on the mask layer in the first and second areas, forming a first imprint pattern on the first planarization layer, forming a first planarization layer pattern by etching the first planarization layer using the first imprint pattern, forming a first mask pattern in the first area by etching the mask layer using the first planarization layer pattern, diposing a second planarization layer on the first mask pattern and the mask layer in the first and second areas, forming a second imprint pattern on the second planarization layer, forming a second planarization layer pattern by etching the planarization layer using the second imprint pattern, and forming a second mask pattern in the second area.

Abstract: An electrooptical apparatus includes a torsion hinge and a mirror support post that are formed integrally with an electroconductive member. Of the mirror support post (second support post), a first end portion at a substrate side has an open end whose opening faces the substrate. Of the mirror support post, a second end portion at a mirror side is a flat plate portion that closes the opening of the mirror support post. A mirror is in contact with the opposite side of the flat plate portion to the substrate. A first sacrificial layer for use for production of the electrooptical apparatus is formed by exposing and developing a photosensitive resist.

Abstract: A lithographic printing plate precursor includes (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, and (ii) a coating including a photopolymerisable layer, characterised in that the photopolymerisable layer includes a compound including at least one free radically polymerisable group and at least one moiety having a structure according to Formula (I): wherein X represents O or NR* and R* represents hydrogen, an optionally substituted alkyl, aryl, aralkyl or heteroaryl group; and * denotes the linking positions to the rest of the compound.

Abstract: A solder resist composition includes: (A) a carboxyl group-containing resin; (B) an epoxy compound; (C) titanium dioxide; (D) a photopolymerization initiator; and (E) an antioxidant. The component (B) contains a hydroquinone epoxy compound represented by following formula (1). The component (D) contains (D1) a bisacylphosphine oxide-based photopolymerization initiator and (D2) an ?-hydroxy alkylphenone-based photopolymerization initiator.

Abstract: A resin composition comprising a binder resin (A), a compound (B) having an acidic group or latent acidic group, an organic solvent (C), and a compound (D) having one atom selected from a silicon atom, titanium atom, aluminum atom, and zirconium atom and having a hydrocarbyloxy group or hydroxy group bonded with that atom, wherein the compound (B) is at least one type selected from the group consisting of an aliphatic compound, aromatic compound, and heterocyclic compound, and a content of the compound (B) is 0.1 to 2.5 parts by weight and a content of the compound (D) is 2.2 to 7.0 parts by weight with respect to 100 parts by weight of the binder resin (A) is provided.

Abstract: Provided herein is a method, including creating a first layer over a substrate, wherein the first layer is configured for directed self-assembly of a block copolymer thereover; creating a continuous second layer over the first layer by directed self-assembly of a block copolymer, wherein the second layer is also configured for directed self-assembly of a block copolymer thereover; and creating a third layer over the continuous second layer by directed self-assembly of a block copolymer. Also provided is an apparatus, comprising a continuous first layer comprising a thin film of a first, phase-separated block copolymer, wherein the first layer comprises a first chemoepitaxial template configured for directed self-assembly of a block copolymer thereon; and a second layer on the first layer, wherein the second layer comprises a thin film of a second, phase-separated block copolymer.

Abstract: Within area where of four heads installed on a wafer stage, heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the wafer stage is driven based on positional information which is obtained using the first head group, as well as obtain the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems is calibrated, which allows the measurement errors that come with the displacement between areas on scale plates where each of the four heads face.

Abstract: A novel method for the manufacturing of fine line circuitry on a transparent substrates is provided, the method comprises the following steps in the given order providing a transparent substrate, depositing a pattern of light-shielding activation layer on at least a portion of the front side of said substrate, placing a photosensitive composition on the front side of the substrate and on the pattern of light-shielding activation layer, photo-curing the photosensitive composition from the back side of the substrate with a source of electromagnetic radiation, removing any uncured remnants of the photosensitive composition; and thereby exposing recessed structures and deposition of at least one metal into the thus formed recessed structures whereby a transparent substrate with fine line circuitry thereon is formed. The method allows for very uniform and fine line circuitry with a line and space dimension of 0.5 to 10 ?m.

Abstract: Some embodiments include methods of forming structures supported by semiconductor substrates. Radiation-imageable material may be formed over a substrate and patterned into at least two separated features. A second material may be formed over the features and across one or more gaps between the features. At least one substance may be released from the features and utilized to alter a portion of the second material. The altered portion of the second material may be selectively removed relative to another portion of the second material which is not altered. Also, the features of radiation-imageable material may be selectively removed relative to the altered portion of the second material. The second material may contain one or more inorganic components dispersed in an organic composition. The substance released from the features of radiation-imageable material may be acid which forms cross-links within such organic composition, an hydroxyl, or any other suitable substance.

Abstract: The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.

Abstract: An exposure apparatus includes a projection system having a final optical element via which an exposure beam is projected, an immersion member having an opening through which the exposure beam is projected, liquid supply ports and liquid recovery ports, a stage which is movable below and relative to the projection system and the immersion member, the stage including a holder configured to hold a substrate, and a detection system configured to detect a residual liquid on at least one of the substrate held on the holder of the movable stage and the movable stage. A liquid immersion area that covers only a portion of the upper surface of the substrate is formed on an upper surface of the substrate held on the holder of the movable stage, while supplying immersion liquid via the liquid supply ports and removing the immersion liquid via the liquid recovery ports.

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.

Abstract: Methods and systems for estimating values of parameters of interest of actual device structures based on optical measurements of nearby metrology targets are presented herein. High throughput, inline metrology techniques are employed to measure metrology targets located near actual device structures. Measurement data collected from the metrology targets is provided to a trained signal response metrology (SRM) model. The trained SRM model estimates the value of one or more parameters of interest of the actual device structure based on the measurements of the metrology target. The SRM model is trained to establish a functional relationship between actual device parameters measured by a reference metrology system and corresponding optical measurements of at least one nearby metrology target. In a further aspect, the trained SRM is employed to determine corrections of process parameters to bring measured device parameter values within specification.

Abstract: A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.

Abstract: A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

Abstract: A toner comprising a toner particle that contains a binder resin, wherein the surface of the toner particle is covered with a resin A; the modulus of elasticity Ea of the resin A and the modulus of elasticity Eb of the binder resin satisfy the following formula: 0.5?(Ea/Eb)×100?50.0; and the adhesion force AT of the toner particle is at least 500 nN when a probe having spherical SiO2 attached at the tip of a cantilever is pressed into the toner particle at 3 ?N.

Abstract: Provided is a toner including at least: a binder resin; and a release agent, wherein in a transmission electron microscopic (TEM) image of a torn cross-section of the toner, the release agent has an acicular or filiform shape and an average aspect ratio of 31 or greater, and wherein a displacement amount of the toner when 250 micronewtons is applied to the toner in a microcompression test is 700 nm or less.

Abstract: In accordance with an embodiment, a toner particle comprises two or more glass transition temperatures. Wherein, a first glass transition temperature is within a range from 5 degrees centigrade to 20 degrees centigrade and a second glass transition temperature is within a range from 50 degrees centigrade to 65 degrees centigrade.

Abstract: A cleaning member includes a core and an elastic layer that is helically wound around an outer peripheral surface of the core. The elastic layer is divided into three or more elastic layer sections in a width direction, and a width of the elastic layer sections at both ends in the width direction is greater than a width of the one or more elastic layer sections in a central region between the elastic layer sections at both ends in the width direction. Alternatively, the elastic layer is divided into three or more elastic layer sections in the width direction, and a minimum thickness of the elastic layer sections at both ends in the width direction is smaller than a minimum thickness of the one or more elastic layer sections in the central region between the elastic layer sections at both ends in the width direction.

Abstract: An image forming apparatus includes a photosensitive member, a charging roller, a voltage source, a current detecting member, and a setting portion configured to set the DC voltage applied to the charging roller in an image forming period on the basis of a detection result of the detecting member when a DC voltage less than a discharge start voltage is applied from the voltage source to the charging roller in a period other than the image forming period, wherein the setting portion sets the DC voltage so that an absolute value of the DC voltage when an absolute value of the detected current is a first value is larger than an absolute value of the DC voltage when the absolute value of the detected current is a second value smaller than the first value.

Abstract: In one embodiment, an image forming apparatus has a mirror which reflects an optical scanning beam toward a photoreceptor, so as to expose the photoreceptor. A rotating member makes contact with the mirror, at an end portion of the mirror, to support the mirror, and rotates, to perform swing adjustment of the mirror. A stopper engages with the rotating member, at a position except a position on a straight line passing through a rotating shaft line of the rotating member and a contact position of the rotating member and the mirror, seen from a rotating shaft direction of the rotating member, to fix a rotation position of the rotating member.

Abstract: In an image forming apparatus, a correction control unit of an image clock control unit controls the frequency of an image clock, so that the partial magnification of each position in an image region in which an image is formed is corrected in a main scanning direction that is a direction in which a laser beam scans a scanning region of one line. When controlling the frequency of the image clock, the correction control unit makes the change rate (the slope) that is a change amount of the image clock per unit time, be smaller in a non-image region being a region other than the image region, than the change rate in the image region.

Abstract: An image forming apparatus includes first and second image forming units each having an image bearing member and an electrification portion. A developing bias application portion applies a common developing bias to first and second developer bearing members. A controller controls a second electrification bias application portion so as to have a voltage value of a second electrification bias applied to a second electrification portion in a first period different from that in a second period such that an absolute value of a potential difference between a surface potential of a second image bearing member and the common developing bias applied to the second developer bearing member in the first period is smaller than that in the second period.

Abstract: A developing cartridge includes a casing, a developer-carrying member, a supply member, a developing electrode, a supply electrode, and an insulating member. The casing is configured to accommodate therein developer. The developer-carrying member is configured to rotate about a rotational axis and carry the developer thereon. The supply member is configured to supply the developer to the developer-carrying member. The developing electrode is configured to be electrically connected to the developer-carrying member. The supply electrode is configured to be electrically connected to the supply member. The insulating member insulates the developing electrode and the supply electrode with each other. The developing electrode, the insulating member, and the supply electrode are overlapped in this order in an axial direction of the rotational axis.

Abstract: A developing device includes a first communication portion defining a communication path through which developer in a second chamber is communicated to a first chamber. The communication path has a first area and a second area. The first area is positioned within a range corresponding to a developer coating area of a developer bearing member in a conveyance direction of developer in the collection chamber, while the second area is positioned downstream of the developer coating area in the conveyance direction. A first length of the first area is shorter than a second length of the second area. The first length is a maximum length from a bottom surface portion of the communication path to an upper portion of the first area, and the second length is a maximum length from the bottom surface portion of the communication path to an upper portion of the second area.

Abstract: An image forming apparatus includes an image bearer, an intermediate transferor, a secondary transferor, a plurality of rotators including a secondary driving rotator, and a detector. The image bearer bears a detection image. The detection image is transferred from the image bearer to the intermediate transferor at a primary transfer position. The secondary transferor is looped around the plurality of rotators and disposed in contact with the intermediate transferor at a secondary transfer position where the detection image is transferred from the intermediate transferor to the secondary transferor. The secondary driving rotator drives the secondary transferor. The detector detects the detection image on the secondary transferor at a detection position. With this configuration, a distance from the secondary transfer position to the detection position on the secondary transferor is an integral multiple of a circumference of the secondary driving rotator.

Abstract: An electrophotographic photosensitive member includes a support member, an electroconductive layer, and photosensitive layer in this order. The electroconductive layer contains a binder and particles. The particles have a core containing titanium oxide, and a coating layer coating the core and containing titanium oxide doped with niobium or tantalum.