Abstract: A semiconductor device according to an embodiment of the disclosure includes: a first substrate; a TFT element provided on the first substrate with a first interlayer insulating layer interposed therebetween, and including a semiconductor layer and a gate electrode that is provided on the semiconductor layer with a gate insulating layer interposed therebetween; and a second substrate disposed to face the first substrate. The gate electrode includes a first electroconductive film and a second electroconductive film that has a light-shielding property in order from side of the semiconductor layer. The second electroconductive film extends from a side face to a bottom face of each of a pair of openings that are provided to interpose the semiconductor layer.

Abstract: A thin film transistor, a method for manufacturing the same, an array substrate and a display device are provided. The method for manufacturing a thin film transistor includes: providing a substrate; forming an active layer and a light shielding layer covering the active layer on the substrate by a patterning process, the light shielding layer being formed of a photoresist material; and forming a source-drain electrode layer and a passivation layer covering the source-drain electrode layer.

Abstract: A liquid crystal display device comprising a TFT substrate having pixels each including a common electrode formed on an organic passivation film, an interlayer insulating film formed so as to cover the common electrode, a pixel electrode having a slit and formed on the interlayer insulating film, a through-hole formed in the organic passivation film and the interlayer insulating film, and a source electrode electrically conducted to the pixel electrode via the through-hole. A taper angle at a depth of D/2 of the through-hole is equal to or more than 50 degrees. The pixel electrode covers part of a side wall of the through-hole but does not cover the remaining part of the side wall of the through-hole. This configuration facilitates the alignment film material to flow into the through-hole, thereby solving a thickness unevenness of the alignment film in vicinity of the through-hole.

Abstract: A display device that is suitable for increasing in size is provided. A display device with high resolution is provided. The display device has a structure in which two adjacent gate lines are supplied with the same selection signal. In addition, two pixels adjacent in the column direction are connected to respective source lines. Furthermore, one of the two source lines overlaps with a conductive layer functioning as a pixel electrode. Moreover, part of a semiconductor layer of a transistor is provided between the two source lines.

Abstract: A liquid crystal display assembly is provided. The liquid crystal display assembly includes a first substrate, a second substrate, and a liquid crystal layer. First component units are disposed on a bottom surface of the first substrate. Second component units are disposed on a top surface of the second substrate. The first component units and the second component units have a one-to-one correspondence. A first thin-film transistor and a second thin-film transistor overlap with each other along a direction perpendicular to the first substrate and the second substrate.

Abstract: Methods of manufacturing electrochromic windows are described. An electrochromic device is fabricated to substantially cover a glass sheet, for example float glass, and a cutting pattern is defined based on one or more low-defectivity areas in the device from which one or more electrochromic panes are cut. Laser scribes and/or bus bars may be added prior to cutting the panes or after. Edge deletion can also be performed prior to or after cutting the electrochromic panes from the glass sheet. Insulated glass units (IGUs) are fabricated from the electrochromic panes and optionally one or more of the panes of the IGU are strengthened.

Abstract: Methods for cutting strengthened glass are disclosed. The methods can include using a laser. The strengthened glass can include chemically strengthened, heat strengthened, and heat tempered glass. Strengthened glass with edges showing indicia of a laser cutting process are also disclosed. The strengthened glass can include an electrochromic film.

Abstract: Systems, methods, and computer-readable media are disclosed for self-healing flexible electrophoretic displays and related devices. In one embodiment, an example flexible electrophoretic display may include a flexible plastic thin film transistor (TFT) backplane having a first width, an electrophoretic layer coupled to the flexible plastic TFT backplane, an electrode layer coupled to the electrophoretic layer, an integrated circuit disposed on the flexible plastic TFT backplane, and a protective sheet having a second width that is greater than or equal to the first width.

Abstract: An optical modulation device includes: a Mach-Zehnder modulator including a semiconductor waveguide; a plurality of phase modulators that are spaced from each other; a first amplifier that is coupled with an input transmission line transmitting an electrical signal, has an input impedance substantially equal to a characteristic impedance of the input transmission line; a first interconnection that is coupled to the first amplifier and transmits the electrical signal to a first end of one of the plurality of phase modulators that is provided on an input side of the Mach-Zehnder modulator; a second interconnection that is coupled to the first amplifier and transmits the electrical signal to a first end of the other of the plurality of phase modulators that is provided on an output side of the Mach-Zehnder modulator; and a plurality of termination resistors respectively coupled to second ends of the plurality of phase modulators.

Abstract: In photonic integrated circuits implemented in silicon-on-insulator substrates, non-conductive channels formed, in accordance with various embodiments, in the silicon device layer and/or the silicon handle of the substrate in regions underneath radio-frequency transmission lines of photonic devices can provide breaks in parasitic conductive layers of the substrate, thereby reducing radio-frequency substrate losses.

Abstract: A terahertz wave generator 1 includes a nonlinear crystal 4, which is capable of generating a terahertz wave TH, a pumping beam emitter 2, which emits a pumping beam L1, a seed beam emitter 3, which is disposed so as to be parallel to a nonlinear crystal 4 and emits a seed beam L2, a first total reflection mirror 17 and a second total reflection mirror 18, which successively reflect the seed beam L2 emitted from the seed beam emitter 3 to cause the seed beam L2 to be incident on the nonlinear crystal 4, and a convex lens 6, which collects the seed beam L2.

Abstract: A mobile device with variable aperture function includes two driving members, which deformation and retraction can be controlled to cause movement of a light hole of a movable aperture sheet towards a camera lens, where the amount of light entering into the camera lens is determined by the light hole of the movable aperture sheet and when the light hole in the movable aperture sheet moves away from the camera lens, the amount of light entering into the camera lens is determined by the camera lens itself, thereby varying the amount of light entering into the camera lens and eliminating the fixed amount of light due to the fixed aperture of the prior art mobile device and permitting miniaturization of the present mobile device.

Abstract: There is provided an image pickup apparatus including: a main body provided with an image pickup section; a viewfinder capable of performing state transition between a housed state in which the viewfinder is housed in the main body and a usage state in which the viewfinder projects from the main body; a first detection section configured to detect use of the viewfinder unit by a user; and a control section configured to turn on or turn off the first detection section based on the state transition.

Abstract: A two-piece extendable L-plate provides clearance between a camera and a quick-release receiver securing the camera to a support permitting a camera having cables connected to the side of the camera's body to be secured in either a landscape or a portrait orientation.

Abstract: A wavelength conversion element includes a wavelength conversion layer which has a first face on which an excitation light is incident and a second face facing the first face, a first layer which is provided facing the second face and contains a first inorganic oxide, a second layer which is provided facing the first layer, contains either silver or aluminum, and reflects the excitation light or a light obtained by wavelength conversion of the excitation light by the wavelength conversion layer, a third layer which is provided facing the second layer and contains a first metal other than silver or aluminum, a fourth layer which is provided facing the third layer and contains the first inorganic oxide or a second inorganic oxide that is different from the first inorganic oxide, and a fifth layer which is provided facing the fourth layer and contains a metal.

Abstract: According to an embodiment, a display device includes a reflecting member and a display. The reflecting member has a reflecting surface and has an optical property that reflected light of parallel light incident on the reflecting surface is focused a focal point. The reflecting member is fixed to a couch top on which a user lies down. The display has a display surface for displaying an image. The display is fixed to the couch top so that the display surface is positioned between the focal point and the reflecting surface to face the reflecting surface.

Abstract: A kit for creating a flat folding projection device is provided and includes a lens and a sheet defining at least a first, second, third and fourth panels, each panel separated from the other panels by at least one fold. A hole is positioned in the first panel, the hole defining an edge. A cut is positioned in the first panel adjacent to the hole such that the first panel on either side of the cut can be separated to create a space configured to receive and hold the lens therein. Further includes is one of: a light source, a translucent sheet or a light source and a translucent sheet. An envelope contains the foregoing such that a thickness of the envelope is less than ½ inches.

Abstract: One general aspect includes a retractable screen system for a vehicle interior, the system including: a retracting module mounted to the backside of the backrest of a vehicle operator seat via an attachment rail; an attachment bar mounted to the backside of the backrest of a vehicle passenger seat, one side of the attachment bar including a ridge; a flexible screen configured to deploy from the retracting module in a lateral direction and releasably attach to the attachment bar ridge via an attachment clip so as to establish a viewing surface adapted to display a projected video output of a projector, the projector installed in the vehicle interior; and where the attachment rail is configured to enable the retracting module to move in relation to a substantially vertical axis.

Abstract: An image reading apparatus comprises a housing having a document table glass, a scanner section, a cover member, an adsorption board, a driving section and a controller. The cover member is connected to the housing to be rotatable around a first rotation center line with respect to the housing between a closed position where the document table glass is covered and an open position. The adsorption board, arranged in a part at a housing side at the time the cover member is positioned at the closed position, has an adsorption surface adsorbing the original document, and is connected to the cover member to be rotatable around a second rotation center line parallel to the first rotation center line. The driving section adsorbs the original document on the adsorption surface of the adsorption board.

Abstract: A test device for the image-capturing ability of a fish-eye camera comprises a test box, an image test console carrying the fish-eye camera, a light plate on the image test console to cover the fish-eye camera, and a plurality of light source plates in the test box, surrounding the image test console and the light plate. The light plate further comprises a cap, the cap being a hollow hemisphere.

Abstract: To provide a reflective mask blank having pseudo defects significantly excluded. The reflective mask blank comprises a substrate, a reflective layer for reflecting EUV light, formed on the substrate, and an absorber layer for absorbing EUV light, formed on the reflective layer, wherein Ssk<1.0 is satisfied, where Ssk is skewness in a region of 1 ?m×1 ?m on the absorber layer side surface.

Abstract: Various embodiments provide a method for processing a carrier, the method including changing the three-dimensional structure of a mask layer arranged over the carrier so that at least two mask layer regions are formed having different mask layer thicknesses; and applying an ion implantation process to the at least two mask layer regions to form at least two implanted regions in the carrier having different implantation depth profiles.

Abstract: A glass substrate for a mask blank includes two main surfaces facing each other and surfaces to be chamfered. The surfaces to be chamfered are provided peripherally around the two main surfaces. A flatness of one of the main surfaces is 100 nm or less. On the surface to be chamfered from which substrate corner parts are excluded, each of the substrate corner part being portions where a distance from an outer end of a two-dimensional projection profile of the one of the main surfaces and the surface to be chamfered is within 10 mm, a waviness measured in a range of 2 mm at an arbitrary part in a direction parallel to one side closest to the surface to be chamfered in the two-dimensional projection profile is 50 nm or less.

Abstract: There is provided a pellicle wherein each edge area where the inner wall of the pellicle frame meets the upper end face or the lower end face, respectively, of the pellicle frame consists not only of the conventional single chamfer face but also of additional attempt(s) to make the edge area virtually rounded, such as additional chamfering(s) or rounding, whereby the edge area is devoid of cracking and scars.

Abstract: In a pattern formation method according to an embodiment, a resist pattern is formed on a first film formed on a substrate. In the process for forming the resist pattern, the resist pattern includes a first pattern including a defect in a predetermined region on the first film. Next, a second film is accumulated on the first pattern in the predetermined region. Furthermore, a second pattern is formed in the first film with the resist pattern and the second film. Then, a third pattern is formed in the predetermined region on the first film.

Abstract: A pattern correction amount calculating apparatus includes: an accepting unit that accepts pattern information; a micro side group acquiring unit that acquires a micro side group, which is a group of continuous sides forming a contour of a pattern figure indicated by the pattern information, and is a group of micro sides that are each small enough to satisfy a predetermined condition; a virtual side acquiring unit that acquires a virtual side, which is a side that approximates micro sides contained in the micro side group; a virtual side correction amount calculating unit that calculates a virtual side correction amount, which is a correction amount for the virtual side; and a micro side correction amount calculating unit that calculates micro side correction amounts, which are correction amounts respectively for the micro sides contained in the micro side group corresponding to the virtual side, using the virtual side correction amount.

Abstract: Systems and methods for isolating a membrane during fabrication. The membrane is connected to a substrate wafer using a plurality of magnets of uniform dimensions formed into two or more magnet stack beams. The magnet stack beams provide a gap between the wafer and the membrane. The wafer connected to the membrane by the magnet stack beams is received by a substrate holder so that a space is present between the membrane and the substrate holder. The membrane is rinsed by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.

Abstract: According to one embodiment, an imprint apparatus including multiple types of imprint units and a conveyor to convey a substrate is provided. Each of the imprint units includes a suction mechanism configured to hold the substrate with multiple suction portions on a substrate holder, and a template having an imprint surface on which a concavo-convex pattern is formed on one face of a template substrate and having a recessed region in the other face, the recessed region corresponding to the imprint surface. The imprint units have different depths of the recessed regions in the templates and different arrangements of the suction portions in the suction mechanisms depending on the types.

Abstract: A method for applying a masked overgrowth layer onto a seed layer for producing semiconductor components, characterized in that a mask for masking the overgrowth layer is imprinted onto the seed layer.

Abstract: The present invention relates to a polymerizable composition comprising at least one ethylenically unsaturated, polymerizable compound and at least one oxime sulfonate compound of the formula I QAaBbCc??(I) where a is 0, 1, 2, 3, 4 or 6, b is 0, 1, 2, 3, 4 or 6, and c is 0, 1, 2, 3, 4 or 6, where the sum of a+b+c is 1, 2, 3, 4 or 6 where A is a group B is a group C is a group where # denotes the point of attachment to Q; X is S or NR14 and Q, R1, R2, R3 and R14 are as defined in claim 1 and in the description. The present invention also relates to the use of the this composition, to novel oxime sulfonates and the use of the oxime sulfonates as thermal curing promoter.

Abstract: A color developing composition which develops colors in a high density and does not significantly discolor when aged, a lithographic printing plate precursor which has excellent plate-inspecting properties by means of color development and is capable of maintaining strong color development even when aged after color development, a plate making method for a lithographic printing plate in which the lithographic printing plate precursor is used, and a new compound that can be preferably used as a color developer. The color developing composition of the present invention includes a compound represented by Formula 1. The compound in the present invention is represented by Formula 1. In Formula 1, R1 represents a group in which an R1—O bond is cleaved by heat or exposure to infrared rays.

Abstract: A method of producing a flexographic printing plate using a continuous liquid interphase is provided herein. This method allows for significantly reduced production times and fewer preparation steps compared to standard non-continuous techniques and results in less waste than typical methods for preparing flexographic printing plates. The printing plate provided by using continuous liquid interphase production results in a printing plate with desirable elastomeric elongation, desirable hardness, plate thickness in the range of 0.030 inches to 0.250 inches, and comprises printing dots with desirable characteristics.

Abstract: The invention relates to naphthyl urethane acrylates particularly useful as writing monomers in photopolymer formulations for holographic media. The invention further relates to a photopolymer formulation comprising matrix polymers, writing monomers and photoinitiators, wherein the writing monomers comprise a naphthyl urethane acrylate according to the invention, to a holographic medium comprising matrix polymers, writing monomers and photoinitiators, wherein the writing monomers comprise a naphthyl urethane acrylate according to the invention, and also to a display comprising a holographic medium according to the invention.

Abstract: A negative photosensitive composition including an epoxy group-containing resin; and a cationic polymerization initiator containing one or more types of the following cationic polymerization initiators: a compound represented by formula (b0-1) and a compound represented by formula (b0-2), and a cationic polymerization initiator which generates an acid having a pKa of ?3 or more. In the formulae, Rb01 to Rb04 are each independently a fluorine atom or an aryl group which may have a substituent, Rb05 is a fluorine atom or a fluorinated alkyl group which may have a substituent, a plurality of Rb05's may be the same as or different from each other, q is an integer of 1 or more, and Qq+'s are each independently a q-valent organic cation.

Abstract: To provide a photosensitive resin composition containing a crosslinkable fluororesin which hardly damages a substrate of e.g. an organic semiconductor when a resin film is formed, and a resin film using it, an organic semiconductor device and its production process, and a fluororesin suitable for the photosensitive resin composition. A photosensitive resin composition comprising a fluororesin having a polymerizable carbon-carbon double bond and having a fluorine atom content of at least 47 mass %, a crosslinking agent having a polymerizable carbon-carbon double bond (excluding the fluororesin), a photoinitiator and a non-aromatic fluorinated solvent.

Abstract: Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate under low irradiation, a high ? value, and high sensitivity, and a positive resist composition that can efficiently form a high-resolution pattern. The polymer includes an ?-methylstyrene unit and a methyl ?-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.48. In the polymer, the proportion of components having a molecular weight of less than 6,000 is no greater than 0.5% and the proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent.

Abstract: A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va1 is a divalent hydrocarbon group. na1 represents an integer of 0 to 2. Ra?12 and Ra?13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra?14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), Rb1 represents a cyclic hydrocarbon group. Yb1 represents a divalent linking group containing an ester bond. Vb1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and Mm+ is an m-valent organic cation.

Abstract: Provided are ionic thermal acid generators of the following general formula (I): wherein: Ar1 represents an optionally substituted carbocyclic or heterocyclic aromatic group; W independently represents a group chosen from carboxyl, hydroxy, nitro, cyano, C1-5 alkoxy and formyl; X is a cation; Y independently represents a linking group; Z independently represents a group chosen from hydroxyl, fluorinated alcohols, esters, optionally substituted alkyl, C5 or higher optionally substituted monocyclic, polycyclic, fused polycyclic cycloaliphatic, or aryl, which may optionally comprise a heteroatom, provided at least one occurrence of Z is a hydroxyl group; a is an integer of 0 or greater; b is an integer of 1 or greater; provided that a+b is at least 1 and not greater than the total number of available aromatic carbon atoms of the aromatic group. Also provided are photoresist pattern trimming compositions and methods of trimming a photoresist pattern using the trimming compositions.

Abstract: The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2).

Abstract: Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.

Abstract: A method for imparting water repellency to a surface of a member includes a step in which a material including a compound containing a fluorine atom is deposited on a surface of a photosensitive resin layer in order to form a member including a material layer; a first exposure step in which the member is exposed to an amount of light with an exposure apparatus in order to form a latent image in the member; a development step in which the member including the latent image is developed; and a second exposure step in which the member is exposed to an amount of light with an exposure apparatus subsequent to the development step.

Abstract: Provided are topcoat compositions that include: a matrix polymer; a surface active polymer; an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.

Abstract: Provided is a resist underlayer film composition which is excellent in resistance to a basic hydrogen peroxide aqueous solution, in gap-filling and planarization characteristics, and in dry etching characteristic, wherein the resist underlayer film composition is used for a multilayer resist method, comprising: (A1) a polymer (1A) comprising one, or two or more, of a repeating unit represented by following general formula (1); (A2) one, or two or more, of a polyphenol compound having a formula weight of 2,000 or less and not having a 3,4-dihydroxy phenyl group; and (B) an organic solvent.

Abstract: The invention relates to a method for preparing a relief printing plate from a printing plate precursor wherein at least an end of the precursor is attached to a leader forming a composite printing form precursor that securely mounts the precursor in a treatment processor. The present method advantageously allows for all or substantially all of the area of the precursor to be utilized for forming the relief surface suitable for printing.

Abstract: An image forming device in which a plurality of nozzles are aligned in a designated alignment direction, wherein a plurality of pixels constituting a formed image includes dot omission pixels continuous in a scan direction by a defective nozzle included in the plurality of nozzles, and neighboring pixels within a designated distance in the alignment direction from the dot omission pixels, the image forming device comprising a pattern determining unit configured to determine a dot pattern after supplementation formed on neighboring pixels within designated range based on at least the number of dots to be formed on the pixels within the designated range including a portion of the dot omission pixels and a portion of the neighboring pixels according to recording data before supplementation of dots by the defective nozzle, and a pattern forming unit configured to form the dot pattern after supplementation.

Abstract: A light source arrangement for a photolithography exposure system comprises at least three light sources with different wavelengths, and a beam splitting unit comprising at least three inputs, one output, and at least two reflecting faces. An input is assigned to each light source and each reflecting face. The reflecting face reflects light that is emitted from the light source assigned to a corresponding input thereof into the output. The three light sources are arranged on three different sides around the beam splitting unit.

Abstract: An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.

Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

Abstract: At least one lithography apparatus that suppresses a decrease in the accuracy of stage control is provided. A lithography apparatus includes a moving unit configured to move with an original or a substrate mounted thereon, a plurality of measurement units configured to obtain information about a position of the moving unit, measurement areas of the respective measurement units overlapping each other, and a control unit configured to switch the measurement units used to obtain the information about the position of the moving unit, based on a switching position lying in an overlapping measurement area, wherein, in a case where a plurality of processes is performed on one of a plurality of processing targets on the original or on the substrate, the control unit makes the switching position changeable and controls the measurement units so that the same one of the measurement units is used in performing the plurality of processes.