Abstract: A light source control apparatus includes a controller, and a plurality of drivers. The controller is configured to transmit an instruction value for adjusting a light amount of at least one light emitting unit. Each of the plurality of drivers is configured to obtain the transmitted instruction value, and to determine, by using a function of a driving value for driving the light emitting unit and the light amount, the function being each set for the light emitting unit, the driving value of the light emitting unit each on the basis of the instruction value.

Abstract: An electronic device according to embodiments of the invention include a fixing target member, a fixing portion having formed thereon a frame portion that is erected around a circumference of the fixing target member, a packing having a groove and disposed between the frame portion and the fixing target member, a core member disposed in the groove, and a pressing member that presses the core member towards the packing.

Abstract: A first holding member holds a first optical system and a first mirror, and has a first junction surface. A second holding member holds a second optical system and a second mirror, and has a second junction surface. A junction portion is configured such that, in a state where the first junction surface and the second junction surface are aligned with each other, the second holding member is capable of being shifted in a direction of both the junction surfaces and rotated around an optical axis, and makes it possible to perform optical axis alignment. An emission-side optical axis of the first optical system and an incidence-side optical axis of the second optical system are aligned with each other, and thus a U-shaped optical path is formed by the first and second optical systems.

Abstract: A projection device for forming an image frame on a projection screen includes a first illumination system for emitting an illumination beam, a second illumination system for emitting an ultraviolet beam, a first light valve located on a transmission path of the illumination beam and for converting the illumination beam into a visible image beam, a lens located on a transmission path of the visible image beam and the ultraviolet beam and for projecting the visible image beam onto the projection screen to form an image frame area and projecting the ultraviolet beam onto the projection screen to form an opaque area, and a processor electrically connected to the first illumination system and the second illumination system and for controlling the first illumination system to emit the illumination beam and controlling the second illumination system to emit the ultraviolet beam. The image frame area partially overlaps the opaque area.

Abstract: A projection screen for receiving a visible image beam and an ultraviolet beam from a projection device is provided. The projection screen includes a substrate, an anti-reflection layer and an anti-ultraviolet layer. The substrate includes a first surface adjacent to the projection device, a second surface away from the projection device and opposite to the first surface, a scattering reflection layer disposed between the first surface and the second surface, and an ultraviolet absorption layer disposed between the first surface and the second surface. The scattering reflection layer scatters and reflects the visible image beam. The ultraviolet absorption layer absorbs the ultraviolet beam so as to be changed from a transparent state to an opaque state. The anti-reflection layer is disposed on the first surface. The anti-ultraviolet layer is disposed at the second surface. The ultraviolet absorption layer is located between the scattering reflection layer and the anti-ultraviolet layer.

Abstract: Provided are a projection member in which a change in tint depending on a projection position is suppressed, a projection system, and a method of manufacturing the projection member. A projection member according to an embodiment of the present invention includes a reflecting layer that is obtained by immobilizing a cholesteric liquid crystalline phase, in which a helical pitch of the cholesteric liquid crystalline phase gradually changes in a plane direction of the reflecting layer.

Abstract: The present invention relates to a system in the form of a projection display system intended to be used to display projected images on an image display layer embedded on the surface of an object. The present invention more particularly relates to a projection display system comprising an image capturing device (14), a projector unit (20) and a passive screen (11). Said passive screen (11) comprises a display layer effecting displaying of at least one image projected thereon. Said passive screen (11) is further placeable on a surface of an object in the manner that said image capturing device (14) in optical communication with said passive screen (11) identifies physical boundaries of said passive screen (11) and the projector unit (20) projects at least one image scaled onto the passive screen (11) within the boundaries thereof.

Abstract: A polarization modulator for stereoscopic projection comprises a polarization beam splitting prism assembly for splitting an incident beam into a transmitted beam, an upper half of reflected beam, and a lower half of reflected beam, a polarization plane rotating component for rotating the polarization plane of the transmitted beam or of the upper half of reflected beam and the lower half of reflected beam by 90 degrees, a reflective mirror for adjusting a propagation direction of the upper half of reflected beam and the lower half of reflected beam, a lens group for adjusting the range of size of the transmitted beam, a linear polarizer for filtering the beam, a polarization modulator for modulating the transmitted beam, the upper half of reflected beam and the lower half of reflected beam into counter-clockwise circularly polarized light and clockwise circularly polarized light in the order of frames, and a driving circuit.

Abstract: A camera device includes a supporter, a plurality of camera units, a cover and a lens driving mechanism. The camera units are movably disposed on the supporter. The cover covers the supporter and the camera units. The lens driving mechanism includes a base, a pivoting component and a fixer. The base is disposed on the supporter. The pivoting component is disposed on the base. The fixer has a top surface and two supporting surfaces connected with each other. The supporting surfaces are used to support the camera units. The fixer includes a connective block disposed on a side of the supporting surface opposite to the top surface. The pivoting component is rotatably assembled with the connective block, so the fixer can rotate relative to the base and the camera units can be moved synchronously.

Abstract: An organic compound represented by general formula (1) is a novel organic compound having an absorption band in the near infrared region, and is useful for infrared absorbing dyes, optical films, and organic electronic devices such as photoelectric conversion elements, wherein R1 to R18 each independently represent a hydrogen atom, an aryl group, a heteroaryl group, an alkyl group, a cycloalkyl group, a halogen atom, a hydroxy group, an alkoxy group, a mercapto group, an alkylthio group, a nitro group, a substituted amino group, an amide group, an acyl group, a carboxyl group, an acyloxy group, a cyano group, a sulfo group, a sulfamoyl group, an alkylsulfamoyl group, a carbamoyl group, or an alkylcarbamoyl group; and X represents a substituted or unsubstituted methine group, a silylidyne group, a germylidyne group, a stannylidyne group, a nitrogen atom, a phosphorus atom, an arsenic atom, or an antimony atom.

Abstract: A reflective mask blank includes, on/above a substrate in the following order from the substrate side, a reflective layer which reflects EUV light, and an absorber layer which absorbs EUV light. The absorber layer contains Sn as a main component and Ta in an amount of 25 at % or more.

Abstract: An exposure mask includes a substrate, and a plurality of first films and a plurality of second films located alternately over each other over selected portions of the substrate. The exposure mask further includes a third film selectively located over the first and second films. At least one first pattern is located over the substrate and does not include any of the first, second or third films. At least one second pattern is located over the substrate and includes the first and second films and does not include the third film. At least one third pattern is located over the substrate and includes the first, second and third films.

Abstract: A fluid dispensing system, an imprint lithography system with a fluid dispensing system, a method of manufacturing an article with the fluid dispensing system. The fluid dispensing system comprising: a fluid dispenser and a heater. The fluid dispenser configured to dispense droplets of a fluid onto a substrate. The heater configured to maintain droplet temperature at greater than 23° C. Each of the droplets has a fluid volume that is less than 1.2 pL. The fluid dispenser is configured to have a drop placement accuracy for the imprint resist fluid that is less than a first threshold when the droplet fluid temperature is greater than 23° C. The drop placement accuracy is greater than the first threshold when the droplet fluid temperature is less than or equal to 23° C.

Abstract: An imprint apparatus including a stage supporting a stamp master on which a master pattern for forming a stamping pattern on a flexible substrate is formed, or a substrate on which a pattern corresponding to the stamping pattern is formed by contact with the stamping pattern; a roll-to-roll mover to move the flexible substrate along a path adjacent to the stage; a clamp including a front clamp that secures a first portion of the flexible substrate, and a rear clamp that secures a second portion of the flexible substrate spaced apart from the first portion; a pressure roller to press the flexible substrate so that the flexible substrate secured by the clamp is brought into contact with the substrate or the stamp master; and a clamp driving controller to drive the clamp to adjust tension between the first portion and the second portion.

Abstract: An imprinting apparatus and methods of forming imprinted patterns are provided. The imprinting apparatus may include an imprint template and an exposure system. The imprint template may include a mesa portion and a light blocking layer. The mesa portion may have a patterned surface providing imprinting patterns, and the light blocking layer may define a window region. The exposure system may be configured to alternately generate a first exposure light travelling toward the window region and a second exposure light travelling toward the patterned surface.

Abstract: An imprint apparatus cures an imprint material on a shot region of a substrate by light irradiation and forms a pattern on the shot region in a state in which a mold is in contact with the imprint material. The apparatus includes a shutter mechanism including a shutter plate configured to control light irradiation to the imprint material on the shot region and an actuator configured to drive the shutter plate, and a driving mechanism configured to change relative positions of the substrate and the mold. The shutter plate includes a first passing portion configured to irradiate a part out of a whole of the imprint material on the shot region with light and a second passing portion configured to irradiate the whole of the imprint material on the shot region.

Abstract: An imprint apparatus performs an imprint process by bringing a mold into contact with an imprint material arranged on a shot region of a substrate and curing the imprint material. The apparatus includes a controller configured to execute, in a case where an elapsed time from the supplying of the imprint material to the shot region until the contact with the mold falls outside an allowable range of a predetermined elapsed time, adjustment processing of adjusting an amount of the imprint material on the shot region at the timing of the contact.

Abstract: A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.

Abstract: A method for manufacturing a color filter substrate is provided in the present disclosure, that includes providing a substrate; forming a plurality of RGB color resists on the substrate, an upper surface of each of the RGB color resists forming a plurality of light emitting regions; forming a black matrix on the surface of each of the RGB color resists, wherein the black matrix covers a portion of the surface of each of the RGB color resists except the light emitting regions; forming a plurality of photo spacers on a surface of the black matrix in a plurality of empty areas within each of the RGB color resists, wherein the adjacent photo spacers are separated by one of the color resist regions; and forming a protective layer over the substrate.

Abstract: The present invention provides a resin composition which can result in a cured film which has chemical resistance, low stress property, and high elongation property even by a heat treatment at a low temperature. The resin composition comprising an alkali-soluble resin (a) which contains a phenol skeleton having a crosslinking group and a phenol skeleton not having a crosslinking group and which has a weight average molecular weight in the range of 1,000 to 50,000, wherein the content ratio of the phenol skeleton having a crosslinking group to the total 100% by mole of structural units of the phenol skeleton having a crosslinking group and the phenol skeleton not having a crosslinking group is in the range of 5 to 90% by mole.

Abstract: Provided are a photosensitive resin composition including: a binder having an I/O value equal to or greater than 0.5 and a weight-average molecular weight equal to or smaller than 25,000; a pigment; a polymerizable monomer; and a polymerization initiator, in which a content of the pigment is equal to or greater than 20% by mass with respect to a total amount of solid contents of the photosensitive resin composition, a transfer film including a photosensitive resin layer including the solid contents of the photosensitive resin composition, a manufacturing method of a pattern using the photosensitive resin composition or the transfer film, a decorative pattern using the photosensitive resin composition or the transfer film, and a touch panel including the decorative pattern.

Abstract: Provided are a photosensitive resin composition including: a binder; a polymerizable monomer; a polymerization initiator; a pigment; and a solvent, in which the polymerizable monomer includes a difunctional polymerizable monomer having a molecular weight equal to or smaller than 500, and a content of the difunctional polymerizable monomer having a molecular weight equal to or smaller than 500 is equal to or greater than 50% by mass with respect to a total mass of the polymerizable monomer, a transfer film, a decorative pattern, and a touch panel.

Abstract: According to one embodiment, a pattern formation method is disclosed. The method can include a film formation process, and a exposure process. The film formation process forms a pattern formation material film on a base body. The pattern formation material film includes a pattern formation material including a first portion and a second portion. The first portion includes at least one of acrylate or methacrylate. The second portion includes an alicyclic compound and a carbonyl group. The alicyclic compound has an ester bond to the at least one of the acrylate or the methacrylate. The carbonyl group is bonded to the alicyclic compound. The exposure process causes the pattern formation material film to expose to a metal compound including a metallic element.

Abstract: A photosensitive composition of an embodiment includes: a resin containing at least one selected from polyacrylic acid, polymethacrylic acid, a cycloolefin-maleic anhydride copolymer, polycycloolefin, and a vinyl ether-maleic anhydride copolymer and having an ester bond which is caused to generate carboxylic acid by an acid or an ether bond which is caused to generate alcohol by an acid; and a photo acid generator which generates an acid by being irradiated with light, of which a wavelength is not less than 300 nm nor more than 500 nm, or KrF excimer laser light, the photo acid generator containing a substance that has a naphthalene ring or a benzene ring and in which at least one carbon atom of the naphthalene ring or the benzene ring is bonded to a bulky group.

Abstract: According to one embodiment, a pattern formation material includes a first monomer. The first monomer includes a first molecular chain, a first group, and a second group. The first molecular chain includes a first end and a second end. The first group has an ester bond to the first end. The second group has an ester bond to the second end. The first group is one of acrylic acid or methacrylic acid. The second group is one of acrylic acid or methacrylic acid. The first molecular chain includes a plurality of first elements bonded in a straight chain configuration. The first elements are one of carbon or oxygen. The number of the first elements is 6 or more. A film including the first monomer is caused to absorb a metal compound including a metallic element.

Abstract: The invention provides a resist underlayer film forming composition which contains a compound having a glycoluril skeleton and which prevents collapse of a resist pattern formed on a substrate in a lithography process during semiconductor production; a resist underlayer film which uses this composition; and a method for producing a semiconductor device. The compound is of formula (1-1), wherein each of R1-R4 represents a C2-C10 alkyl group wherein a hydrogen atom is substituted by at least one substituent selected from the group consisting of a hydroxy group, a thiol group, a carboxyl group, C1-C5 alkoxyethyl groups, C1-C5 alkylsulfanyl groups and organic groups containing an ester bond, or a C2-C10 alkenyl group; the R1-R4 moieties may be the same as or different from each other; and each of R5 and R6 represents a hydrogen atom or a group selected from among C1-C10 alkyl groups and a phenyl group.

Abstract: The disclosure relates to a sequential infiltration synthesis for treatment of infiltrateable material.

Abstract: Exhaust of gas in the processing chamber is started by a gas exhaust section, and supply of an inert gas into the processing chamber is started by a gas supply section after a predetermined time length has elapsed since the exhaust of gas is started. Alternatively, the gas in the processing chamber in which a substrate is stored is exhausted by the gas exhaust section, the inert gas is supplied into the processing chamber by the gas supply section, and the pressure in a light emitter that has a light-transmitting plate is allowed to match or be close to the pressure in the processing chamber. The substrate in the processing chamber is irradiated with vacuum ultraviolet rays by the light emitter with an oxygen concentration in the gas in the processing chamber lowered to a predetermined concentration. Thus, the substrate is exposed.

Abstract: A method for cleaning masking material is provided. A sacrificial layer is patterned to form a masking material over a semiconductor structure. The method includes plasma striping a top surface of the masking material, and cleaning the masking material by a hot ammonia solution.

Abstract: A method including: computing a value of a first variable of a pattern of, or for, a substrate processed by a patterning process by combining a fingerprint of the first variable on the substrate and a certain value of the first variable; and determining a value of a second variable of the pattern based at least in part on the computed value of the first variable.

Abstract: The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical system; and a phase modulating member which is arranged in the optical path on the illumination target surface side with respect to the polarization converting member and which transmits light from the pupil intensity distribution so as to convert linearly polarized light thereof polarized in a first direction, into required elliptically polarized light and maintain a polarization state of linearly polarized light polarized in a second direction (X-direction or Y-direction) obliquely intersecting with the first direction, in order to reduce influence of retardation caused by a subsequent optical system between the polarization converting member and the illumination targe

Abstract: An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.

Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Abstract: When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in a direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.

Abstract: A process for manufacturing a flat, polymer-coated electrostatic chuck platen involves imposing forces on the chuck to compensate for platen warpage induced during shrinkage of the polymer coating as it is cured.

Abstract: A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.

Abstract: A photo-sensitive layer is applied over a wafer. The photo-sensitive layer is exposed. In some embodiments, the photo-sensitive layer is exposed to EUV light. The photo-sensitive layer is baked. The photo-sensitive layer is developed. Humidity is introduced in at least one of: the applying, the baking, or the developing.

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

Abstract: The present invention provides a calculation method of calculating optical characteristics of a projection optical system that change due to heat during exposure of a substrate, the method comprising measuring image point positions at different measurement times for a plurality of measurement points on an object plane of the projection optical system; and calculating the optical characteristics based on the image point position measured in the measuring for each of the plurality of measurement points and measurement time for each of the plurality of measurement points.

Abstract: A connection arrangement for connecting an optical component of an optical imaging arrangement to a support unit of a support structure includes: a connecting element unit having a support interface end with support interface section; and a component interface end with a component interface section.

Abstract: A method of determining positions of marks, the marks comprising periodic structures, at least some of the structures comprising periodic sub-structures, the sub-structures having a smaller period than the structures, the marks formed with positional offsets between the sub-structures and structures, the positional offsets caused by a combination of both known and unknown components, the method comprising illuminating a plurality of the marks with radiation having different characteristics, detecting radiation diffracted by the marks using one or more detectors which produce output signals, discriminating between constituent parts of the signals, the discriminating based on a variation of the signals as a function of spatial positions of the marks on a substrate, selecting at least one of the constituent parts of the signals, and using the at least one selected constituent part, and information relating to differences between the known components, to calculate a corrected position of at least one mark.

Abstract: An electrophotographic photosensitive member (1) includes a conductive substrate (2) and a photosensitive layer (3). The photosensitive layer (3) is a single-layer photosensitive layer containing at least a charge generating material, an electron transport material, a hole transport material, and a binder resin. The electron transport material includes a naphthoquinone derivative represented by general formula (1). An amount of triboelectric charge of calcium carbonate as measured by charging the calcium carbonate through friction with the photosensitive layer (3) is at least +7 ?C/g. In general formula (1), R11 and R12 are respectively the same as R11 and R12 described in the description.

Abstract: A positively chargeable toner includes a plurality of toner particles each including a toner mother particle and an external additive attached to a surface of the toner mother particle. The external additive includes first resin particles each having a surface to which a cationic surfactant is attached and second resin particles each having a surface to which a cationic surfactant is attached. The first resin particles have a hydrophobicity of at least 15% and no greater than 30%. The second resin particles have a hydrophobicity of at least 50% and no greater than 80%. A first resin particle coverage ratio and a second resin particle coverage ratio each are at least 10% and no greater than 30%. Each blocking rate of the first resin particles and the second resin particles is no greater than 30% by mass.

Abstract: An image forming apparatus includes an image holding member, a charging device that charges a surface of the image holding member, an electrostatic charge image forming device that forms an electrostatic charge image on the charged surface of the image holding member, a developing device that has an electrostatic charge image developer containing an electrostatic charge image developing toner and that develops the electrostatic charge image to form a toner image on the surface of the image holding member, and a transfer device that transfers the toner image onto a recording medium, wherein the transfer device includes a belt member and a transfer member, the belt member has an outer surface that contacts the image holding member, and the belt member is winding around the image holding member and the transfer member; and the toner has a binder resin containing an amorphous polyester resin.

Abstract: A positively chargeable toner includes a plurality of toner particles. Each of the toner particles includes a toner mother particle and an external additive adhering to a surface of the toner mother particle. The external additive includes a plurality of resin particles. Each of the resin particles has a resin mother particle and a coat layer covering at least a portion of a surface of the resin mother particle. The coat layer contains a specific vinyl resin.

Abstract: An object of the present invention is to provide a ferrite carrier core material for an electrophotographic developer having desired resistance properties and charging properties with small environmental variation of resistivity and charge amount while maintaining the advantages of ferrite carriers, a ferrite carrier for an electrophotographic developer, an electrophotographic developer using the ferrite carrier, and a method for manufacturing the ferrite carrier core material for an electrophotographic developer. In order to solve the problem, a ferrite carrier core material comprising ferrite particles containing 15 mass % or more and 25 mass % or less of Mn, 0.5 mass % or more and 5.0 mass % or less of Mg, 0.05 mass % or more and 4.0 mass % of Sr, and 45 mass % or more and 55 mass % or less of Fe, with Si localized in the surface thereof is used.

Abstract: An image forming apparatus includes: a photoreceptor having a photosensitive layer formed on a surface; a charging device that electrically charges the surface of the photoreceptor through electric discharge between the charging device and the photoreceptor; and a hardware processor that: calculates a peak-to-peak voltage to be applied to the charging device, using a measured value of a relative dielectric constant of the charging device, the relative dielectric constant having been measured in advance; and controls a voltage to be applied to the charging device, to apply the peak-to-peak voltage calculated by the hardware processor to the charging device.